• 제목/요약/키워드: carrier film

검색결과 734건 처리시간 0.03초

증착 및 열처리 조건에 따른 AZO/Cu/AZO 박막의 전기적·광학적 특성 평가 (Effect of Deposition and Heat Treatment Conditions on the Electrical and Optical Properties of AZO/Cu/AZO Thin Film)

  • 김찬영;임하은;양가은;권숙정;강찬희;임상철;이택영
    • 한국재료학회지
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    • 제33권4호
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    • pp.142-150
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    • 2023
  • AZO/Cu/AZO thin films were deposited on glass by RF magnetron sputtering. The specimens showed the preferred orientation of (0002) AZO and (111) Cu. The Cu crystal sizes increased from about 3.7 nm to about 8.5 nm with increasing Cu thickness, and from about 6.3 nm to about 9.5 nm with increasing heat treatment temperatures. The sizes of AZO crystals were almost independent of the Cu thickness, and increased slightly with heat treatment temperature. The residual stress of AZO after heat treatment also increased compressively from -4.6 GPa to -5.6 GPa with increasing heat treatment temperature. The increase in crystal size resulted from grain growth, and the increase in stress resulted from the decrease in defects that accompanied grain growth, and the thermal stress during cooling from heat treatment temperature to room temperature. From the PL spectra, the decrease in defects during heat treatment resulted in the increased intensity. The electrical resistivities of the 4 nm Cu film were 5.9×10-4 Ω·cm and about 1.0×10-4 Ω·cm for thicker Cu films. The resistivity decreased as the temperature of heat treatment increased. As the Cu thickness increased, an increase in carrier concentration resulted, as the fraction of AZO/Cu/AZO metal film increased. And the increase in carrier concentration with increasing heat treatment temperature might result from the diffusion of Cu ions into AZO. Transmittance decreased with increasing Cu thicknesses, and reached a maximum near the 500 nm wavelength after being heat treated at 200 ℃.

Chemical vapor deposition of $TaC_xN_y$ films using tert-butylimido tris-diethylamido tantalum(TBTDET) : Reaction mechanism and film characteristics

  • Kim, Suk-Hoon;Rhee, Shi-Woo
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2009년도 추계학술발표대회
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    • pp.24.1-24.1
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    • 2009
  • Tantalum carbo-nitride($T_aC_xN_y$) films were deposited with chemical vapor deposition(CVD) using tert-butylimido tris-diethylamido tantalum (TBTDET, $^tBu-N=Ta-(NEt_2)_3$, $Et=C_2H_5$, $^tBu=C(CH_3)_3$) between $350^{\circ}C$ and $600^{\circ}C$ with argon as a carrier gas. Fourier transform infrared (FT-IR)spectroscopy was used to study the thermal decomposition behavior of TBTDET in the gas phase. When the temperature was increased, C-H and C-N bonding of TBTDET disappeared and the peaks of ethylene appeared above $450^{\circ}C$ in the gas phase. The growth rate and film density of $T_aC_xN_y$ film were in the range of 0.1nm/min to 1.30nm/min and of $8.92g/cm^3$ to $10.6g/cm^3$ depending on the deposition temperature. $T_aC_xN_y$ films deposited below $400^{\circ}C$ were amorphous and became polycrystal line above $500^{\circ}C$. It was confirmed that the $T_aC_xN_y$ film was a mixture of TaC, graphite, $Ta_3N_5$, TaN, and $Ta_2O_5$ phases and the oxide phase was formed from the post deposition oxygen uptake. With the increase of the deposition temperature, the TaN phase was increased over TaC and $Ta_3N_5$ and crystallinity, work function, conductivity and density of the film were increased. Also the oxygen uptake was decreased due to the increase of the film density. With the increase of the TaC phase in $T_aC_xN_y$ film, the work function was decreased to 4.25eV and with the increase of the TaN phase in $T_aC_xN_y$ film,it was increased to 4.48eV.

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DC 마그네트론 스퍼터링법에 의한 대면적 투명전도성 ZnO(Al)와 ZnO(AlGa) 박막제조 및 물리적 특성 연구 (Fabrication and Study of Transparent Conductive Films ZnO(Al) and ZnO(AlGa) by DC Magnetron Sputtering)

  • 손영호;최승훈;박중진;정명효;허영준;김인수
    • 한국진공학회지
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    • 제22권3호
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    • pp.119-125
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    • 2013
  • In-line magnetron sputtering system을 사용하여 대면적($60{\times}60cm^2$) 소다라임 유리기판위에 투명전도성 ZnO(Al)와 ZnO(AlGa) 박막을 500 nm에서 1,450 nm까지 두께별로 증착하여 전기적, 광학적 특성을 연구하였다. XRD를 통해 c-축 방향성(002)을 가지고 성장된 것을 확인 하였다. Hall 특성 분석을 통해 이동도 및 캐리어 농도의 특성을 확인 하였으며, 그에 따른 ZnO(AlGa)의 비저항이 $9.03{\times}10^{-4}{\Omega}{\cdot}cm$에서 $7.83{\times}10^{-4}{\Omega}{\cdot}cm$으로 ZnO(Al) 보다 높게 나타났으며, 가시광선 영역에서 투과율은 87.6%에서 84.3%으로 나타났다. 따라서 ZnO(AlGa)는 전기적 특성이 우수하고 높은 투과율로 대면적용 투명전도성 재료로의 활용에 적합한 특성을 지닌 것을 확인 할 수 있었다.

Hot Wall Epitaxy (HWE)에 의한 성장된 $ZnIn_2S_4/GaAs$ 에피레이어의 광학적 특성 (Optical Properties of $ZnIn_2S_4/GaAs$ Epilayer Grown by Hot Wall Epitaxy method)

  • 홍광준;이관교
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.175-178
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    • 2004
  • The stochiometric mixture of evaporating materials for the $ZnIn_2S_4$ single crystal thin film was prepared from horizontal furnace. To obtain the $ZnIn_2S_4$ single crystal thin film, $ZnIn_2S_4$ mixed crystal was deposited on throughly etched semi-insulating GaAs(100) in the Hot Wall Epitaxy(HWE) system. The source and substrate temperature were $610^{\circ}C$ and $450^{\circ}C$, respectively and the growth rate of the $ZnIn_2S_4$ sing1e crystal thin film was about $0.5\;{\mu}m/hr$. The crystalline structure of $ZnIn_2S_4$ single crystal thin film was investigated by photoluminescence and double crystal X-ray diffraction(DCXD) measurement. The carrier density and mobility of $ZnIn_2S_4$ single crystal thin film measured from Hall effect by van der Pauw method are $8.51{\times}10^{17}\;cm^{-3}$, $291\;cm^2/V{\cdot}s$ at $293_{\circ}\;K$, respectively. From the photocurrent spectrum by illumination of perpendicular light on the c - axis of the $ZnIn_2S_4$ single crystal thin film, we have found that the values of spin orbit splitting ${\Delta}S_O$ and the crystal field splitting ${\Delta}Cr$ were 0.0148 eV and 0.1678 eV at $10_{\circ}\; K$, respectively. From the photoluminescence measurement of $ZnIn_2S_4$ single crystal thin film, we observed free excition $(E_X)$ typically observed only in high quality crystal and neutral donor bound exciton $(D^{o},X)$ having very strong peak intensity The full width at half maximum and binding energy of neutral donor bound excition were 9 meV and 26 meV, respectively, The activation energy of impurity measured by Haynes rule was 130 meV.

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유기박막트랜지스터 적용을 위한 Soluble Pentacene 박막의 특성연구 (A Study of Soluble Pentacene Thin Film for Organic Thin Film Transistor)

  • 공수철;임현승;신익섭;박형호;전형탁;장영철;장호정
    • 마이크로전자및패키징학회지
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    • 제14권3호
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    • pp.1-6
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    • 2007
  • 본 연구에서는 유기박막트랜지스터(OTFT, Organic Thin film Transistor)에 응용을 위해 용액(soluble) 공정을 통하여 제작된 pentacene 박막의 특성을 분석하여 pentacene 박막의 OTFT 소자에 적용 가능성을 조사하였다. Pentacene을 용해시키기 위해 toluene과 chloroform의 두 종류의 용제를 사용하였으며, 이들 용제가 pentacene 박막의 특성에 미치는 영향을 연구하였다. Pentacene 용액은 ITO/Glass 기판위에 spin-coating 법으로 유기 반도체 박막을 제작하여 각 박막의 표면형상, 결정화 특성과 전기적 특성을 조사하였다. AFM을 이용한 표면 형상 관찰 결과 chloroform을 이용한 pentacene 박막이 toluene을 이용한 박막에 비하여 표면 거칠기가 개선되는 경향을 보여주었다. XRD 회절 분석 결과 모든 pentacene 박막 시료에서 결정화가 되지 않은 비정질 형태를 보여주었다. Hall effect measurement 분석 결과 chloroform 용제를 이용한 pentacene 박막이 toluene용제를 사용한 시료에 비해 보다 우수한 전기적 특성을 나타내었다. 즉, chloroform에 용해된 pentacene 박막의 경우 전하농도와 이동도는 $-3.225{\times}10^{14}\;cm^{-3}$$3.5{\times}10^{-1}\;cm^2\;V^{-1}{\cdot}S^{-1}$를 각각 나타내었다. 또한 비저항은 약 $2.5{\times}10^2\;{\Omega}{\cdot}cm$를 얻었다.

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박막트랜지스터 응용을 위한 ${\mu}c-Si/CaF_2$/glass 구조특성연구 (The study of ${\mu}c-Si/CaF_2$/glass properties for thin film transistor application)

  • 김도영;안병재;임동건;이준신
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 D
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    • pp.1514-1516
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    • 1999
  • This paper covers our efforts to improve the low carrier mobility and light instability of hydrogenated amorphous silicon (a-Si:H) films with microcrystalline silicon $({\mu}c-Si)$ films. We successfully prepared ${\mu}c-Si$ films on $CaF_2$/glass substrate by decomposition of $SiH_4$ in RPCVD system. The $CaF_2$ films on glass served as a seed layer for ${\mu}c-Si$ film growth. The XRD analysis on $CaF_2$/glass illustrated a (111) preferred $CaF_2$ grains with the lattice mismatch less than 5 % of Si. We achieved ${\mu}c-Si$ films with a crystalline volume fraction of 61 %, (111) and (220) crystal orientations. grain size of $706\AA$, activation energy of 0.49 eV, and Photo/dark conductivity ratio of 124. By using a $CaF_2$/glass structure. we were able to achieve an improved ${\mu}c-Si$ films at a low substrate temperature of $300^{\circ}C$.

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Synthesis and Characterization of Cationic and Anionic Cyclodextrin Oligomers and Their Use in Layer-by-Layer Film Formation

  • Yang, Sung Yun;Hoonor, Rekha;Jin, Hye-Seung;Kim, Jeongkwon
    • Bulletin of the Korean Chemical Society
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    • 제34권7호
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    • pp.2016-2022
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    • 2013
  • Ionically modified ${\beta}$-cyclodextrins, which have excellent water-solubility, have been interested in purification technology as well as drug carrier system. The present study summarizes the synthesis and characterization of cationic and anionic ${\beta}$-cyclodextrin (${\beta}$-CyD) products using by polycondensation. The oligo (${\beta}$-CyD)s are synthesized from ${\beta}$-CyD, epichlorohydrin (EP) and choline chloride (CC; for cationic polymer) or chloroacetic acid (CAA; for anionic polymer) through one step polycondenstaion process. Unlike the previous studies, we successfully purified the ionic ${\beta}$-CyD condensation products from the ${\beta}$-CyD reaction mixtures and accomplished a great level of structural analysis. The detailed structural analysis of these ionic ${\beta}$-CyD compounds is done by $^1H$ NMR, MALDI-TOF as well as GPC analysis and confirms the formation of oligomers with a few units of ${\beta}$-CyD. We found that the sequence of reactant addition also could effect on the molecular weight of the resulting product as well as the molar ratio of the reactants. Finally, we used the cationic and anionic ${\beta}$-CyD oligomers for fabricating multilayer films by layer-layer process.

Synthesis of Semiconducting $KTaO_3$ Thin films

  • Bae, Hyung-Jin;Ku, Jayl;Ahn, Tae-Won;Lee, Won-Seok
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2005년도 추계종합학술대회
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    • pp.1265-1268
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    • 2005
  • In this study, the synthesis and semiconducting properties of cation and defect-doped $KTaO_3$ film is reported. $KTaO_3$ is an important material for optoelectronic and tunable microwave applications. It is an incipient ferroelectric with a cubic structure that becomes ferroelectric when doped with Nb. While numerous studies have investigated the thin-film growth of semiconducting perovskites, little is reported about semiconducting $KTaO_3$ thin films. In this work, the films were grown on (001) MgO single crystal substrates using pulsed-laser deposition. Semiconducting behavior is achieved by inducing oxygen vacancies in the $KTaO_3$ lattice via growth in a hydrogen atmosphere. The resistivity of semiconducting $KTaO_3:Ca$ films was as low as 10cm, and n-type semiconducting behavior was indicated. Hall mobility and carrier concentration were $0.27cm^2/Vs$ and $3.21018cm^{-3}$, respectively. Crystallinity and microstructure of the $KTaO_3:Ca$ films were examined using X-ray diffraction and field-emission scanning microscopy.

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무접합 원통형 MOSFET에 대한 드레인 유도 장벽 감소의 SPICE 모델 (SPICE Model of Drain Induced Barrier Lowering in Junctionless Cylindrical Surrounding Gate (JLCSG) MOSFET)

  • 정학기
    • 한국전기전자재료학회논문지
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    • 제31권5호
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    • pp.278-282
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    • 2018
  • We propose a SPICE model of drain-induced barrier lowering (DIBL) for a junctionless cylindrical surrounding gate (JLCSG) MOSFETs. To this end, the potential distribution in the channel is obtained via the Poisson equation, and the threshold voltage model is presented for the JLCSG MOSFET. In a JLCSG nano-structured MOSFET, a channel radius affects the carrier transfer as well as the channel length and oxide thickness; therefore, DIBL should be expressed as a function of channel length, channel radius, and oxide thickness. Consequently, it can be seen that DIBLs are proportional to the power of -3 for the channel length, 2 for the channel radius, 1 for the thickness of the oxide film, and the constant of proportionality is 18.5 when the SPICE parameter, the static feedback coefficient ${\eta}$, is between 0.2 and 1.0. In particular, as the channel radius and the oxide film thickness increase, the value of ${\eta}$ remains nearly constant.

The Effect of Thermal Annealing Process on Fermi-level Pinning Phenomenon in Metal-Pentacene Junctions

  • Cho, Hang-Il;Park, Jin-Hong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.290.2-290.2
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    • 2016
  • Recently, organic thin-film transistors have been widely researched for organic light-emitting diode panels, memory devices, logic circuits for flexible display because of its virtue of mechanical flexibility, low fabrication cost, low process temperature, and large area production. In order to achieve high performance OTFTs, increase in accumulation carrier mobility is a critical factor. Post-fabrication thermal annealing process has been known as one of the methods to achieve this by improving the crystal quality of organic semiconductor materials In this paper, we researched the properties of pentacene films with X-Ray Diffraction (XRD) and Atomic Force Microscope (AFM) analyses as different annealing temperature in N2 ambient. Electrical characterization of the pentacene based thin film transistor was also conducted by transfer length method (TLM) with different annealing temperature in Al- and Ti-pentacene junctions to confirm the Fermi level pinning phenomenon. For Al- and Ti-pentacene junctions, is was found that as the surface quality of the pentacene films changed as annealing temperature increased, the hole-barrier height (h-BH) that were controlled by Fermi level pinning were effectively reduced.

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