• 제목/요약/키워드: carrier gas flow rate

검색결과 132건 처리시간 0.024초

가스응축장치 캐리어가스 공급속도 및 압력변화를 통한 비스무스 나노분말 입도제어 (Size Control of Bismuth Nanoparticles by Changes in Carrier-Gas Flow Rate and Chamber Pressure of Gas Condensation Apparatus)

  • 이경자;김창규;이민구;이창규
    • 한국분말재료학회지
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    • 제17권5호
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    • pp.379-384
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    • 2010
  • In the present work, bismuth nanopowders with various particle size distributions were synthesized by controlling argon (Ar) gas flow rate and chamber pressure of a gas condensation (GC) apparatus. From the analyses of transmission electron microscopy (TEM) images and nitrogen gas adsorption results, it was found that as Ar gas flow rate increased, the specific surface area of bismuth increased and the average particles size decreased. On the other hand, as the chamber pressure increased, the specific surface area of bismuth decreased and the average particles size increased. The optimum gas flow rate and chamber pressure for the maximized electrochemical active surface area were determined to be 8 L/min and 50 torr, respectively. The bismuth nanopowders synthesized at the above condition exhibit 13.47 $m^2g^{-1}$ of specific surface area and 45.6 nm of average particles diameter.

온도, 가스량 및 도핑시간변화에 따른 $POCI_3$ 도핑 공정의 최적화 (Optimization of the $POCI_3$ doping process according to the variation of deposition temperature, gas flow rate and doping time)

  • 정경화;강정진
    • E2M - 전기 전자와 첨단 소재
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    • 제7권3호
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    • pp.206-212
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    • 1994
  • In this paper, We discuss the $POCI_3$ doping process according to the variation of deposition temperature, gas flow rate and doping time. The factors acted with $POCI_3$ doping are gas flow rate deposition temperature and time etc. Among them the temperature is the most important factor. For the $POCI_3$ flow rate, it should not exceed the resistivity saturation point developed on poly surface by annealing treatment. Therefore, this study suggests the optimum conditions of Poly-silicon treatments with the $POCI_3$ flow rate.

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증착 온도 및 산소 유량에 따른 IZO 박막의 구조적 및 전기적 특성 (Structural and Electrical Characteristics of IZO Thin Films deposited at Different Substrate Temperature and Oxygen Flow Rate)

  • 한성호;이규만
    • 반도체디스플레이기술학회지
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    • 제11권4호
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    • pp.25-30
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    • 2012
  • In this study, we have investigated the effect of the substrate temperature and oxygen flow rate on the characteristics of IZO thin films for the organic light emitting diodes (OLED) devices. For this purpose, IZO thin films were deposited by RF magnetron sputtering at room temperature and $300^{\circ}C$ with various $O_2$ flow rate. In order to investigate the influences of the oxygen, the flow rate of oxygen in argon mixing gas has been changed from 0.1sccm to 0.5sccm. IZO thin films deposited at room temperature show amorphous structure, whereas IZO thin films deposited at $300^{\circ}C$ show crystalline structure having an (222) preferential orientation regardless of $O_2$ flow rate. The electrical resistivity of IZO film increased with increasing flow rate of $O_2$ under $Ar+O_2$. The change of electrical resistivity with increasing flow rate of $O_2$ was mainly interpreted in terms of the charge carrier concentration rather than the charge carrier mobility. The electrical resistivity of the amorphous-IZO films deposited at R.T. was lower than that of the crystalline-IZO thin films deposited at $300^{\circ}C$. The change of electrical resistivity with increasing substrate temperature was mainly interpreted in terms of the charge carrier mobility rather than the charge carrier concentration. All the films showed the average transmittance over 83% in the visible range.

증착 온도 및 수소 유량에 따른 IZO 박막의 구조적 및 전기적 특성 (Structural and Electrical Characteristics of IZO Thin Films Deposited at Different Substrate Temperature and Hydrogen Flow Rate)

  • 한성호;이규만
    • 반도체디스플레이기술학회지
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    • 제12권2호
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    • pp.33-37
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    • 2013
  • In this study, we have investigated the effect of the substrate temperature and hydrogen flow rate on the characteristics of IZO thin films for the organic light emitting diodes (OLED) devices. For this purpose, IZO thin films were deposited by RF magnetron sputtering at room temperature and $300^{\circ}C$ with various $H_2$ flow rate. In order to investigate the influences of the oxygen, the flow rate of hydrogen in argon mixing gas has been changed from 0.1sccm to 0.9sccm. IZO thin films deposited at room temperature show amorphous structure, whereas IZO thin films deposited at $300^{\circ}C$ show crystalline structure having an (222) preferential orientation regardless of $H_2$ flow rate. The electrical resistivity of IZO film decreased with increasing flow rate of $H_2$ under Ar+$H_2$. The change of electrical resistivity with increasing flow rate of $H_2$ was mainly interpreted in terms of the charge carrier concentration rather than the charge carrier mobility. The electrical resistivity of the amorphous-IZO films deposited at R.T. was lower than that of the crystalline-IZO thin films deposited at $300^{\circ}C$. The increase of electrical resistivity with increasing substrate temperature was interpreted in terms of the decrease of the charge carrier mobility and the charge carrier concentration. All the films showed the average transmittance over 83% in the visible range.

미분탄 연소를 위한 공기압 수송에 관한 연구 (Study on Pneumatic Transport for Pulverized coal Combustion)

  • 오창섭;최병선;홍성선;황갑성
    • 설비공학논문집
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    • 제4권4호
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    • pp.299-305
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    • 1992
  • Saltation occurs in horizontal flow of solid and gas when the carrier gas velocity is small enough to permit enough to settling of the solid particles within the transport line. So we should examine the pneumatic flow system to lessen the unbured carbon in the power plant. In this paper the saltation velocity was studied on the various solid flow rate in the constant pipe diameter and on the various temperatures of the flow gas. The air velocity in the power plant transport lines was also surveyed in order to compare with the saltation velocity. As the solid flow rate increased in the constant diameter, saltation velocity increased and as the temperater of the flow gas inereased in the transport line, saltation velocity also increased.

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MOCVD 반응로내 GaN 성장에 미치는 입구형상의 영향 (Effect of inlet configuration on the growth rate of GaN layer in a MOCVD reactor)

  • 윤성규;백병준;박복춘
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2003년도 추계학술대회
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    • pp.67-72
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    • 2003
  • Numerical calculation has been performed to investigate the effect of inlet configuration on the growth rate of GaN layer on the heated susceptor. The conventional single inlet, where the gas is mixed by force in the inlet, is compared with separated flow inlet. Two-parallel gas flow $H_{2}$ and $NH_{3}$ are separated by a plate with finite length which are also parallel to the susceptor. The effect of separated plate length, carrier gas and flow rate of each precursor on the mixing of reactant gases and growth rate were investigated. Furthermore the three dimensional model is employed to predict the transverse variation of growth rate.

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Slit-jet 노즐을 통해 분사되는 초음파 무화 액체연료 화염의 형성 (Flame Formation of Ultrasonically-atomized Liquid-fuel Injected through a Slit-jet Nozzle)

  • 김민성;김정수
    • 한국추진공학회지
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    • 제21권1호
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    • pp.17-25
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    • 2017
  • 초음파 진동자에 의해 미립화된 탄화수소계 액체연료를 태우는 버너의 연소특성을 고찰하기 위한 실험이 수행되었다. 고속카메라와 열화상 카메라를 이용하여 slit-jet 버너에서 생성된 화염의 이미지를 획득하였으며, 후처리를 통해 화염의 형상과 온도구배를 면밀히 분석하였다. 또한, 정밀유량 계측법을 이용하여 수송기체 실험조건 변화에 따른 연료소모량을 측정하였다. 그 결과, 수송기체 유량이 증가하면 무화된 연료의 분사량도 같이 증가한다는 사실을 확인하였으나, 낮은 유량 조건에서는 주변 장치의 진동에 의해 공연비(air/fuel ratio)와 수송기체 유량의 상관성이 관찰되지 않았다. 또한, 수송기체 유량과 초음파진동자의 소비전력이 증가하면 연소반응이 촉진되어 연소영역이 신장되고 화염온도가 증가하였다.

수평 및 수직형 CVD 증착로의 실리콘 부착에 관한 수치해석 (Numerical Analysis of Silicon Deposition in Horizontal & Vertical CVD Reactor)

  • 김인;백병준
    • 대한기계학회논문집B
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    • 제26권3호
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    • pp.410-416
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    • 2002
  • The fluid flow, heat transfer and the local mass fraction of chemical species in the chemical vapor deposition(CVD) manufacturing process are studied numerically. Flow with a dilute precursor concentration of silane in hydrogen as the carrier gas enters to the reactor and deposits silicon onto the heated surface. The silicon deposition rate using silane is calculated in the horizontal or vertical, axisymmetric reactor. The effects of inlet carrier gas velocity, mass fraction of silane, susceptor angle and rotation of surface on the deposition rate are described.

합성절차에 따른 1차원 ZnO 나노구조의 형태조절과 특성평가 (Shape Control and Characterization of One-dimensional ZnO Nanostructures through the Synthesis Procedure)

  • 공보현;박태은;조형균
    • 한국전기전자재료학회논문지
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    • 제19권1호
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    • pp.13-17
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    • 2006
  • The one-dimensional ZnO nanostructures prepared through thermal evaporation under various cooling down procedures by changing the flow rates of the carrier gas and the reactive gas were investigated. The nanorod structures were changed into the nanonail types with a broad head through the reduction of the flow rate of the carrier gas. The decrease of the reactive gas reduced the length of the nail heads due to the limited mass transport of reactive gas. The intensity ratio of the ultraviolet emission/green emission of photoluminescence was proportional to the length of the broad head showing a larger surface area. The vertically aligned nanostructures were grown along the [0001] direction of ZnO regardless of the aligned directions. The crystal direction of the nanostructures was determined by that of the initial ZnO crystal.

Pyrolytic Carbon Coating on A Simulated Fuel by Fluidized Bed Type Chemical Vapour Deposition

  • Park, Y.;Kim, Bong G.;Lee, Young W.;Dong S. Sohn
    • 한국원자력학회:학술대회논문집
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    • 한국원자력학회 1997년도 춘계학술발표회논문집(2)
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    • pp.159-164
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    • 1997
  • Pyrolytic carbon layer was coated on A1203 balls by fluidized bed type chemical vapour deposition unit to develop the coating technology for the preparation of coated nuclear fuel. The deposition was carried out at the temperature ranges between 110$0^{\circ}C$ and 130$0^{\circ}C$ with various gas contents and flow rates. Source and carrier gas were propane and argon, respectively. X-ray analysis shows that the deposition layer was typical carbon spectra. The growth rate of carbon layer depended on the amount of source gas and the deposition temperature. For the alumina balls with 2mm in diameter, the deposition rate was 11${\mu}{\textrm}{m}$/hr in the flow gases containing 30% source gas at 130$0^{\circ}C$ with a total flow rate of 2.0$\ell$/min. Microstructural observation of the deposits with scanning electron microscope revealed that the deposits had relatively dense and isotropic structure. Chemical analysis by energy dispersive spectroscopy showed that the layer was pure carbon.

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