• 전기학회논문지
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• 제57권1호
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• pp.98-101
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• 2008

In this paper, we describe the RLG current stabilizer circuit for attitude control in the satellite. The RLG makes use of the Sagnac effect within a resonant of a HeNe laser. The difference between two discharge currents causes one of the gyro bias errors. The theoretical background and current stabilizer are introduced. It is verified that the circuit designed is applicable to the test of input voltage and temperature.

• Journal of information and communication convergence engineering
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• 제7권1호
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• pp.57-61
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• 2009

This paper has presented the subthreshold current model of FinFET using the potential variation in the doped channel based on the analytical solution of three dimensional Poisson's equation. The model has been verified by the comparison with the data from 3D numerical device simulator. The variation of subthreshold current with front and back gate bias has been studied. The variation of subthreshold swing and threshold voltage with front and back gate bias has been investigated.

• 전자공학회논문지A
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• 제30A권10호
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• pp.20-26
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• 1993

The base-collector capacitance of an npn bipolar transistor in bipolar or BiCMOS technology has significant influence on the switching performances, and comprises pnjunction component and MOS component. Both components have complicated dependences on the isolation oxide structure, epitaxial doping density, and bias voltage. Analytical/empirical formulas for both components are derived in this paper for a generic isolation structure as a function of epitaxial doping density and bias voltage based on some theoretical understanding and two-dimensional device simulations. These formulas are useful in estimating the effect of device isoation schemes on the switching speed of bipolar transistors.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.611-614
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• 2003

We have investigated electric field effect on the formation of phase separated composite organic film structure which is utilized by anisotropic phase separation from LC and prepolymer mixtures. Application of bias field resulted in a significant change in liquid crystal alignment between glass substrate and polymer layer. The liquid crystal molecules segregated into the inter-electrodes and formed twisted structure which is the result of imprinting of LC alignment by the bias field on polymer layers during polymerization process.

• 전자공학회논문지A
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• 제31A권2호
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• pp.81-87
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• 1994

We used IR laser inteferometric technique for measuring the temperature of wafer during cryogenic ECR etching. Using this technique, the effect of RF bias power and microwave power on the wafer temperature during etching period is investigated. As the RF bias power and microwave power was increased, the temperature of the wafer considerably increased and we concluded that to prevent the increase of substrate temperature during etching period, an adequate wafer cooling is needed.

• 한국정보처리학회:학술대회논문집
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• 한국정보처리학회 2020년도 춘계학술발표대회
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• pp.455-457
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• 2020

Recent studies demonstrate that deep learning model is easily biased by trained with unbalanced datasets. For example, the deep network can be trained to make a prediction by background feature instead the real target's feature. For those problem, a measurement called leakage was introduced to digitize this tendency. In this paper, we propose augmentation strategy which are used generally in computer vision problem to remedy this bias problem and we showed a simple augmentation methods have a effect to this task with experiments.

• 반도체디스플레이기술학회지
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• 제9권4호
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• pp.13-18
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• 2010

Extreme ultraviolet (EUV) lithography using 13.5 nm wavelengths is expected to be adopted as a mass production technology for 32 nm half pitch and below. One of the new issues introduced by EUV lithography is the shadowing effect. Mask shadowing is a unique phenomenon caused by using mirror-based mask with an oblique incident angle of light. This results in a horizontal-vertical (H-V) biasing effect and ellipticity in the contact hole pattern. To minimize the shadowing effect, a refilled mask is an available option. The concept of refilled mask structure can be implemented by partial etching into the multilayer and then refilling the trench with an absorber material. The simulations were carried out to confirm the possibility of application of refilled mask in 32 nm line-and-space pattern under the condition of preproduction tool. The effect of sidewall angle in refilled mask is evaluated on image contrast and critical dimension (CD) on the wafer. We also simulated the effect of refilled absorber thickness on aerial image, H-V CD bias, and overlapping process window. Finally, we concluded that the refilled absorber thickness for minimizing shadowing effect should be thinner than etched depth.

• The Journal of Asian Finance, Economics and Business
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• 제7권12호
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• pp.535-543
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• 2020

Investors from the whole world are looking for those stock markets that are less affected by interest rates. Pakistan is a good place to invest and the investors from the whole world are considering Pakistan for future ventures. The current study, therefore, aims to analyze the factors affecting investors' decision making in Pakistan with the interaction effect of locus of control. The primary data are gathered from 300 respondents. Structural equation modelling (SEM-PLS) is used to analyze the interactions among variables. The study finds positive impact of availability and representative biases on investment decision making. The study could not find any moderating role of locus of control. The results imply that decisions made by Pakistani investors are driven by the most easily or currently available information and they trust on the information obtained from family and friends without any authentication and verification. One possible description of insignificant moderation effect of locus of control can be the sample traits used in the study, e.g., personal characteristics, that change from culture to culture. Another description of these findings may be the association between heuristic biases, including availability, representative and psychological biases and decision-making regarding investment is not personality specific.

• 천문학회지
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• 제38권2호
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• pp.175-178
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• 2005

We show that next-generation galaxy surveys such as KAOS (the Kilo-Aperture Optical Spectro-graph)will constrain dark energy even if the baryon oscillations are missing from the monopole power spectrum and the bias is scale- and time-dependent KAOS will accurately measure the quadrupole power spectrum which gives the leading anisotropies in the power spectrum in redshift space due to peculiar velocities, the finger of God effect, as well as the Alcock-Paczynski effect. The combination of monopole and quadrupole power spectra powerfully breaks the degeneracy between the bias parameters and dark energy and, in the complete absence of baryon oscillations ($\Omega$b = 0), leads to a roughly $500\%$ improvement in constraints on dark energy compared with the monopole spectrum alone. As a result, for KAOS the worst case with no oscillations has dark energy errors only mildly degraded relative to the ideal case, providing insurance on the robustness of KAOS constraints on dark energy. We show that nonlinear effects are crucial in correctly evaluating the quadrupole and significantly improving the constraints on dark energy when we allow for multi-parameter scale-dependent bias.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.177-177
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• 2012

진공을 기초로 한 다양한 반도체 식각 공정에서 RF bias가 결합된 유도 결합 플라즈마 소스는 널리 사용되고 있다. 하지만, 대부분의 연구는 RF bias에 의한 자기 바이어스 효과에만 한정되어 있으며, 공정 결과와 소자 품질에 결정적인 역할을 하는 플라즈마 변수들(전자 온도, 플라즈마 밀도)과 RF bias의 상관관계에 대한 연구는 거의 없는 실정이다. 본 연구에서는 RF bias가 플라즈마 변수에 미치는 영향과 비충돌 전자 가열 메커니즘의 실험적 증거에 관한 연구를 진행하였다. 플라즈마 밀도는 RF bias에 의하여 감소 또는 증가하였으며, 이러한 결과는 Fluid global model에 의한 계산과 잘 일치하는 결과를 보였다. 전자 온도는 RF bias에 의하여 증가하였으며, 적은 RF bias 전력에서는 플라즈마 전위에 갇혀있는 낮은 에너지 그룹의 전자들의 가열이 주가 되었으나, 큰 RF bias 전력에서는 높은 에너지 그룹의 전자들의 가열이 주가 됨을 관찰하였다. 이는 높은 에너지 그룹의 전자 가열 메커니즘이 anomalous skin effect에서 collisionless sheath heating으로 전이되는 것을 나타내며, bounce resonance heating이 RF bias의 전자가열에 중요한 역할을 함을 보여주는 실험적 근거이다. 플라즈마 밀도의 공간 분포는 RF bias의 인가에 의하여 더욱 균일함을 보였으며, 이는 (electro-static and electro-magnetic) edge effect에 의한 영향으로 해석될 수 있다. 이러한 RF bias와 플라즈마 변수들의 상관관계 및 전자 가열 메커니즘에 대한 연구는 방전 특성의 물리적 이해뿐만 아니라, 반도체 식각 공정에서 소자 품질 및 공정 개선을 위한 최적의 방전 조건 도출과 외부 변수 제어에 큰 도움을 주리라 예상된다.