• Title/Summary/Keyword: asymmetric channel model

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Threshold Voltage Roll-off for Bottom Gate Voltage of Asymmetric Double Gate MOSFET (비대칭 이중게이트 MOSFET의 하단게이트 전압에 따른 문턱전압이동현상)

  • Jung, Hakkee
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2014.05a
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    • pp.741-744
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    • 2014
  • This paper has analyzed threshold voltage roll-off for bottom gate voltages of asymmetric double gate(DG) MOSFET. Since the asymmetric DGMOSFET is four terminal device to be able to separately bias for top and bottom gates, the bottom gate voltage influences on threshold voltage. It is, therefore, investigated how the threshold voltage roll-off known as short channel effects is reduced with bottom gate voltage. In the pursuit of this purpose, off-current model is presented in the subthreshold region, and the threshold voltage roll-off is observed for channel length and thickness with a parameter of bottom gate voltage as threshold voltage is defined by top gate voltage that off-currnt is $10^{-7}A/{\mu}m$ per channel width. As a result to observe the threshold voltage roll-off for bottom gate voltage using this model, we know the bottom gate voltage greatly influences on threshold voltage roll-off voltages, especially in the region of short channel length and thickness.

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On Constructing an Explicit Algebraic Stress Model Without Wall-Damping Function

  • Park, Noma;Yoo, Jung-Yul
    • Journal of Mechanical Science and Technology
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    • v.16 no.11
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    • pp.1522-1539
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    • 2002
  • In the present study, an explicit algebraic stress model is shown to be the exact tensor representation of algebraic stress model by directly solving a set of algebraic equations without resort to tensor representation theory. This repeals the constraints on the Reynolds stress, which are based on the principle of material frame indifference and positive semi-definiteness. An a priori test of the explicit algebraic stress model is carried out by using the DNS database for a fully developed channel flow at Rer = 135. It is confirmed that two-point correlation function between the velocity fluctuation and the Laplacians of the pressure-gradient i s anisotropic and asymmetric in the wall-normal direction. Thus, a novel composite algebraic Reynolds stress model is proposed and applied to the channel flow calculation, which incorporates non-local effect in the algebraic framework to predict near-wall behavior correctly.

Bit Error Bounds for Trellis Coded Asymmetric 8PSK in Rain Fading Channel (강우 페이딩 채널에서 비대칭 8PSK 트랠리스 부호화방식의 비트에러 상한 유도)

  • 황성현;최형진
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.25 no.5B
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    • pp.797-808
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    • 2000
  • This paper presents the bit error rate(BER) upper bounds for trellis coded asymmetric 8PSK(TC-A8PSK) system using the Ka-band satellite in the rain fading environment. The probability density function(PDF) for the rain fading random variable can be theoretically derived by assuming that the rain attenuation can be approximated to a long-normal distribution and the rain fading parameters are calculated by using the rain precipitation data from the Crane global model. Furthermore, we analyze the BER upper bounds of TC-A8PSK system according to the number of states in the trellis diagram and the availability of channel state information(CSI). In the past, Divsalar and Simon[9] has analyzed the BER upper bounds of 2-state TCM system in Rician fading channels however this paper is the first to analyze the BER upper bounds of TCM system in the rain fading channels. Finally, we summarize the dominant six factors which are closely related to the BER upper bounds of TC-A8PSK satellite system in the rain fading channel as follows: 1) frequency band, 2) rain intensity, 3) elevation angle, 4) signal to noise ratio, 5) asymmetric angle, and 6) availability of CSI.

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A study of electrical stress on short channel poly-Si thin film transistors (짧은 채널 길이의 다결정 실리콘 박막 트랜지스터의 전기적 스트레스에 대한 연구)

  • 최권영;김용상;한민구
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.32A no.8
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    • pp.126-132
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    • 1995
  • The electrical stress of short channel polycrystalline silicon (poly-Si) thin film transistor (TFT) has been investigated. The device characteristics of short channel poly-Si TFT with 5$\mu$m channel length has been observed to be significantly degraded such as a large shift in threshold voltage and asymmetric phenomena after the electrical stress. The dominant degradation mechanism in long channel poly-Si TFT's with 10$\mu$m and 20$\mu$m channel length respectively is charage trappling in gate oxide while that in short channel device with 5.mu.m channel length is defect creation in active poly-Si layer. We propose that the increased defect density within depletion region near drain junction due to high electric field which could be evidenced by kink effect, constitutes the important reason for this significant degradation in short channel poly-Si TFT. The proposed model is verified by comparing the amounts of the defect creation and the charge trapping from the strechout voltage.

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Optimal Strategy of Hybrid Marketing Channel in Electronic Commerce (전자상거래하에서의 하이브리드 마케팅 채널의 믹스 전략에 관한 연구)

  • Chun, Se-Hak;Kim, Jae-Cheol
    • Asia pacific journal of information systems
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    • v.17 no.2
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    • pp.83-95
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    • 2007
  • We are motivated by how offline and online firms compete. The Internet made many conventional offline firms build a dynamic online business as another sales channel using their advantages such as brand equity, an existing customer base with comprehensive purchasing data, integrated marketing, economies of scale, and longtime experience with the logistics of order fulfillment and customer service. Even though the hybrid selling using both offline and online channel seems to have advantages over a pure online retailer, all the conventional offline firms are not seen to create an online business. Many conventional offline firms began to launch online business since the Internet era, however, just being online business is not likely to guarantee success. According to Bizate.com's report whether the hybrid channel strategy is successful is still under investigation. For example, consider the classic case of Barnes and Noble versus Amazon.com, Barnes and Noble was already the largest chain of bookstores in the U,S., when Amazon.com was established in 1995, BarnesandNoble.com followed suit in 1997, After suffering losses in its initial years, Amazon finally turned profitable in 2003. In 2004, Amazon's net income was $588 million on revenues of $6.92 billion, while Barnes and Noble earned $143 million on revenues of $4.87 billion, which included BarnesandNoble.com's loss of $21 million on revenues of $420 million. While these examples serve to motivate our thinking, it does not explain when offline firms should venture online. It also does not provide an analytical framework that can generalized to other competitive online-offline situations. We attempt to do this in this paper and analyze a hybrid channel model where a conventional offline firm competes against online firms using its own direct online channels. We are particularly interested in an optimal channel strategy when a conventional offline firm sells its products through its own direct online channel to compete with other rival online firms. We consider two situations where its direct online channel and other online firms are symmetric and asymmetric in the brand effect. The analysis of this paper presents several findings. In the symmetric model where a hybrid firm's online channel is not differentiated from a pure online firm, (i) a conventional offline firm will not launch its online business. In the asymmetric model where a hybrid firm's online channel is differentiated from a pure online firm, (ii) a conventional offline firm can launch its online business if its brand effect is greater than a certain threshold. (iii) there is a positive relationship between its brand effect and online customer costs showing that a conventional offline firm needs more brand effect in order to launch online business as online customer costs decrease. (iv) there is a negative relationship between its brand effect and the number of customers with access to the Internet showing that a conventional offline firm tends to launch its online business when customers with access to the Internet increases.

Analysis of Laminar Flow and Heat Transfer in Asymmetric, Sudden Expansion Channel (비대칭급확대채널의 층류유동 및 열전달 해석)

  • Won, Seung-Ho;Maeng, Joo-Sung;Son, Byung-Jin
    • The Magazine of the Society of Air-Conditioning and Refrigerating Engineers of Korea
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    • v.13 no.1
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    • pp.5-13
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    • 1984
  • This analysis of numerical procedure is prediction of laminar flow and heat transfer at two dimension and steady flow in asymmetric sudden expansion channel. At former study, to analyse the flows with separation, the full Navier-Stokes equation is used, but there are many difficulties to analyse, and although significant progress has been made in the development of efficient computational methods for the Navier-Stokes equations, very large computation times are still required. In case of reward-facing flow, boundary-layer equation is used instead of full Navier-Stokes equation to analyse velocity fields, and result of this numerical analysis is good agreement with the given experimental study. In this case, since the computer time required for the boundary-layer calculation is an order of magnitude less than required for the solution of the full Navier-Stokes equation, this boundary-layer model provides a good approximate solution.

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Analysis of Threshold Voltage for Symmetric and Asymmetric Oxide Structure of Double Gate MOSFET (이중게이트 MOSFET의 대칭 및 비대칭 산화막 구조에 대한 문턱전압 분석)

  • Jung, Hakkee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.18 no.12
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    • pp.2939-2945
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    • 2014
  • This paper has analyzed the change of threshold voltage for oxide structure of symmetric and asymmetric double gate(DG) MOSFET. The asymmetric DGMOSFET can be fabricated with different top and bottom gate oxide thickness, while the symmetric DGMOSFET has the same top and bottom gate oxide thickness. Therefore optimum threshold voltage is considered for top and bottom gate oxide thickness of asymmetric DGMOSFET, compared with the threshold voltage of symmetric DGMOSFET. To obtain the threshold voltage, the analytical potential distribution is derived from Possion's equation, and Gaussian distribution function is used as doping profile. We investigate for bottom gate voltage, channel length and thickness, and doping concentration how top and bottom gate oxide thickness influences on threshold voltage using this threshold voltage model. As a result, threshold voltage is greatly changed for oxide thickness, and we know the changing trend greatly differs with bottom gate voltage, channel length and thickness, and doping concentration.

Game Theoretic Model for Radio Channel Sharing between MNO and MVNO (MNO와 MVNO 사이의 무선 채널 공유를 위한 게임이론적 모델)

  • Park, Jae-Sung;Kim, Beom-Joon
    • Journal of KIISE:Information Networking
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    • v.37 no.4
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    • pp.312-316
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    • 2010
  • In this paper, we propose a game theoretic channel sharing model that allocates resources of a base station between MNO(Mobile Network Operator) and MVNO(Mobile Virtual Network Operator) in a fair and efficient manner. Considering the input traffic loads of MNO and MVNO, the proposed model uses the bargaining game theory to allocate channel resources between MNO and MNVO. When the input loads of the carriers are asymmetric, the proposed model increases the resource utilization by allocating more channel resources to the operator with high input load. In addition, the proposed model prevents the quality of service of an operator from degrading even if the input load of the other operators increases excessively.

Design and Characteristics of Modern Power MOSFETs for Integrated Circuits

  • Bang, Yeon-Seop
    • The Magazine of the IEIE
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    • v.37 no.8
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    • pp.50-59
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    • 2010
  • $0.18-{\mu}m$ high voltage technology 13.5V high voltage well-based symmetric EDMOS isolated by MTI was designed and fabricated. Using calibrated process and device model parameters, the characteristics of the symmetric and asymmetric EDMOS have been simulated. The asymmetric EDMOS has higher performance, better $R_{sp}$ / BVDSS figure-of-merit, short-channel immunity and smaller pitch size than the symmetric EDMOS. The asymmetric EDMOST is a good candidate for low-power and smaller source driver chips. The low voltage logic well-based EDMOS process has advantages over high voltage well-based EDMOS in process cost by eliminating the process steps of high-voltage well/drift implant, high-temperature long-time thermal steps, etc. The specific on-resistance of our well-designed logic well-based EDMOSTs is compatible with the smallest one published. TCAD simulation and measurement results show that the improved logic well-based nEDMOS has better electrical characteristics than those of the conventional one. The improved EDMOS proposed in this paper is an excellent candidate to be integrated with low voltage logic devices for high-performance low-power low-cost chips.

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Analysis of Threshold Voltage for Double Gate MOSFET of Symmetric and Asymmetric Oxide Structure (대칭 및 비대칭 산화막 구조의 이중게이트 MOSFET에 대한 문턱전압 분석)

  • Jung, Hakkee;Kwon, Ohshin;Jeong, Dongsoo
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2014.05a
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    • pp.755-758
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    • 2014
  • This paper has analyzed the change of threshold voltage for oxide structure of symmetric and asymmetric double gate(DG) MOSFET. The asymmetric DGMOSFET can be fabricated with different top and bottom gate oxide thickness, while the symmetric DGMOSFET has the same top and bottom gate oxide thickness. Therefore optimum threshold voltage is considered for top and bottom gate oxide thickness of asymmetric DGMOSFET, compared with the threshold voltage of symmetric DGMOSFET. To obtain the threshold voltage, the analytical potential distribution is derived from Possion's equation, and Gaussian distribution function is used as doping profile. We investigate for bottom gate voltage, channel length and thickness, and doping concentration how top and bottom gate oxide thickness influences on threshold voltage using this threshold voltage model. As a result, threshold voltage is greatly changed for oxide thickness, and we know the changing trend very differs with bottom gate voltage, channel length and thickness, and doping concentration.

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