• Korean Journal of Materials Research
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• v.25 no.1
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• pp.21-26
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• 2015

CMP(Chemical Mechanical Polishing) Processes have been used to improve the planarization of the wafers in the semiconductor manufacturing industry. Polishing performance of CMP Process is determined by the chemical reaction of the liquid sol containing abrasive, pressure of the head portion and rotational speed of the polishing pad. However, frictional heat generated during the CMP process causes agglomeration of the particles and the liquidity degradation, resulting in a non-uniform of surface roughness and surface scratch. To overcome this chronic problem, herein, we introduced NaCl salt as an additive into silica sol for elimination the generation of frictional heat. The added NaCl reduced the zata potential of silica sol and increased the contact surface of silica particles onto the sapphire wafer, resulting in increase of the removal rate up to 17 %. Additionally, it seems that the silica particles adsorbed on the polishing pad decreased the contact area between the sapphire water and polishing pad, which suppressed the generation of frictional heat.

• Journal of Korean Society of Environmental Engineers
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• v.27 no.3
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• pp.231-239
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• 2005

This study was performed to investigate adsorption characteristics of MTBE and Cd depending upon types of clay minerals md their physicochemical properties. The adsorption characteristics were examined by batch adsorption test on various experimental parameters such as adsorption time, ratio of solution to soil, concentration of contaminants, content of organic matter, pH, and zeta potential. The adsorption efficiency of MTBE or Cd for three types of clays decreased in response to the increase of the ratio of solution to soil whereas their adsorbed amounts increased. MTBE was greatly adsorbed in the decreasing order of vermiculite, bentonite, and CTAB-bentonite while Cd was adsorbed in the decreasing order of bentonite, vermiculite, and CTA-bentonite. An equilibrium isotherm for MTBE was well fitted to Freundlich plotting whereas that for Cd was closely corresponded to Langmuir isotherm. The adsorbed amount of MTBE on bentonite and vermiculite showed the maximum at 1% and 5% of humic acid, thereafter diminished while the adsorbed amount of MTBE on CTAB-bentonite increased in proportion to humic acid. Conversely, the adsorbed amount of Cd on the addition of humic acid continued to increase regardless of types of adsorbents. For all types of adsorbents, adsorbed quantity and adsorption efficiency of Cd have been coincidently increased at pH 8 and they were further enhanced at pH 10 showing 90% adsorption efficiency. Upon pH rose, the zeta potential on each adsorbent began to decrease, while increasing Cd concentration led to decline of zeta potential, which in turn ascribed to lowering dispersion stability that could consequently enhance adsorption capability.