• 제목/요약/키워드: carrier gas flow rate

검색결과 132건 처리시간 0.022초

통계적 기법을 이용한 선택적 CVD 텅스텐 공정 최적화 연구 (The Optimization of the Selective CVD Tungsten Process using Statistical Methodology)

  • 황성보;최경근;박흥락;고철기
    • 전자공학회논문지A
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    • 제30A권12호
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    • pp.69-76
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    • 1993
  • The statistical methodology using RSM (response surface method) was used too ptimize the deposition conditions of selective CVD tungsten process for improving the deposition rate and the adhesion property. Temperature, flow rate of SiH$_4$ and WF$_6$ and H$_2$ and Ar carrier gases were chosen for the deposition variables and process characteristics due to carrier gas were intensively investigated. It was observed that temperature was the main factor influencingthe deposition rate in the case of H$_2$ carrier gas while the reactant ratio, $SiH_{4}/WF_{6}$, had the principal effect on the deposition rate in the case of Ar carrier gas. The increased deposition rate and the good adhesion to Si were obtained under Ar carrier gas compared to H$_2$ carrier gas. The optimum conditions for deposition rate and antipeeling property were found to be the temperature range of 300~32$0^{\circ}C$ and the reactant ratio, $SiH_{4}/WF_{6}$, of 0.5~0.6.

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Formaldehyde 측정을 위한 PZT 압전 바이오센서 개발 (Development of PZT Piezoelectric Biosensor for the Detection of Formaldehyde)

  • 김병옥;곽성곤;임동준
    • KSBB Journal
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    • 제13권5호
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    • pp.477-482
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    • 1998
  • A biosensor with PZT piezoelectric ceramic crystal was developed for the detection of formaldehyde gas. Poled PZT piezoelectric ceramic disk was made from ZrO2, TiO2 and Nb2O5, together with the addition of PbO and polyvinyl alcohol, through various processes of mixing, calcination drying, crushing, forming, sintering, polishing, ion coating and poling. Oscillator circuit of sensor was made of operational amplifier(AD811AN). Formaldehyde dehydrogenase was immobilized onto a piezoelectic ceramic crystal, together with the cofactors, reduced glutathione and nicotinamide adenine dinucleotide. The effect of flow rate on the sensitivity was determined by varing the flow rate of carrier gas from 24.7mL/min to 111.7mL/min through detector cell. The results indicated that as the flow rate was increased, the recovery rate was increased. And a significant increase in the sensitivity was observed in enhanced flow rate of carrier gas. Frequency difference(ΔF) of immobilized PZT piezoelectic disk increased proportionally to the concentration gas and reproduced to repeated exposures of formaldehyde gas(28ppm, Δ68Hz).

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글로우방전 가스크로마토그라프 검출기에서 방전가스의 영향 (Effect of Discharge Gas on the Electrical Characteristics of the Glow Discharge Plasma for the Gas Chromatographic Detector)

  • 박현미;강종성;김효진
    • 약학회지
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    • 제39권5호
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    • pp.480-486
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    • 1995
  • The change in discharge current of a glow discharge has been shown the potential sensitive detector for gas chromatography. To investigate the effect of carrier gas on the electrical characteristics of the discharge and the peak response, the discharge pressure, gas flow rate, and discharge gap have been studied. The discharge gas included the Ar, He, and N$_{2}$. The gas flow rate has been found one of the important parameters to affect both the electrical characteristics and the peak response.

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증착 온도 및 수소 유량에 따른 MZO 박막의 구조적 및 전기적 특성 (Structural and Electrical Characteristics of MZO Thin Films Deposited at Different Substrate Temperature and Hydrogen Flow Rate)

  • 이지수;이규만
    • 반도체디스플레이기술학회지
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    • 제17권2호
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    • pp.6-11
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    • 2018
  • In this study, we have studied the effect of substrate temperature and hydrogen flow rate on the characteristics of MZO thin films for the TCO(Transparent conducting oxide). MZO thin films were deposited by RF magnetron sputtering at room temperature and $100^{\circ}C$ with various $H_2$ flow rate(1sccm~4sccm). In order to investigate the effect of hydrogen gas flow rate on the MZo thin film, we experimented with changing the hydrogen in argon mixing gas flow rate from 1.0sccm to 4.0sccm. MZO thin films deposited at room temperature and $100^{\circ}C$ show crystalline structure having (002), (103) preferential orientation. The electrical resistivity of the MZO films deposited at $100^{\circ}C$ was lower than that of the MZO film deposited at room temperature. The decrease of electrical resistivity with increasing substrate temperature was interpreted in terms of the increase of the charge carrier mobility and carrier concentration which seems to be due to the oxygen vacancy generated by the reducing atmosphere in the gas. The average transmittance of the MZO films deposited at room temperature and $100^{\circ}C$ with various hydrogen gas flow was more than 80%.

광산란과 입자포집을 이용한 동축류 확산화염 내의 실리카 입자의 성장 측정(II) - 확산의 영향 - (An Experimental Study of Silica Particle Growth in a Coflow Diffusion Flame Utilizing Light Scattering and Local Sampling Technique (II) - Effects of Diffusion -)

  • 조재걸;이정훈;김현우;최만수
    • 대한기계학회논문집B
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    • 제23권9호
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    • pp.1151-1162
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    • 1999
  • The effects of radial heat and $H_2O$ diffusion on the evolution of silica particles in coflow diffusion flames have been studied experimentally. The evolution of silica aggregate particles in coflow diffusion flames has been measured experimentally using light scattering and thermophoretic sampling techniques. The measurements of scattering cross section from $90^{\circ}$ light scattering have been utilized to calculate the aggregate number density and volume fraction using with combination of measuring the particle size and morphology through the localized sampling and a TEM image analysis. Aggregate or particle number densities and volume fractions were calculated using Rayleigh-Debye-Gans and Mie theory for fractal aggregates and spherical particles, respectively. Flame temperatures and volumetric differential scattering cross sections have been measured for different flame conditions such as inert gas species, $H_2$ flow rates, and burner injection configurations to examine the relation between the formation of particles and radial $H_2O$ diffusion. The comparisons of oxidation and flame hydrolysis have also been made for various $H_2$ flow rates using $N_2$ or $O_2$ as a carrier gas. Results indicate that the role of oxidation becomes dominant as both carrier gas($O_2$) and $H_2$ flow rates increases since the radial heat diffusion precedes $H_2O$ diffusion in coflow flames used in this study. The effect of carrier gas flow rates on the evolution of silica particles have also been studied. When using $N_2$ as a carrier gas, the particle volume fraction has a maximum at a certain carrier gas flow rate and as the flow rate is further increased, the hydrolysis reaction Is delayed and the spherical particles finally evolves into fractal aggregates due to decreased flame temperature and residence time.

A Study on Properties of RF-sputtered Al-doped ZnO Thin Films Prepared with Different Ar Gas Flow Rates

  • Han, Seung Ik;Kim, Hong Bae
    • Applied Science and Convergence Technology
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    • 제25권6호
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    • pp.145-148
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    • 2016
  • This paper, Al-doped ZnO(AZO) thin films for application as transparent conducting oxide films were deposited on the Corning glass substrate by using RF magnetron sputtering system. The effects of various Argon gas flow rates on optical and electrical characteristics of AZO films were investigate sputtering method. The Carrier Concentration is enhanced as Ar gas rate increases, and also the oxygen vacancy concentration. The figure of merit obtained in this study means that AZO films which deposited Ar gas rate of 75 sccm have the highest Carrier concentration and Hall mobility, which have the highest photoelectrical performance that it could be used as transparent electrodes.

에어로졸성막법에 의해 제작된 Bi:YIG 막에 미치는 에어로졸유량의 영향 (Effect of Carrier Gas Flow Rate on Magnetic Properties of Bi:YIG Films Deposited with Aerosol Deposition Method)

  • 신광호
    • 한국자기학회지
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    • 제18권1호
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    • pp.14-18
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    • 2008
  • 본 연구에서는 Bi:YIG($Bi_{0.5}Y_{2.5}Fe_5O_{12}$) 막을 에어로졸 성막법을 이용하여 제작함에 있어서, 에어로졸을 구성하는 수송가스의 유량이 막의 자기적 특성과 광학적인 특성에 대하여 분석하였다. 직경 $100{\sim}500$ nm 의 Bi:YIG 분말을 질소 가스를 수송가스로 사용하여 성막을 실시하였고, 이 때, 수송가스의 유량은 0.5 l/min${\sim}10$ l/min 사이에서 변화시켰다. 수송가스의 유량이 증가할수록 Bi:YIG 막의 보자력은 51 Oe에서 37 Oe까지 지수함수적으로 감소하였다. 이것은 충돌에너지가 증가함에 따라 막내부 혹은 막표면의 결함이 감소하였기 때문이라고 고찰되었다. 포화자화는 유량이 증가할수록 감소하였는데, 이는 충돌에너지가 강해짐에 따라 결정이 왜곡되는 힘을 받았기 때문이라고 고찰되었다.

초음파 분무열분해에 의한 Bi-Pb-Sr-Ca-Cu-O의 미분체 제조 (Direct Preparation of fine Powders of Bi-Pb-Sr-Ca-Cu-O by Ultrasonic Spray Pyrolysis)

  • 주명희;박도순;김윤수
    • 한국세라믹학회지
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    • 제28권5호
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    • pp.353-358
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    • 1991
  • Fine powders of the 2212 superconducting phase of bismuth system have been prepared directly from solution using ultrasonic spray pyrolysis. The fine superconducting powders produced by pyrolysis were characterized for the size, shape, and crystalline phase by SEM and XRD. The pyrolysis temperature, flow rate of the carrier gas, residence time of the droplets greatly influenced the size, shape, and crystalline phase. The optimum temperature and flow rate of the carrier gas for the preparation of fine powders of the 2212 superconduting phase were found to be 830$^{\circ}C$and 3ι/min, respectively.

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산소 유량에 따른 IZO 박막의 전기적 및 광학적 특성 (Electrical and Optical Characteristics of IZO Thin Films Deposited in Different Oxygen Flow Rate)

  • 권수경;이규만
    • 반도체디스플레이기술학회지
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    • 제12권4호
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    • pp.49-54
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    • 2013
  • In this study, we have investigated the effect of the substrate temperature and oxygen flow rate on the characteristics of IZO thin films for the OLED (organic light emitting diodes) devices. For this purpose, IZO thin films were deposited by RF magnetron sputtering at room temperature and $300^{\circ}C$ with various $O_2$ flow rate. In order to investigate the influences of the oxygen, the flow rate of oxygen in argon mixing gas has been changed from 0.1sccm to 0.5sccm. IZO thin films deposited at room temperature show amorphous structure, whereas IZO thin films deposited at $300^{\circ}C$ show crystalline structure having an (222) preferential orientation regardless of $O_2$ flow rate. The electrical resistivity of IZO film increased with increasing flow rate of $O_2$ under Ar+$O_2$. The change of electrical resistivity with increasing flow rate of $O_2$ was mainly interpreted in terms of the charge carrier concentration rather than the charge carrier mobility. The electrical resistivity of the amorphous-IZO films deposited at R.T. was lower than that of the crystalline-IZO thin films deposited at $300^{\circ}C$. The change of electrical resistivity with increasing substrate temperature was mainly interpreted in terms of the charge carrier mobility rather than the charge carrier concentration. All the films showed the average transmittance over 85% in the visible range. The current density and the luminance of OLED devices with IZO thin films deposited at room temperature in 0.1sccm $O_2$ ambient gas are the highest amongst all other films. The optical band gap energy of IZO thin films plays a major role in OLED device performance, especially the current density and luminance.

Optical emission analysis of hybrid air-water discharges

  • Pavel, Kostyuk;Park, J.Y.;Han, S.B.;Koh, H.S.;Gou, B.K.;Lee, H.W.
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.521-522
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    • 2006
  • In this paper, hybrid air-water discharges were used to develop an optimal condition for providing a high level of water decomposition for hydrogen yield. Electrical and optical phenomena accompanying the discharges were investigated along with feeding gases, flow rates, and point-to-plane electrode gap distance. The primary focus of this experiment was put on the optical emission of the near UV range, with the energy threshold sufficient for water dissociation and excitation. The $OH(A^{2+},'=0\;X^2,"=0$) band's optical emission intensity indicated the presence of plasma chemical reactions involving hydrogen formation. In the gaseous atmosphere saturated with water vapor the OH(A-X) band intensity was relatively high compared to the liquid and transient phases although the optical emission strongly depended on the flow rate and type of feeding gas. In the gaseous phase discharge phenomenon for Ar carrier gas transformed into a gliding arc via the flow rate growth. OH(A-X) band's intensity increased according to the flow rate or residence time of He feeding gas. Reciprocal tendency was acquired for $N_2$ and Ar carrier gases. The peak value of OH(A-X) intensity was observed in the proximity of the water surface, however in the cases of Ar and $N_2$ with 0.5 SLM flow rate peaks shifted to the region below the water surface. Rotational temperature ($T_{rot}$) was estimated to be in the range of 900-3600 K, according to the carrier gas and flow rate, which corresponds to the arc-like-streamer discharge.

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