• Title/Summary/Keyword: Vertically aligned CNTs

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A review: controlled synthesis of vertically aligned carbon nanotubes

  • Hahm, Myung-Gwan;Hashim, Daniel P.;Vajtai, Robert;Ajayan, Pulickel M.
    • Carbon letters
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    • v.12 no.4
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    • pp.185-193
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    • 2011
  • Carbon nanotubes (CNTs) have developed into one of the most competitively researched nano-materials of this decade because of their structural uniqueness and excellent physical properties such as nanoscale one dimensionality, high aspect ratio, high mechanical strength, thermal conductivity and excellent electrical conductivity. Mass production and structure control of CNTs are key factors for a feasible CNT industry. Water and ethanol vapor enhance the catalytic activity for massive growth of vertically aligned CNTs. A shower system for gas flow improves the growth of vertically aligned single walled CNTs (SWCNTs) by controlling the gas flow direction. Delivery of gases from the top of the nanotubes enables direct and precise supply of carbon source and water vapor to the catalysts. High quality vertically aligned SWCNTs synthesized using plasma enhance the chemical vapor deposition technique on substrate with suitable metal catalyst particles. This review provides an introduction to the concept of the growth of vertically aligned SWCNTs and covers advanced topics on the controlled synthesis of vertically aligned SWCNTs.

Growth of Vertically Aligned CNTs with Ultra Thin Ni Catalysts

  • Ryu, Je-Hwang;Yu, Yi-Yin;Lee, Chang-Seok;Jang, Jin;Park, Kyu-Chang;Kim, Ki-Seo
    • Transactions on Electrical and Electronic Materials
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    • v.9 no.2
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    • pp.62-66
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    • 2008
  • We report on the growth mechanism of vertically aligned carbon nanotubes (VACNTs) using ultra thin Ni catalysts and direct current plasma enhanced chemical vapor deposition (PECVD) system. The CNTs were grown with -600 V bias to substrate electrode and catalyst thickness variation of 0.07 nm to 3 nm. The CNT density was reduced with catalyst thickness reduction and increased growth time. Cone like CNTs were grown with ultra thin Ni thickness, and it results from an etch of carbon network by reactive etchant species and continuous carbon precipitation on CNT walls. Vertically aligned sparse CNTs can be grown with ultra thin Ni catalyst.

Carbon Nanotube Synthesis with High Purity by Introducing of NH3 Etching Gas (암모니아 식각 가스 도입에 의한 고순도 탄소나노튜브의 합성)

  • Lee, Sunwoo;Lee, Boong-Joo
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.62 no.6
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    • pp.782-785
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    • 2013
  • Multi-walled carbon nanotubes were synthesized on Ni catalyst using thermal chemical vapor deposition. By introducing ammonia gas during the CNT synthesis process, clean and vertically aligned CNTs without impurities could be prepared. As the ammonia gas increased a partial pressure of hydrogen in the mixed gas during the CNT synthesis process, we could control the CNT synthesis rate appropriately. As the ammonia gas has an etching ability, amorphous carbon species covering the catalyst particles were effectively removed. Therefore catalyst particles could maintain their catalytic state actively during the synthesis process. Finally, we could obtain clean and vertically aligned CNTs by introducing $NH_3$ gas during the CNT synthesis process.

Improvement Study on Vertical Growth of Carbon Nanotubes and their Field Emission Properties at ICPCVD (유도결합형 플라즈마 화학기상증착법에서 탄소나노튜브의 수직성장과 전계방출 특성 향상 연구)

  • 김광식;류호진;장건익
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.8
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    • pp.713-719
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    • 2002
  • In this study, the vertically well-aligned CNTs were synthesized by DC bias-assisted inductively coupled plasma hot-filament chemical vapor deposition (ICPHFCVD) using radio-frequence plasma of high density and that CNTs were vertically grown on Ni(300 )/Cr(200 )-deposited glass substrates at 58$0^{\circ}C$. This system(ICPHFCVD) added to tungsten filament in order to get thermal decompound and DC bias in order to vertically grow to general Inductively Coupled Plasma CVD. The grown CNTs by ICPHFCVD were developed to higher graphitization and fewer field emission properties than those by general ICPCVD. In this system, DC bias was effect of vortical alignment to growing CNTs. The measured turn-on fields of field emission property by general ICPCVD and DC bias-assisted ICPHFCVD were 5 V/${\mu}{\textrm}{m}$ and 3 V/${\mu}{\textrm}{m}$, respectively.

Simultaneous growth of graphene and vertically aligned single-walled carbon nanotubes at low temperature by chemical vapor deposition

  • Hong, Suck Won;Kim, Kwang Ho;Jung, Hyun Kyung;Kim, Daesuk;Lee, Hyung Woo
    • Journal of Ceramic Processing Research
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    • v.13 no.spc1
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    • pp.154-157
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    • 2012
  • We present the simultaneous growth of single-walled carbon nanotubes and graphene with the optimal conditions of the synthesizing parameters. The dense and vertically aligned SWNTs having the length of over 100 ㎛ was grown by 2 nm-thick Fe catalytic layer. From 650 ℃, the vertically well-grown SWNTs were obtained by increasing the temperature. The severallayered graphene was synthesized with the gas mixing ratio of 15 : 1(H2 : C2H2) at 650 ℃ and higher temperatures. With these optimal conditions, the vertically well-grown SWNTs and the several-layered graphene were synthesized simultaneously. The presence of SWNTs and the layer of graphene were verified by field emission scanning electron microscopy and high resolution transmission electron microscopy. From the result of this simultaneous synthesizing approach, the possibility of one step growth process of CNTs and grapheme could be verified.

Controlled growth of Carbon Nanotubes using thermal CVD

  • Lee, Tae-Jae;Lyu, Seung-Chul;Choi, Sang-Kyu;Lee, Cheol-Jin;Lee, Jin-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.674-677
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    • 2002
  • Vertically aligned CNTs were grown on Fe-deposited $SiO_2$ substrates using thermal CVD of acetylene gas. The size of Fe particle is controlled by the flow rate of $NH_3$ and pretreatment time, which leads to control the diameter of CNTs. As the diameter of CNTs decreases, the growth rate is enhanced with an inverse dependence of the CNT diameter. The growth rate of CNTs increases linearly as the growth time increases until 30 min but is rapidly decreased over 40 min. We found an inverse relation between the diameter and growth rate of carbon nanotubes. As the diameter of CNTs increases, the compartment layers of bamboo-shaped CNTs appear more frequently. A base-growth model is suitable to explain the dependence of growth rate and structure of CNTs on the diameter size of catalytic particles.

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Selective Growth of Multi-walled Carbon Nanotubes by Thermal Chemical Vapor Deposition and Their Field Emission Characteristics

  • Jeong, Se-Jeong;Lee, Seung-Hwan;Lee, Nae-Sung;Han, In-Taek;Kim, Ha-Jin;Kim, Jong-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1096-1099
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    • 2005
  • Multi-walled carbon nanotubes (CNTs) grown on catalyst dots by thermal chemical vapor deposition were vertically aligned with a high population density. Such densely populated CNTs showed poor field emission characteristics due to the electrical screening effect. We reduced the number density of CNTs using an adhesive tape treatment. For dotpatterned CNTs, the tape treatment decreased the CNT density by three orders of magnitude, drastically improved the turn-on electric field from 4.8 to $1.8V/{\mu}m$, and changed the emission image from spotty to uniform luminescence. We also report long-term emission stability of dot-patterned CNTs by measuring the emission currents with time at different duty ratios.

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Microfabrication of Vertical Carbon Nanotube Field-Effect Transistors on an Anodized Aluminum Oxide Template Using Atomic Layer Deposition

  • Jung, Sunghwan
    • Journal of Electrical Engineering and Technology
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    • v.10 no.3
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    • pp.1169-1173
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    • 2015
  • This paper presents vertical carbon nanotube (CNT) field effect transistors (FETs). For the first time, the author successfully fabricated vertical CNT-based FETs on an anodized aluminum oxide (AAO) template by using atomic layer deposition (ALD). Single walled CNTs were vertically grown and aligned with the vertical pores of an AAO template. By using ALD, a gate oxide material (Al2O3) and a gate metal (Au) were centrally located inside each pore, allowing the vertical CNTs grown in the pores to be individually gated. Characterizations of the gated/vertical CNTs were carried and the successful gate integration with the CNTs was confirmed.

Uniform Field Emission from Carbon Nanotubes Fabricated by CO Disproportionation

  • Lee, Jin-Seung;Suh, Jung-Sang
    • Bulletin of the Korean Chemical Society
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    • v.24 no.12
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    • pp.1827-1831
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    • 2003
  • Field emission of carbon nanotubes (CNTs) fabricated by disproportionation of CO has been studied. CNTs fabricated on well-ordered Co nanowire arrays formed on the porous anodic aluminum oxide templates were well graphitized, uniform in diameter and aligned vertically with respect to the plane of the template, and showed a good field emission property. Very uniform emissions were observed from the CNTs fabricated at relatively low temperature, $500-600^{\circ}C$. Low fabrication temperature such as $500^{\circ}C$ could make it possible to fabricate CNTs on soda lime glass, a low-cost substrate, for display panel.

Fabrication of Integrated Triode-type CNT Field Emitters (집적화된 3 극형 탄소 나노 튜브 전자 방출원의 제작)

  • 이정아;문승일;이윤희;주병권
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.2
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    • pp.212-216
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    • 2004
  • In this paper, we have fabricated a triode field emitter using carbon nanotubes (CNTs) directly grown by thermal chemical vapor deposition(CVD) method as an electron omission source. Vertically aligned CNTs have been grown in the center of the gate hole, to the size of 1.5 ${\mu}{\textrm}{m}$ in diameter, with help of a sacrificial layer of a type generally used in metal tip process. By the method of tilling the substrate, we made CNTs emitters both with and without SiO$_2$layer, a sidewall protector, deposited on sidewall of gate. After that we researched the electrical characteristics about two types of emitters. In effect, a sidewall protector can enhance the electrical characteristics by suppressing the problem of short circuits between the gate and the CNTs. The leakage current of an emitter with a sidewall protector is approximately sevenfold lower than that of an emitter without it at a gate voltage of 100 V.