• 반도체디스플레이기술학회지
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• 제20권1호
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• pp.32-36
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• 2021

The number of processes in the manufacture of semiconductors, displays and solar cells is increasing. And as the processes is performed, multiple layers of films and various patterns are formed on the wafer. At this time, substrate warpage occurs due to the difference in stress between each film and pattern formed on the wafer. the substrate warping phenomenon occurs due to the difference in stress between each film and pattern formed on the wafer. We developed a new warpage measurement method to measure wafer warpage during real-time processing. We performed an experiment to measure the presence and degree of warpage of the substrate in real time during the process by adding only measurement equipment for applying additional electrical signals to the existing ESC and detecting the change of the additional electric signal. The additional electrical measurement signal applied at this time is very small compared to the direct current (DC) power applied to the electrostatic chuck whit a frequency that is not generally used in the process can be selectively used. It was confirmed that the measurement of substrate warpage can be easily separated from other power sources without affecting.

• 한국기계가공학회지
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• 제13권6호
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• pp.139-144
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• 2014

As a result of a mismatch of the residual stress between both sides of the silicon wafer, which warps and distorts during the patterning process. The accuracy of the warpage measurement is related to the calibration. A CCD camera was used for the calibration. Performing optimization of the error function constructed with phase values measured at each pixel on the CCD camera, the coordinates of each light source can be precisely determined. Measurement results after calibration was performed to determine the warpage of the silicon wafer demonstrate that the maximum discrepancy is $5.6{\mu}m$ with a standard deviation of $1.5{\mu}m$ in comparison with the test results obtained by using a Form TalySurf instrument.

• 반도체디스플레이기술학회지
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• 제17권4호
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• pp.86-90
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• 2018

Standards related to express the non-flatness of a wafer are reviewed and discussed, for example, bow, warp, and sori. Novel wafer warpage measurement method is proposed for 3D stacked IC application. The new way measures heat transfer from a heater to a wafer, which is a function of the contact area between these two surfaces and in turn, this contact area depends on the wafer warpage. Measurement options such as heating from room temperature and cooling from high temperature were experimentally examined. The heating method was found to be sensitive to environmental conditions. The cooling technique showed more robust and repeatable results and the further investigation for the optimal cooling condition is underway.

• 소성∙가공
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• 제15권1호
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• pp.76-81
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• 2006

In this study, warpage characteristics of mobile phone cover through injection molding process were investigated using design of experiments in injection molding process. Warpage in plastic injection molding has a significant effect on quality of product. Effects of injection time, packing pressure, packing time, mold temperature and melt temperature on the warpage of mobile phone cover were considered by numerical analysis and experiment with Taguchi method. The degree of warpage for the injection molded part was measured by using three dimensional coordinate measurement machine. It was shown that temperature control factor has more significant effect on the warpage of mobile phone cover than pressure control factor.

• 마이크로전자및패키징학회지
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• 제29권4호
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• pp.83-87
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• 2022

최근 반도체 패키지 두께가 점점 얇아짐에 따라 휨(warpage) 문제가 대두되고 있다. 휨(warpage)은 패키지 구성요소들 간의 물성 차이로 인해 발생하기 때문에, 휨(warpage)을 예측하기 위해서는 주된 구성요소인 EMC(Epoxy molding compound)의 정확한 물성 파악이 필수적으로 요구된다. 특히 EMC는 경화 공정 중 경화 수축을 보이는데, 겔점 이후에 발생하는 유효 경화 수축은 휨(warpage) 발생의 핵심 요소이다. 본 연구에서는 유전 센서를 이용해 측정한 소실 계수로부터 실제 반도체 패키지 경화 공정 동안 발생하는 EMC의 겔점이 정의되었다. 유전 센서로부터 얻은 결과를 분석하기 위해 DSC(Differential scanning calorimetry) 시험과 rheometer 시험이 수행되었다. 그 결과, 유전 측정법이 EMC 경화상태 모니터링에 효과적인 방법임이 검증되었다. 유전 측정과 동시에 광섬유 센서를 이용해 EMC의 경화 공정 중 변형률 변화 추이가 함께 측정되었다. 위 결과들로부터 경화 공정 중 발생하는 EMC의 유효 경화 수축이 측정되었다.

• 한국기계가공학회지
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• 제7권1호
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• pp.47-52
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• 2008

We present a 3-D profiler specially devised for the profile measurement of rough surfaces that are difficult to be measured with conventional non-contact interferometer. The profiler comprises multiple two-point-diffraction sources made of single-mode optical fibers. Test measurement proves that the proposed profiler is well suited for the warpage inspection of microelectronics components with rough surface, such as unpolished backsides of silicon wafers and plastic molds of integrated-circuit chip package.

• 반도체디스플레이기술학회지
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• 제15권4호
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• pp.1-9
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• 2016

The warpage on mobile phone camera packages occurs due to the CTE(Coefficient of Thermal Expansion) mismatch between a thin silicon die and a substrate. The warpage in the optical instruments such as camera module has an effect on the field curvature, which is one of the factors degrading the optical performance and the product yield. In this paper, we studied the effect of die bonding epoxy on the package and optical performance of mobile phone camera packages. We calculated the warpages of camera module packages by using a finite element analysis, and their shapes were in good agreement showing parabolic curvature. We also measured the warpages and through-focus MTF of camera module specimens with experiments. The warpage was improved on an epoxy with low elastic modulus at both finite element analysis and experiment results, and the MTF performance increased accordingly. The results show that die bonding epoxy affects the warpage generated on the image sensor during the packaging process, and this warpage eventually affects the optical performance associated with the field curvature.

• 마이크로전자및패키징학회지
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• 제22권3호
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• pp.57-65
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• 2015

반도체 패키지는 여러 가지 다양한 재료로 구성되어 있으며, 제조시나 사용 환경에서 온도가 변하면 각 재료의 열팽창 계수의 차이로 인하여 굽힘변형이 발생하게 된다. 그림자 무아레 방법은 비접촉으로 전체 영역에 걸친 면외변위를 측정하는 광학적 방법이지만 측정 감도가 $50{\mu}m/fringe$ 이상이어서 반도체 패키지의 굽힘변형을 측정하기에는 적당하지 않은 면이 있었다. 본 논문에서는 그림자 무아레 시스템에 위상이동 기법을 적용하여 $12.5{\mu}m/fringe$의 향상된 감도를 갖는 측정장치를 구성하였다. 그림자 무아레 측정에서 나타나는 탈봇 현상을 고려하여 1/2 탈봇 영역에서 변형을 측정할 수 있도록 실험을 수행하였다. 위상이동에 의해 기록되는 4장의 그림자 무늬를 영상처리하여 감도가 4배 향상된 그림자 무늬를 얻어내었다. 본 논문에서 개발한 측정방법을 기존의 섬유강화 패키지 기판과 무섬유 패키지 기판에 적용하여 상온과 약 $100^{\circ}C$의 환경에서 발생하는 굽힘변형을 측정하였다.

• 한국전기전자재료학회논문지
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• 제25권3호
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• pp.241-246
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• 2012

A layered planer SOFC module was designed from planar-type SOFC. It was prepared by multi-layered ceramic technology. To form the cathode and the anode in the layered structure, reliable channels should be made on the both side of electrolyte perpendicularly. However, monolithic SOFC using multi-layered ceramic technology hasn't been studied another group, and the warpage of electrolyte in the channel, also, hasn't been studied, when electrode is printed on the electrolyte. In this study, the channels are prepared with electrode printing, and their warpage are evaluated. In the case of YSZ without electrode, the warpages are nothing in the limit of measurement using optical microscope. The warpage of 'YSZ-NiO printed' increases than that of 'NiO printed', and also, the case of 'double electrode printed' is similar to 'YSZ-NiO printed'. It is thought that, in the printed electrolyte, the warpage is related to the difference of the sintering behavior of each material.

• 마이크로전자및패키징학회지
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• 제24권1호
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• pp.57-65
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• 2017

모바일 기기 내부에 있는 전자부품들은 반도체 칩이나 그 밖의 여러 가지 재료로 구성되어 있다. 이러한 전자부품들은 매우 얇고, 구성된 재료들은 다양한 열팽창 계수를 가지고 있으므로 온도 변화나 외부 하중에 의해서 쉽게 굽힘이 일어난다. 그림자 무아레 방법은 비접촉으로 전체 영역에 걸친 면외변위를 측정하는 광학적 방법이지만 측정 감도를 $50{\mu}m/fringe$ 이내로 하기 어려워서 반도체 패키지의 굽힘변형을 측정하기에는 적당하지 않은 면이 있었다. 본 논문에서는 그림자 무아레 기법의 여러 실험조건들을 최적화하여 $25{\mu}m/fringe$의 향상된 감도를 갖는 측정 방법을 구현하였다. 또한 이로부터 위상이동에 의해 기록되는 4장의 그림자 무늬를 영상 처리하여 감도가 4배 향상된 그림자 무늬를 얻어내고 이를 스마트폰의 소형 전자부품들에 적용하여 온도변화에 따라 발생하는 굽힘 변위를 $5{\mu}m/fringe$의 고감도로 측정하였다.