• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.04b
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• pp.18-21
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• 2000

진공 분위기에서 소성하여 ZnS 형광체를 제작하였다. ZnS 형광체는 소성온도가 $950^{\circ}C$ 이하인 경우 sphalerite 구조로 성장되었고, $1050^{\circ}C$ 이상인 경우 sphalerite 구조와 wurtize 구조의 공존이 확인되었다. Sphalerite 구조일 때 나타나는 460 nm를 중심으로 하는 발광 peak과 wurtize 구조일 때 나타나는 440 nm를 중심으로 하는 발광 peak은 ZnS 형광체 내에 형성된 $V_{Zn}$에 기인한다. Sphalerite 구조로 성장되었을 때 발광 스펙트럼에서 관측되는 528 nm를 중심으로 하는 발광 peak과 sphalerite와 wurtize 구조가 공존할 때 발광 스펙트럼에서 관측되는 515 nm를 중심으로 하는 발광 peak은 ZnS 형광체 내에 형성된 S의 결핍($V_s$) 준위로부터 가전자 띠로 복사 전이에 기인하는 것으로 설명된다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.10
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• pp.876-882
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• 2000

ZnS phosphors were sintered at vacuum atmosphere, Sintered under the temperature of 950$\^{C}$, ZnS phosphors were grown into the sphalerite structure and two emission peaks were observed at the positions of 460nm and 528nm of the emission spectra. Sintered over the temperature of 1050$\^{C}$, there were simultaneously the sphalerite and wurtize structure in the ZnS phosphors and three emission peaks were observed at the positions of 440nm and 515nm of emission spectra. The emission peaks of 460nm obsrved under the sphalerite structure and 440nm observed under the wurtize structure were due to the vacancy of Zn formed in the ZnS phosphors. The emission peaks of 528nm observed under the sphalerite structure and 515nm observed under the wurtize structure wre caused by the radiative transitions from the level of the vacancy of S formed in the ZnS phosphors to the valance band.

• Journal of Powder Materials
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• v.12 no.4 s.51
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• pp.279-283
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• 2005

In this study, the ZnS composite powders for host material in phosphor was synthesized in situ by mechanical alloying. As the mechanical alloying time increases, particle size of ZnS decreases. ZnS powders of $1.85\;\mu{m}$ in a mean size was fabricated by mechanical alloying for 10h. The crystal structures of ZnS powders were investigated by X-ray diffraction and the photo-luminescence properties was evaluated with the optical spectra analyzer. The steady state condition of mechanically alloyed ZnS was obtained as a mean particle size of $2\;\mu{m}$ in 5h milling. The sphalerite and wurtize structures coexist in the ZnS mechanically alloyed for 5h. The ZnS powder mechanically alloyed for 10h grows to the sphalerite structure. And the strong emission peaks of ZnS are observed at 480 nm wave length at the powders of mechanically alloyed for 10h, but the sphalerite and wurtize structures in ZnS coexist and emission peaks are not appeared at the powders of mechanically alloyed for 10h.

• Journal of the Korean Vacuum Society
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• v.20 no.1
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• pp.50-56
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• 2011

In this study, the effects of ZnO buffer layer thickness and annealing temperature on the heterojunction diode, ZnO/b-ZnO/p-Si(111), were reported. The effects of those on the structural and electrical properties of zinc oxide (ZnO) films on ZnO buffered p-Si (111) substrate were also studied. Structural properties of ZnO thin films were studied by X-ray diffraction and I-V characteristics were measured by a semiconductor parameter analyzer. ZnO thin films with 70 nm thick buffer layer and annealing temperature of $700^{\circ}C$ showed the best c-axis preferred orientation. The best electrical property was found at the condition of buffer layer annealing temperature of $700^{\circ}C$ and 50nm thick ZnO buffer layer (resistivity: $2.58{\times}10^{-4}[{\Omega}-cm]$, carrier concentration: $1.16{\times}1020[cm^{-3}]$). The I-V characteristics for ZnO/b-ZnO/p-Si(111) heterojunction diode were improved with increasing buffer layer thickness at buffer layer annealing temperature of $700^{\circ}C$.