• Journal of the Korean Vacuum Society
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• v.19 no.5
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• pp.353-359
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• 2010

We report the surface photovoltage (SPV) properties of $In_{0.49}Ga_{0.51}P$/GaAs heterostructure grown by metal-organic chemical vapour deposition (MOCVD). The SPV measurements were studied as a function of modulation beam intensity, modulation frequency and temperature. From a line shape analysis of room temperature derivative surface photovoltage (DSPV) spectrum, the band gap energies for GaAs and $In_{0.49}Ga_{0.51}P$ transitions were 1.400 and 1.893 eV respectively. The surface photovoltage (SPV) increases with increasing the light intensity and temperature, whereas the SPV decreases with increasing the modulation frequency. From the temperature variation of the energy gaps, we have analysis by both Varshni and Bose-Einstein type expressions.

• Journal of the Korean Vacuum Society
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• v.19 no.2
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• pp.134-140
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• 2010

We have investigated the contactless electroreflectance (CER) properties of $In_{0.5}(Ga_{1-x}Al_x)_{0.5}P$/GaAs double heterostructures grown by metal-organic chemical vapour deposition (MOCVD). The CER measurements on the sample were studied as a function of temperature, modulation voltage ($V_{ac}$), and dc bias voltage ($V_{bias}$). Five signals observed at room temperature are related to the GaAs, $In_{0.5}Ga_{0.5}P$, $In_{0.5}(Ga_{0.73}Al_{0.27})_{0.5}P$, $In_{0.5}(Ga_{0.5}Al_{0.5})_{0.5}P$, and $In_{0.5}(Ga_{0.2}Al_{0.8})_{0.5}P$ transitions, respectively. From the temperature dependence of CER spectrum, the Varshni coefficients and broadening parameters were determined and discussed. In addition, we found that the behavior of the CER amplitude for the reverse bias is larger than that of the forward.

• Journal of the Korean Vacuum Society
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• v.9 no.2
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• pp.116-121
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• 2000

We measured surface photovoltage (SPV) of $Al_{0.24}Ga_{0.76}As/GaAs$ epilayer grown by molecular beam epitixy (MBE). The band gap energies of $Al_{0.24}Ga_{0.76}As/GaAs$ epilayer, GaAs substrate and buffer layer obtained from SPV signals are 1.70, 1.40 and 1.42 eV, respectively. There results are in good agreements with photoreflectance (PR) measurement. The measured SPV intensity of GaAs substrate is three times larger than $Al_{0.24}Ga_{0.76}$Asepilayer by carrier mobility difference. The parameters of Varshni equation were determined from the SPV spectra as a function of temperature.

• Journal of the Korean Vacuum Society
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• v.10 no.1
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• pp.81-86
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• 2001

We have investigated surface photovoltage characteristics of InGaAs grown by metalorganic chemical vapor deposition (MOCVD) method on semi-insulating GaAs. The splitted SPV signals from the substrate and epilayer were observed. The band gap energy of InGaAs was about 1.376 eV, The In composition(x) was determined by Pan's composition formula. The photovoltage gradually decreases with increasing frequency. This is because the transfer of charge from the surface states reduces. From the temperature dependent SPV measurement, we obtained Varshni and temperature coefficients. In spectrum of etched sample at 300 K, the 'A' peak below $E_o(GaAs)$ is related with residual impurity during sample growth.

• Journal of the Korean Vacuum Society
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• v.6 no.3
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• pp.249-254
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• 1997

We investigated characteristics of Fe-doped semi-insulating InP by means of photoreflectance(PR) measurement. The band gap energy($E_0$) and broadening parameter($\Gamma$) from PR signals at 300K are 1.336 eV and 11.2 meV, respectively. As the temperature is decreased from 300 to 80 K, PR signals are varied from an overlapped shape of exciton and 2-dimensional band gap transitions(300 K) to that of exciton transition(80 K). We calculated Varshni coefficient($\alpha=0.94\pm$0.07 meV/K, $\beta=587\pm$35.2 K) and Bose-Einstein coefficient ($a_B=33.6{\pm}2.02meV$ , $\theta=165\pm$33K). After annealing of isothermal and isochronism crystallinity of InP is found to be excellent when annealed at $300^{\circ}C$ for 10~20 min, qualitatively.

• Journal of the Korean Vacuum Society
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• v.7 no.4
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• pp.334-340
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• 1998

Photoreflectance (PR) measurents have been performed on $In_xGa_{1-x}As/GaAs$ grown by molecular beam epitaxy (MBE). Bandgap $(E_0)$ of $In_xGa_{1-x}As$ epilayer measured from PR was separated as heavy-hole $(E_0(HH))$ and light-hole $(E_0(LH))$ by strain effect. The compositions and the strains of epilayer were obtained from the energy value of $E_0(HH)$ and from energy difference of $E_0(HH)$ and $E_0(LH)$, respectively. In addition, the PR signal of $E_0(LH)$ was diminished below 160 K. The interface electric field (E) of InGaAs/GaAs was increased from $0.75{\times}10^5$ V/cm to $2.66{\times}10^5$ V/cm as In composition increased, which was calculated from Franz-Keldysh oscillation (FKO) peaks. As the temperature dependence of the PR signal at x=0.09 sample, we obtained Varshni and Bose-Einstein coefficients.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.296-296
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• 2011

동시 증발법(co-evaporation)에 의해 성장된 $CuIn_xGa_{1-x}Se_2$ (CIGS) 박막의 광학적 특성을 photoreflectance (PR) 분광법으로 연구하였다. 조성비 x는 0~1까지 변화시켰다. 시료의 두께는 약 2.2 ${\mu}m$였다. PR 측정은 변조빔 세기, 변조빔 주파수 및 온도의 함수로 조사하였다. PR 스펙트럼으로부터 조성비 x가 증가함에따라 시료의 띠간격 에너지가 증가하는 것을 관측하였다. 상온 PR 스펙트럼으로부터 시료내에 형성된 내부 전기장을 구하였다. 그리고 변조빔 세기의 증가에 따른 PR 신호의 세기는 점차 증가하는 반면에, 변조 주파수를 증가시킴에 따라 신호의 세기가 점차 감소함을 보였다. PR 신호의 온도 의존성 실험으로부터 띠간격 에너지의 변화 및 Varshni 계수 등을 구하여 CIGS 시료의 특성을 조사하였다.