• Journal of the Korean Crystal Growth and Crystal Technology
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• v.22 no.2
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• pp.65-72
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• 2012

Aluminum induced crystallization of amorphous silicon was attempted by the aluminum substrate. To avoid the layer exchange between silicon and aluminum layer, Ni layer was deposited between these two layers by sputtering. To obtain the bigger grain of the crystalline silicon, wet blasted silica layer was employed as windows between the nickel and a-Si layer. Ni obtained after the annealing treatment at $520^{\circ}C$ was found to be a promising material for the diffusion barrier between silicon and aluminum. One way to obtain bigger grain of crystalline silicon layer applicable to solar cell of higher performance was envisioned in this investigation.

• Journal of the Korean Magnetics Society
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• v.17 no.6
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• pp.226-231
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• 2007

High frequency loss property of nanocrystalline amorphous ribbon with a high resistivity insulation layer of $TiO_2$ and $SiO_2$ was studied. The insulation layer was fabricated by sol-gel method using dip-coating. The optimum composition ratio of metal alkoxide and slurry for fabrication of insulation layer was established and insulation layer with high adhesion was coated on the nanocrystalline amorphous ribbon. Frequency loss of magnetic core material manufactured on nanocrystalline amorphous ribbon with the surface insulation layer decreased over 40 % compared with that of magnetic core material without surface insulation layer. The insertion loss of an inductive coupler, which was prepared by using magnetic core material coated insulation layer, decreased due to reduction of frequency loss for magnetic core material and insertion loss decreased in proportion to frequency.

• Current Photovoltaic Research
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• v.8 no.3
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• pp.94-101
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• 2020

This study was trying to focus on achieving high efficiency of multi junction solar cell with thin film silicon solar cells. The proposed thin film Si-Ge/c-Si tandem junction solar cell concept with a combination of low-cost thin-film silicon solar cell technology and high-efficiency c-Si cells in a monolithically stacked configuration. The tandem junction solar cells using amorphous silicon germanium (a-SiGe:H) as an absorption layer of upper sub-cell were simulated through ASA (Advanced Semiconductor Analysis) simulator for acquiring the optimum structure. Graded Ge composition - effect of E_g profiling and inserted buffer layer between absorption layer and doped layer showed the improved current density (J_sc) and conversion efficiency (η). 13.11% conversion efficiency of the tandem junction solar cell was observed, which is a result of showing the possibility of thin film Si-Ge/c-Si tandem junction solar cell.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.100-103
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• 2001

In order to investigate the magnetic properties of CoCr-based bilayered thin films on kind of underlayer, we introduced amorphous Si layer to Co-Cr(-Ta) magnetic layer as underlayer. With the thickness of CoCr, CoCrTa single layer, crystalline orientation and perpendicular coercivity was improved. It was revealed that by introducing the Si underlayer, the c-axis orientation of CoCr, CoCrTa magnetic layer was improved largely. However, with increasing Si film thickness, perpendicular coercivity and saturation magnetization of Cocr/si, CoCrTa/Si bilayered thin films was decreased. Grain size of bilayered thin films became larger.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.463-465
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• 2002

In order to increase perpendicular magnetic anisotropy of magnetic layer and prepare magnetic recording layer with a good quality by epitaxial growth between magnetic layer and, we prepared Co$\_$77/Cr$\_$20/Ta$_3$/Si doublelayer for perpendicular magnetic recording media which was promoted as next generation recording media on slide glass substrate. The thickness of magnetic layer and Underlayer were varied from 20 to 100 nm and 5 to 100 m, respectively. The surface morphology and crystal structure of the CoCrTa/Si film were examined with XRD and AFM. Prepared thin films showed improvement of dispersion angle of c-axis orientation Δ$\theta$$\_$50/ caused by inserting amorphous Si underlayer.

• Journal of the Korean Ceramic Society
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• v.34 no.5
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• pp.512-518
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• 1997

The high temperature oxidation behaviors of titanium nitride films prepared by PACVD technique were studied in the temperature range of from 50$0^{\circ}C$ to 80$0^{\circ}C$ under air atmosphere. Ti0.88Al0.12N film, which showed the excellent microhardness from the previous work, was investigated on its oxidation resistance compared with pure TiN film. Ti-Al-N film showed superior oxidation resistance up to $700^{\circ}C$, whereas TiN film was fast oxidized into rutile TiO2 crystallites from at 50$0^{\circ}C$. It was found that an amorphous layer having AlxTiyOz formula was formed on the surface region due to outward diffusion of Al ions at the initial stage of oxidation. The amorphous oxide layer played a role as a barrier against oxygen diffusion, protected the remained nitride layer from further oxidation, and thus, resulted in the high oxidation resistive characteristics of Ti-Al-N film.

• Solar Energy
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• v.8 no.1
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• pp.68-73
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• 1988

In the glass/TCO/p-i-n a-Si/Al type of amorphous silicon solar cell, the effects on solar cell efficiency and metastability for the various kinds of TCO analyzed by SAM and ESCA, which was used to measure the diffusion profiles of In and Sn and the Fermi energy shifts in the TCO/p interface respectively. Indium which diffused into a-Si p-layer did not have any significant effects on the Fermi level shift of p-layer when the content of $B_2H_6/SiH_4$ in p-layer was at 1 gas%. The cell fabricated on $SnO_2$ turned out to have the best cell photovoltaic characteristics. ITO fabricated by electron beam deposition system, which was shown to have the greatest rate of diffusion of Indium in ITO/p interface produced the worst metastability among the cells tested.

• Journal of Magnetics
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• v.2 no.3
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• pp.96-100
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• 1997

A spin valve structure of NiO(40 nm)/Co(2 nm)/Cu(2.6 nm)/Co(x nm)/Ta(5 nm) has been investigated for the application of magnetic random access memory (MRAM). The spin valve structure exhibited very large difference in the coercivities between pinned and free layers, a relatively high GMR ratio, and a low free layer coercivity. The spin valves were prepared by sputtering and were characterized by dc 4-point probe, and VSM. The spin valves with combined free layer exhibited a maximun GMR ratio of 10.4% with a free layer coercivity of about 82 Oe. The spin valves with a single 10 nm thick a-CoNbZr free layer exhibited a GMR ratio of about 4.3% with a free layer coercivity of about 12 Oe. The GMR ratio of the spin valves increased by addition of Co between Cu and a-CoNbZr. It has been confirmed that the coercivity of free layer can be decreased by increasing the thickness of a-CoNbZr. It has been confirmed that the coercivity of free layer can be decreased by increasing the thickness of a-CoNbZr layer without losing the GMR ratio substantially, which was mainly due to high resistivity of the amorphous "layers".

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.8 no.2
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• pp.221-226
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• 1998

Amorphous (Ba, Sr)$TiO_3$[BST] layer(30, 70 nm) was introduced between crystalline BST and $RuO_2$electrode to realize double-layered BST structure in order to improve the properties of BST film. The structure and surface morphology of double-layered BST film were modified by the application of amorphous BST layer; that is, surface became smoother and grain size increased abruptly. Amorphous layer thicker than 30 nm was effective to hinder the influence of $RuO_2$surface on the structure of as-grown BST films by in-situ process. Dielectric constant of double-layered BST film was improved dramatically from 152 to 340 and leakage current was lowered from $1.25{\times}10^{-5}A/{\textrm}{cm}^2);to;6.85{\times}10^{-7}A/{\textrm}{cm}^2$, respectively.

• Korean Journal of Materials Research
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• v.12 no.2
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• pp.140-145
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• 2002

This study was conducted to investigate the brazing characteristics between Zircaloy-4 nuclear fuel cladding tubes and bearing pads with filler metals of amorphous $Zr_{1-x}Be_x$(0.3$\leq$x$\leq$0.5) binary alloy, in which they were produced in the ribbon form by the melt-spinning metod. The crystallization behavior, stability, hardness and micro-structure of brazed zone were examined by X-ray diffraction, differential scanning calorimetry, micro-Vickers hardness test, optical microscopy, and transmission electron microscopy. $Zr_{1-x}Be_x$(0.3$\leq$x$\leq$0.4) amorphous alloys were crystallized to $\alpha$-Zr with increasing the temperature, and the rest were transformed to ZrBe$_2$at higher temperatures. On the other hand, $Zr_{1-x}Be_x$(0.4$\leq$x$\leq$0.5) amorphous alloys were crystallized to $\alpha$-Zr and ZrBe$_2$, simultaneously. The thickness of the layer brazed with amorphous alloy was increased with increasing the beryllium content due to the higher diffusion of Be. The morphology of brazed layer with PVD Be filler metal showed dendrite while that brazed with amorphous alloys appeared globular. Micro-Vickers hardness of brazed zone increased as the beryllium content of filler metal was decreased.