• Title/Summary/Keyword: bonding temperature

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Warpage Characteristics of Bottom Packages for Package-on-Package(PoP) with Different Chip Mounting Processes (칩 실장공정에 따른 Package on Package(PoP)용 하부 패키지의 Warpage 특성)

  • Jung, D.M.;Kim, M.Y.;Oh, T.S.
    • Journal of the Microelectronics and Packaging Society
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    • v.20 no.3
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    • pp.63-69
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    • 2013
  • The warpage of a bottom package of Package on Package(PoP) where a chip was mounted to a substrate by flip chip process was compared to that of a bottom package for which a chip was bonded to a substrate using die attach film(DAF). At the solder reflow temperature of $260^{\circ}C$, the packages processed with flip chip bonding and DAF bonding exhibited warpages of $57{\mu}m$ and $-102{\mu}m$, respectively. At the temperature range between room temperature and $260^{\circ}C$, the packages processed with flip chip bonding and DAF bonding exhibited warpage values ranging from $-27{\mu}m$ to $60{\mu}m$ and from $-50{\mu}m$ to $-15{\mu}m$, respectively.

Fabricability of Reaction-sintered SiC for Ceramic Heat Exchanger Operated in a Severe Environment (원자력 극한환경용 세라믹 열교환기 소재로서 반응소결 SiC 세라믹스 제작성)

  • Jung, Choong-Hwan;Park, Ji-Yeon
    • Journal of the Korean Ceramic Society
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    • v.48 no.1
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    • pp.52-56
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    • 2011
  • Silicon carbide (SiC) is a candidate material for heat exchangers for VHTR (Very High Temperature Gas Cooled Reactor) due to its refractory nature and high thermal conductivity. This research has focused on demonstration of physical properties and mock-up fabrication for the future heat exchange applications. It was found that the SiC-based components can be applied for process heat exchanger (PHE) and intermediate heat exchanger (IHX), which are operated at $400{\sim}1000^{\circ}C$, based on our examination for the following aspects: optimum fabrication technologies (design, machining and bonding) for compact design, thermal conductivity, corrosion resistance in sulfuric acid environment at high temperature, and simulation results on heat transferring and thermal stress distribution of heat exchanger mock-up.

Molecular Dynamic Simulation of The Temperature-Dependent Single Wall Carbon Nanotube (온도변화에 따른 탄소 나노튜브의 분자 동역학 시뮬레이션)

  • 문원하;강정원;이영직;박수현;황호정
    • Proceedings of the IEEK Conference
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    • 1999.11a
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    • pp.913-916
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    • 1999
  • Recent developments of carbon nanotubes are reviewed[1,2,3,4]. We use Tersoff carbon potential for bonded interactions[5] and Lennard-Jones 12-6 potential for non bonding interactions[6]to describe mechanical properties of the temperature-dependent armchair single wall carbon nanotube. At first we report that through defect number and bonding energy calculation, how single wall carbon nanutube is capped in the constant temperature. (300K, 2000K, 3000K, 4000K) At second, we perform MD simulation, which are performed on the energy optimized structure of carbon nanotube.

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Analysis of Temperature Distribution using Finite Element Method for SCS Insulator Wafers (유한요소법을 이용한 SCS 절연 웨이퍼의 온도분포 해석)

  • Kim, O.S.
    • Journal of Power System Engineering
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    • v.5 no.4
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    • pp.11-17
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    • 2001
  • Micronization of sensor is a trend of the silicon sensor development with regard to a piezoresistive silicon pressure sensor, the size of the pressure sensor diaphragm have become smaller year by year, and a microaccelerometer with a size less than $200{\sim}300{\mu}m$ has been realized, In this paper, we study some of the bonding processes of SCS(single crystal silicon) insulator wafer for the microaccelerometer. and their subsequent processes which might affect thermal loads. The finite element method(FEM) has been a standard numerical modeling technique extensively utilized in micro structural engineering discipline for design of SCS insulator wafers. Successful temperature distribution analysis and design of the SCS insulator wafers based on the tunneling current concept using microaccelerometer depend on the knowledge about normal mechanical properties of the SCS and $SiO_2$ layer and their control through manufacturing processes.

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A Characteristic of Microstructures in Bonding Interlayer of Brazed Titanium to Copper (브레이징한 Ti/Cu 접합계면부의 미세조직 특성)

  • 김우열;정병호;이성렬
    • Journal of Welding and Joining
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    • v.13 no.3
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    • pp.106-115
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    • 1995
  • To know the bonding phenomena of Ti/Cu brazed joint, a characteristic of microstructures in bonding interlayer of vacuum brazed pure Ti to Cu has been studied in the temperature range from 1088 to 1133K for various bonding times using Ag-28wt%Cu filler metal. Also intermediate phases formed in bonded interlayer and behavior of layer growth have been investigated. The obtained results in this study are as follows: 1) Liquid insert metal width at the each brazing temperature was proportional to the square root of brazing time, and it was considered that the liquid insert metal width was controlled by the diffusion rate process of primary .alpha.-Cu formed at the Ti side. 2) Intermediate phases formed near the Ti interface were .betha.-Ti and intermetallic compounds TiCu, Ti$_{2}$Cu, Ti$_{3}$Cu, and TiCu. 3) .betha.-Ti formed in Ti base metal durig brazing transformed to lamellar structure, .alpha.-Ti + Ti$_{2}$Cu. The structure came from the eutectoil decomposition reaction in cooling. And the width of .betha.-Ti layer was proportional to the square root of brazing time, and it was considered that the growth of .betha.-Ti layer was controlled by interdiffusion rate process in .betha.-Ti. 4) The layer growth of TiCu, Ti$_{3}$Cu$_{4}$ and TiCu, phases formed near the Ti interface was linerface was linearly proportional to the brazing time, and it was considered that the layer growth of these phases was controlled by the chemical reaction rate at the interface.

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Adhesive bonding using thick polymer film of SU-8 photoresist for wafer level package

  • Na, Kyoung-Hwan;Kim, Ill-Hwan;Lee, Eun-Sung;Kim, Hyeon-Cheol;Chun, Kuk-Jin
    • Journal of Sensor Science and Technology
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    • v.16 no.5
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    • pp.325-330
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    • 2007
  • For the application to optic devices, wafer level package including spacer with particular thickness according to optical design could be required. In these cases, the uniformity of spacer thickness is important for bonding strength and optical performance. Packaging process has to be performed at low temperature in order to prevent damage to devices fabricated before packaging. And if photosensitive material is used as spacer layer, size and shape of pattern and thickness of spacer can be easily controlled. This paper presents polymer bonding using thick, uniform and patterned spacing layer of SU-8 2100 photoresist for wafer level package. SU-8, negative photoresist, can be coated uniformly by spin coater and it is cured at $95^{\circ}C$ and bonded well near the temperature. It can be bonded to silicon well, patterned with high aspect ratio and easy to form thick layer due to its high viscosity. It is also mechanically strong, chemically resistive and thermally stable. But adhesion of SU-8 to glass is poor, and in the case of forming thick layer, SU-8 layer leans from the perpendicular due to imbalance to gravity. To solve leaning problem, the wafer rotating system was introduced. Imbalance to gravity of thick layer was cancelled out through rotating wafer during curing time. And depositing additional layer of gold onto glass could improve adhesion strength of SU-8 to glass. Conclusively, we established the coating condition for forming patterned SU-8 layer with $400{\mu}m$ of thickness and 3.25 % of uniformity through single coating. Also we improved tensile strength from hundreds kPa to maximum 9.43 MPa through depositing gold layer onto glass substrate.

Application of the Infusion Method to the Repair of Damage in Wind Turbine Blades (진공성형 공법을 이용한 풍력발전기 블레이드의 수리)

  • Lee, Kwangju;Jang, Han Seul;Seon, Seokwoon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.15 no.8
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    • pp.4756-4762
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    • 2014
  • Damaged wind turbine blades are repaired conventionally using a hand lay-up method with epoxy, where the bonding strength is not high. Epoxy has poor curing characteristics at low temperatures. The infusion method with polyester was proposed. Infusion method is believed to distribute resin uniformly. Polyester is used because it hardens better than epoxy at low temperatures. At room temperature, the proposed method increased the bonding strength by 77.7% compared to the conventional method. Using the proposed method at 15 and $5^{\circ}C$, the bonding strength increased compared to the conventional method. This paper proposes a new method for repairing wind turbine blades, even at temperatures where the conventional method cannot be used because epoxy resin does not harden. The bonding strength of the proposed method at low temperatures is higher than that of the conventional method at room temperature.

Process window of simultaneous transfer and bonding materials using laser-assisted bonding for mini- and micro-LED display panel packaging

  • Yong-Sung Eom;Gwang-Mun Choi;Ki-Seok Jang;Jiho Joo;Chan-mi Lee;Jin-Hyuk Oh;Seok-Hwan Moon;Kwang-Seong Choi
    • ETRI Journal
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    • v.46 no.2
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    • pp.347-359
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    • 2024
  • A simultaneous transfer and bonding (SITRAB) process using areal laser irradiation is introduced for high-yield and cost-effective production of mini- or micro-light-emitting diode (LED) display panels. SITRAB materials are special epoxy-based solvent-free pastes. Three types of pot life are studied to obtain a convenient SITRAB process: Room temperature pot life (RPL), stage pot life (SPL), and laser pot life (LPL). In this study, the RPL was found to be 1.2 times the starting viscosity at 25℃, and the SPL was defined as the time the solder can be wetted by the SITRAB paste at given stage temperatures of 80℃, 90℃, and 100℃. The LPL, on the other hand, was referred to as the number of areal laser irradiations for the tiling process for red, green, and blue LEDs at the given stage temperatures. The process windows of SPL and LPL were identified based on their critical time and conversion requirements for good solder wetting. The measured RPL and SPL at the stage temperature of 80℃ were 6 days and 8 h, respectively, and the LPL was more than six at these stage temperatures.

High Temperature Silicon Pressure Sensor of SDB Structure (SDB 구조의 고온용 실리콘 압력센서)

  • Park, Jae-Sung;Choi, Deuk-Sung;Kim, Mi-Mok
    • Journal of the Institute of Electronics and Information Engineers
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    • v.50 no.6
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    • pp.305-310
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    • 2013
  • In this paper, the pressure sensor usable in a high temperature, using a SDB(silicon-direct-bonding) wafer of Si/$SiO_2$/Si-sub structure was provided and studied the characteristic thereof. The pressure sensor produces a piezoresistor by using a single crystal silicon as a first layer of SDB wafer, to thus provide a prominent sensitivity, and dielectrically isolates the piezoresistor from a silicon substrate by using a silicon dioxide layer as a second layer thereof, to be thus usable even under the high temperature over $120^{\circ}C$ as a limited temperature of a general silicon sensor. The measured result for a pressure sensitivity of the pressure sensor has a characteristic of high sensitivity, and its tested result for an output of the sensor further has a very prominent linearity and hysteresis characteristic.

Lower Temperature Soldering of Capacitor Using Sn-Bi Coated $Sn-3.5\%Ag$ Solder (Sn-Bi도금 $Sn-3.5\%Ag$ 솔더를 이용한 Capacitor의 저온 솔더링)

  • Kim Mi-Jin;Cho Sun-Yun;Kim Sook-Hwan;Jung Jae-Pil
    • Journal of Welding and Joining
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    • v.23 no.3
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    • pp.61-67
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    • 2005
  • Since lead (Pb)-free solders for electronics have higher melting points than that of eutectic Sn-Pb solder, they need higher soldering temperatures. In order to decrease the soldering temperature we tried to coat Sn-Bi layer on $Sn-3.5\%Ag$ solder by electroplating, which applies the mechanism of transient liquid phase bonding to soldering. During heating Bi will diffuse into the $Sn-3.5\%Ag$ solder and this results in decreasing soldering temperature. As bonding samples, the 1608 capacitor electroplated with Sn, and PCB, its surface was finished with electroless-plated Ni/Au, were selected. The $Sn-95.7\%Bi$ coated Sn-3.5Ag was supplied as a solder between the capacitor and PCB land. The samples were reflowed at $220^{\circ}C$, which was lower than that of normal reflow temperature, $240\~250^{\circ}C$, for the Pb-free. As experimental result, the joint of $Sn-95.7\%Bi$ coated Sn-3.5Ag showed high shear strength. In the as-reflowed state, the shear strength of the coated solder showed 58.8N, whereas those of commercial ones were 37.2N (Sn-37Pb), 31.4N (Sn-3Ag-0.5Cu), and 40.2N (Sn-8Zn-3Bi). After thermal shock of 1000 cycles between $-40^{\circ}C$ and $+125^{\circ}C$, shear strength of the coated solder showed 56.8N, whereas the previous commercial solders were in the range of 32.3N and 45.1N. As the microstructures, in the solder $Ag_3Sn$ intermetallic compound (IMC), and along the bonded interface $Ni_3Sn_4$ IMC were observed.