• Title/Summary/Keyword: X-Ray Photoelectron Spectroscopy

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Influence of Nanostructured TiO2 Electrode Fabricated with Acid-treated Paste on the Photovoltaic Efficiency of Dye-Sensitized Solar Cells (산처리된 페이스트로 제조한 나노 구조체 TiO2 전극이 염료감응형 태양전지의 효율에 미치는 영향)

  • Lee, Jae-Wook;Hwang, Kyung-Jun;Roh, Sung-Hee;Kim, Sun-Il
    • Applied Chemistry for Engineering
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    • v.18 no.4
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    • pp.356-360
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    • 2007
  • Recently, dye sensitized solar cells (DSSCs) composed of nanoporous $TiO_2$, light-sensitive dyes, electrolytes, and counter electrode have been received much attention. Nanostructured particles with higher surface area for the higher adsorption of Ru (II) dye are required to increase the quantity of light absorption. Also, it has been reported that the key factor to achieve high energy conversion efficiency in the photoelectrode of DSSC is the heat treatment of $TiO_2$ paste with acid addition. In this work, we investigated the influence of acid treatment of $TiO_2$ solar cell on the photovoltaic performance of DSSC. The working electrodes fabricated in this work were characterized by X-ray photoelectron spectroscopy (XPS), extended X-ray absorption fine structure (EXAFS), field emission scanning electron microscope (FE-SEM), and atomic force microscope (AFM). In addition, the influence of nanostructured photoelectrode fabricated with the acid-treated paste on the energy conversion efficiency was investigated on the basis of photocurrent-potential curves. It was found that the influence of acid-treated paste on the photovoltaic efficiency was significant.

Low Temperature Selective Catalytic Reduction of NO with $NH_3$ over Mn/$CeO_2$ and Mn/$ZrO_2$ (Mn/$CeO_2$와 Mn/$ZrO_2$ 촉매 상에서 $NH_3$를 사용한 NO의 선택적 촉매 산화 반응)

  • Ko, Jeong Huy;Park, Sung Hoon;Jeon, Jong-Ki;Sohn, Jung Min;Lee, See-Hoon;Park, Young-Kwon
    • Applied Chemistry for Engineering
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    • v.23 no.1
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    • pp.105-111
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    • 2012
  • Manganese (Mn) catalysts were generated using $CeO_2$ and $ZrO_2$supports synthesized by the supercritical hydrothermal method and two different Mn precursors, aimed at an application for a low-temperature selective catalytic reduction process. Manganese acetate (MA) and manganese nitrate (MA) were used as Mn precursors. Effects of the kind and the concentration of the Mn precursor used for catalyst generation on the NOx removal efficiency were investigated. The characteristics of the generated catalysts were analyzed using $N_2$ adsorption-desorption, thermo-gravimetric analysis, X-ray diffraction, and X-ray photoelectron spectroscopy. De-NOx experiments were carried out to measure NOx removal efficiencies of the catalysts. NOx removal efficiencies of the catalysts generated using MA were superior to those of the catalysts generated using MN at every temperature tested. Analyses of the catalyst characteristics indicated that the higher NOx removal efficiencies of the MA-derived catalysts stemmed from the higher oxygen mobility and the stronger interaction with support material of $Mn_2O_3$ produced from MA than those of $MnO_2$ produced from MN.

Fluorination of Polymethylmethacrylate (PMMA) Film and Its Surface Characterization (폴리메틸메타아크릴레이트(PMMA) 필름의 불소화 및 그 표면특성)

  • Jung, Min-Jung;Lim, Jae-Won;Park, In-Jun;Lee, Young-Seak
    • Applied Chemistry for Engineering
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    • v.21 no.3
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    • pp.317-322
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    • 2010
  • In this study, poly(methyl methacrylate) (PMMA) was treated with changing mixing ratios of $F_2$ and $O_2$ using oxyfluorination method for hydrophilic modification of PMMA film. For the characterizations of oxyfluorinated PMMA surface, contact angle, surface free energy, X-ray photoelectron spectroscopy (XPS) and optical transmittance (UV-vis) were carried out. After the oxyfluorination, PMMA surface became more hydrophilic showing the decrease of water contact angle from $69^{\circ}$ to $44^{\circ}$. So, surface free energy of oxyfluorinated PMMA film was increased from 46 to $58\;mN\;m^{-1}$. These results are attributed to hydrophilic functional groups such as hydroxyl group formed oxyfluorination method on the PMMA surface. From XPS results, it was confirmed that O/C concentration ratio on the surface of PMMA was increased, the amount of C-OH bonding which shows hydrophilicity was also largely increased from 6.7 to 24.8% with increasing fluorine partial-pressure via the oxyfluorination, The oxyfluorination conditions, room temperature, 1 bar with one mixture ratio of $F_2$ to $O_2$ had little influence on optical transmittance properties of PMMA film but enhanced its surface hydrophilicity. This result suggests that oxyfluorination method could be useful to change hydrophobic PMMA surface to hydrophilic.

A Study On the Electrical Characteristic of WO3 and NiO-WO3 Thin Films Prepared by Thermal Evaporation (Thermal Evaporation법에 의해 제조된 WO3 박막과 NiO-WO3박막의 전기적 특성에 관한 연구)

  • Na Eun-young;Na Dong-myong;Park Jin-seong
    • Journal of the Korean Electrochemical Society
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    • v.8 no.1
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    • pp.32-36
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    • 2005
  • [ $WO_3$ ] and $NiO-WO_3$ thin films were deposited on a Si (100) substrate by using high vacuum thermal evaporation. The effects of various film thicknesses on the surface morphology $WO_3$ and $NiO-WO_3$ thin films were investigated. X-ray diffraction (XRD), Scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy(XPS) were employed to characterize the deposited films. The results suggest that as $WO_3$ thin films became thick, their grain grew up to a $0.6{\mu}m$. On the other hand, NiO-doping to $WO_3$ thin films inhibited the grain growth five times less than undoped $WO_3$ thin films. This results show that NiO doping inhibited the grain growing of $WO_3$ thin films. Also, the variation of NOx sensitivity $(R_{NOx}/R_{air})$ to the thickness of $WO_3$ and $NiO-WO_3$ thin films were measured according to the thickness change of thin films and the working temperature of sensor in 5ppm NOx gas. As a result, $NiO-WO_3$ thin films showed more excellent properties than $WO_3$ thin films for NOx sensitivity.

Characteristics of TiN Barrier Metal Prepared by High Density Plasma CVD Method (고밀도 플라즈마 CVD 방법에 의한 TiN barrier metal 형성과 특성)

  • Choe, Chi-Gyu;Gang, Min-Seong;O, Gyeong-Suk;Lee, Yu-Seong;O, Dae-Hyeon;Hwang, Chan-Yong;Son, Jong-Won;Lee, Jeong-Yong;Kim, Geon-Ho
    • Korean Journal of Materials Research
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    • v.9 no.11
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    • pp.1129-1136
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    • 1999
  • TIN films were prepared on Si(100) substrate by ICP-CVD(inductive1y coupled plasma enhanced chemical vapor deposition) using TEMAT(tetrakis ethylmethamido titanium : Ti$[\textrm{N}\textrm{(CH)}_{3}\textrm{C}_{2}\textrm{H}_{5}]_{4}$) precursor at various deposition conditions. Phase, microstructure, and the electrical properties of TIN films were characterized by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), high resolution transmission electron microscopy (HRTEM) and electrical measurements. Polycrystalline TiN films with B1 structure were grown at temperatures over $200^{\circ}C$. Preferentially oriented along TiN(111) films were obtained at temperatures over $300^{\circ}C$ with the flow rates of 10, 5, and 5 sccm for TEMAT, $\textrm{N}_{2}$ and Ar gas. The TiN/Si(100) interface was flat and no chemical reaction between TIN and $\textrm{SiO}_2$ was found. The resistivity, carrier concentration and the carrier mobility for the TiN sample prepared at $500^{\circ}C$ are 21 $\mu\Omega$cm, 9.5$\times\textrm{10}^{18}\textrm{cm}^{-3}$ and $462.6\textrm{cm}^{2}$/Vs, respectively.

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Synthesis of the orange color pigment in the system of TiO2-SnO-ZnO by solid state reaction (고상반응법에 의한 TiO2-SnO-ZnO의 주황 안료 합성에 관한 연구)

  • Kim, Soomin;Kim, Ungsoo;Cho, Woo Seok
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.26 no.5
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    • pp.181-187
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    • 2016
  • In this study, new composition of orange color pigment was developed by replacing formerly used lead and chromium with environment-friendly elements. $TiO_2-SnO-ZnO$ composite was synthesized using the solid state reaction under the reducing atmosphere with the LPG and air mixture gas. The synthesized pigments were characterized by spectrophotometer, X-ray Diffraction (XRD), Scanning Electron Microscopy (SEM) and X-ray Photoelectron Spectroscopy (XPS). The colorimetric analysis of pigments exhibited color values ranging from yellow to orange-red. Five different crystalline phases were formed after the heat treatment for 4 and 6 hours. The color of pigments was strongly influenced by the crystalline structure of $SnO_2$, having either cubic or tetragonal structure. The oxidation state study of elements revealed that the color of pigment is getting close to rYR with the increase of $Sn^{4+}$ ratio.

Effect of Alkali and Heat Treatments of Ti-6Al-4V Alloy on the Precipitation of Calcium Phosphate (Ti-6Al-4V 합금의 알칼리 및 열처리가 인산칼슘 침착에 미치는 영향)

  • Park, Jae-Han;Lim, Ki-Jung;Kim, Sang-Mok;Kim, Byung-Ock;Han, Kyung-Yoon
    • Journal of Periodontal and Implant Science
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    • v.30 no.1
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    • pp.187-203
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    • 2000
  • The precipitation of calcium phosphate on implant surface has been known to accelerate osseointegration and to enhance osseous adaptation. The present study was performed to examine whether the precipitation of calcium phosphate on Ti-6Al-4V alloy could be affected by the immersion in NaOH solution and heat treatment. Ti-6Al-4V alloy plates of $15{\times}3.5{\times}1mm$ in dimension were polished sequentially from #240 to #2,000 emery paper and one surface of each specimen was additionally polished with $0.1{\mu}m$ alumina paste. Polished specimens were soaked in various concentrations of NaOH solution(0.1, 1.0, 3.0, 5.0, 7.0, 10.0 M) at $60^{\circ}C$ for 24 hours for alkali treatment, and 5.0 M NaOH treated specimens were heated for 1 hour at each temperature of 400, 500, 600, 700, $800^{\circ}C$. After the alkali and heat treatments, specimens were soaked in the Hank's solution with pH 7.4 at $36.5^{\circ}C$ for 30days.The surface ingredient change of Ti-6Al-4V alloy was evaluated by thin-film X-ray diffractometer(TF-XRD) and the surface microstructure was observed by scanning electron microscope(SEM), and the elements of surface were analyzed by X-ray photoelectron spectroscopy(XPS). The results were obtained as follows ; 1. The precipitation of calcium phosphate on Ti-6Al-4V alloy was accelerated by the immersion in NaOH solution and heat treatment. 2. In Alkali treatment for the precipitation of calcium phosphate on Ti-6Al-4V alloy, the optimal concentration of NaOH solution was 5.0 M. 3. In heat treatment after alkali treatment in 5.0 M NaOH solution, the crystal formation on alloy surface was enhanced by increasing temperature. In heat treated alloys at $600^{\circ}C$, latticed structure and prominences of calcium phosphate layer were most dense. On heat treated alloy surface at the higher temperature(${\geq}700^{\circ}C$), main crystal form was titanium oxide rather than apatite. The above results suggested that the precipitation of calcium phosphate on the surface of Ti-6Al-4V alloy could be induced by alkali treatment in 5.0 M-NaOH solution and by heat treatment at $600^{\circ}C$.

Facile Synthesis of In2S3 Modified Ag3PO4 Nanocomposites with Improved Photoelectrochemical Properties and Stabilities

  • Zeng, Yi-Kai;Bo, Shenyu;Wang, Jun-hui;Cui, Bin;Gu, Hao;Zhu, Lei;Oh, Won-Chun
    • Korean Journal of Materials Research
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    • v.30 no.11
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    • pp.601-608
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    • 2020
  • In this work, Ag3PO4/In2S3 nanocomposites with low loading of In2S3 (5-15 wt %) are fabricated by two step chemical precipitation approach. The microstructure, composition and improved photoelectrochemical properties of the as-prepared composites are studied by X-ray diffraction pattern (XRD), field emission scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), photocurrent density, EIS and amperometric i-t curve analysis. It is found that most of In2S3 nanoparticles are deposited on the surfaces of Ag3PO4. The as-prepared Ag3PO4/In2S3 composite (10 wt%) is selected and investigated by SEM and TEM, which exhibits special morphology consisting of lager size substrate (Ag3PO4), particles and some nanosheets (In2S3). The introduction of In2S3 is effective at improving the charge separation and transfer efficiency of Ag3PO4/In2S3, resulting in an enhancement of photoelectric behavior. The origin of the enhanced photoelectrochemical activity of the In2S3-modified Ag3PO4 may be due to the improved charge separation, photocurrent stability and oriented electrons transport pathways in environment and energy applications.

Structural Characteristics of Ar-N2 Plasma Treatment on Cu Surface (Ar-N2 플라즈마가 Cu 표면에 미치는 구조적 특성 분석)

  • Park, Hae-Sung;Kim, Sarah Eunkyung
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.4
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    • pp.75-81
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    • 2018
  • The effect of $Ar-N_2$ plasma treatment on Cu surface as one of solutions to realize reliable Cu-Cu wafer bonding was investigated. Structural characteristic of $Ar-N_2$ plasma treated Cu surface were analyzed using X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscope. Ar gas was used for a plasma ignition and to activate Cu surface by ion bombardment, and $N_2$ gas was used to protect the Cu surface from contamination such as -O or -OH by forming a passivation layer. The Cu specimen under high Ar partial pressure plasma treatment showed more copper oxide due to the activation on Cu surface, while Cu surface after high $N_2$ gas partial pressure plasma treatment showed less copper oxide due to the formation of Cu-N or Cu-O-N passivation layer. It was confirmed that nitrogen plasma can prohibit Cu-O formation on Cu surface, but nitrogen partial pressure in the $Ar-N_2$ plasma should be optimized for the formation of nitrogen passivation layer on the entire surface of Cu wafer.

p-Type AlN epilayer growth for power semiconductor device by mixed-source HVPE method (혼합소스 HVPE 방법에 의한 전력 반도체 소자용 p형 AlN 에피층 성장)

  • Lee, Gang Seok;Kim, Kyoung Hwa;Kim, Sang Woo;Jeon, Injun;Ahn, Hyung Soo;Yang, Min;Yi, Sam Nyung;Cho, Chae Ryong;Kim, Suck-Whan
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.29 no.3
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    • pp.83-90
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    • 2019
  • In this paper, Mg-doped AlN epilayers for power semiconductor devices are grown by mixed-source hydride vapor phase epitaxy. Magnesium is used as p-type dopant material in the grown AlN epilayer. The AlN epilayers on the GaN-templated sapphire substrate and GaN-templated-patterned sapphire substrate (PSS), respectively, as the base substrates for device application, were selectively grown. The surface and the crystal structures of the AlN epilayers were investigated by field emission scanning electron microscopy (FE-SEM) and high-resolution-X-ray diffraction (HR-XRD). From the X-ray photoelectron spectroscopy (XPS) and Raman spectra results, the p-type AlN epilayers grown by using the mixed-source HVPE method could be applied to power devices.