• Bulletin of the Korean Chemical Society
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• v.27 no.4
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• pp.489-494
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• 2006

Goethite, hematite, magnetite and synthesized iron oxide are used as catalysts for Fenton-type oxidation of phenol. The synthesized iron oxides were characterized by X-ray diffraction (XRD), BET, X-ray photoelectron spectroscopy (XPS), and electron paramagnetic resonance (EPR). The catalytic activity of these materials is classified according to the observed rate of phenol oxidation. The effectiveness of the catalysts followed the sequence: ferrous ion > synthesized iron oxide >> magnetite hematite > goethite. According to these results, the most effective iron oxide catalyst had the structure similar to natural hematite. The surface oxidation state of the catalyst was between magnetite and hematite (+2.5 ~ +3.0). Phenol degraded completely in 40 min at neutral pH (pH = 7). Soluble ferric and ferrous ions were not detected in the filtrate from Fenton reaction solution by AAS. The formation of hydroxyl radicals was confirmed by EPR.

• Bulletin of the Korean Chemical Society
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• v.27 no.12
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• pp.2037-2039
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• 2006

The adsorption and surface reactions of $SO_2$ on Ni(100), c($2{\times}2$)_O/Ni (100) and NiO(111)/Ni(100) surfaces have been investigated using X-ray photoelectron spectroscopy (XPS) and near-edge X-ray absorption fine structure (NEXAFS) technique. On Ni(100), chemisorbed $SO_2$ is formed at 160 K. When $SO_2$ is adsorbed on c($2{\times}2$)_O/Ni(100) at 160 K, $SO_2$ reacts with oxygen to form $SO_3$ and trace amount of $SO_4$ species. $SO_3$ is adsorbed on this surface with its $C_3$ axis perpendicular to the surface. On a NiO(111)/Ni(100) surface, both $SO_3$ and $SO_4$ species are formed at 160 K from adsorbed $SO_2$.

• Carbon letters
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• v.13 no.1
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• pp.48-50
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• 2012

Mass production of graphene-based materials, which have high specific surface area, is of importance for industrial applications. Herein, we report on a facile approach to produce thermally modified graphene oxide (TMG) in large quantities. We performed this experiment with a hot plate under environments that have relatively low temperature and no using inert gas. TMG materials showed a high specific surface area (430 $m^2g^{-1}$). Successful reduction was confirmed by elemental analysis, X-ray photoelectron spectroscopy, thermogravimetic analysis, and X-ray diffraction. The resulting materials might be useful for various applications such as in rechargeable batteries, as hydrogen storage materials, as nano-fillers in composites, in ultracapacitors, and in chemical/bio sensors.

• Journal of the Korean Ceramic Society
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• v.44 no.11
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• pp.650-654
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• 2007

[ $SnO_2$ ]-doped $TiO_2$ thin films were prepared from tin (IV) bis (acetylacetonate) dichloride and titanium diisopropoxide bis (acetylacetonate) with pluronic P123 or degussa P25 as a structural-directing agent. These hydrolyzed sol were spin coated onto Si(100) wafer substrate. The microstructure, morphology and bonding states of thin films were studied by field-emission scanning electron microscopy (FE-SEM), X-ray diffractometry (XRD), and X-ray photoelectron spectroscopy (XPS). The photocatalytic activity of these films was investigated by using indigo carmine solution.

• Bulletin of the Korean Chemical Society
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• v.33 no.4
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• pp.1242-1246
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• 2012

The Co oxide microfibers were synthesized using the electrospinning process and formed $Co_3O_4$ microfibers after being calcined at high temperatures. The calcination temperature influenced the diameters, morphology, crystalline phase, and chemical environment of the fibers. The surface morphology of the obtained fibers was examined by using the scanning electron microscope (SEM). As the calcination temperatures increased from room temperature to 873 and 1173 K, the diameters of the cobalt oxide fibers decreased from 1.79 to 0.82 and 0.32 mm, respectively. The structure of the fibers was investigated with X-ray diffraction (XRD) and transmission electron microscopy (TEM). The calcined $Co_3O_4$ fibers had crystalline face-centered cubic (fcc) structure. The X-ray photoelectron spectroscopy (XPS) results revealed that increasing the calcination temperature promoted the formation of $Co^{2+}$ and $Co^{3+}$ species.

• Journal of the Semiconductor & Display Technology
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• v.10 no.2
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• pp.83-89
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• 2011

In this study, we investigated the effects of shutter control by Reactive Magnetron Sputtering using Inductively-Coupled Plasma(ICP) for obtaining ZnO thin films with high purity. The surface morphologies and structure of deposited ZnO thin films were characterized using Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM) and X-ray Diffractometer (XRD). Also, optical and chemical properties of ZnO thin films were analyzed by Spectroscopic Ellipsometer (SE) and X-ray Photoelectron spectroscopy (XPS). As a result, it observed that ZnO thin films grown at reactive sputtering using shutter control and ICP were higher density, lower surface roughness, better crystallinity than other conventional sputtering deposition methods. For obtaining better quality deposition ZnO thin films, we will investigate the effects of substrate temperature and RF power on shutter control by a reactive magnetron sputtering using inductively-coupled plasma.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.180-180
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• 1999

The interaction of oxygen with a Ni(100) surface has been investigated using X-ray Photoelectron Spectroscopy (XPS) and Near-Edge X-ray Absorption Fine Structure (NEXAFS) technique. Below 200L oxygen exposure, molecular oxygen was dissociated to atomic oxygen. Increasing oxygen exposure, -1s binding energy shifted from 531.0 eV to 533.0 eV due to molecular adsorption. The presence of molecular oxygen species was confirmed by NEXAFS. Molecular oxygen adsorbed on Ni(100) was oriented perpendicular to the surface. Upon heating over 150K molecular adsorbed oxygen surface was also analyzed using NEEXFS.

• 한국방재학회:학술대회논문집
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• 2008.02a
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• pp.815-818
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• 2008

Titanium was oxidized with oxygen plasma and calcinated with rapid thermal annealing for degradation of humic acid dissolved in water. Titania photocatalytic plate was produced by titanium surface oxidized with oxygen plasma by Plasma Enhanced Chemical Vapor Deposition(PECVD). RF-power and deposition condition is controlled under 100 W, 150 W, 300 W and 500 W. Treatment time was controlled by 5 min and 10 min. The film properties were evaluated by the X-ray Photoelectron Spectroscopy (XPS) and X-Ray Diffraction (XRD). From the experimental results, we found the optimal condition of titania film which exhibited good performance. Moreover photocatalytic capacity was about twice better than thermal spray titania film, and also as good as titania powder.

• Journal of the Korean Vacuum Society
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• v.9 no.1
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• pp.16-23
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• 2000

The epitaxial growth of $CeO_2$ films has been investigated on three different substrates-Si(111), $SrTiO_3$(001), and MgO(001)-over wide range of growth parameters using oxygen-plasma-assisted molecular beam epitaxy. Pure-phase, single-crystalline epitaxial films of $CeO_2$ (001) have been grown only on $SrTiO_3$(001). We discuss the growth conditions in conjunction with the choice of substrates required to synthe-size this oxide, as well as the associated characterization by menas of x-ray diffraction, reflection high-energy electron diffraction, low-energy electron diffraction, and x-ray photoelectron spectroscopy and diffraction. Successful growth of single crystalline $CeO_2$ depends critically on the choice of substrate and is rather insensitive to the growth conditions studied in this investigation. $CeO_2$(001) films on $SrTiO_3$exhibit the sturcture of bulk $CeO_2$ without surface reconstructions. Ti outdiffusion is observed on the films grown temperatures above $650^{\circ}C$.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.385-385
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• 2010

Copper oxide thin films were deposited on the p-type Si(100) by r.f. magnetron sputtering as a function of different oxygen concentration. The deposited copper oxide thin films were investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), spectroscopic ellipsometry (SE), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The SEM and SE data show that the thickness of the copper oxide films was in the range of 100-400 nm. AFM images show that the surface morphology was depended on the oxygen ratio. The crystal structure of copper oxide films was changed from metallic copper to copper oxide with increasing oxygen concentration. The oxidation states of Cu 2p and O 1s resulted from XPS were consistent with XRD results.