• Applied Science and Convergence Technology
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• 제24권5호
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• pp.132-135
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• 2015

Schematic of RAON vacuum system is introduced. Vacuum test for superconducting cavity with liquid nitrogen is performed. Schematic plan for RAON vacuum system is introduced and vacuum control system for superconducting cavity test is constructed. Vacuum pressure of cavity is shown as a function of pumping time. The temperature of cavity is shown as a function of cooling time. Outgassing species from cavity is also detected. Detailed experimental procedure is presented to test the cavity vacuum with liquid nitrogen.

• 한국전기전자재료학회논문지
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• 제23권4호
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• pp.287-292
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• 2010

Effect of conductance factors on performance of vacuum system was simulated for optimum design of vacuum system. In this investigation, the feasibility of modeling mechanism for VacSim$^{Multi}$ simulator was proposed. Application specific design of vacuum system is required to meet the particular process conditions for various industrial implementations of vacuum equipments. Geometry and length, diameter of exhaust pipeline were modeled as simulation modeling variables for conductance effects. Series vacuum system was modeled and simulated with varied dimensions and structures of exhaust pipeline. Variation of pipeline diameter showed the more significant effects on vacuum characteristics than that of pipeline length variations. It was also observed that the aperture structure of pipeline had the superior vacuum characteristics among the modeled systems.

• International journal of advanced smart convergence
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• 제5권2호
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• pp.1-7
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• 2016

Recently, with the development of advanced thin film devices comes the need for constant high quality vacuum as the deposition pressure is more demanding. It is for this reason our research seeks to understand how the variable design factors are employed in such vacuum systems. In this study, the effects of design factor applications on the vacuum characteristics were simulated to obtain the optimum design modeling of variable models on an ultra high vacuum system. The commercial vacuum system simulator, $VacSim^{(multi)}$, was used in our investigation. The reliability of the employed simulator was verified by the simulation of the commercially available models of ultra high vacuum system. Simulated vacuum characteristics of the proposed modeling aligned with the observed experimental behavior of real systems. Simulated behaviors showed the optimum design models for the ideal conditions to achieve optimal pressure, pumping speed, and compression ratio in these systems.

• 한국전기전자재료학회논문지
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• 제24권6호
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• pp.449-457
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• 2011

Effect of pump combinations on the vacuum characteristics of vacuum system was simulated for optimum design of system. In this investigation, the feasibility of modelling mechanism for VacSimMulti simulator was proposed. Simulation results of various pumping combinations showed the possibilities and reliabilities of simulation for the performance of vacuum system in specific semiconductor processing. Simulation of roughing pump presented the expected pumping behaviors based on commercial specifications of employed pumps. Application of booster pump exhibited the high pumping efficiency for middle vacuum range. Combinations of optimum backing pump for diffusion and turbo vacuum system were obtained. And, the predictable characteristics of process application of both simulated systems were also acquired.

• 한국초전도ㆍ저온공학회논문지
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• 제24권4호
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• pp.65-70
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• 2022

A vacuum system is designed for thermal insulation of a 10 ton/day class air liquefaction cold box for liquid air energy storage. The vacuum system is composed of a turbomolecular pump, a backing pump and vacuum piping for the vacuum pumps. The turbomolecular pump is in combination with the backing pump for pumping capacity. The vacuum piping is designed with system installation conditions, such as distance from the cold box, connections to vacuum pumps and installation space. The capacity of the vacuum pump combination, namely pumping speed, is determined by analysis of the vacuum system, and pump-down time to 1×10^-5 mbar is estimated. Vacuum piping conductance, system pumping speed and outgassing rate are calculated for the pump-down time with the ultimate pumping speed range of the vacuum pump combination of 1400 - 2300 l/s. Although the pump-down time gets shorter by larger capacity vacuum pumps, it mainly depends on target vacuum degree and outgassing rate in the cold box. The pump-down time is estimated as 3 - 6 hours appropriate for cold box operation for the pumping speed range. Considering the outgassing rate has uncertainty, the vacuum pump combination with pumping speed of 1900 l/s is chosen for the vacuum system, which is middle value of the pumping speed range.

• International journal of advanced smart convergence
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• 제10권1호
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• pp.159-165
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• 2021

Electronic devices used in the mobile environments fabricated under the plasma conditions in high vacuum system. Especially for the development of advanced electronic devices, high quality plasma as the process conditions are required. For this purpose, the variable conductance throttle valves for controllable plasma employed to the high vacuum system. In this study, we analyzed the effects of throttle valve applications on vacuum characteristics simulated to obtain the optimum design modelling for plasma conditions of high vacuum system. We used commercial simulator of vacuum system, VacSim(multi) on this study. Reliability of simulator verified by simulation of the commercially available models of high vacuum system. Simulated vacuum characteristics of the proposed modelling agreed with the observed experimental behaviour of real systems. Pressure limit valve and normally on-off control valve schematized as the modelling of throttle valve for the constant process-pressure of below 10-3 torr. Simulation results plotted as pump down curve of chamber, variable valve conductance and conductance logic of throttle valve. Simulated behaviors showed the applications of throttle valve sustained the process-pressure constantly, stably, and reliably in plasma process.

• Transactions on Electrical and Electronic Materials
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• 제14권6호
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• pp.334-338
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• 2013

In this study, the outgassing effects of selected vacuum materials on the vacuum characteristics were simulated by the $VacSim^{Multi}$ simulation tool. This investigation examined the feasibility of reliably simulating the outgassing characteristics of common vacuum chamber materials (aluminum, copper, stainless steel, nickel plated steel, Viton A). The optimum design factors for these vacuum systems were suggested based on the simulation results. The baking-out effects of the modeled systems and materials on the performance of the vacuum system were also analyzed. The simulation predicted that the overall outgassing effect was more significant in the turbomolecular pump system than in the diffusion pump system and that the utilization of a booster pump has a greater effect on the evacuation time than on the ultimate pressure.

• International Journal of Internet, Broadcasting and Communication
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• 제7권2호
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• pp.28-35
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• 2015

Thin film electronic devices which brought the current mobile environment could be fabricated only under the high quality vacuum conditions provided by high vacuum systems. Especially for the development of advanced thin film devices, constant high quality vacuum as the deposition pressure is definitely needed. For this purpose, the variable conductance throttle valves were employed to the high vacuum system. In this study, the effects of throttle valve applications on vacuum characteristics were simulated to obtain the optimum design modelling of variable conductance of high vacuum system. Commercial simulator of vacuum system, $VacSim^{(multi)}$, was used on this investigation. Reliability of employed simulator was verified by the simulation of the commercially available models of high vacuum system. Simulated vacuum characteristics of the proposed modelling were agreed with the observed experimental behaviour of real systems. Pressure limit valve and normally on-off control valve were schematized as the modelling of throttle valve for the constant process-pressure of below $10^{-3}torr$. Simulation results were plotted as pump down curve of chamber, variable valve conductance and conductance logic of throttle valve. Simulated behaviors showed the applications of throttle valve sustained the process-pressure constantly, stably, and reliably.

• Journal of Advanced Marine Engineering and Technology
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• 제21권1호
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• pp.26-36
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• 1997

Recently, the new refrigerating system, using non - fluorinated hydrocarbon refrigerants has to be developed for the agricultural fields. One of that kinds of systems is the cooling system using the water vapor and vacuum, in which the water evaporate at the low temperature under vacuum and absorb the large amount of the latent heat. If vapor with large amount of latent heat is removed from the system, the system is cooled accordingly. The characteristics of cooling under the vacuum was observed and measured using experimental apparatus, which is consisted of vacuum chamber, the ejectors, the pumps and the measurement apparatus. As the results of experiments, we know that the evaporation in the vacuum occurs vigorously when the materials to be cooled has more amounts of heat before cooling, and by which effects the materials can be cooled. The cooling vacuum system is more efficient than other methods when the agricultural products is chilled or dried.

• Applied Science and Convergence Technology
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• 제23권3호
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• pp.103-112
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• 2014

The Korea Research Institute of Standards and Science (KRISS) has three major vacuum systems: an ultrasonic interferometer manometer (UIM; Section II, Figs. 1 and 2) for a low vacuum, a static expansion system (SES; Section III, Figs. 3 and 4) for a medium vacuum, and an orifice-type dynamic expansion system (DES, Section IV, Figs. 5 and 6) for high and ultra-high vacuum systems. For each system, explicit measurement model equations with multiple variables are given. According to ISO standards, all of these system variable errors were used to calculate the expanded uncertainty (U). For each system, the expanded uncertainties (k = 1, confidence level = 95%) and relative expanded uncertainty (expanded uncertainty/generated pressure) levels are summarized in Table 4. Within the uncertainty limits, our bilateral and key comparisons [CCM.P-K4 (10 Pa to 1 kPa)] are extensive and in good agreement with those of other nations (Fig. 8 and Table 5).