• Title/Summary/Keyword: X-선 라만 산란

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Characteristics of Raman scattering spectroscopy for $ZnS_{1-x}Te_x$ alloy semi- conductor ($ZnS_{1-x}Te_x$ 삼원 화합물 반도체의 라만 산란 특성)

    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.12 no.5
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    • pp.223-228
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    • 2002
  • We have studied the characteristics of Raman scattering spectroscopy from $_ZnS{1-x}Te_x$ alloys in the whole range of Te composition x. The Raman spectra showed two-mode behaviors for those alloys. The Raman line shape showed the changes of an asymmetry and broadening of that with Te composition x. The asymmetric broadening of the line shape could be explained with a spatial correlation model.

A Study on the Characteristics of High Energy Nitrogen ion Implanted CdS Thin Films (고에너지 질소 이온 주입된 CdS 박막 특성에 관한 연구)

  • 이재형;홍석주;양계준
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.7 no.4
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    • pp.712-718
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    • 2003
  • The effects of nitrogen ion implantation on vacuum evaporated cadmium sulphide (CdS) thin films were investigated by X-ray diffraction, optical transmittance spectra, and Raman scattering studies. The as-deposited CdS films have a hexagonal structure with preferential (0 0 2) orientation. Formation of Cd metallic clusters was observed in ion implanted films from the XRD patterns. The band gap of N+ implanted films decreased, whereas the optical absorption coefficient values increased with the increase of implantation dose. The Raman peak position appeared at 299 cm-1 and the FWHM increased with the ion dose. A decrease in the area of Raman peak of CdS Al(LO) mode is seen on implantation.

Electronic Structure and Si L2,3-edge X-ray Raman Scattering Spectra for SiO2 Polymorphs: Insights from Quantum Chemical Calculations (양자화학계산을 이용한 SiO2 동질이상의 전자 구조와 Si L2,3-edge X-선 라만 산란 스펙트럼 분석)

  • Kim, Yong-Hyun;Yi, Yoo Soo;Lee, Sung Keun
    • Korean Journal of Mineralogy and Petrology
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    • v.33 no.1
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    • pp.1-10
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    • 2020
  • The atomic structures of silicate liquids at high pressure provide insights into the transport properties including thermal conductivities or elemental partitioning behavior between rocks and magmas in Earth's interior. Whereas the local electronic structure around silicon may vary with the arrangement of the nearby oxygens, the detailed nature of such relationship remains to be established. Here, we explored the atomic origin of the pressure-induced changes in the electronic structure around silicon by calculating the partial electronic density of states and L3-edge X-ray absorption spectra of SiO2 polymorphs. The result showed that the Si PDOS at the conduction band varies with the crystal structure and local atomic environments. Particularly, d-orbital showed the distinct features at 108 and 130 eV upon the changes in the coordination number of Si. Calculated Si XAS spectra showed features due to the s,d-orbitals at the conduction band and varied similarly with those observed in s,d-orbitals upon changes in the crystal structures. The calculated Si XAS spectrum for α-quartz was analogous to the experimental Si XRS spectrum for SiO2 glass, implying the overall similarities in the local atomic environments around the Si. The edge energies at the center of gravity of XAS spectra were closely related to the Si-O distance, thus showing the systematic changes upon densification. Current results suggest that the Si L2,3-edge XRS, sensitive probe of the Si-O distance, would be useful in unveiling the densification mechanism of silicate glasses and melts at high pressure.