• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.399-399
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• 2008

Synthesis and characterization of ZnO structure such as nanowires, nanorods, nanotube, nanowall, etc. have been studied to multifunctional application such as optical, nanoscale electronic and chemical devices because it has a room-temperature wide band gap of 3.37eV, large exiton binding energy(60meV) and various properties. Various synthesis methods including chemical vapor deposition (CVD), physical vapor deposition, electrochemical deposition, micro-emulsion, and hydrothermal approach have been reported to fabricate various kinds of ZnO nanostructures. But some of these synthesis methods are expensive and difficult of mass production. Wet chemical method has several advantage such as simple process, mass production, low temperature process, and low cost. In the present work, ZnO nanorods are deposited on ITO/glass substrate by simple wet chemical method. The process is perfomed by two steps. One-step is deposition of ZnO seeds and two-step is growth of ZnO nanorods on substrates. In order to form ZnO seeds on substrates, mixture solution of Zn acetate and Methanol was prepared.(one-step) Seed layers were deposited for control of morpholgy of ZnO seed layers by spin coating process because ZnO seeds is deposited uniformly by centrifugal force of spin coating. The seed-deposited samples were pre-annealed for 30min at $180^{\circ}C$ to enhance adhesion and crystallinnity of ZnO seed layer on substrate. Vertically well-aligned ZnO nanorods were grown by the "dipping-and-holding" process of the substrates into the mixture solution consisting of the mixture solution of DI water, Zinc nitrate and hexamethylenetetramine for 4 hours at $90^{\circ}C$.(two-step) It was found that density and morphology of ZnO nanorods were controlled by manipulation of ZnO seeds through rpm of spin coating. The morphology, crystallinity, optical properties of the grown ZnO nanostructures were carried out by field-emission scanning electron microscopy, high-resolution electron microscopy, photoluminescence, respectively. We are convinced that this method is complementing problems of main techniques of existing reports.

• Journal of Convergence for Information Technology
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• v.10 no.6
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• pp.28-34
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• 2020

A structure in which GaAs and AlGaAs epilayers are formed with a metal organic chemical vapor deposition equipment on a GaAs wafer similar to the structure of making a vertical cavity surface emitting laser is used. Photonic Quantum Ring (PQR) devices that are naturally generated by 3D resonance are manufactured by chemically assisted ion beam etching technology, which is a dry etching method. A new technology that can be fabricated has been studied, and as a result, the possibility of wet etching of a solution containing phosphoric acid, hydrogen peroxide and methanol was investigated, and the device fabrication by applying this method are also discussed. In addition, the spectrum of the fabricated optical device was measured, and the results were theoretically analyzed and compared with the wavelength value obtained by the measurement. It is expected that the PQR device will be able to model cells in a three-dimensional shape or be applied to the display field.

• Journal of the Korean Electrochemical Society
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• v.11 no.2
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• pp.100-104
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• 2008

Titanium sheet metal substrates used in thin film batteries were wet etched and their surface area was increased in order to increase the discharge capacity and power density of the batteries. To obtain a homogeneous etching pattern, we used a conventional photolithographic process. Homogeneous hemisphere-shaped wells with a diameter of approximately $40\;{\mu}m$ were formed on the surface of the Ti substrate using a photo-etching process with a $20\;{\mu}m{\times}20\;{\mu}m$ square patterned photo mask. All-solid-state thin film cells composed of a Li/Lithium phosphorous oxynitride (Lipon)/$LiCoO_2$ system were fabricated onto the wet etched substrate using a physical vapor deposition method and their performances were compared with those of the cells on a bare substrate. It was found that the discharge capacity of the cells fabricated on wet etched Ti substrate increased by ca. 25% compared to that of the cell fabricated on bare one. High discharge rate was also able to be obtained through the reduction in the internal resistance. However, the cells fabricated on the wet etched substrate exhibited a higher degradation rate with charge-discharge cycling due to the nonuniform step coverage of the thin films, while the cells on the bare substrate demonstrated a good cycling performance.

• 한국신재생에너지학회:학술대회논문집
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• 2005.06a
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• pp.192-195
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• 2005

The silicon thin film solar cells were fabricated by 13.56 MHz PECVD (Plasma-Enhanced Chemical-Vapor Deposition) and 60 MHz VHF PECVD (Very High-Frequency Plasma-Enhanced Chemical-Vapor Deposition). We focus on textured ZnO:Al films prepared by RF sputtering and post deposition wet chemical etching and studied the surface morphology and optical properties. These films were optimized the light scattering properties of the textured ZnO:Al after wet chemical etching. Finally, the textured ZnO:Al films were successfully applied as substrates for silicon thin films solar cells. The efficiency of tandem solar cells with $0.25 cm^2$ area was $11.8\%$ under $100mW/cm^2$ light intensity. The electrical properties of tandem solar cells were measured with solar simulator (AM 1.5, $100 mW/cm^2)$ and spectral response measurements.

• Carbon letters
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• v.21
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• pp.33-50
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• 2017

In this study, Fe-Ni bimetallic catalyst supported on kaolin is prepared by a wet impregnation method. The effects of mass of kaolin support, pre-calcination time, pre-calcination temperature and stirring speed on catalyst yields are examined. Then, the optimal supported Fe-Ni catalyst is utilised to produce multi-walled carbon nanotubes (MWCNTs) using catalytic chemical vapour deposition (CCVD) method. The catalysts and MWCNTs prepared using the optimal conditions are characterized using high resolution transmission electron microscope (HRTEM), high-resolution scanning electron microscope (HRSEM), electron diffraction spectrometer (EDS), selected area electron diffraction (SAED), thermogravimetric analysis (TGA), Brunauer-Emmett-Teller (BET), and X-ray diffraction (XRD). The XRD/EDS patterns of the prepared catalyst confirm the formation of a purely crystalline ternary oxide ($NiFe_2O_4$). The statistical analysis of the variance demonstrates that the combined effects of the reaction temperature and acetylene flow rate predominantly influenced the MWCNT yield. The $N_2$ adsorption (BET) and TGA analyses reveal high surface areas and thermally stable MWCNTs. The HRTEM/HRSEM micrographs confirm the formation of tangled MWCNTs with a particle size of less than 62 nm. The XRD patterns of the MWCNTs reveal the formation of a typical graphitized carbon. This study establishes the production of MWCNTs from a bi-metallic catalyst supported on kaolin.

• Journal of Environmental Science International
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• v.11 no.6
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• pp.489-496
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• 2002

The purpose of this study was to investigate spatial distributions of total deposition. A total number 79 samples were collected at 17 sampling sites from September 1999 to January 2000. Total (=wet+dry) atmospheric depositions were collected by filtered deposition sampler at sampling site (the Western Part of Kyongsangnam Province). In addition, the deposition of soluble and insoluble fraction was also investigated to find a suitable simplified collection method for a long-term monitoring of total deposition. The total depositions were measured soluble amount(mm/month), insoluble amount(kg/km$^2$/month), pH, conductivity(E.C.) and eight ionic components. The spatial distribution of deposition flux was to estimated by using a kringing analysis. The 17 sites mean fluxes of water soluble ionic components; SO$_4$$\^$2-/, Cl$\^$-/, NO$_3$$\^$-/, Na$\^$+/, NH$_4$$\^$+/, K$\^$+/, Mg$\^$2+/, Ca$\^$2+/ were 100.7∼315.6kg/km$^2$/month, 30.1∼234.3kg/km$^2$/month, 64.4∼ 139.4kg/km$^2$/month, 7.5∼68.3kg/km$^2$/month, 10.7∼48.7kg/km$^2$/month, 5.6∼27.9kg/km$^2$/month, 4.5∼17.5kg/km$^2$/month, 27.6∼81.7kg/km$^2$/month, respectively.

• Journal of Korea Water Resources Association
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• v.40 no.5
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• pp.409-418
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• 2007

Combined sewer solid deposition during dry weather periods and their resuspension during wet weather periods has long been recognized as a major contributor to the first-flush phenomenon. Also, these deposition of sewer solids results in a loss of flow capacity that may restrict flow and cause a local flooding at urban area. In order to solve these problems, measurement of solid deposition for a given sewer system for extended period is needed but this task is very difficult and extremely expensive. This paper presents the development and applicability of estimation equations for solid deposition in sewer systems based on the solid deposition estimated using MOUSE model. As results, the comparison between estimated and measured solid deposition is difficult due to the absent of measured data, but the estimated values using developed equations show applicability compared with the results of MOUSE model and the estimation equations developed by the EPA.

• Korean Journal of Materials Research
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• v.14 no.2
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• pp.141-145
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• 2004

Silicon nitride thin films were deposited by atomic layer deposition (ALD) technique in a batch-type reactor by alternating exposures of precursors. XJAKO200414714156408$_4$ or$ SiH_2$$Cl_2$ was used as the Si precursor, $NH_3$ was used as the N precursor, and the deposited films were characterized comparatively. The thickness of the film linearly increased with the number of deposition cycles, so that the thickness of the film can be precisely controlled by adjusting the number of cycles. As compared with the deposition using$ SiCl_4$, the deposition using $SiH_2$$Cl_2$ exhibited larger deposition rate at lower precursor exposures, and the deposited films using $SiH_2$$Cl_2$ had lower wet etch rate in a diluted HF solution. Silicon nitride films with the Si:N ratio of approximately 1:1 were obtained using either Si precursors at $500^{\circ}C$, however, the films deposited using $SiH_2$$Cl_2$ exhibited higher concentration of H as compared with those of the $SiC_4$ case. Silicon nitride thin films deposited by ALD showed similar physical properties, such as composition or integrity, with the silicon nitride films deposited by low-pressure chemical vapor deposition, lowering deposition temperature by more than $200^{\circ}C$.

• Journal of Environmental Health Sciences
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• v.20 no.2
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• pp.39-54
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• 1994

Dry and wet deposition samples were continuously collected by deposit gauge. In Bulkwang area of Seoul and Kanghwa in west coastal area of Korea. In order to evaluate the level of air pollution and its chemical composition, Bulkwang area located in Seoul and Kanghwa in west coastal area were chosen for sampling site. dry deposition concentrations, pH, electric conductivity and water soluble ion concentrations of deposit gauge were analysed. The results of comparison between urban area and coastal area were summarized as follows. Mean concentrations of dry deposition in Bulkwang was 2.807 ton/km$^2$/month (range: 5.171~1.128 ton/km$^2$/month) while that in Kanghwa was 1.990 ton/km$^2$/month (range: 3.358 ~ 1.084 ton/km$^2$/month), which showed a significant difference between two areas. The rainfall during the period from June to September in 1990 recorded 1859.7 mm which was 78.8% of its mean amount in Seoul, and 1846.9 mm which was 81.6% that of Kanghwa. In Bulkwang area, correlation coefficients of deposit chemical composition were 0.95 for SO$_4^{-2}$ and Na$^+$, 0.94 for SO$_4^{-2}$ and NH$_4^+$, 0.93 for CI$^-$ and NH$_4^+$ and 0.85 for Cl$^-$ and Ca$^{2+}$, respectively. Then, the results indicate that sulfates such as $Na_2SO_4$, $(NH_4)_2SO_4$, and CaSO$_4$ were the major chemical state of deposit. In Kanghwa area, it was considered that NaCl, $NH_4NO_3$, NaNO$_3$, and $Ca(NO_3)_2$ were the major chemical state of deposit.

• Journal of the Korean Ceramic Society
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• v.52 no.4
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• pp.284-289
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• 2015

This study examined carbon layer coating on silicon carbide (SiC) fibers by utilizing solid-state and wet chemistry routes to confer toughness to the fiber-reinforced ceramic matrix composites, as an alternative to the conventional pyrolytic carbon (PyC) interphase layer. Electrophoretic deposition (EPD) of carbon black nanoparticles using both AC and DC current sources, and the vacuum infiltration of phenolic resin followed by pyrolysis were tested. Because of the use of a liquid phase, the vacuum infiltration resulted in more uniform and denser carbon coating than the EPD routes with solid carbon black particles. Thereafter, vacuum infiltration with controlled variation in phenolic resin concentration, as well as the iterations of infiltration steps, was improvised to produce a homogeneous carbon coating having a thickness of several hundred nanometers on the SiC fiber. Conclusively, it was demonstrated that the carbon coating on the SiC fiber could be achieved using a simpler method than the conventional chemical vapor deposition technique.