• 제목/요약/키워드: Vapor growth

검색결과 1,161건 처리시간 0.032초

1차원 InN 단결정 나노선의 구조특성에 대한 고찰 (Structural Characteristic of One Dimensional Single Crystalline of InN Nanowires)

  • 변윤기;정용근;이상훈;최성철
    • 한국세라믹학회지
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    • 제44권4호
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    • pp.202-207
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    • 2007
  • High-Quality 1-Dimensional InN single crystalline have been grown by Halide Vapor-Phase Epitaxy on the Au catalyst coated Si substrate using the vapor-liquid-solid growth mechanism. We have been grown 1-dimension InN nanowires having controlled the growth conditions for substrate temperature and gases flow rate. The grown InN nanowire of characteristics for morphologies, crystal structure, and element analysis were carried out by SEM, HR-TEM, and EDS respectively. And the defects of InN crystalline were analyzed by indexing of selective area diffraction pattern with attached HR-TEM. We have successfully obtained the defect-free 1-dimensional InN single crystalline nanowire at the atmosphere pressure.

초고진공 전자 사이클로트론 공명 화학 기상증착장치의 제작과 수소 플라즈마를 이용한 실리콘 기판 표면 세정화 (Manufacturing of Ultrahigh Vacuum Electron Cyclotron Resonance Chemical Vapor Deposition Reactor and Si Wafer Surface Cleaning by Hydrogen Plasma)

  • 황석희;태흥식;황기웅
    • 전자공학회논문지A
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    • 제31A권4호
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    • pp.63-69
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    • 1994
  • The Ultrahigh Vacuum Electron Cyclotron Resonance Chemical Vapor Deposition(UHV-ECRCVD) system whose base pressure is 1${\times}10^{9}$ torr has been constructed. In-situ cleaning prior to the epitaxial growth was carried out at 56$0^{\circ}C$ by ECR generated uniform hydrogen plasma whose density is $10^{10}/cm{3}$. The natural oxide was effectively removed without damage by applying positive DC bias(+10V) to the substrate. RHEED(Reflection High Energy Electron Diffraction) analysis has been used to confirm the removal of the surgace oxide and the streaky 2$\times$1 reconstruction of the Si surface, and the suppression of the substrate damage is anaylized by X-TEM(cross-sectional Transmission Electron Microscopy). Surface cleaning technique by ECR hydrogen plasma confirmed good quality epitaxial growth at low temperature.

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Synthesis of Vertically Aligned SiNW/Carbon Core-shell Nanostructures

  • 김준희;김민수;김동환
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.488.2-488.2
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    • 2014
  • Carbon-based materials such as carbon nanotubes and graphene have emerged as promising building blocks in applications for nanoelectronics and energy devices due to electrical property, ease of processability, and relatively inert electrochemistry. In recent years, there has been considerable interest in core-shell nanomaterials, in which inorganic nanowires are surrounded by inorganic or organic layers. Especially, carbon encapsulated semiconductor nanowires have been actively investigated by researchers in lithium ion batteries. We report a method to synthesize silicon nanowire (SiNW) core/carbon shell structures by chemical vapor deposition (CVD), using methane (CH4) as a precursor at growth temperature of $1000{\sim}1100^{\circ}C$. Unlike carbon-based materials synthesized via conventional routes, this method is of advantage of metal-catalyst free growth. We characterized these materials with FE-SEM, FE-TEM, and Raman spectroscopy. This would allow us to use these materials for applications ranging from optoelectronics to energy devices such as solar cells and lithium ion batteries.

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YSZ 박막의 성장속도와 특성에 미치는 전기화학증착 조건의 영향(I) (Influences of Electrochemical Vapor Deposit Conditions Growth Rate and Characteristics of YSZ Thin Films (I))

  • 박동원;전치훈;강대갑;최병진;김대룡
    • 한국세라믹학회지
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    • 제33권1호
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    • pp.25-34
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    • 1996
  • Yttria stabilized zirconia (YSZ) thin films were prepared by the electrochemical vapor deposition (EVD) method on the porous Al2O3 substrates which were fabricated by different substrate thickness and porosity. Film growth rates decreased with increase on the substrate thickness and porosity and obeyed a parabolic rate law. Activa-tion energy calculated from the parabolic rate onstants was 69.9 kcal/mol. With increase on the deposition time, monoclinic phase was appeared and then disappeared. YSZ penetrated deeply into substrates when the EVD temperature decreased. Electrical conductivity of the films was 0.09 S/cm at 100$0^{\circ}C$ similar to the value of YSZ single crystal.

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Effect of Fe Catalyst on Growth of Carbon Nanotubes by thermal CVD

  • Yoon, Seung-Il;Heo, Sung-Taek;Kim, Sam-Soo;Lee, Yang-Kyu;Lee, Dong-Gu
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.760-763
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    • 2007
  • The properties of carbon nanotube obtained by thermal chemical vapor deposition (CVD) process were investigated as a function of ammonia $(NH_3)$ gas in hydrocarbon gas, Fe catalyst thickness, and growth temperature. Fe catalyst was prepared by DC magnetron sputter and pre-treated with ammonia gas. CNTs were then grown with ammonia-acetylene gas mixture by thermal CVD. The diameter of these CNTs shows a strong correlation with the gas rate, the catalyst film thickness and temperature. From our results, it was found that the factors of grown CNTs positively acted to improve CNT quality.

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Synthesis of Carbon Nanotubes by Using Inductively Coupled Plasma Chemical Vapor Deposition at Low Temperature

  • Kim, Young-Rae;Jang, In-Goo;Cho, Hyun-Jin;Jeon, Hong-Jun;Cho, Jung-Keun;Hwang, Ho-Soo;Kong, Byung-Yun;Lee, Nae-Sung
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.768-771
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    • 2007
  • Carbon nanotubes (CNTs) were synthesized by inductively coupled plasma CVD at $450^{\circ}C$. CNTs were grown on the 1-nm-thick Fe-Ni-Co with $C_2H_2$ and $H_2$ at different pressures and plasma powers. CNTs were grown longer in height as the $H_{\alpha}/CH$ ratios became lower by decreasing plasma powers and increasing growth pressures.

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Morphologically Controlled Growth of Aluminum Nitride Nanostructures by the Carbothermal Reduction and Nitridation Method

  • Jung, Woo-Sik
    • Bulletin of the Korean Chemical Society
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    • 제30권7호
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    • pp.1563-1566
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    • 2009
  • One-dimensional aluminum nitride (AlN) nanostructures were synthesized by calcining an Al(OH)(succinate) complex, which contained a very small amount of iron as a catalyst, under a mixed gas flow of nitrogen and CO (1 vol%). The complex decomposed into a homogeneous mixture of alumina and carbon at the molecular level, resulting in the lowering of the formation temperature of the AlN nanostructures. The morphology of the nanostructures such as nanocone, nanoneedle, nanowire, and nanobamboo was controlled by varying the reaction conditions, including the reaction atmosphere, reaction temperature, duration time, and ramping rate. Iron droplets were observed on the tips of the AlN nanostructures, strongly supporting that the nanostructures grow through the vapor-liquid-solid mechanism. The variation in the morphology of the nanostructures was well explained in terms of the relationship between the diffusion rate of AlN vapor into the iron droplets and the growth rate of the nanostructures.

Application of thermodynamics to chemical vapor deposition

  • Latifa Gueroudji;Hwang, Nong-Moon
    • 한국결정성장학회:학술대회논문집
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    • 한국결정성장학회 1998년도 PROCEEDINGS OF THE 15TH KACG TECHNICAL MEETING-PACIFIC RIM 3 SATELLITE SYMPOSIUM SESSION 4, HOTEL HYUNDAI, KYONGJU, SEPTEMBER 20-23, 1998
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    • pp.1-20
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    • 1998
  • Processing of thin films by chemical vapor deposition (CVD) is accompanied by chemical reactions, in which the rigorous kinetic analysis is difficult to achieve. In these conditions, thermodynamic calculation leads to better understanding of the CVD process and helps to optimise the experimental parameters to obtain a desired product. A CVD phase diagram has been used as guide lines for the process. By determining the effect of each process variable on the driving force for deposition, the thermodynamic limit for the substrate temperature that diamond can deposit is calculated in the C-H system by assuming that the limit is defined by the CVD diamond phase diagram. The addition of iso-supersaturation ratio lines to the CVD phase diagram in the Si-Cl-H system provides additional information about the effects of CVD process variables.

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Hot Filament Chemical Vapor Deposition of Crystalline Boron Films

  • Soto, Gerardo
    • 한국세라믹학회지
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    • 제56권3호
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    • pp.269-276
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    • 2019
  • This article reports on the conditions required for the growth of crystalline boron films on silicon substrates by hot filament chemical vapor deposition method. The reactive gas was 3% diborane diluted in hydrogen. The films were characterized by optical, electronic, and atomic force microscopies; x-ray diffraction; and energy dispersive, electron energy loss, Raman, x-ray photoelectron, and Auger spectroscopies. The parameters that affect the morphologies of the films have been investigated. It was concluded that faceted crystals are produced at low B2H6 flows and working pressures below 200 mT. α-boron is produced between 530 and 600℃. Deposition outside this range produces thin films with a wide variety of morphologies. This result indicates that the films crystallize through a process called "abnormal or discontinuous grain growth." It is assumed that this is due to the anisotropic surfaces of boron allotropes.

Preliminary Studies on Double-Diffusive Natural Convection During Physical Vapor Transport Crystal Growth of Hg2Br2 for the Spaceflight Experiments

  • Ha, Sung Ho;Kim, Geug Tae
    • Korean Chemical Engineering Research
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    • 제57권2호
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    • pp.289-300
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    • 2019
  • We have conducted a preliminary numerical analysis to understand the effects of double-diffusive convection on the molar flux at the crystal region during the growth of mercurous bromide ($Hg_2Br_2$) crystals in 1 g and microgravity (${\mu}g$) conditions. It was found that the total molar fluxes decay first-order exponentially with the aspect ratio (AR, transport length-to-width), $1{\leq}AR{\leq}10$. With increasing the aspect ratio of the horizontal enclosure from AR = 1 up to Ar = 10, the convection flow field shifts to the advective-diffusion mode and the flow structures become stable. Therefore, altering the aspect ratio of the enclosure allows one to control the effect of the double diffusive natural convection. Moreover, microgravity environments less than $10^{-2}g$ make the effect of double-diffusive natural convection much reduced so that the convection mode could be switched over the advective-diffusion mode.