• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.11a
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• pp.297-298
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• 2015

우수한 열전 성능의 소자가 되기 위해서는 높은 전기 전도도 및 제백상수 그리고 낮은 열 전도도를 가져야한다. 본 연구에서는 DC 마그네트론 스퍼터링 법을 이용하여 비정질 구조를 갖는 ITZO 박막을 제작하였으며, 전기적 특성과 열전 특성을 조사하였다. 그 결과 ITO에 ZnO 첨가시 전기적 특성 및 열전 특성이 향상 되었다. 또한 비정질 구조를 가지므로 격자에 의한 열 전도도가 낮아 전체 열 전도도가 낮을 것이며 이는 높은 열전 성능 지수(ZT)를 가질 것이라 예상된다.

• Korean Journal of Crystallography
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• v.10 no.2
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• pp.136-144
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• 1999

고주파 마그네트론 스퍼터법을 이용한 Al:ZnO(AZO) 박막 증착시, 증착 조건에 따른 미세구조 변화를 조사하였으며, 이를 전기적 광학적 성질과 상관하여 고찰하였다. 박막은 기판 온도가 증가함에 따라 c축이 기판표면에 수직으로 놓이는 주상구조로 성장하였으며, 스퍼터 파워가 증가함에 따라 증착 속도와 입자의 크기가 증가한 반면 결정성은 저하되었다. 증착된 박막은 가시광선영역에서 85% 이상의 광 투과도를 나타내었으며 Al 첨가에 의해 광학적 밴드갭이 약 0.15 eV 증가하였다. 주상구조로 성장한 입자들은 저각 입계(low angle grain boundary)와 특수 입계(special grain boundary)를 형성하였으며, 특히 Σ=7 [001] (210)A/(110)B 입계의 규칙적인 원자배열 및 원자이완을 HRTEM을 이용하여 고찰하였다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.04a
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• pp.49-50
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• 2007

MOCVD 법으로 사파이어 기판위에 ZnO 박막을 성장시켰으며, 이때 VI/II 족 유량비를 변화 시켜 나타나는 박막의 특성 변화에 대해 연구하였다. 유량비가 증가할수록 박막의 결정성과 광특성이 향상되는 것을 관찰할 수 있었다. 또한 유량비가 증가할수록 전기전도도와 캐리어 농도가 증가하는 것을 관찰할 수 있었다.

• Journal of the Korean Vacuum Society
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• v.16 no.2
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• pp.105-109
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• 2007

In this paper, we fabricated TCO (transparent conductive oxide) electrode on flexible substrate in order to study effects of electrical and optical properties according to Al-doped ZnO(AZO) film thickness. The thickness of film was from 100 nm to 500 nm and was controlled by changing deposition time. We used High Resolution X-ray Diffractometer (HR-XRD) to analyze crystal structure and UV-visible spectrophotometer to measure property of optical transmittance, respectively. The surface images are obtained by using ESEM (Environment Scanning Electron Microscopy). In this experiment, all the AZO films deposited on flexible substrate show high transmittance over 90% and especially in the films with 400 nm and 500 nm thickness, the resistivity ($4.5{\times}10^{-3}\;{\Omega}-cm$) and optical bandgap energy (3.61 eV) are superior to the other films.

• Journal of the Korean Ceramic Society
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• v.49 no.1
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• pp.78-83
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• 2012

The electrophoretic deposition(EPD) of ZnO nano-sized colloids is investigated by changing the colloid number concentration, applied force, and deposition time. The change of the colloid size in a suspension was examined by the different colloid number concentrations (N = $3.98{\times}10^{15}$, N = $3.98{\times}10^{14}$, and N = $3.98{\times}10^{13}$) with an increase of the deposition time and applied forces. Deposition behavior was investigated by changing the applied fields (from DC 5 V to 50 V) and the deposition time (5 min to 25 min). The surface microstructures of the as-deposited films were investigated by SEM. The dried films were sintered from $850^{\circ}C$ to $1,050^{\circ}C$ for 2 h and then the microstructures were also explored by SEM. The agglomeration rate was enhanced by increasing the colloid number concentration of colloids. Colloid number concentration in a suspension must be rapidly decreased at higher values of the electric field. ZnO nano-sized colloids had the highest zeta potential value of over -28 mV in methanol. A homogeneous microstructure was obtained at colloid number concentration of N = $3.98{\times}10^{13}$, applied DC field of 5 V/cm and 15 min of deposition time at an electrode distance of 1.5 cm. Under these conditions, the deposited films were sintered at $850^{\circ}C$ and $1,050^{\circ}C$ for 2 h. The results show a typical pore-free surface morphology of a uniform thickness of 400 nm under these experimental conditions.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.8 no.4
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• pp.587-591
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• 1998

AZO transparent conducting thin film were fabricated by DC magnetron sputtering using the Zn: Al (2% aluminu contained ) alloy target with inducing microwave to the plasma, and the effect of microwave was studied. The optical transmittance, the resistivity and dynamic deposition rate at the applied voltage to target of 420 V was 50~70%, $ 5.5{\times}10^{-3}{\Omega}$cm and 6,000 $\AA\textrm{mm}^2$/J, respectively. After annealing AZO coated glass at $400^{\circ}C$ for 30 minutes, the light transmittance was increased to 80% and electrical conductivity was also increased two times, reached to resistivity of $2.0{\times}10^{-3}{\Omega}$cm.

• Journal of Sensor Science and Technology
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• v.9 no.1
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• pp.36-43
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• 2000

In oder to enhance the selectivity of TMA(trimethylamine) gas, the ZnO-based films which were doped with $Al_2O_3$, $TiO_2, $In_2O_3$ and $V_2O_5$ catalysts with various weight percents were deposited in oxygen by RF magnetron sputtering method. To improve electrical stability of sensors, the ZnO-based films were annealed in oxygen at $700^{\circ}C$ for 1 hour. The TMA selectivity of sensors was defined by the magnitude($S_{TMA}/S_{DMA}$ and $S_{TMA}/S_{NH3}$) of TMA sensitivity relative to DMA and sensitivity ammonia($NH_3$) sensitivity, respectively. The $ZnO+Al_2O_3(4\;wt.%)+TiO_2(1\;wt.%)+In_2O_3(1\;wt.%)$ sensor showed high $S_{TMA}/S_{DMA}$ of 5.9 and $S_{TMA}/S_{NH3}$ of 26 to 160 ppm at the working temperature of $300^{\circ}C$ respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.88-88
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• 2008

In this study, effect of thickness on structural, electrical and optical properties of B doped ZnO:Ga (GZOB) films was investigated. GZOB films were deposited on glass substrates by DC magnetron sputtering. The thickness range of films were from 100 nm to 600 nm to identified as increasing thickness, stress between substrate and GZOB film. The average transmittance of the films was over 80 % until 500 nm. Then a resistivity of $9.16\times10^{-4}\Omega$-cm was obtained. We presented that a GZOB film of 400 nm was optimization to obtain a high transmittance and conductivity.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.138-138
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• 2008

In this study, effect of thickness on structural, electrical and optical properties of B doped ZnO:Al (AZOB) films was investigated. AZOB films were deposited on PC substrates by DC magnetron sputtering. The thickness range of films were from 300 nm to 800 nm to identified as increasing thickness, stress between substrate and AZOB film. The. average transmittance of the films was over 80 % until 500 nm. Then a resistivity of $1.58\times10^{-3}\Omega$-cm was obtained. We presented that a AZOB film of 500 nm was optimization to obtain a high transmittance and conductivity.

• Journal of the Korean institute of surface engineering
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• v.39 no.1
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• pp.9-12
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• 2006

Al-doped ZnO(AZO)/Ag/AZO multi-layer films deposited on PET substrate by RF magnetron sputtering have a much better electrical properties than Al-doped ZnO single-layer films. The multi-layer structure consisted of three layers, AZO/Ag/AZO, the optimum thickness of Ag layers was determined to be $112{\AA}$ for high optical transmittance and good electrical conductivity. With about $1800{\AA}$ thick AZO films, the multi-layer showed a high optical transmittance in the visible range of the spectrum. The electrical and optical properties of AZO/Ag/AZO were changed mainly by thickness of Ag layers. A high quality transparent electrode, having a resistance as low as $6\;W/{\square}$ and a high optical transmittance of 87% at 550 nm, was obtained by controlling Ag deposition parameters.