• 한국세라믹학회지
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• 제33권9호
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• pp.985-994
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• 1996

The initiation and growth of $\alpha$-Al2O3/metal composites by the directed oxidation of molten commercial AlZnMg-alloy at 1223-1423K were investigated. Spontaneous bulk growth did not occur on the alloy alone. but the uniform initiation and growth of the composite were obtained by putting a thin layer of SiO2 particles on the surface of the alloy. Without SiO2 the external surface of the oxide layer was convered by MgO and MgAl2O4. But with the SiO2 reaction initiate the porous ZnO layers were found on the growth surface. The higher process temperature yielded a lower metal content. The oxidation product of $\alpha$-Al2O3 was found to be oriented with c-axis parallel to th growth direction. The growth rates increased with temperature and the apparent activation energy was 111.8 kJ/mol.

• 한국재료학회지
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• 제14권5호
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• pp.328-333
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• 2004

Transparent ZnO:Al conductor films for the optoelectronic devices were deposited by using the capacitively coupled DC magnetron sputtering method. The effect of Al doping concentration and discharge power on the electrical and optical properties of the films was studied. The film resistivity of $8.5${\times}$10^{-4}$ $\Omega$-cm was obtained at the discharge power of 40 W with the ZnO target doped with 2 wt% $Al_2$$_O3$. The transmittance of the 840 nm thick film was 91.7% in the visible waves. Increasing doping concentration of 3 wt% $Al_2$$O_3$ in ZnO target results in significant decrease of film resistivity, which may be due to the formation of $Al_2$$O_3$ particles in the as-deposited ZnO:Al film and the reduced ZnO grain sizes. Increasing DC power from 40 to 60 W increases deposition rate by more than 50%, but can induce high defect density in the film, resulting in higher film resistivity.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.47-50
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• 2002

ZnO nanowires were coated conformally with aluminum oxide ($Al_{2}O_{3}$) material by atomic layer deposition (ALD). The ZnO nanowires were first synthesized on a Si (100) substrate at $1380^{\circ}C$ from ball-milled ZnO powders by a thermal evaporation procedure with an argon carrier gas without any catalysts; the length and diameter of these ZnO nanowires are $20\sim30{\mu}m$ and $50{\sim}200$ nm, respectively. $Al_{2}O_{3}$ films were then deposited on these ZnO nanowires by ALD at a substrate temperature of $300^{\circ}C$ using trimethylaluminum (TMA) and distilled water ($H_{2}O$). Transmission electron microscopy (TEM) images of the deposited ZnO nanowires revealed that 40nm-thick $Al_{2}O_{3}$ cylindrical shells surround the ZnO nanowires.

• 한국전기전자재료학회논문지
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• 제21권6호
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• pp.575-579
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• 2008

Al-doped p-type ZnO films were fabricated on n-Si (100) and homo-buffer layers in pure oxygen at $450^{\circ}C$ of by RF magnetron sputtering. Target was ZnO ceramic mixed with 2 wt% $Al_2O_3$. XRD spectra show that the Al-doped ZnO thin films have ZnO crystal structure and homo-buffer layers are beneficial to Al-doped ZnO films to grow along c-axis. Hall Effect experiments with Van der Pauw configuration show that p-type carrier concentrations are ranged from $1.66{\times}10^{16}$ to $4.04{\times}10^{18}\;cm^{-3}$, mobilities from 0.194 to $2.3\;cm^2V^{-1}s^{-1}$ and resistivities from 7.97 to $18.4\;{\Omega}cm$. p-type sample has density of $5.40\;cm^{-3}$ which is smaller than theoretically calculated value of $5.67\;cm^{-3}$. XPS spectra show that Ols has O-O and Zn-O structures and Al2p has only Al-O structure. P-ZnO:Al/n-ZnO:Al junctions were fabricated by magnetron sputtering. V-I curves show that the p-n junctions have rectifying characteristics.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.408-409
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• 2007

Al-doped p-type ZnO films were fabricated on n-Si (100) and homo-buffer layers in pure oxygen at $450^{\circ}C$ by RF magnetron sputtering. Target was ZnO ceramic mixed with 2wt% $Al_2O_3$. XRD spectra show that the Al-doped ZnO thin films have ZnO crystal structure and homo-buffer layers are beneficial to Al-doped ZnO films to grow along c-axis. Hall Effect experiments with Van der Pauw configuration show that p-type carrier concentrations are ranged from $1.66{\times}10^{16}\;to\;4.04{\times}10^{18}cm^{-3}$, mobilities from 0.194 to $2.3cm^2V^{-1}s^{-1}$ and resistivities from 7.97 to $18.4{\Omega}cm$. P-type sample has density of $5.40cm^{-3}$ which is smaller than theoretically calculated value of $5.67cm^{-3}$. XPS spectra show that O1s has O-O and Zn-O structures and A12p has only Al-O structure. P-ZnO:Al/n-ZnO:Al junctions were fabricated by magnetron sputtering. V-I curves show that the p-n junctions have rectifying characteristics.

• 센서학회지
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• 제7권3호
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• pp.218-224
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• 1998

ZnO 분말과 $Al_{2}O_{3}$ 분말을 1 : 1의 mole 비로 ball milling 시킨 후, 압착하여 펠렛을 제작하였다. 소성시 분위기를 진공으로 유지하기 위하여 각각 $3{\times}10^{-5}$ Torr의 진공도로 석영관에 봉입한 다음 $900^{\circ}C{\sim}1200^{\circ}C$로 소성하였다. 실험결과, $900^{\circ}C{\sim}1100^{\circ}C$까지는 ZnO, $Al_{2}O_{3}$ 및 $ZnAl_{2}O_{4}$의 혼합구조를 보이다가 $1200^{\circ}C$에서 (311), (220)면등의 주된 피크를 갖는 다결정으로 성장하여 $ZnAl_{2}O_{4}$ 삼원화합물의 구조가 확인되었고, 전자현미경촬영에 의해 화합물의 결정화된 입자들이 관찰되었다. 광흡수측정에 의해 에너지 밴드갭은 약 4.53 eV로 계산되었으며, PL 스펙트럼은 소결온도의 상승에 따라 단파장영역으로 이동하여, $1200^{\circ}C$에서 430nm부근에서 발광피크를 보였다.

• 한국세라믹학회지
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• 제29권3호
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• pp.223-231
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• 1992

CaO and ZnO were added to Al2O3-SiO2 binary system respectively as flux, then ZrO2 and TiO2 were applied as nucleating agent to these CaO-Al2O3-SiO2 and ZnO-Al2O3-SiO2 ternary system glass. The transparency could not be kept in CaO-Al2O3-SiO2 system glass, whereas the transparent glass-ceramics were prepared in ZnO-Al2O3-SiO2 system glass containing ZrO2 as the nucleating agent. At this time the optimum heating temperatures for the nucleation and the crystal growth were 78$0^{\circ}C$ and 97$0^{\circ}C$. The sizes of the precipitated crystals in the transparent glass-ceramics were below 0.1 ${\mu}{\textrm}{m}$, and their light transmissibilities were more than 80%.

• 열처리공학회지
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• 제6권2호
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• pp.89-97
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• 1993

An improvement in corrosion resistance of various types of Zn-coated steel sheets is thought to be possible with the addition of fine oxide powder to the coating. In this study the corrosion resistance of the $Al_2O_3$ dispersed Zn-Co-Cr electroplated steel sheet has been investigated and the results were as follows : The corrosion resistance of $Al_2O_3$ dispersed Zn-Co-Cr electroplated steel sheets was improved by increasing the contents of Co and Cr ions, and also $Al_2O_3$ powders in the bath because of the increased amount of Co, Cr and $Al_2O_3$ in deposits. In the $Al_2O_3$ dispersed Zn-Co-Cr electroplated steels sheet, the structure of deposits was changed from fine microstructure as observed in high Co containing deposits to coarse microstructure as in high Cr and $Al_2O_3$ containing deposits. By cold rolling of the $Al_2O_3$ dispersed Zn-Co-Cr electroplated steel sheets to about 2 percent, thr corrosion resistance was improved further.

• 에너지공학
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• 제11권2호
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• pp.136-141
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• 2002

석탄가스화 복합발전용 고온건식 탈황제의 반응성을 개선하기 위하여 $Al_2$O$_3$를 지지체로사용한 ZnO/Al$_2$O$_3$ 탈황제를 제조하고 반응특성을 조사하였다. ZnO/Al$_2$O$_3$의 성분함량 및 소성온도에 따른 물리화학적 구조변화를 XRD로 관찰하였고 ZnO의 소결 및 열화로 인한 활성저하를 $Al_2$O$_3$의 함량과 소성온도를 변화시켜 개선할 수 있음을 탈황 및 재생반응실험을 통하여 확인하였다. 마지막으로 첨가제를 함유한 ZnO/Al$_2$O$_3$ 탈황제의 내구성실험에 의한 고온건식 탈황제로의 사용가능성을 실험적으로 확인하였다.

• Transactions on Electrical and Electronic Materials
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• 제4권3호
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• pp.15-18
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• 2003

Aluminum oxide ($Al_2O_3$) materials were coated conformally on ZnO nanorods by atomic layer deposition (ALD). The ZnO nanorods were first synthesized on a Si(100) substrate from ball-milled ZnO powders by a thermal evaporation procedure. $Al_2O_3$ films were then deposited on these ZnO nanorods by ALD at a substrate temperature of $300^{\circ}C$ using trimethylaluminum (TMA) and distilled water ($H_2O$). Transmission electron microscopy (TEM) and high-resolution transmission electron microscopy (HRTEM) images of the deposited ZnO nanorods revealed that amorphous $Al_2O_3$ cylindrical shells surround the ZnO nanorods. These TEM images illustrate that ALD has an excellent capability to coat any shape of nanorods conformally.