• 제목/요약/키워드: annealing.

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Effect of Annealing Temperature on the Structural and Optical Properties of ZrO2 Thin Films

  • Kumar, Davinder;Singh, Avtar;Kaur, Navneet;Katoch, Apoorva;Kaur, Raminder
    • 한국재료학회지
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    • 제32권5호
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    • pp.249-257
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    • 2022
  • Transparent thin films of pure and nickel-doped ZrO2 are grown successfully by sol-gel dip-coating technique. The structural and optical properties according to the different annealing temperatures (300 ℃, 400 ℃ and 500 ℃) are investigated. Analysis of crystallographic properties through X-ray diffraction pattern reveals an increase in crystallite size due to increase in crystallinity with temperature. All fabricated thin films are highly-oriented along (101) planes, which enhances the increase in nickel doping. Scanning electron microscopy and energy dispersive spectroscopy are employed to confirm the homogeneity in surface morphology as well as the doping configuration of films. The extinction coefficient is found to be on the order of 10-2, showing the surface smoothness of deposited thin films. UV-visible spectroscopy reveals a decrease in the optical band gap with the increase in annealing temperature due to the increase in crystallite size. The variation in Urbach energy and defect density with doping and the change in annealing temperature are also studied.

Effects on Heat Treatment Methods in Indium-Tin-Oxide Films by DC Magnetron Sputter of Powder Target

  • Kim, H.H.;Shin, J.H.;Baek, J.Y.;Shin, S.H.;Park, K.J.
    • Transactions on Electrical and Electronic Materials
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    • 제2권1호
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    • pp.22-26
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    • 2001
  • ITO (Indium-tin-oxide) thin films were deposited on glass substrates by a dc magnetron sputtering system using ITO powder target. The methods of heat treatment are important factor to obtain high quality ITO films with low electrical resistivity and good optical transmittance. Therefore, both methods of the substrate temperature and post-deposition annealing temperature have been compared on the film structural, electrical and optical properties. A preferred orientations shifts from (411) to (222) peak at annealing temperature of 200$\^{C}$. Minimum resistivity of ITO film is approximately 8.7$\times$10$\^$-4/ Ωcm at substrate temperature of 450$\^{C}$. Optical transmittances at post annealing temperature above 200$\^{C}$ are 90%. As a result, the minimum value of annealing temperature that is required for the recrystallization of as-deposited ITo thin films is 200$\^{C}$.

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Microstructural Evolution of a Cold Roll-Bonded Multi-Layer Complex Aluminum Sheet with Annealing

  • Jo, Sang-Hyeon;Lee, Seong-Hee
    • 한국재료학회지
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    • 제32권2호
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    • pp.72-79
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    • 2022
  • A cold roll-bonding process using AA1050, AA5052 and AA6061 alloy sheets is performed without lubrication. The roll-bonded specimen is a multi-layer complex aluminum alloy sheet in which the AA1050, AA5052 and AA6061 sheets are alternately stacked. The microstructural evolution with the increase of annealing temperature for the roll-bonded aluminum sheet is investigated in detail. The roll-bonded aluminum sheet shows a typical deformation structure in which the grains are elongated in the rolling direction over all regions. However, microstructural evolution of the annealed specimen is different depending on the type of material, resulting in a heterogeneous microstructure in the thickness direction of the layered aluminum sheet. Complete recrystallization occurs at 250 ℃ in the AA5052 region, which is lower by 100K than that of the AA1050 region. Variation of the misorientation angle distribution and texture development with increase of annealing temperature also differ depending on the type of material. Differences of microstructural evolution between aluminum alloys with increase of annealing temperature can be mainly explained in terms of amounts of impurities and initial grain size.

저온 중수소 어닐링을 활용한 Enclosed-Layout Transistors (ELTs) 소자의 제작 및 전기적 특성분석 (Fabrication of Enclosed-Layout Transistors (ELTs) Through Low-Temperature Deuterium Annealing and Their Electrical Characterizations)

  • 왕동현;김동호;길태현;연지영;김용식;박준영
    • 한국전기전자재료학회논문지
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    • 제37권1호
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    • pp.43-47
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    • 2024
  • The size of semiconductor devices has been scaled down to improve packing density and output performance. However, there is uncontrollable spreading of the dopants that comprise the well, punch-stop, and channel-stop when using high-temperature annealing processes, such as rapid thermal annealing (RTA). In this context, low-temperature deuterium annealing (LTDA) performed at a low temperature of 300℃ is proposed to reduce the thermal budget during CMOS fabrication. The LTDA effectively eliminates the interface trap in the gate dielectric layer, thereby improving the electrical characteristics of devices, such as threshold voltage (VTH), subthreshold swing (SS), on-state current (ION), and off-state current (IOFF). Moreover, the LTDA is perfectly compatible with CMOS processes.

The Comparison of Neural Network Learning Paradigms: Backpropagation, Simulated Annealing, Genetic Algorithm, and Tabu Search

  • Chen Ming-Kuen
    • 한국품질경영학회:학술대회논문집
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    • 한국품질경영학회 1998년도 The 12th Asia Quality Management Symposium* Total Quality Management for Restoring Competitiveness
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    • pp.696-704
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    • 1998
  • Artificial neural networks (ANN) have successfully applied into various areas. But, How to effectively established network is the one of the critical problem. This study will focus on this problem and try to extensively study. Firstly, four different learning algorithms ANNs were constructed. The learning algorithms include backpropagation, simulated annealing, genetic algorithm, and tabu search. The experimental results of the above four different learning algorithms were tested by statistical analysis. The training RMS, training time, and testing RMS were used as the comparison criteria.

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Effects of the mosture and thermal annealing on CLBO crystal

  • Mori, Yusuke;Sasaki, Takatomo
    • 한국결정성장학회:학술대회논문집
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    • 한국결정성장학회 1997년도 Proceedings of the 12th KACG Technical Meeting and the 4th Korea-Japan EMGS (Electronic Materials Growth Symposium)
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    • pp.125-129
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    • 1997
  • The effects of the moisture and thermal annealing on CLBO crystal have been investigated. CLBO has hydrated at high humidity condition, resulting in 5B$_2$O$_3$$.$Cs$_2$O$.$8H$_2$O. The surface hydration seems to induce the cracking and the refractive index change in CLBO. The thermal annealing is effective to restore the changed index.

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어닐링 기능을 갖는 CNN칩 설계 (Design of CNN Chip with annealing Capability)

  • 류성환;박병일정금섭전흥우
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 1998년도 추계종합학술대회 논문집
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    • pp.1041-1044
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    • 1998
  • In this paper the cellular neural networks with annealing capability is designed. The annealing capability helps the networks escape from the local-minimum points and quickly search for the global-minimum point. A 6$\times$6 CNN chip is designed using a $0.8\mu\textrm{m}$ CMOS technology, and the chip area is 2.89mm$\times$2.89mm. The simulation results for hole filling image processing show that the general CNN has a local-minimum problem, but the annealed CNN finds the global-minimum solutions very efficiently.

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열처리온도에 따른 SBN 세라믹 박막의 특성

  • 김진사;송민종;박건호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
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    • pp.90-90
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    • 2009
  • The $Sr_{0.7}Bi_{2.3}Nb_2O_9$(SBN) thin films are deposited on Pt-coated electrode($Pt/Ti.SiO_2/Si$) using RF sputtering method. The dielectric constant of SBN thin films were increased with the increase of annealing temperature. The maximum dielectric constant of SBN thin film is obtained by annealing at 700[$^{\circ}C$]. The dielectric constant and dielectric loss had a stable value within -5~+5[V].

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A Distributed Stock Cutting using Mean Field Annealing and Genetic Algorithm

  • Hong, Chul-Eui
    • Journal of information and communication convergence engineering
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    • 제8권1호
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    • pp.13-18
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    • 2010
  • The composite stock cutting problem is defined as allocating rectangular and irregular patterns onto a large composite stock sheet of finite dimensions in such a way that the resulting scrap will be minimized. In this paper, we introduce a novel approach to hybrid optimization algorithm called MGA in MPI (Message Passing Interface) environments. The proposed MGA combines the benefit of rapid convergence property of Mean Field Annealing and the effective genetic operations. This paper also proposes the efficient data structures for pattern related information.