• JSTS:Journal of Semiconductor Technology and Science
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• 제14권1호
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• pp.34-39
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• 2014

This paper discusses the 3-level charge pumping (CP) method in planar-type Silicon-Oxide-High-k-Oxide-Silicon (SOHOS) and Silicon-Oxide-Nitride-Oxide-Silicon (SONOS) devices to find out the reason of the degradation of data retention properties. In the CP technique, pulses are applied to the gate of the MOSFET which alternately fill the traps with electrons and holes, thereby causing a recombination current Icp to flow in the substrate. The 3-level charge pumping method may be used to determine not only interface trap densities but also capture cross sections as a function of trap energy. By applying this method, SOHOS device found to have a higher interface trap density than SONOS device. Therefore, degradation of data retention characteristics is attributed to the many interface trap sites.

• 대한전자공학회논문지
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• 제25권7호
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• pp.780-790
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• 1988

We have studied the hot-carrier-induced degradation caused by the high channel electric field due to the decrease of the gate length of MOSFET used in VLSI. Under DC stress, the condition in which maximum substrate current occures gave the worst degradation. Under AC dynamic stress, other conditions, the pulse shape and the falling rate, gave enormous effects on the degradation phenomena, especially at 77K. Threshold voltage, transconductance, channel conductance and gate current were measured and compared under various stress conditions. The threshold voltage was almost completely recovered by hot-injection stress as a reverse-stress. But, the transconductance was rapidly degraded under hot-hole injection and recovered by sequential hot-electron stress. The Si-SiO2 interface state density was analyzed by a charge pumping technique and the charge pumping current showed the same trend as the threshold voltage shift in degradation process.

• 한국전기전자재료학회논문지
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• 제16권2호
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• pp.97-101
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• 2003

New Pt/Ti and hi/Ti double-metal structures have been investigated for the application of a diffusion barrier between Cu and Si in deep submicron integrated circuits. Pt/Ti and Ni/Ti were deposited using E-beam evaporator at room temperature. The performance of Pt/Ti and Ni/Ti structures as diffusion barrier against Cu diffusion was examined by charge pumping method, gate leakage current, junction leakage current, and SIMS(secondary ion mass spectroscopy). These evaluation indicated that Pt/Ti(200${\AA}$/100${\AA}$) film is a good barrier against Cu diffusion up to 450$^{\circ}C$.

• 대한전자공학회논문지SD
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• 제45권5호
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• pp.50-57
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• 2008

본 논문에서는 CMOS image sensor(CIS)에서 사용될 수 있는 고 효율 charge pump를 제안하였다. 제안된 charge pump는 CIS의 동작 특성을 활용하여 switching loss 및 reversion loss를 최소화하여 고 효율 동작을 실현하였다. 즉, CIS 픽셀 동작 구간에 따라 local clock driver, 펌핑 커패시터, 그리고 charge 전달 switch의 크기를 역동적으로 조절함으로써 switching loss 를 최소화하였다. 또한, schmitt trigger를 채용한 tri-state local clock driver를 이용하여 non-overlapping 구간이 충분히 확보된 local clock을 공급할 수 있게 함으로써 reversion loss를 최소화하였다. 0.13-um CMOS 공정을 이용한 시뮬레이션 비교 결과, 제안된 charge pump는 구동 전류가 없는 조건에서 기존 구조에 비해 최대 49.1% 전력 소모를 개선하였으며, 구동 전류가 최대인 조건에서는 19.0% 전력 소모를 개선할 수 있었음을 확인하였다.

• 대한전기학회논문지:전기기기및에너지변환시스템부문B
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• 제53권2호
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• pp.76-81
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• 2004

This paper deals with characteristic analysis and experiments on components of low-Tc(LTS) power supply. A LTS power supply consists of two exciters, a rotor, a stator, and an LTS magnet. The power supply has eight rotating poles, which make rotational magnetic flux. These flux penetrate superconducting sheets and cause currents which charge an LTS load. In this experiment, a 25.8mH LTS magnet was used, and rotor revolutions from 30 to 300rpm were used. In order to measure the pumping-current with respect to the magnet flux changes, a hall sensor was installed at the center of the LTS magnet. The experimental observations have been compared with the theoretical predictions. In this experiment, the pumping-current has reached about 372A.

• 대한전자공학회논문지SD
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• 제41권7호
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• pp.21-29
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• 2004

본 논문에서는 Dual oxide를 갖는 Nano-scale CMOSFET에서 각 소자의 Hot carrier 특성을 분석하여 두 가지 중요한 결과를 나타내었다. 하나는 NMOSFET Thin/Thick인 경우 CHC stress 보다는 DAHC stress에 의한 소자 열화가 지배적이고, Hot electron이 중요하게 영향을 미치고 있는 반면에, PMOSFET에서는 특히 Hot hole에 의한 영향이 주로 나타나고 있다는 것이다. 다른 하나는, Thick MOSFET인 경우 여전히 NMOSFET의 수명이 PMOSFET의 수명에 비해 작지만, Thin MOSFET에서는 오히려 PMOSFET의 수명이 NMOSFET보다 작다는 것이다. 이러한 분석결과는 Charge pumping current 측정을 통해 간접적으로 확인하였다. 따라서 Nano-scale CMOSFET에서의 NMOSFET보다는 PMOSFET에 대한 Hot camel lifetime 감소에 관심을 기울여야 하며, Hot hole에 대한 연구가 진행되어야 한다고 할 수 있다.

• Journal of Power Electronics
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• 제6권4호
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• pp.298-306
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• 2006

A high efficiency and low cost sustain driver for a plasma display panel (PDP) utilizing a current pumping method is proposed. The main concept of the proposed circuit is using the current source to charge and discharge the panel. As a result, all power switches can achieve zero voltage switching (ZVS) and every auxiliary switch can also achieve zero current switching (ZCS). Since the inductor current can compensate for the discharge current, the current stress of all the power switches can be reduced considerably. Furthermore, it has features such as a simpler structure, less mass, lower cost, and lower electromagnetic interference than in previous circuits.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 하계학술대회 논문집 F
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• pp.2795-2797
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• 1999

Several power factor correction(PFC) circuits are presented to achieve high PF electronic ballast for both voltage-fed and current-fed electronic ballast. The proposed PFC circuits use valley-fill(VF) type DC-link stages modified from the conventional VF circuit to adopt the charge pumping method for PFC operations during the valley intervals. In voltage-fed ballast, charge pump capacitors are connected with the resonant capacitors. In current-fed type, the charge pump capacitors are connected with the additional secondary-side of the power transformer. The measured PF and THD are higher than 0.99 and 15% for all proposed PFC circuits. The lamp current CF is also acceptable in the proposed circuits. The proposed circuit is suitable for implementing cost-effective electronic ballast.

• 한국초전도ㆍ저온공학회논문지
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• 제11권3호
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• pp.40-45
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• 2009

Many superconductor applications such as MRI and SMES must be operated in persistent current mode to eliminate the electrical ohmic loss. This paper presents the characteristic analysis of the high temperature superconducting (HTS) power supply made of YBCO coated conductor (CC). In this research, we have manufactured the HTS power supply to charge the 0.73 mH HTS double-pancake magnet made of YBCO CC. Among the all design parameters, the heater triggerring time and magnet applying time were the most important factors for the best performance of the HTS power supply. In this paper, three-dimensional simulation through finite element method (FEM) was used to study the heat transfer in YBCO CC and the magnetic field of the magnetic circuit. Based upon these results, the final operational sequence could be determined to generate the pumping current. In the experiment, the maximum pumping current reached about 16 A.

• E2M - 전기 전자와 첨단 소재
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• 제7권2호
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• pp.123-129
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• 1994

SONOS EEPROM chips, containing several SONOSFET nonvolatile memories of various channel size, have been fabricated on the basis of the existing n-well CMOS processing technology for 1 Mbit DRAM ($1.2\mu\textrm{m}$.m design rule). All the SONOSFET memories have the triple insulated-gate consisting of 30.angs. tunneling oxide, 205.angs. nitride and 65.angs. blocking oxide. The miniaturization of the devices for the higher density EEPROM and their characteristics alterations accompanied with the scaling-down have been investigated. The stabler operating characteristics were attained by increasing the ratio of the channel width to length. Also, the transfer, switching, retention and degradation characteristics of the most favorable performance devices were presented and discussed.