• The Korean Journal of Ceramics
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• 제5권2호
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• pp.131-136
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• 1999

Yttria stabilized zirconia(YSZ) films were deposited on porous NiO substrates and quartz plates by the thermal CVD using $ZrCl_4, YCl_3$ as precursors, and $O_2$ as a reactive gas at atmospheric pressure. The evaporation temperature of $ZrCl_4$ was varied from $250^{\circ}C$ to $550^{\circ}C$ while the temperatures of $YCl_3$ and the substrate were varied from $1000^{\circ}C$ to $1030^{\circ}C$. As the evaporation temperature of $ZrCl_4$ increased, the deposition rate of $ZrO_2$ decreased, contrary to our expectation. As a result of the decreased deposition rate of $ZrO_2$, the yttria content increase. The high evaporation temperature of $ZrCl_4$ makes the well-faceted crystal while the low evaporation temperature leads to the cauliflower-shaped structure. The dependence of the evaporation temperature on the growth rate and the morphological evolution was interpreted by the charged cluster model.

• 한국세라믹학회지
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• 제33권11호
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• pp.1223-1230
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• 1996

• 한국표면공학회지
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• 제30권3호
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• pp.183-190
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• 1997

Fabrication and crystallization characteristics of yttria($T_2O_3$) stabilized zirconia(YSZ) thin film by sol-gel process were studied. YSZ sol was synthesized with zirconium n-propoxide($Zr(OC_3H_7)_4)$) and yttrium nitrate pentahydrate ($Y(NO_3)_3.5H_2O$). YSZ film was prepared by depositing the polymeric sol on porous $Al_2O_3$ substrate by spin-coating, and the film characteristics were investigated by FRIR, TG-DTA, XRD, DSC, optical microscopy and SEM. The film topology was uniform and cracks were not found. It was found that the annealing temperature and the concentration of stabilizer affect the crystallization of YSZ film. The YSZ film began to crystallize from amorphous to tetragonal phase at 40$0^{\circ}C$, and it was not converted to cubic structure until $1100^{\circ}C$. It seemed that the grains were formed over $700^{\circ}C$and the average grain size was obtained about 0.2$\mu\textrm{m}$.

• 한국세라믹학회지
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• 제41권2호
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• pp.111-117
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• 2004

고순도 3Y-TZP에 알루미나를 0.3∼l.2wt%까지 첨가하여 attrition milling을 하고 slip-casting하여 시료를 제조하였다. 1390∼151$0^{\circ}C$까지 열처리하여 소결체의 소결특성을 기제적 물성과 미세구조 분석을 통하여 확인하였다. XRD를 이용하여 monoclinic-ZrO$_2$의 생성량을 정량적으로 확인하였으며, 147$0^{\circ}C$ 이장에서 열처리한 시료의 경우 m-ZrO$_2$의 생성으로 밀도의 저하를 보였으며, 비정상 입자성장을 유발하여 경도가 저하되었다. 알루미나의 첨가량이 0.9wt% 미만, 열처리 온도143$0^{\circ}C$에서 microhardness가 1360Hv 이상의 소결체를 제조할 수 있었다.

• 한국분말재료학회지
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• 제20권6호
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• pp.445-452
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• 2013

Yttria-stabilized zirconia (YSZ) coatings are fabricated via suspension plasma spray (SPS) for thermal barrier applications. Three different suspension sets are prepared by using a planetary mill as well as ball mill in order to examine the effect of starting suspension on the phase evolution and the microstructure of SPS prepared coatings. In the case of planetary-milled commercial YSZ powder, a deposited thick coating turns out to have a dense, vertically-cracked microstructure. In addition, a dense YSZ coating with fully developed phase can be obtained via suspension plasma spray with suspension from planetary-milled mixture of $Y_2O_3$ and $ZrO_2$.

• 한국결정성장학회지
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• 제24권3호
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• pp.127-132
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• 2014

$Y_2O_3$-BN 세라믹 복합체를 제작하기 위해서, 분말 입도 $3{\sim}10{\mu}m$인 $Y_2O_3$ 분말을 분산한 슬러리에 pH 조절제인 NaOH를 첨가하였으며 결합제로는 PVA, 가소제로는 PEG를, BN 분말과 혼합하고, 분무건조(spray drying)공정을 거쳐 $Y_2O_3$ 혼합 분말을 제조하였다. ${\O}14mm$ 크기의 $Y_2O_3$-BN 시편을 성형하고, $1550^{\circ}C$ 및 $1600^{\circ}C$에서 소결하여 $Y_2O_3$-BN 복합체를 제작하였다. BN 투입량과 소결온도의 변수에 따른 미세구조, 순도, 꺽임강도, 열팽창계수, 밀도, 체적저항, 내플라즈마 특성을 조사하였다.

• 한국세라믹학회지
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• 제28권7호
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• pp.549-555
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• 1991

Mullite-zirconia (0∼4 mol% yttria) composites were obtained by In-situ sintering of zircon and alumina mixture, and their mechanical properties were studied in conjuction with microstructure observation. Martensitic transformation temperature (Ms) of zirconia dispersed in the mullite matrix decreased with Y2O3 contents and was about 600$^{\circ}C$ for ZrO2 containing 4 mol% Y2O3. On cooling of this composites, tetragonal to monoclinic phase transformation induced microcracks at the grain boundary of mullite matrix. The microcracks seemed to absorb the fracture energy in stress field during mechanical tests. Therefore, toughening mechanisms of this composite were considered to nucleation and extension of microcrack, and crack deflection mechanism due to the difference of thermal expansion coefficient between matrix and dispersed phase.

• 한국세라믹학회지
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• 제29권11호
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• pp.851-854
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• 1992

It was grown ZrO2:10 mol% Y2O3 single crystals doped with 1 wt% of rare earth metal ion (Ce, Pr, Nd, Er, Eu) by Skull Method. Grown crystals showed Ce:orange-red, Pr:golden-yellow, Nd:lilac, Er:pink, Eu:light pink due to dopant effect. It was examined color centers in light absorption pattern of visible region (λ= 300~700 nm); in as grown samples, absorption by Ce4+, (Pr4+, Pr3+), Nd3+, Er3+, Eu3+ ions were important, and in samples after vacuum annealing, decrease of absorption by Pr4+ ion and increase of absorption by Pr3+ ion was important, and absorption by Ce3+, Eu2+ was important due to reduction of activator.

• 대한화학회지
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• 제34권6호
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• pp.555-560
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• 1990

$YBa_2Cu_3O_{7-x}$ 초전도 필름을 초음파에 의한 aerosol spray 법을 이용하여 YSZ (yttria stabilized zirconia) 및 SrTi$O_3$의 (100) 결정면 위에 만들었다. 초전도상은 세 단계의 과정을 거쳐서 형성되었다 : (가) 이트륨, 바륨, 구리의 질산염을 화학 양론비로 섞어 만든 용액을 250$^{\circ}C$로 가열된 기질에 분무하여, (나) 형성된 필름을 공기 중에서 550$^{\circ}C$로 예열하고, (다) 흐르는 산소 분위기에서 950$^{\circ}C$로 소결한 뒤 노냉하였다. 필름의 저하을 dc four-point probe 법으로 측정하여 액체질소 온도 이상에서 초전도성을 확인하였다.

• 한국세라믹학회지
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• 제45권11호
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• pp.707-712
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• 2008

Plasma resistant nanocrystalline $Y_2O_3$ films were deposited on alumina substrates through the electron-beam PVD technique. Increasing substrate temperature to $600^{\circ}C$ resulted in the textured microstructures with significantly enhanced adhesion force of the coating to the substrate. During the exposure to fluorine plasma, erosion rate of the coated specimen was higher than that of a sintered yttria specimen, but significantly lower than that of a single crystalline alumina. Considering the adhesion and erosion behaviors observed in the coated specimen prepared at $600^{\circ}C$, the deposition technique appears effective in reducing contamination particles generated from the ceramic parts in the plasma environment.