• Journal of Intelligence and Information Systems
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• v.9 no.1
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• pp.157-177
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• 2003

This paper presents a comprehensive and successful application of data mining methodologies to improve and predict wafer yield in a semiconductor wafer fabrication system. As the wafer fabrication process is getting more complex and the volume of technological data gathered continues to be vast, it is difficult to analyze the cause of yield deterioration effectively by means of statistical or heuristic approaches. To begin with this paper applies a clustering method to automatically identify AUF (Area Uniform Failure) phenomenon from data instead of naked eye that bad chips occurs in a specific area of wafer. Next, sequential pattern analysis and classification methods are applied to and out machines and parameters that are cause of low yield, respectively. Furthermore, radial bases function method is used to predict yield of wafers that are in process. Finally, this paper demonstrates an information system, Y2R-PLUS (Yield Rapid Ramp-up, Prediction, analysis & Up Support), that is developed in order to analyze and predict wafer yield in a korea semiconductor manufacturer.