• Journal of Magnetics
• /
• v.14 no.4
• /
• pp.172-174
• /
• 2009

Nanolithography by atomic force microscope local oxidation was applied to the fabrication of planar-type Ni/Ni oxide/Ni junctions from 10 nm-thick Ni films. The junction characteristics were sensitive to the lithography conditions such as the bias voltage. Successful oxidation produced junctions of nonlinear current-voltage characteristics, implying the formation of oxide barriers. Magnetoresistance (MR) at low temperatures resembled that of spin valves.

• Journal of the Korean Society for Precision Engineering
• /
• v.22 no.2
• /
• pp.194-201
• /
• 2005

Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate easily by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin damaged layer rapidly forms in the substrate at the diamond tip-sample junction along scanning path of the tip and simultaneously the area uncovered with the damaged layer is being etched. This study demonstrates how the TNL parameters can affect the formation of damaged layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

• International Journal of Precision Engineering and Manufacturing
• /
• v.7 no.4
• /
• pp.8-13
• /
• 2006

Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with a diamond tip, allowing the formation of a mask layer on the silicon substrate by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of the conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin mask layer rapidly forms on the substrate at the diamond tip-sample junction along scanning path of the tip, and simultaneously, the area uncovered with the mask layer is etched. This study demonstrates how the TNL parameters can affect the formation of the mask layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

• Transactions on Electrical and Electronic Materials
• /
• v.15 no.5
• /
• pp.235-240
• /
• 2014

Nanocomposites made of linear low density polyethylene (LLDPE) and organo-modified montmorillonite (O-MMT) were processed by melt compounding from a commercially available premixed LLDPE/nanoclay masterbatch, at different nanoclay loadings, by co-rotating twin-screw extruder. The morphological and dielectric properties of LLDPE/O-MMT nanocomposites were investigated to understand the structure-dielectric properties relationship in the nanocomposites. The microstructures of the materials were characterized by wide angle X-ray diffraction (WAXD), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and atomic force microscopy (AFM). Initial findings by FTIR spectroscopy characterization indicated the absence of any chemical interaction between LLDPE and nanoclay during the extrusion process, while DSC showed that a 1% wt loading of nanoclay particles increased the degree of crystallinity of the nanocomposites samples. On the other hand, XRD, SEM, TEM and AFM indicated that nanoclay layers were intercalated or exfoliated in the LLDPE matrix. A correlation between the structure and dielectric properties of LLDPE/O-MMT nanocomposites was found and discussed.

• Applied Microscopy
• /
• v.42 no.3
• /
• pp.129-135
• /
• 2012

In this study, the changes in hair quality before and after Magic straight perm have been evaluated through a hair damage measurement method. For this, a healthy high school student's (age18 years) wavy hair was selected and permed on the left and right sides. Then, the changes caused by physical methods which were applied during the fl at iron-based Magic straight perm were evaluated based on the hair damage measurement method before and after the Magic straight perm. According to the protein release test after the Magic straight perm, 1.26% in average and 0.14% was observed in Cool Magic straight perm sample. In a field emission scanning electron microscopy (FE-SEM) test, saw teeth-shaped partial desquamation of cuticle cells and impurities were observed in the warm-treated hair sample. In atomic force microscope (AFM), line-profile is a method to represent roughness data on hair. According to analysis on 3-dimensional (3D) images, the hair with Cool Magic straight perm was lower than the hair with Warm Magic perm in terms of the color change of 3D images. In addition, vertical changes were observed in the hair with Cool Magic perm. As a result, irregular surface roughness was observed. This study proposed a method to minimize hair damage by cooling down the heat with the cool hair straightener as soon as the Warm Magic was finished.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2004.07b
• /
• pp.1292-1295
• /
• 2004

본 연구는 Cu CMP공정 중 알루미나 연마입자의 wafer 표면에서의 점착과 오염을 AFM (Atomic Force Microscopy)을 사용하여 슬러리내에서 점착력 측정과 실제 연마 후 wafer 표면의 오염을 실험적으로 비교 평가하였다. 연마입자의 adhesionn force 측정에 있어서도 역시 wafer들의 zetapotential 결과와 잘 일치하였으며, 모든 wafer 종류에 관계없이, 산성 영역에서 염기성영역의 슬러리가 적용됨에 따라 adhesion force가 작아짐을 확인할 수 있었다. 특히 FSG wafer의 zetapotential 결과는 비록 산성 분위기에서는 양성 전하값을 나타내었으나, 염기성 분위기의 pH에서는 급격하게 음성 전하값을 나타내었고, 이는 adhesionn force결과와 FESEM 결과와 잘 일치하였다.

• Journal of the Korean Vacuum Society
• /
• v.6 no.4
• /
• pp.321-325
• /
• 1997

Recently, photosensitive color filters have received much attention for their use in the liquid crystal display (LCD) industry. It is well known that chemical and physical properties of polymer surfaces can be modified by special surface treatments. In this work, we have studied the polymer surfaces of LCD blue color filters which were exposed to the UV light during photolithography. A better understanding of the irradiated polymer surfaces is required for the subsequent processes such as plasma etching, ITO electrode deposition, etc. The surface analysis has been undertaken using secondary ion mass spectrometry (SIMS), x-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). A significant enrichment of the pigment component and roughening of surface with bubble-like feature have been observed at the modified polymer surface.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.16 no.6
• /
• pp.510-514
• /
• 2003

We have studied the alignment of liquid crystals (LCs) on homeotropic polymeric surface that is scanned using an atomic force microscope (AFM) tip by optical polarizing microscopy and computer simulation. The scanned areas on one substrate are 5 $\mu\textrm{m}$ ${\times}$ 5 $\mu\textrm{m}$, 10 $\mu\textrm{m}$ ${\times}$ 10 $\mu\textrm{m}$, and 20 $\mu\textrm{m}$ ${\times}$ 20 $\mu\textrm{m}$ and this substrate is assembled to another substrate coated. with homeotropic polymer. The fabricated micro-LC cell using two substrates does not show any hysteresis and disclination lines inside the nano-rubbing areas, while changing voltage up and down. This indicates that the pretilt angle exists in the areas, thereby forming a hybrid LC configuration. From the experimental and computer simulation results, we can understand that the AFM rubbing clearly changes surface status of homeotropic alignment layer and causes the pretilt angle to an initial scanning direction.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.274-274
• /
• 2013

We fabricate encapsulation-layer of OLED panel from organic-inorganic hybrid thin film by atomic layer deposition (ALD) molecular layer deposition (MLD) using Al2O3 as ALD process and Adipoyl Chloride (AC) and 1,4-Butanediamine as MLD process. Ellipsometry was employed to verify self-limiting reaction of MLD. Linear relationship between number of cycle and thickness was obtained. By such investigation, we found that desirable organic thin film fabrication is possible by MLD surface reaction in monolayer scale. Purging was carried out after dosing of each precursor to eliminate physically adsorbed precursor with surface. We also confirmed roughness of the organic thin film by atomic force microscopy (AFM). We deposit AC and 1,4-Butanediamine at $70^{\circ}C$ and investigated surface roughness as a function of increasing thickness of organic thin film. We confirmed precursor's functional group by IR spectrum. We calculated WVTR of organic-inorganic hybrid super-lattice epitaxial layer using Ca test. WVTR indicates super-lattice film can be possibly use as encapsulation in flexible devices.

• KSTLE International Journal
• /
• v.1 no.2
• /
• pp.69-75
• /
• 2000

The paper compares topography, phase contrast and force spectroscopy in atomic force microscopy data for evaluating the microheterogeneity of surface layer. The worn surface of ion-plated TiN coating was measured using both a laboratory-built and a commercial AFM. The results of analysis revealed structural and micromechanical heterogeneity of the worn surfaces. We demonstrated that the phase image allows relatively qualitative estimation of elastic modulus of the sample surface. The tribolayer formed in the worn surface possessed much lower stiffness than the original coating. It is shown that the most stable phase imaging is provided with a stiff cantilever. In this case, phase contrast is well conditioned, first of all, by microheterogeneity of elastic properties of the investigated surfaces. In this study an attempt was also made to correlate the results of phase imaging with that of the farce spectroscopy. The joint analysis of information on the surface properties obtained by the phase imaging and quantitative data measured with the force spectroscopy methods allows a better understanding of the nature of the surface micromechanical heterogeneity.