• JSTS:Journal of Semiconductor Technology and Science
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• v.14 no.1
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• pp.8-22
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• 2014

In the past few decades, CMOS logic technologies and devices have been successfully developed with the steady miniaturization of the feature size. At the sub-30-nm CMOS technology nodes, one of the main hurdles for continuously and successfully scaling down CMOS devices is the parametric failure caused by random variations such as line edge roughness (LER), random dopant fluctuation (RDF), and work-function variation (WFV). The characteristics of each random variation source and its effect on advanced device structures such as multigate and ultra-thin-body devices (vs. conventional planar bulk MOSFET) are discussed in detail. Further, suggested are suppression methods for the LER-, RDF-, and WFV-induced threshold voltage (VTH) variations in advanced CMOS logic technologies including the double-patterning and double-etching (2P2E) technique and in advanced device structures including the fully depleted silicon-on-insulator (FD-SOI) MOSFET and FinFET/tri-gate MOSFET at the sub-30-nm nodes. The segmented-channel MOSFET (SegFET) and junctionless transistor (JLT) that can suppress the random variations and the SegFET-/JLT-based static random access memory (SRAM) cell that enhance the read and write margins at a time, though generally with a trade-off between the read and the write margins, are introduced.

• The Journal of Internal Korean Medicine
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• v.42 no.6
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• pp.1199-1210
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• 2021

Objectives: The aim of this study was to analyze the correlation between patterns determined by pattern identification of functional dyspepsia (FD) and tongue features, including tongue coating and tooth marks, in FD patients. Methods: We reviewed the clinical records of 68 FD patients who visited the Department of Digestive Diseases of Kyung Hee University Korean Medicine Hospital from September 1, 2020 to August 31, 2021. The subjects were evaluated with a computerized tongue image acquisition system (CTIS) and by pattern identification of FD. Measurement included the percentage of tongue coating, tooth mark levels, and pattern scores. Results: Statistically significant negative correlations were noted between the scores of the pattern of 'spleen and stomach deficiency and cold' (SSDC) and the percentage of tongue coating in whole, center, and root of the tongue body. However, no other patterns were correlated with any parameter measured by CTIS. No significant difference was noted in the percentage of tongue coating and the tooth mark level between the patterns. Conclusions: This study demonstrated that the pattern of SSDC was significantly associated with the percentage of tongue coating. We suggest that the percentage of tongue coating could be a useful indicator for identifying the degree of patterning of SSDC in patients with FD.