• Title/Summary/Keyword: X-capacitors

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Nickel Oxide Nano-Flake Films Synthesized by Chemical Bath Deposition for Electrochemical Capacitors (CBD(Chemical Bath Deposition) 법으로 제조된 전기화학식 캐패시터용 NiO 나노박편 필름)

  • Kim, Young-Ha;Park, Soo-Jin
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.163.2-163.2
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    • 2010
  • In this work, nano-flake shaped nickel oxide (NiO) films were synthesized by chemical bath deposition technique for electrochemical capacitors. The deposition was carried out for 1 and 2 h at room temperature using nickel foam as the substrate and the current collector. The structure and morphology of prepared NiO film were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). And, electrochemical properties were characterized by cyclic voltammetry, galvanostatic charge-discharge, and AC impedence measurement. It was found that the NiO film was constructed by many interconnected NiO nano-flakes which arranged vertically to the substrate, forming a net-like structure with large pores. The open macropores may facilitate the electrolyte penetration and ion migration, resulted in the utilization of nickel oxide due to the increased surface area for electrochemical reactions. Furthermore, it was found that the deposition onto nickel foam as substrate and curent collector led to decrease of the ion transfer resistance so that its specific capacitance of a NiO film had high value than NiO nano flake powder.

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Fabrication of Metal-insulator-metal Capacitors with SiNx Thin Films Deposited by Plasma-enhanced Chemical Vapor Deposition

  • Wang, Cong;Kim, Nam-Young
    • Transactions on Electrical and Electronic Materials
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    • v.10 no.5
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    • pp.147-151
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    • 2009
  • For integrated passive device (IPD) applications, we have successfully developed and characterized metalinsulator-metal (MIM) capacitors with 2000 $\AA$ plasma-enhanced chemical vapor deposition (PECVD) silicon nitride which are deposited with the $SiH_4/NH_3$ gas mixing rate, working pressure, and RF power of PECVD at $250^{\circ}C$. Five PECVD process parameters are designed to lower the refractive index and lower the deposition rate of $Si_3N_4$ films for the high breakdown electric field. For the PECVD process condition of gas mixing rate (0.957), working pressure (0.9 Torr), and RF power (60 W), the atomic force microscopy (AFM) root mean square (RMS) value of about 2000 $\AA$ $Si_3N_4$ on the bottom metal is lowest at 0.862 nm and the breakdown electric field is highest at about 8.0 MV/cm with a capacitance density of 326.5 pF/$mm^2$. A pretreatment of metal electrodes is proposed, which can reduce the peeling of nitride in the harsh test environment of heat, pressure, and humidity.

The Electric Conductivity $SrBi_2Ta_2O_9$ Capacitors using Rf Magnetron Sputtering Technique

  • Cho, C.N.;Shin, C.G.;Song, M.J.;Choi, W.S.;Park, G.H.;So, B.M.;Kim, C.H.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.04b
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    • pp.3-5
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    • 2008
  • The $SrBi_2Ta_2O_9$ thin films are deposited on Pt-coated electrode(Pt/$TiO_2/SiO_2$/Si) using RF magnetron sputtering method. The ferroelectric properties of SBT capacitors with annealing temperatures were studied. Through the x-ray diffraction analysis and the scanning electron microscopy (SEM), it could be observed that crystallization of the SBT thin film started around $650^{\circ}C$ and complete crystallization was accomplished around $750^{\circ}C$ and grains grew from a small spheric form to rod-like. For the leakage current density of the SBT capacitor depending upon various annealing atmospheres, capacitor annealed in the oxygen atmosphere showed the most excellent characteristic, and they were respectively about $2.13\times10^{-9}[A/cm^2]$ at 5V and 340.

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VLSI Implementation of Hopfield Network using Correlation (상관관계를 이용한 홉필드 네트웍의 VLSI 구현)

  • O, Jay-Hyouk;Park, Seong-Beom;Lee, Chong-Ho
    • Proceedings of the KIEE Conference
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    • 1993.07a
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    • pp.254-257
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    • 1993
  • This paper presents a new method to implement Hebbian learning method on artificial neural network. In hebbian learning algorithm, complexity in terms of multiplications is high. To save the chip area, we consider a new learning circuit. By calculating similarity, or correlation between $X_i$ and $O_i$, large portion of circuits commonly used in conventional neural networks is not necessary for this new hebbian learning circuit named COR. The output signals of COR is applied to weight storage capacitors for direct control the voltages of the capacitors. The weighted sum, ${\Sigma}W_{ij}O_j$, is realized by multipliers, whose output currents are summed up in one line which goes to learning circuit or output circuit. The drain current of the multiplier can produce positive or negative synaptic weights. The pass transistor selects eight learning mode or recall mode. The layout of an learnable six-neuron fully connected Hopfield neural network is designed, and is simulated using PSPICE. The network memorizes, and retrieves the patterns correctly under the existence of minor noises.

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Influence of Activation Temperature on Electrochemical Performances of Styrene-Acrylonitrile Based Porous Carbons (Styrene-Acrylonitrile 기반 다공성 탄소의 전기화학적 특성에 활성화 온도가 미치는 영향)

  • Lee, Ji-Han;Heo, Gun-Young;Park, Soo-Jin
    • Polymer(Korea)
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    • v.36 no.6
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    • pp.739-744
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    • 2012
  • In this work, we prepared the carbons from synthesized styrene-acrylonitrile carbon precursor. The prepared carbons were chemically activated, and then the activated SAN-based carbons were named as A-SANs. The activations were carried out at different temperatures to investigate the effect of activation temperature on the surface and electrochemical properties of the activated SAN-based carbons for using as an electrode of electric double layer capacitors (EDLC). The characteristics of A-SAN were determined by X-ray diffraction (XRD), scanning electron microscopy (SEM), surface area and pore size analysis. Also, the electrochemical behaviors were observed by cyclic voltammetry and galvanostatic charge-discharge method. From the results, the A-SAN 700 showed excellent electrochemical property and the highest specific capacitance, but these properties decreased when the activation temperature was above $700^{\circ}C$. This is due to the fact that the activation at a temperature over $700^{\circ}C$ causes deformation of micropore structures.

Electrochemical Properties of Graphene-vanadium Oxide Composite Prepared by Electro-deposition for Electrochemical Capacitors (양극전착을 통한 그래핀-바나듐 산화물 복합체 제조 및 전기화학적 특성평가)

  • Jeong, Heeyoung;Jeong, Sang Mun
    • Korean Chemical Engineering Research
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    • v.53 no.2
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    • pp.131-136
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    • 2015
  • The nanostructural graphene/vanadium oxide (graphene/$V_2O_5$) composite with enhanced capacitance was synthesized by the electro-deposition in 0.5 M $VOSO_4$ solution. The morphology of composites was characterized using scanning electron microscopy (SEM), x-ray diffraction pattern (XRD), and x-ray photoelectron spectroscopy (XPS). The oxidation states of the electro-deposited vanadium oxide was found to be $V^{5+}$ and $V^{4+}$. The morphology of the prepared graphene/$V_2O_5$ composite exhibits a netlike nano-structure with $V_2O_5$ nanorods in about 100 nm diameter, which could lead a better contact between electrolyte an electrode. The composite with a deposition time of 4,000 s exhibits the specific capacitance of $854mF/cm^2$ at a scan rate of 20 mV/s and the capacitance retention of 53% after 1000 CV cycles.

Effect of Annealing Atmosphere on the La2O3 Nanocrystallite Based Charge Trap Memory

  • Tang, Zhenjie;Zhao, Dongqiu;Hu, Huiping;Li, Rong;Yin, Jiang
    • Transactions on Electrical and Electronic Materials
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    • v.15 no.2
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    • pp.73-76
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    • 2014
  • $Pt/Al_2O_3/La_2Si_5O_x/SiO_2/Si$ charge trap memory capacitors were prepared, in which the $La_2Si_5O_x$ film was used as the charge trapping layer, and the effects of post annealing atmospheres ($NH_3$ and $N_2$) on their memory characteristics were investigated. $La_2O_3$ nanocrystallites, as the storage nodes, precipitated from the amorphous $La_2Si_5O_x$ film during rapid thermal annealing. The $NH_3$ annealed memory capacitor showed higher charge storage performances than either the capacitor without annealing or the capacitor annealed in $N_2$. The memory characteristics were enhanced because more nitrogen was incorporated at the $La_2Si_5O_x/SiO_2$ interface and interfacial reaction was suppressed after the $NH_3$ annealing treatment.

Dielectric Properties of the PFN-PFW-PMN Ceramics for the MLCC (MLCC용 PFN-PFW-PMN 세라믹의 유전 특성)

  • Park, In-Gil;Ryu, Ki-Won;Bae, Seon-Gi;Lee, Young-Hie
    • Proceedings of the KIEE Conference
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    • 1992.07b
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    • pp.747-749
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    • 1992
  • In this study, $0.45Pb(Fe_{1/2}Nb_{1/2})O_3-(0.55-x)Pb(Fe_{2/3}W_{1/3})O_3-xPb(Mg_{1/3}Nb_{2/3})O_3(x=0.20, 0.25, 0.30)$ (x=0.20, 0.25, 0.30) ceramics were fabricated by the mixed oxide method. The sintering temperature and time were 950-990[$^{\circ}C$], 2[hr], respectively. The dielectric and structural properties with the composition and sintering temperature were investigated for the application as multilayer ceramic capacitors. To improve the dielectric loss, specimens doped with $MnO_2$, (0$\sim$2.0 [mol%] ) were fabricated and their dielectric properties were studied. With increasing the amount of $MnO_2$, dielectric constant was decreased and transition temperature was increased. Dielectric constant and dielectric loss of the 0.45PFN-0.30PFW-0.25PMN+$MnO_2$(1.0[mol.%]specimen(970[$^{\circ}C$]) had a good properties of 11,227, 1.3[%].

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Improved Temperature Stability in Dielectric Properties of 0.8BaTiO3-(0.2-x)NaNbO3-xBi(Mg1/2Ti1/2)O3 Relaxors

  • Goh, Yumin;Kim, Baek-Hyun;Bae, Hyunjeong;Kwon, Do-Kyun
    • Journal of the Korean Ceramic Society
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    • v.53 no.2
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    • pp.178-183
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    • 2016
  • Ferroelectric relaxor ceramics with $BaTiO_3-NaNbO_3-Bi(Mg_{1/2}Ti_{1/2})O_3$ ternary compositions (BT-NN-BMT) have been prepared by sol-gel powder synthesis and consequent bulk ceramic processing. Through the modified chemical approach, fine and single-phase complex perovskite compositions were successfully obtained. Temperature and frequency dependent dielectric properties indicated typical relaxor characteristics of the BT-NN-BMT compositions. The ferroelectric-paraelectric phase transition became diffusive when NN and BMT were added to form BT based solid solutions. BMT additions to the BT-NN solid solutions affected the high temperature dielectric properties, which might be attributable to the compositional inhomogeneity of the complex perovskite and resulting weak dielectric coupling of the Bi-containing polar nanoregions (PNRs). The temperature stability of the dielectric properties was good enough to satisfy the X9R specification. The quasi-linear P-E response and the temperature- stable dielectric properties imply the high potential of this ceramic compound for use in high temperature capacitors.

Pyroelectric infrared microsensors made by micromachining technology (마이크로 가공 기술을 이용한 강유전체 박막 초전형 적외선 센서)

  • 최준임
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.4
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    • pp.93-100
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    • 1998
  • Pyoelectric infrared detectors based on La-modified PbTiO3 (PLT) thin films have been fabricated by RF magnetron sputtering and micromachining technology. The detectors form Pb$_{1-x}$ La$_{x}$Ti$_{1-x}$ O$_{3}$ (x=0.05) thin film ferroelectric capacitors epitaxially grown by RF magnetron sputtering on Pt/MgO (100) substrate. The sputtered PLT thin film exhibits highly c-axis oriented crystal struture that no poling trealization for sensing applications is required. This is an essential factor to increase the yield for realization of an infrared image sensor. Micromachining technology is used to lower the thermal mass of the detector by giving maximum sensor efficiency. Polyimide is coated on top of the sensing elements to support the fragile structure and the backside of the MgO substrate is selectively eteched to reduce the heat loss. The sensing element exhibited a very high detectivity D* of 8.5*10$^{8}$ cm..root.Hz/W at room temperature and it is about 100 times higher than the case of micromachining technology is not used. a sensing system that detects the position as well as the existence of a human body is realized using the array sensor.sor.

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