• Title/Summary/Keyword: Zr-Nb-O

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A Study on X-Ray Fluorescence Analysis of Ta$_2O_5,\;Nb_2O_5,\;SnO_2$ and ZrO$_2$ in Tin-slag Samples (희석 파라미터법에 의한 주석슬랙중 Ta$_2O_5,\;Nb_2O_5,\;SnO_2$ 및 ZrO$_2$의 X-선형광분석에 관한 연구)

  • Young Sang Kim
    • Journal of the Korean Chemical Society
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    • v.29 no.3
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    • pp.265-270
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    • 1985
  • Ta$_2$O$_5$, Nb$_2$O$_5$, SnO$_2$ and ZrO$_2$ in tin-slag samples were determined by X-ray fluorescence spectrometry using the dilution parameter method and the analytical results were compared with the data obtained by standard calibration curve method. Tin-slag samples and one standard sample having very similar composition to the tin-slags were diluted with a proper diluent (La$_2$O$_3$) to the ratio of 1: 1, 1 : 2, 1 : 3 and 1 : 4. After measuring the X-ray intensities of original and diluted samples, the values of dilution parameters were calculated by using the dilution parameter equation. Without any calibration curve, the analytical results were calculated from the equation including the dilution parameter term. The results were in good agreement with the reference data by the standard calibration curve method.

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Corrosion Characteristics of Nanotube Surface Formed on the Ti-29Nb-xZr Alloy by Anodization Treatment (Ti-29Nb-xZr합금의 양극산화처리에 의해 형성된 나노튜브표면의 부식특성)

  • Jeong, Yong-Hun;Choe, Han-Cheol;Go, Yeong-Mu
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.05a
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    • pp.164-164
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    • 2009
  • 저탄성 계수를 갖는 Ti-29Nb-x(3, 5, 7, 10, 15)Zr 합금을 제조하여 양극산화 방법을 통해 표면에 nanotube를 형성한 후 0.9% NaCl 용액에서 부식특성을 관찰하였다. 합금 표면에 형성된 안정된 $TiO_2$ nanotube가 내식성 향상에 영향을 주었음을 알 수 있었다.

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X-Ray Fluorescence Analysis of $Ta_2O_5,\;Nb_2O_5$ and ZrO_2$ in Tin-Slag Samples using Simple Dilution Method (주석 슬랙중 $Ta_2O_5,\;Nb_2O_5$ZrO_2$의 단일희석법을 이용한 X-선 형광분석)

  • Young-Sang Kim;Hak Je Sung
    • Journal of the Korean Chemical Society
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    • v.28 no.5
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    • pp.293-301
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    • 1984
  • -ray fluorescence analysis of $Ta_2O_5$, $Nb_2O_5$ and $ZrO_2$ in tin-slag samples using the simple dilution method was studied. The method is to correct mathematically the calibration curve to the linear line by the dilution. One synthesized standard having similar composition to the sample and tin slag samples were diluted with anhydrous $Li_2B_4O_7$ at the level of 1%, 2% and 3% of the sample content respectively. The diluted samples were fused at $1150^{\circ}C$ for 30 minutes and these glass beads were finely ground and pelletized. Measuring the X-ray intensities with these pellets, analytical results were calculated by the equation derived from J. Scherman's equation for the characteristic X-ray intensity of an element. Analytical results agreed with the reference values obtained by the standard calibration method within allowable error range and were reproducible.

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X-Ray Spectrometric Determination of $Ta_2O_5,\;Nb_2O_5$ and $ZrO_2$in Tin-Slag Samples by Double Dilution Technique (주석-슬랙중 $Ta_2O_5,\;Nb_2O_5$$ZrO_2$의 이중희석법을 이용한 X-선 분광분석)

  • Young-Sang Kim;Kee-Chae Park
    • Journal of the Korean Chemical Society
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    • v.28 no.5
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    • pp.302-308
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    • 1984
  • X-ray spectrometric determination of $Ta_2O_54, $Nb_2O_5$ and $ZrO_2$ in tin-slag samples using the double dilution technique was conducted. Tin-slag samples and one synthesized standard sample having similar composition to the samples were diluted with anhydrous $Li_2B_4O_7$ at the level of 1.00, 2.00 and 3.00% of the sample content, respectively. The diluted samples were fused at $1,150^{\circ}C$ for 30 minutes, and these glass beads were finely ground and pelletized. With the X-ray intensities measured, analytical results were calculated by the double dilution equation. The results agreed to the reference values obtained by the standard calibration method and the simple dilution technique within allowable error range and were reproducible.

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Dielectric and Piezoelectric Characteristics of 0.94$(K_{0.5}Na_{0.5})NbO_3$-0.06Ba$(Zr_{0.05}Ti_{0.95})O_3$ Ceramics System According to the variations of sintering aids (소결조재 변화에 따른 0.94$(K_{0.5}Na_{0.5})NbO_3$-0.06Ba$(Zr_{0.05}Ti_{0.95})O_3$ 세라믹스의 유전 및 압전특성)

  • Seo, Byeong-Ho;Kim, Do-Hyung;Lee, Yu-Hyong;Yoo, Ju-Hyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.205-205
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    • 2008
  • PZT 세라믹은 우수한 유전 및 압전특성을 갖고 있어 변압기, 센서 및 엑츄에이터 등에 널리 응용되고 있다. 그러나, 우수한 특성에도 불구하고 PZT세라믹스의 소결시 PbO의 높은 유독성 및 휘발로 인하여 환경오염을 야기 시킨다. 그러므로 PbO로 구성된 세라믹을 대체하기 위한 우수한 압전특성을 가진 비납계 세라믹스 개발이 연구의 주류를 이루고 있다. 그 중 비납계 NKN와 BZT는 대체물질로 많이 관심을 받고 있다. 이는 일반적인 NKN조성은 우수한 압전성과 높은 큐리온도를 가지고 있을 뿐만 아니라, BZT조성의 Zr성분이 큐리온도를 낮추거나 유전특성을 졸게 하여 유전율 곡선을 완화하게 하는 특징이 있다. 하지만 NKN은 $1140^{\circ}C$이상의 소결온도에서 K의 휘발특성으로 인해 소성 후에도 주변의 수분을 흡수하는 조해성이 발생하는 문제가 발생한다. 그래서 본 연구에서는 낮은 온도에서 NKN계 세라믹스의 밀도를 증가시킬 뿐만 아니라, 우수한 유전 및 압전특성을 갖는 세라믹스를 제조하고자 비납계 $0.94(K_{0.5}Na_{0.5})NbO_3-0.06Ba(Zr_{0.05}Ti_{0.95})O_3$ (NKN-BZT)의 조성을 사용하였고 소결조제로는 $MnO_2$, NiO, $Bi_2O_3$, ZnO, $Li_2CO_3$, CuO등을 변화주어 유전 및 압전 특성을 알아보았다.

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Physical properties of $PbZrO_3-PbTiO_3-Pb(Ni_{1/3}Nb_{2/3})O_3$ thin films by sol-gel method (Sol-gel법에 의한 $PbZrO_3-PbTiO_3-Pb(Ni_{1/3}Nb_{2/3})O_3$박막의 물리적 특성)

  • 임무열;구경완;김성일;유영각
    • Electrical & Electronic Materials
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    • v.9 no.10
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    • pp.991-1000
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    • 1996
  • PbTiO$_{3}$-PbZrO$_{3}$-Pb(Ni$_{1}$3/Nb$_{2}$3/O$_{3}$) (PZT-PNN) thin films were prepared from corresponding metal organics partially stabilized with diethanolamine by the sol-gel spin coating method. Each mol ratio of PT:PZ:PNN solutions were #1(50:40:10), #2(50:30:20), #3(45:35:20), #4(40:40:20), #5(40:50:10), #6(35:45:20) and #7(30:50:20) respectively. The spin-coated PZT-PNN films were heat-treated at 350.deg. C for decomposition of residual organics, and were sintered from 450.deg. C to 750.deg. C for crystallization. The substrates, such as Pt and Pt/TiN/Ti/TiN/Si were used for the spin coating of PZT PNN films. The perovskite phase was observed in the PZT-PNN films heat-treated at 500.deg. C. The crystalline of the PZT-PNN films was optimized at the sintering of 700.deg. C. By the result of AES analysis, It is confirmed that the films of TiN/Ti/TiN was a good diffusion barrier and that co-diffusion into the each films was not observed.

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