• 제목/요약/키워드: aluminum, copper

검색결과 389건 처리시간 0.024초

Assessment of chemical purity of [13N]ammonia injection: Identification of aluminium ion concentration

  • Kim, Ho Young;Park, Jongbum;Lee, Ji Youn;Lee, Yun-Sang;Jeong, Jae Min
    • 대한방사성의약품학회지
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    • 제4권2호
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    • pp.80-84
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    • 2018
  • $[^{13}N]$Ammonia or $[^{13}N]NH_3$ is one of the most widely used PET tracer for the measurement of MBF. To produce $[^{13}N]NH_3$, devarda's alloy which contains aluminum, copper and zinc is used for the purpose of reduction from $^{13}N$-nitrate/nitrite to $[^{13}N]NH_3$. Since aluminum has neurotoxicity and renal toxicity, the amount of it should be carefully limited for the administration to the human body. Although USP and EP provide a way to identify the aluminum ion concentration, there are some difficulties to perform. Therefore, we tried to develop the modified method for verifying aluminum concentration of test solution. We compared color between test and standard solutions using chrome azurol S in pH 4.6 acetate buffer. We also tested color change of test and standard solutions according to pH, amounts and the order of reagent and time difference These results demonstrated that the color change of the solution can reflect quantitatively measure aluminum ion concentration. We hope the method is to be used effectively and practically in many sites where $[^{13}N]NH_3$ is produced.

Effects of DC Biases and Post-CMP Cleaning Solution Concentrations on the Cu Film Corrosion

  • Lee, Yong-K.;Lee, Kang-Soo
    • Corrosion Science and Technology
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    • 제9권6호
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    • pp.276-280
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    • 2010
  • Copper(Cu) as an interconnecting metal layer can replace aluminum (Al) in IC fabrication since Cu has low electrical resistivity, showing high immunity to electromigration compared to Al. However, it is very difficult for copper to be patterned by the dry etching processes. The chemical mechanical polishing (CMP) process has been introduced and widely used as the mainstream patterning technique for Cu in the fabrication of deep submicron integrated circuits in light of its capability to reduce surface roughness. But this process leaves a large amount of residues on the wafer surface, which must be removed by the post-CMP cleaning processes. Copper corrosion is one of the critical issues for the copper metallization process. Thus, in order to understand the copper corrosion problems in post-CMP cleaning solutions and study the effects of DC biases and post-CMP cleaning solution concentrations on the Cu film, a constant voltage was supplied at various concentrations, and then the output currents were measured and recorded with time. Most of the cases, the current was steadily decreased (i.e. resistance was increased by the oxidation). In the lowest concentration case only, the current was steadily increased with the scarce fluctuations. The higher the constant supplied DC voltage values, the higher the initial output current and the saturated current values. However the time to be taken for it to be saturated was almost the same for all the DC supplied voltage values. It was indicated that the oxide formation was not dependent on the supplied voltage values and 1 V was more than enough to form the oxide. With applied voltages lower than 3 V combined with any concentration, the perforation through the oxide film rarely took place due to the insufficient driving force (voltage) and the copper oxidation ceased. However, with the voltage higher than 3 V, the copper ions were started to diffuse out through the oxide film and thus made pores to be formed on the oxide surface, causing the current to increase and a part of the exposed copper film inside the pores gets back to be oxidized and the rest of it was remained without any further oxidation, causing the current back to decrease a little bit. With increasing the applied DC bias value, the shorter time to be taken for copper ions to be diffused out through the copper oxide film. From the discussions above, it could be concluded that the oxide film was formed and grown by the copper ion diffusion first and then the reaction with any oxidant in the post-CMP cleaning solution.

유기발광소자의 결정구조에 따른 Photocurrent 발광효율특성 연구 (Photocurrent multiplication process in OLEDs due to light irradiation and crystalline hole transporting layer)

  • 임은주;이기진;한우미;이정윤
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.1026-1029
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    • 2002
  • We report the electric properties of organic light emitting diodes (OLEDs) by controlling the carrier density according to the crystalline of copper(II) phthalocyanine(CuPc) and the irradiation light intensity. OLEDs were constructed with indium tin oxaide (ITO)/CuPc/triphenyl-diamin (TPD)/tris-(8-hydroxyquinoline)aluminum (Alq3)/Al. The transport properties of OLEDs were changedby the heat-treatments of CuPc. The irradiation of red and blue light exciting CuPc, TPD and Alq3. And then we observed the carrier density of OLEDs.

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이중복합봉 정수압 압출시 접합면 거동에 관한 연구 (A Bonding Surface Behavior of Bi-metal Bar through Hydrostatic Extrusion)

  • 박훈재;나경환;조남선;이용신
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 1997년도 춘계학술대회논문집
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    • pp.140-143
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    • 1997
  • The present study is concerned with the hydrostatic extrusion process of copper-clad aluminium bar to investigate the basic flow characteristics. Considering the bonding mechanism of bi-metal contact surface as cold pressure welding, the normal pressure and the contact surface expansion are selected as process parameters governing the bonding condition. The critical pressure required for the bonding at the interface is obtained by solving a "local extrusion" using a slip line meyhod. A viscoplastic finite element method is used to analyze the steady state extrusion process. The boundary profile of bi-metal rod is predicted by tracking a particle path adjacent to interface surface. The variations of contact surface area and the normal pressure along the interface profile are predicted and compared to those by experiments.

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Cu CMP 슬러리에서 화학첨가제 조건의 최적화 (Optimization of Condition of Chemical Additives in Cu CMP Slurry)

  • 김인표;김남훈;임종흔;김상용;김창일;장의구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.304-307
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    • 2003
  • Replacement of aluminum by copper for interconnections in the semiconductor industry has raised a number of important issues. The integration of copper interconnection can be carried out by CMP(chemical mechanical polishing) is used to planarize the surface topography. In this experiments, we evaluated the optimization of several conditions for chemical additives during Cu CMP process. It was presented that the main cause of grown particle size is tartaric acid. The particle size was in inverse propotion to a quantity of bead and the time of milling process. The slurry stabilizer and oxidizer have been shown to have very good effect by addition in later milling process.

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ENHANCEMENT OF PHOTOVOLTAIC PERFORMANCE IN COPPER PHTHALOCYNINE THICK FILM SOLAR CELLS

  • Ruiono, Yo Tomota;Momose, Yoshihiro;Takeuchi, Manabu
    • 한국표면공학회지
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    • 제29권6호
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    • pp.673-677
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    • 1996
  • Copper phthalocyanine(CuPc) thick film solar cells were fabgricated byspin coating and their photovoltaic behavior was studied. Polyvinylidene fluoride (PVdF) was used for the binder. Aluminum and indium were employed as electrode metals to form Schottky contact to CuPc layer. The cells showed rectifying J-V characteristics in the dark and photovoltaic effect associated with white light irradiation. The photovoltaic performance of the cells strongly depended on contact metals, in which the formation of oxide layer between binder layer and electrode interface affected the solar cell. Influnce of the CuPc layer thickness, CuPc/PVdF ratio on the photovoltaic performance of the cells were also examined.

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동물성 섬유에 대한 Lac추출물의 염색성(II) -매염방법과 매염제 종류의 효과- (Dyeabilites of Lac extract onto the silk and wool fabrics(II) -Effects of mordanting methods and various mordants-)

  • 김호정;박문영;이문철
    • 한국의류학회지
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    • 제27권9_10호
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    • pp.1134-1143
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    • 2003
  • The purpose of this study is to investigate surface color change and effects of mordants on the K/S values of silk and wool fabrics dyed with Lac extract, according to the mordanting methods and conditions such as temperature, concentration and time of the mordanting bath. The results were as follow; 1 K/S values of the silk and wool fabrics according to the temperature of the mordanting bath were shown a slight decline beyond 40$^{\circ}C$. 2. Surface color of the silk changed from red to reddish purple and that of the wool showed red tone when mordanted with Aluminum postassium sulfate, Copper acetate and Copper (II) sulfate regardless of the mordanting conditions. 3. The light and dry cleaning fastness of silk and wool fabrics dyed with Lac extract according to the mordanting methods were very good.

천연염료에 관한 연구(11) -코치닐 색소의 양모섬유 염색성- (Studies on the Natural Dyes(11) -Dyeing Properties of Cochineal Colors for Wool Fibers-)

  • 조경래
    • 한국염색가공학회지
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    • 제11권4호
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    • pp.39-49
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    • 1999
  • In order to study the properties of cochineal colors, uv-visible spectra of cochineal colors solution, dyeing properties on the wool in several dyeing conditions and thermodynamic parameters were investigated. UV-visible spectra of cochineal colors solution showed hypochromic effect with the lapse of irradiation time but bathochromic shift with decreasing acidity of solution and addition of metallic ions. The concentration of cochineal colors in wool fiber increased with the increase of dyeing temperature, time, and acidity of initial dyebath. The value of apparent diffusion coefficients and standard affinities of dyeing decreased with the increase of dyeing temperature. The standard heats of dyeing$(\Delta{H}^\circ)$ and variation of entropy$(\Delta{S}^\circ)$ increased with the increase of concentration of initial dyebath. The activation energy$(E_a)$ were calculated to be 1.399~2.595kcal/mol in condition of 6~1%(o.w.f) dyebath. Wool fabrics were dyed reddish blue by iron sulfate, copper sulfate, aluminum acetate and tannic acid, and red by tin chloride, respectively. Lightfastness of wool fabrics dyed by cochineal colors were increased by mordant treatment, especially copper sulfate and iron sulfate treatment.

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초정밀가공기를 이용한 비철금속의 절삭특성에 관한 연구 (A study on the cutting characteristics of non-ferrous metals using diam odd turning machine)

  • 고준빈;김건희;원종호
    • 한국공작기계학회논문집
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    • 제10권5호
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    • pp.124-129
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    • 2001
  • The experimental study was the cutting characteristics of non-ferrous metals. The experimental apparatus was used the turning machine and diamond tool. This aimed at lading the optimal cutting conditions by measuring surface farm and roughness. Used non-ferrous metals were aluminum, brass and oxygen-free copper. As well, according to changing cutting conditions such as feed rate by measuring cutting farce and surface roughness and according to cutting conditions the non-ferrous metals studied about cutting properties.

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항균처리를 한 공조기기의 항균성능 평가방법과 평가결과

  • 미우라쿠니오;다까츠까다케시;야나기우;야마자키쇼지
    • 공기청정기술
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    • 제22권2호
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    • pp.40-49
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    • 2009
  • Aluminum thin plate coated with epoxy resin containing about 20wt% brass powder, was applied to fins of heat exchanger. We carried out a series of detailed examinations to evaluate the anti-bacterial performance of the plate and heat exchanger (fan coil unit). In the presence of water or moisture, copper ions which have an anti-bacterial ability eluted from brass powder and showed sufficient effects on many kinds of bacteria. We also evaluated the anti-bacterial performance quantitatively by use of the index API (Anti-bacterial Performance Index) which has already been proposed by authors.

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