• 제목/요약/키워드: Working Gas

검색결과 705건 처리시간 0.027초

자기치유성 마이크로캡슐 합성 공정에서의 포름알데히드 잔류량 연구 (A Study on Remaining Formaldehyde Concentration in the Synthesis of Self-Healing Microcapsules)

  • 김동민;이준서;유병철;정찬문
    • 한국건설순환자원학회논문집
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    • 제8권1호
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    • pp.129-133
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    • 2020
  • 우레아-포름알데히드(UF) 캡슐막의 마이크로캡슐 합성 공정에 있어서 반응 폐액에 포함된 포름알데히드의 잔류량을 GC-MS로 분석하였다. 포름알데히드의 반응에 영향을 주는 주된 인자로서 pH, 암모늄클로라이드 투입량, 온도의 3가지를 선정하고, 이 인자들이 반응 폐액 중의 포름알데히드 농도에 미치는 영향을 조사하였다. 실험 조건 중 암모늄클로라이드를 0.025g 투입한 경우에는 캡슐막 형성이 안 되거나 캡슐막이 약한 경향이 있어서 기본적으로 이 조건은 마이크로캡슐화에 부적절한 것으로 판단된다. 본 연구의 실험 조건에서 포름알데히드 잔류량이 최소화되는 마이크로캡슐화 조건은 70℃의 온도와 2.5의 pH에서 암모늄클로라이드를 0.050g 투입하는 조건임이 확인되었다. 본 연구의 결과는 보다 안전한 작업환경에서 마이크로캡슐화를 수행하는데 기여할 수 있을 것으로 기대된다.

Analysis of BNNT(Boron Nitride Nano Tube) synthesis by using Ar/N2/H2 60KW RF ICP plasma in the difference of working pressure and H2 flow rate

  • Cho, I Hyun;Yoo, Hee Il;Kim, Ho Seok;Moon, Se Youn;Cho, Hyun Jin;Kim, Myung Jong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.179-179
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    • 2016
  • A radio-frequency (RF) Inductively Coupled Plasma (ICP) torch system was used for boron-nitride nano-tube (BNNT) synthesis. Because of electrodeless plasma generation, no electrode pollution and effective heating transfer during nano-material synthesis can be realized. For stable plasma generation, argon and nitrogen gases were injected with 60 kW grid power in the difference pressure from 200 Torr to 630 Torr. Varying hydrogen gas flow rate from 0 to 20 slpm, the electrical and optical plasma properties were investigated. Through the spectroscopic analysis of atomic argon line, hydrogen line and nitrogen molecular band, we investigated the plasma electron excitation temperature, gas temperature and electron density. Based on the plasma characterization, we performed the synthesis of BNNT by inserting 0.5~1 um hexagonal-boron nitride (h-BN) powder into the plasma. We analysis the structure characterization of BNNT by SEM (Scanning Electron Microscopy) and TEM (Transmission Electron Microscopy), also grasp the ingredient of BNNT by EELS (Electron Energy Loss Spectroscopy) and Raman spectroscopy. We treated bundles of BNNT with the atmospheric pressure plasma, so that we grow the surface morphology in the water attachment of BNNT. We reduce the advancing contact angle to purity bundles of BNNT.

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병원 내 근로자 중 유기용제를 취급하는 부서에서 벤젠, 크실렌, 톨루엔의 노출 여부에 관한 연구 (On Exposure of Workers in Sections Handling Organic Solvents within Hospitals to Benzene, Xylene, and Toluene)

  • 오동선;박미숙
    • 대한임상검사과학회지
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    • 제40권2호
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    • pp.147-152
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    • 2008
  • Due to the development and expansion of industries and medical standards, the number of workers who handle organic solvents within hospitals is increasing. The authors in this study intended to investigate the actual conditions of the handling of the solvents and to encourage the recognition that the exposure to such solvents may be possible because of insensitivity to safety. In order to investigate the actual conditions of exposure of workers within hospitals, the experimental group included the three sections (Pathology department, Central Supply Room, and Operating Room), which handle organic solvents most frequently. Meanwhile, university interns were selected to be the control group. This study was conducted between May 1 to May 30, 2007, and urine was taken as samples. Hippuric acid, mandelic acid, methylhippuric acid, and phenylglyoxylic acid were analyzed through gas chromatography, and a total of 52 subjects of the experimental and the control groups were performed of the analysis. As for the results of the analysis of the experimental group, the exposure to benzene was $42.27{\pm}3.70mg/g$ creatinine, that of xylene was $1.30{\pm}0.18g/g$ creatinine, and that of toluene was $2.36{\pm}0.24g/g$ creatinine. Meanwhile, the results of the analysis of the control group showed that the exposure to benzene was $15.54{\pm}2.85mg/g$ creatinine, that of xylene was $0.52{\pm}0.02g/g$ creatinine, and that of toluene was $0.85{\pm}0.20g/g$ creatinine. The amount of exposure to benzene, xylene, and toluene was shown to be under the maximum permitted level, but as for Pathology department, it was required to educate on working conditions, to educate workers on prevention management about their health, and to install fume hood and exhaust system to improve the environments.

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마그네트론 스퍼터링법에 의해 합성되어진 비정질 탄소박막들의 구조적, 물리적 특성 (Physical and Structural Properties of Amorphous Carbon Films Synthesized by Magnetron Sputtering Method)

  • 박용섭;조형준;홍병유
    • 한국진공학회지
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    • 제16권2호
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    • pp.122-127
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    • 2007
  • 본 연구에서는 비정질 탄소박막들(a-C, a-C:H, a-C:N)을 흑연타겟이 부착되어진 비대칭 마그네트론 스퍼터링법을 이용하여 증착하였으며, 음의 DC 바이어스 전압의 효과를 알아보기 위해 증착가스 압력내에서 200 V를 인가하여 탄소박막들을 제작하였다. 수소화된 비정질 탄소박막과 질화탄소박막은 각각 스퍼터링 가스로써 아세틸렌과 질소를 주입하여 제작하였다. 결과적으로 26.5 GPa의 높은경도와 0.1 nm의 낮은 거칠기 그리고 접착력은 30.5 N를 가지는 수소화된 비정질 탄소박막을 합성하였으며, 32 N의 좋은 접착 특성을 나타내는 질화 탄소 박막을 합성하였다. 본 논문에서는 아세틸렌과 질소 가스의 효과와 음의 DC 바이어스 전압에 따른 비정질 탄소박막들의 구조적 특성과 물리적 특성과의 관계를 규명하였다.

Feasibility Studies on Anaerobic Sequencing Batch Retractor for Sludge Treatment

  • Duk Chang;Joo
    • 한국환경과학회지
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    • 제1권2호
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    • pp.125-136
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    • 1992
  • Digestion of a municipal wastewater sludge by the anaerobic sequencing batch reactor (ASBR) was investigated to evaluate the performance of the ASBR process at a critical condition of high-solids-content fined. The reactors were operated at an HRT of 10 days with an equivalent loading rate of 0.8-1.5 gVS/L/d at 35$^{\circ}C$ The main conclusions drawn from this study were as follows: 1. Digestion of a municipal wastewater sludge was possible using the ASBR in spite of high concentration of settleable solids in the sludge. The ASBRS with 3- and 4-day cycle period showed almost identical high digestion performances. 2. No adverse effect on digestion stability was observed In the ASBRS in spite of withdrawal and replenishment of 30% or 40% of liquid contents. A conventional anaerobic digester could be easily converted to the ASBR without any stability problem. 3. Flotation thickening occurred in thicken step of the ASBRS throughout steady state, and floating bed volume at the end of thicken period occupied about 70% of the working volume of the reactor Efficiency of flotation thickening in the ASBRS could be comparable to that of additional gravity thickening of a completely mixed digester. 4. Solids were accumulated rapidly in the ASBR during start-up period. Solids concentrations in the ASBRS were 2.6 times higher than that in the completely mixed control reactor at steady state. Dehydrogenase activity had a strong correlation with the solids concentration. Dehydrogenase activity of the digested flu형e in the ASBR was 2.9 times higher than that of the flu형e in the control reactor, and about 25 times higher than that of the subnatant in the ASBR. 5. Remarkable increase in equivalent gas production of 52% was observed at the ASBRS compared with the control reactor in spite of similar quality of clarified effluent from the ASBRS and control reactor. The increase in gas production from the ASBRS was believed to be combined results of accumulation of microorganisms, higher driving force applied, and additional long-term degradation of organics continuously accumulated.

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접촉식 밀봉 링의 변형거동 안정성에 관한 유한요소해석 (Finite Element Analysis on the Deformation Behavior Stability of Contact Sealing Rings)

  • 김청균;김도현
    • 한국가스학회지
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    • 제16권5호
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    • pp.47-51
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    • 2012
  • 본 연구에서는 3가지의 서로 다른 단면형상을 갖는 밀봉 링의 변형거동 안정성을 FEM으로 해석하였다. NBR 소재로 제조한 밀봉 링의 변형거동 안정성을 고찰하기 위해 초기 압축률로 25%를 적용하였다. 작동유체의 압력을 최대 $25kgf/cm^2$까지 올렸을 때 발생한 최대변형률, 최대응력, 최대접촉법선응력을 해석하였다. FEM 결과에 의하면, 밀봉 링의 중심부에 빈 공간을 확보한 중공오링과 중공사각링의 최대 변형률은 기존 오링에 비해 높아졌지만, 최대응력과 최대접촉법선응력은 떨어지는 것으로 나타났다. 결국, 밀봉 링이 장수명의 내구 안정성을 확보하기 위해서는 중심부에 빈 공간을 확보하는 것이 권장된다. 그렇지만, 접촉식 밀봉 링의 밀봉 안전성을 확보하기 위해서는 밀봉 링을 하나의 몸체로 설계하는 것이 바람직하다.

대향타겟식 스퍼터링 장치의 공정 조건에 따른 SiO2 가스 차단막의 특성 (Characteristics of SiO2 Gas Barrier Films as a Function of Process Conditions in Facing Target Sputtering (FTS) System)

  • 배강;왕태현;손선영;김화민;홍재석
    • 한국전기전자재료학회논문지
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    • 제22권7호
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    • pp.595-601
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    • 2009
  • For the silicon oxide $(SiO_x)$ films prepared by using the facing target sputtering (FTS) apparatus that was manufactured to enhance the preciseness of the fabricated thin-film and sputtering yield rate by forming a higher-density plasma in the electrical discharge space for using it as a thin-film passivation system for flexible organic light emitting devices (FOLEDs). The deposition characteristics were investigated under various process conditions, such as array of the cathode magnets, oxygen concentration$(O_2/Ar+O_2)$ introduced during deposition, and variations of distance between two targets and working pressure. We report that the optimum conditions for our FTS apparatus for the deposition of the $SiO_x$ films are as follows: $d_{TS}\;and\;d_{TT}$ are 90mm and 120mm, respectively and the maximum deposition rate is obtained under a gas pressure of 2 mTorr with an oxygen concentration of 3.3%. Under this optimum conditions, it was found that the $SiO_x$ film was grown with a very high deposition rate of $250{\AA}$/min by rf-power of $4.4W/cm^2$, which was significantly enhanced as compared with a deposition rate (${\sim}55{\AA})$/min) of the conventional sputtering system. We also reported that the FTS system is a suitable method for the high speed and the low temperature deposition, the plasma free deposition, and the mass-production.

The Effects of CF4 Partial Pressure on the Hydrophobic Thin Film Formation on Carbon Steel by Surface Treatment and Coating Method with Linear Microwave Ar/CH4/CF4 Plasma

  • Han, Moon-Ki;Cha, Ju-Hong;Lee, Ho-Jun;Chang, Cheol Jong;Jeon, Chang Yeop
    • Journal of Electrical Engineering and Technology
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    • 제12권5호
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    • pp.2007-2013
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    • 2017
  • In order to give hydrophobic surface properties on carbon steel, the fluorinated amorphous carbon films were prepared by using linear 2.45GHz microwave PECVD device. Two different process approaches have been tested. One is direct deposition of a-C:H:F films using admixture of $Ar/CH_4/CF_4$ working gases and the other is surface treatment using $CF_4$ plasma after deposition of a-C:H film with $Ar/CH_4$ binary gas system. $Ar/CF_4$ plasma treated surface with high $CF_4$ gas ratio shows best hydrophobicity and durability of hydrophobicity. Nanometer scale surface roughness seems one of the most important factors for hydrophobicity within our experimental conditions. The properties of a-C:H:F films and $CF_4$ plasma treated a-C:H films were investigated in terms of surface roughness, hardness, microstructure, chemical bonding, atomic bonding structure between carbon and fluorine, adhesion and water contact angle by using atomic force microscopy (AFM), nano-indentation, Raman analysis and X-ray photoelectron spectroscopy (XPS).

Development of Parallel Plate Avalanche Counter for heavy ion collision in radioactive ion beam

  • Wei, Xianglun;Guan, Fenhai;Yang, Herun;Wang, Yijie;Zhang, Junwei;Ma, Peng;Diao, Xinyue;Lu, Chengui;Li, Meng;Guan, Yuanfan;Duan, Limin;Hu, Rongjiang;Zhang, Xiuling;Xiao, Zhigang
    • Nuclear Engineering and Technology
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    • 제52권3호
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    • pp.575-580
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    • 2020
  • We have developed a position-sensitive Parallel Plate Avalanche Counter (PPAC) to detect the fission fragments and reconstruct the fission reaction plane in the experiment of studying nuclear equation of state (nEOS) by means of heavy ion collision (HIC). This experiment put forward high requirements for the performances of PPAC, such as the time resolution, efficiency and position resolution. According to these requirements we designed the PPAC with an active area of 240 mm × 280 mm working at low gas pressure. The results show that time resolution could be less than 300 ps. Position resolution is consistent with the theoretical calculation about 1.35 mm. Detection efficiency could be approaching 100% gradually with the voltage increasing in different gas pressures. The performances of PPAC have also been verified in beam experiment. Each set of anode wires can be accurately separated in the position spectrum. In the beam experiment, we also got the back-to-back correlation of fission fragments which is one of the direct signals characterizing binary decay.

톨루엔 폭로 근로자의 혈중 톨루엔 및 요중 마뇨산 농도 (Blood Toluene and Urine Hippuric Acid Concentrations of Occupationally Toluene-exposed Workers)

  • 양정선;강성규;김기웅;이종성;조영숙;정호근
    • 한국산업보건학회지
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    • 제3권2호
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    • pp.188-193
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    • 1993
  • Toluene in air and blood and hippuric acid in urine were checked for the 41 female workers who are exposed to toluene and have normal liver function in shoe making factories in July, 1993. Toluene in air was sampled with charcoal by personal air sampler at least 4 times and analyzed by gas chromatography. At the end of shift, blood and spot urine were collected with a vacuum tube containing EDTA and a polyethylene bottle for detecting blood toluene and urine hippuric acid and analyzed by gas chromatography and high performance liquid chromatography. Means of air and blood toluene and urine hippuric acid concentrations were 34.35ppm, 0.360mg/L, and 1.78g/g creatinine, respectively. Toluene in air showed a good correlation with hippuric acid in urine(r=0.4503) and toluene in blood(r=0.4596). The hippuric acid in urine and toluene in blood corresponded 10 exposure of 100ppm toluene in air were 2.628g/g creatinine and 0.481mg/L. Blood toluene and urine hippuric acid expected ratio were not correlated to the obesity index and working duration, however increased with age.

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