• 제목/요약/키워드: Voltage holding ratio

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A Study of Characteristics Comparison with Polyimide in LCOS Microdisplay

  • Kim, Su-Gun;Kim, Ji-Hyun;Lee, Sang-Shin;Kim, Joo-Hyung;Cho, Chul-Shik
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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    • pp.891-894
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    • 2002
  • We studied characteristics of polyimide (PI) about Liquid Crystal on Silicon (LCOS) microdisplay. In order to compare two kinds of PI and choose one PI, we measured some items. First, we measured thermal imidization of SE-7492, SE-5291 (Nissan) PI using FT-IR. The results of thermal imidization are same 85%for SE-7492 and 86% for SE-5291. The second, we measured voltage-holding ratio (VHR) of LCOS imager using two kinds PI and one liquid crystal (LC) that is a mixture developed by Merck. The third, we measured contrast ratio (C/R) of LCOS imager using function generator from ov to 4V. The results of VHR and C/R are higher LCOS imager using SE-7492 than LCOS imager using SE-5291. And last we measured response time and the result is same two types LCOS Imagers. So, we choose PI of LCOS imager and concluded that LC is much better matched of PI using SE-7492.

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23' LCD TV by using ALT plasma beam alignment technology

  • Lee, C.Y.;Tang, H.C.;Chen, C.W.;Shih, Y.J.;Liu, C.H.;Lin, C.H.;Yang, K.H.;Lin, S.H.;Chang, H.C.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.776-779
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    • 2006
  • The alignment of liquid crystal (LC) is one of the key issues of liquid crystal display (LCD) technologies. In this study, we aligned polyimide (as the LC alignment layer) by ALT plasma beam and to realize the stability and characteristics of this technology. The characteristics such as anchoring energy, pre-tilt angle, voltage holding ratio(VHR) and residual direct current(Rdc) were discussed. Besides, we applied it to the in plane switch (IPS) mode 23" WXGA real panel, the performance parameters and electrical properties were measured and compared with those of rubbing alignment. From the result, we demonstrated a successful LC alignment treatment process in real panel by ALT plasma beam.

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Improve the Transparency of Liquid Crystal Display Using Hybrid Conductive Films Based on Carbon Nanomaterials

  • Shin, Seung Won;Kim, Ki-Beom;Jung, Yong Un;Hur, Sung-Taek;Choi, Suk-Won;Kang, Seong Jun
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.241.2-241.2
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    • 2014
  • We present highly transparent liquid crystal displays (LCDs) using hybrid films based on carbon nanomaterials, metal grid, and indium-tin-oxide (ITO) grid. Carbon based nanomaterials are used as transparent electrodes because of high transmittance. Despite of their high transmittance they have relatively high sheet resistance. To solve this problem, we applied grid and made hybrid conductive films based on carbon nanomaterials. Conventional photolithography processes were used to make a grid pattern of metal and ITO. To fabricate transparent conductive films, carbon nanotube (CNT) ink was spin coated on the grid pattern. The transparency of the conductive film was controlled by shape and size of the grid pattern and the thickness of CNT films. The optical transmittance of CNT-based hybrid films is 92.2% and sheet resistance is also reduced to $168{\Omega}/square$. These substrates were used for the fabrication of typical twisted nematic (TN) LCD cells. From the characteristics of LCD devices such as transmittance, operating voltage, voltage holding ratio our devices were comparable to those of pristine ITO substrates. The result shows that the hybrid conductive films based on carbon nanomaterials could be alternative of ITO for the highly transparent LCDs.

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파이프라인드식 비교기 배열을 이용한 아날로그 디지털 변환기 (Analog-to-Digital Converter using Pipelined Comparator Array)

  • 손주호;조성익;김동용
    • 전자공학회논문지SC
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    • 제37권2호
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    • pp.37-42
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    • 2000
  • 본 논문에서는 파이프라인드 구조의 빠른 변환 속도와 축차비교 구조의 저전력 구조를 이용하여 고속, 저전력 아날로그 디지털 변환기를 제안하였다. 제안된 구조의 변환 방법은 축차비교 구조의 변환에서 비교기를 파이프라인드 구조로 연결하여 홀드된 주기에 비교기의 기준 전위를 전 비교기의 출력 값에 의해 변환하도록 하여 고속 동작이 가능하도록 하였다. 제안된 구조에 의해 8비트 아날로그 디지털 변환기를 0.8㎛ CMOS공정으로 HSPICE를 이용하여 시뮬레이션한 결과, INL/DNL(Integral Non-Linearity/Differential Non-Linearity)은 각각 ±0.5/±1이었으며, 100㎑ 사인 입력 신호를 10MS/s로 샘플링 하여 DFT(Discrete Fourier Transform)측정 결과 SNR(Signal to Noise Ratio)은 41㏈를 얻을 수 있었다. 10MS/s의 변환 속도에서 전력 소모는 4.14㎽로 측정되었다.

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플라즈마 표면처리가 TiO2/TiO2-x 저항 변화형 메모리에 미치는 영향 (Effect of Plasma Treatment on TiO2/TiO2-x Resistance Random Access Memory)

  • 김한상;김성진
    • 한국전기전자재료학회논문지
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    • 제33권6호
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    • pp.454-459
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    • 2020
  • In this study, a TiO2/TiO2-x-based resistance variable memory was fabricated using a DC/RF magnetron sputtering system and ALD. In order to analyze the effect of oxygen plasma treatment on the performance of resistance random access memory (ReRAM), the TiO2/TiO2-x-based ReRAM was evaluated by applying RF power to the TiO2-x oxygen-holding layer at 30, 60, 90, 120, and 150 W, respectively. The ReRAM was fabricated, and the electrical and surface area performances were compared and analyzed. In the case of ReRAM without oxygen plasma treatment, the I-V curve had a hysteresis curve shape, but the width was very small, with a relatively high surface roughness of the oxygen-retaining layer. However, in the case of oxygen plasma treatment, the HRS/LRS ratio for the I-V curve improved as the applied RF power increased; stable improvement was also noted in the surface roughness of the oxygen-retaining layer. It was confirmed that the low voltage drive was not smooth due to charge trapping in the oxygen diffusion barrier layer owing to the high intensity ReRAM applied with an RF power of approximately 150 W.