• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2007.06a
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• pp.207-210
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• 2007

We prepared Al doped ZnO/Ag/Al doped ZnO on the polymer substrate by Facing Target Sputtering (FTS). FTS featured Facing Target Sputtering featured that deposition is stable at the low pressure, it has high plasma density and suppresses the substrate damage from energetic particles. We fixed to 50nm up and down thickness of AZO layer, respectively and that of intermediate Ag layer was adjusted with deposition time. In the result, AZO/Ag/AZO multilayer thin films have much better electrical conductivity than AZO single layer thin film. As increasing the thickness of Ag layer, the transmittance decreased.

• Korean Journal of Materials Research
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• v.15 no.5
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• pp.293-300
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• 2005

ZnO:Li epilayers were synthesized on sapphire substrates by the pulesd laser deposition (PLD) after the surface of the ZnO:Li sintered pellet was irradiated by the ArF (193 nm) excimer laser. The growth temperature was fixed at $400^{\circ}C$. The crystalline structure of epilayers was investigated by the photoluminescence (PL) and double crystal X-ray diffraction (DCXD). The carrier density and mobility of epilayers measured by van der Pauw-Hall method are $2.69\times10cm^{-3}$ and $52.137cm^2/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of epilayers obtained from the absorption spectra is well described by the Varshni's relation, $E_g(T)=3.5128eV{\cdot}(9.51\times10^{-4}eV/K)T^2/(T+280K)$. After the as-grown ZnO:Li epilayer was annealed in Zn atmospheres, oxygen and vaccum the origin of point defects of ZnO:Li has been investigated by PL at 10 K. The Peaks of native defects of $V_{zn},\;V_o,\;Zn_{int},\;and\;O_{int}$ showned on PL spectrum are classified as a donors or accepters type. We confirm that $ZnO:Li/Al_2O_3$ in vacuum do not form the native defects because ZnO:Li epilayers in vacuum existe in the form of stable bonds.

• Proceedings of the KIEE Conference
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• 2009.07a
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• pp.1425_1426
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• 2009

In this study, commercially available polyethylene terephthalate(PET), which is widely used as a substrate of flexible electronic devices, was modified by dielectric barrier discharge(DBD) method in an air condition at atmospheric pressure, and aluminium - doped zinc oxide (ZnO:Al) transparent conducting film was deposited on PET substrate by r. f. magnetron sputtering method. Surface analysis and characterization of the plasma-treated PET substrate was carried out using contact angle measurements, X-ray Photoelectron Spectroscopy(XPS) and Atomic Force Microscopy (AFM). Especially the effect of surface state of PET substrate on some important properties of ZnO:Al transparent conducting film such as electrical and morphological properties and deposition rate of the film, was studied experimentally. The results showed that the contact angle of water on PET film was reduced significantly from $62^{\circ}$ to $43^{\circ}$ by DBD surface treatment at 20 min. of treatment time. The plasma treatment also improved the deposition rate and electrical properties. The deposition rate was increased almost linearly with surface treatment time. The lowest electrical resistivity as low as $4.97{\times}10^{-3}[\Omega-cm]$ and the highest deposition rate of 234[${\AA}m$/min] were obtained in ZnO:Al film with surface treatment time of 5min. and 20min., respectively.

• 한국신재생에너지학회:학술대회논문집
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• 2008.05a
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• pp.436-437
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• 2008

Flexible CIGS thin film solar cell was fabricated using STS430 plate as a flexible substrate in this work. A diffusion barrier layer of $SiO_2$ thin film was deposited on STS430 substrate by PECVD followed by deposition of double layered Mo back contact. After depositing CIGS absorber layer by co-evaporation, CdS buffer layer by chemical bath deposition, ZnO window layer by RF sputtering and Al electrode by thermal evaporation, the solar cell fabrication processes were completed and its performance was evaluated. Corresponding solar cell showed an conversion efficiency of 8.35 % with $V_{OC}$ of 0.52 V, $J_{SC}$ of 26.06 mA/$cm^2$ and FF of 0.61.

• 한국신재생에너지학회:학술대회논문집
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• 2009.11a
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• pp.390-390
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• 2009

마그네트론 스퍼터링법을 이용하여 n-i-p 구조의 플렉서블 실리콘 박막태양전지용 ZnO/Ag 후면전극을 stainless steel 기판위에 제조하고 증착온도와 Ag 박막의 두께 변화에 따른 광학적 특성변화를 조사하였다. ZnO/Ag 구조의 후면전극은 RF와 DC 마그네트론 스퍼터링으로 Ag 금속 및 ZnO:Al($Al_2O_3$ 2.5%) 세라믹 타겟을 이용하여 각각 제조하였으며 증착온도는 상온 ${\sim}500^{\circ}C$로, Ag 박막두께는 100 ~ 500 nm로 변화시켰다. 증착조건 변화에 따라 제조된 후면전극의 표면거칠기 및 형상변화를 Atomic Force Mircroscope (AFM)와 Scanning electron miroscopy (SEM)으로 분석하였으며 이에 따른 반사도 변화를 UV-visible-nIR spectrometry 측정을 통하여 조사하였다. 증착온도가 증가함에 따라 Ag 박막의 표면 거칠기는 점차로 증가하였으며 증착된 후면전극의 반사도도 함께 증가함을 알 수 있었다. Ag 박막의 두께 변화에 따른 반사도 변화와 n-i-p 구조의 플렉서블 실리콘 박막태양전지에 미치는 영향을 조사하였다.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2005.09a
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• pp.93-96
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• 2005

In this study, AZO(ZnO:Al) thin film were Prepared by FTS(Facing Target Sputtering) system. The electrical, optical properties and crystalline of AZO thin film with thickness have been investigated. The thickness, transmittance, crystalline and electrical Properties of AZO thin film were measured by $\alpha$-step, UV-VIS spectrometer, hall effect measurement system, XRD and four-point probe, respectively. As a result, AZO thin film deposited with the transmittance over $80\%$ and the resistivity about $10^{-4}{\Omega}-cm$.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.99-99
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• 2014

Transparent oxide semiconductors (TOSs) are. currently attracting attention for application to transparent electrodes in optoelectronic devices and active channel layers in thin-film transistors. One of the key issues for the realization of next generation transparent electronic devices such as transparent complementary metal-oxide-semiconductor thin-film transistors (CMOS TFTs), transparent wall light, sensors, and transparent solar cell is to develop p-type TOSs. In this talks, I will introduce issues and status related to p-type TOSs such as LnCuOQ (Ln=lanthanide, Q=S, Se), $SrCu_2O_2$, $CuMO_2$ (M=Al, Ga, Cr, In), ZnO, $Cu_2O$ and SnO. The growth and properties of SnO and Cu-based oxides and their application to electronic devices will be discussed.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.04a
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• pp.39-40
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• 2006

We prepared ZnO:Al (AZO) thin films on polycarbonate (Pc) and polyethersulfon (PES). Because the polymer substrate has weak thermal resistance. The AZO thin films were deposited at room temperature by facing targets sputtering (FTS) method In the work, AZO thin films were deposited with different thickness in 1mTorr and $O_2$ gas flow rate 0.05. The electrical, optical and crystallographic properties were measured From the results, the resistivity of $7.3{\times}10^{-4}{\Omega}cm$ and transmittance of over 80% in visible range were obtained.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.24 no.4
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• pp.66-72
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• 2010

In this paper, AZO thin film was deposited on polyethylene terephthalate(PET) substrate by r. f. magnetron sputtering method from a ZnO target mixed with 2[wt%] Al2O3. The flexible film-typed dye sensitized solar cell(F-DSC) was fabricated and photo-electric conversion efficiency was investigated. The results showed that the minimum resistivity and the maximum deposition rate of AZO conducting film were recorded as $1.8{\times}10^{-3}[{\Omega}{\cdot}cm]$ and 25.5[nm/min], respectively at r.f. power of 220[W]. From the analysis of XPS data an improvement of electrical resistivity or an increase in carrier concentration with increasing sputtering power may be related to the generation of lattice imperfections as a result of increasing component ratio of O1s/Zn2p, which generates donor carriers or active growth of crystalline grain. The photo-electric conversion efficiency of F-DSC with AZO conducting electrode was over 2.79[%], which was comparable as that with commercially available ITO electrode.

• 한국신재생에너지학회:학술대회논문집
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• 2010.11a
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• pp.58.1-58.1
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• 2010

Stainless Steel의 유연한 기판을 사용하여 ZnO:Al/Ag의 후면전극에서 Ag 증착 실험조건 변화를 통해서 light trapping을 개선한 n-i-p 구조의 플렉서블 미세결정질 실리콘 박막 태양전지를 제작하였다. 실험 방법으로 마그네트론 스퍼터를 사용하여 Stainless Steel 기판 위에 ZnO:Al/Ag를 증착하여 후면전극으로 사용되는 back reflector를 제작하였으며 그 위에 미세결정질 실리콘 박막을 증착하였다. Back reflector에서 Ag 박막의 증착 온도가 증가할수록 표면결정 성장으로 roughness가 증가하여 반사도를 증가하였다. 또한, Ag 박막 증착 두께와 압력 변화에 따른 광학적 특성변화를 Atomic Force Microscope(AFM), Scanning Electron Microscopy(SEM),UV-visible-nIR spectrometry로 조사하여 최적의 조건을 찾았으며 개선된 back reflector의 특성이 n-i-p 구조의 플렉서블 미세결정질 실리콘 박막 태양전지에 적용하여 light trapping의 증가가 태양전지에서 광학적인 특성 변화 및 효율 향상에 영향을 주는지 Photo IV와 EQE(External Quantum Efficiency)를 통하여 조사하였다.