• 대한치과보철학회지
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• 제44권2호
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• pp.157-164
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• 2006

Purpose: The purpose of this study was to compare the fracture strength of the zirconia monolithic all-ceramic crowns according to the thickness(0.5 mm, 0.8 mm, 1.1 mm) and IPS Empress II ceramic crown of 1.5 mm thickness. Material and method: Eight crowns for each of 3 zirconia crown groups were fabricated using CAD/CAM system(Kavo, Germany) and eight Empress II crowns were made from silicone mold and wax pattern. Each crown group was finished in accordance with the specific manufacturer s instruction. All crowns were luted to the metal dies using resin cement and mounted on the testing jig in a universal testing machine. The load was directed at the center of crown with perpendicular to the long axis of each specimen until catastrophic failure occurred. Analysis of variance and Tukey multiple comparison test(p<.05) were applied to the data. Results and Conclusion: 1. The fracture strength of the zirconia monolithic all-ceramic crown was higher thickness increased(p<.05). 2 The fracture strength of 1.1 mm thickness zirconia monolithic all-ceramic crown was higher than the fracture strength of 1.5 mm thickness IPS Empress II crown(p<.05). 3. The fracture strength of 0.5 mm thickness zirconia monolithic all-ceramic crown exceeded maximum occlusal forces.

• 한국세라믹학회지
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• 제23권1호
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• pp.21-26
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• 1986

By the floating zone method with infrared radiation convergence type heater homogeneously $Cr^{3+}$ doped alu-mina single crystal was obtained. And sizx {1010} facets appeared at the surface of [0001] grown crystals. $ZrO_2$ and $HfO_2$ precipitated as secondary phase and were not doped in the crystals. We found that the dist-ribution of the secondary phase which was mainly located at the surface and the peripheral region was closely related to the flow pattern of melt zone.

• 한국세라믹학회지
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• 제25권1호
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• pp.78-82
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• 1988

Good quality LiNbO3 single crystals which can be applied to SAW devices, were grown by Czochralski method. It was observed that the gas-bubbles were concentrated in ring shape at the outer part of grown crystals, and this anomaly was illustrated by modeling the mechanism of gas-bubble entrapment according to the melt flow pattern in the crucible. And this mechanism was also encertained by observation of solid-liquid interface shape of grown crystals. The optimal condition for good quality crystals was known that the solid-liquid interface shape was slightly concave.

• 한국세라믹학회지
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• 제34권7호
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• pp.699-702
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• 1997

The cross sectional image of thin oxide failure of MOS device could be observed by Emission Microscope and Focused Ion Beam at the weak point. The oxide failures in low electric field was associated with the presence of a particle or abnormal pattern. The failures occuring at medium field are related to a pit of Si substrate. The pits could be originated from the microdefects of Cz Si wafer.

• 한국세라믹학회지
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• 제33권9호
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• pp.1019-1023
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• 1996

The dielectric properties at microwave frequencies of B site complex perovskite La(Zn1/2Ti1/2)O3 which has +3 ion in A site were investigated. maximum Q*F value of the specimens was 59000 dielectric constant 34, temperature coefficient of resonant frequency -52 ppm/$^{\circ}C$. XRD pattern of the sintered specimen shows (111) ssuperlattice reflection which indicates Zn and Ti cation ordering.

• 한국세라믹학회지
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• 제30권11호
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• pp.919-924
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• 1993

Domain structure and the spatial arrangement of tetragonal and rhombohedral phases in PZT ceramics at MPB composition were investigated with a transmission electron microscope. Fringe Contrast and doublet spot splitting were observed in the image mode and the selected area diffraction pattern, respectively. Besides, triplet spot splitting was also observed in the other part of the specimen. These observations indicate that both the single phase regions and the regions which are comosed of alternatively arranged tetragonal and rhombohedral domains coexist in a PZT ceramics at the MPB composition.

• 한국세라믹학회지
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• 제47권6호
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• pp.623-626
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• 2010

We synthesized ZnO nanowires patterned on Si substrate and investigated the field emission properties of the nanowires. Firstly, Au catalyst layers were fabricated on Si substrate by photo-lithography and lift-off process. The diameter of Au pattern was $50\;{\mu}m$ and the pattern was arrayed as $4{\times}4$. ZnO nanowires were grown on the Au catalyst pattern by the aid of Au liquid phase. The orientation of the ZnO nanowires was vertical on the whole. Sufficient brightness was obtained when the electric field was $5.4\;V/{\mu}m$ and the emission current was $5\;mA/cm^2$. The threshold electric field was $5.4\;V/{\mu}m$ in the $4{\times}4$ array of ZnO nanowires, which is quite lower than that of the nanowires grown on the flat Si substrate. The lower threshold electric field of the patterned ZnO nanowires could be attributed to their vertical orientation of the ZnO nanowires.

• 한국세라믹학회지
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• 제56권4호
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• pp.354-359
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• 2019

Information security films that can ensure personal privacy by reducing the viewing angle of display screens were fabricated by microlouver patterning and a ZnO nano-ink filling process. Optical simulation results demonstrated that all the microlouver films showed good security performances. Security performances were evaluated as calculated relative luminance ratios compared between the side and front. Based on the simulation results, microlouver films were fabricated by UV imprint lithography and nano-ink bar coating. However, distortion of the microlouver pattern occurred with the use of high-viscosity nano-inks such as ZrO₂ and TiO₂, and the CuO-filled microlouver film suffered from very low optical transmittance. Accordingly, the effects of ZnO filling height on security performance were intensively investigated through simulation and experimental measurements. The fabricated microlouver film with a 75-㎛-high ZnO filling exhibited a good relative luminance ratio of 0.75 at a 60° side angle and a transmittance of 44% at a wavelength of 550 nm.

• 복식
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• 제44권
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• pp.57-75
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• 1999

The purpose of this study is to infer the shape and change as auspicious symbolic meaning and figures of a peony pattern. For this study. I analyzed the example of a peony pattern, which is traditional Chinese pattern appeared on a ceramic and textile. The results of this study are as following. First, a peony has particular title, such as 'the king of flowers' and 'the most beautiful woman in country and the smell in heaven' originated in a verse of a poet at Dang's Dynasty. It is reputed to be the best of all flowers, representing beauty, and a beauty. Second, the basic meaning of a peony pattern used as auspicious pattern is prosperity and it has various meanings of it's similar kind through several auspicious objects and combination. Also, it was used for the purpose of adequating the desire of man's blessing mentality. Third, four kinds of characteristics of a peony pattern are as following. 1) A peony pattern has similar shape with 'Bosanghwamoon', which was used as a pattern at formerly period of peony flowers. It was used as realistic shape gave vividness to the characteristic of peony on the shape of 'Bosanghwamoon'. 2) 8-petaled, unique leaves and veins were described in detail by vivid sketching shape of real peony flower. 3) Laying stress on the characteristics of peony flower, which is large and magnificent, several folds petals were described abundantly by exaggerated shape or a shape of big honeycomb. And unique leaves were described realistically on these. 4) It was also expressed peculiar characteristic of peony flower composed of several pieces by weakened design shape.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.259-259
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• 2008

The LTCC (Low Temperature Co-fired Ceramic) technology meets the requirements for high quality microelectronic devices and microsystems application due to a very good electrical and mechanical properties, high reliability and stability as well as possibility of making integrated three dimensional microstructures. The wet process, which has been applied to the etching of the metallic thin film on the ceramic substrate, has multi process steps such as lithography and development and uses very toxic chemicals arising the environmental problems. The other side, Plasma technology like ion beam sputtering is clean process including surface cleaning and treatment, sputtering and etching of semiconductor devices, and environmental cleanup. In this study, metallic multilayer pattern was fabricated by the ion beam etching of Ti/Pd/Cu without the lithography. In the experiment, Alumina and LTCC were used as the substrate and Ti/Pd/Cu metallic multilayer was deposited by the DC-magnetron sputtering system. After the formation of Cu/Ni/Au multilayer pattern made by the photolithography and electroplating process, the Ti/Pd/Cu multilayer was dry-etched by using the low energy-high current ion-beam etching process. Because the electroplated Au layer was the masking barrier of the etching of Ti/Pd/Cu multilayer, the additional lithography was not necessary for the etching process. Xenon ion beam which having the high sputtering yield was irradiated and was used with various ion energy and current. The metallic pattern after the etching was optically examined and analyzed. The rate and phenomenon of the etching on each metallic layer were investigated with the diverse process condition such as ion-beam acceleration energy, current density, and etching time.