• Title/Summary/Keyword: Vacuum Assisted Process

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A Study on the Etching Effect and the Capacitance of Aluminum Oxide Thin Film by Oxygen Ion Beam (산소 이온 빔에 의한 산화 알루미늄 박막의 식각 효과 및 정전 용량 특성에 관한 연구)

  • Cho, E.S.;Kwon, S.J.
    • Journal of the Korean Vacuum Society
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    • v.22 no.1
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    • pp.26-30
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    • 2013
  • For the realization of high-k insulator, aluminum oxide ($Al_2O_3$) was deposited by using an oxygen ion beam assisted deposition (IBAD) during e-beam evaporation. From the thickness of the $Al_2O_3$ layer evaporated with IBAD process, it was possible to investigate the etching effect of ion beam at higher energies during e-beam evaporation. It was also possible to obtain a higher capacitance as a result of IBAD in spite of the reduced thickness of $Al_2O_3$.

Influence of Neutral Particle Beam Energy on the Structural Properties of Amorphous Carbon Films Prepared by Neutral Particle Beam Assisted Sputtering

  • Lee, Dong-Hyeok;Jang, Jin-Nyeong;Gwon, Gwang-Ho;Yu, Seok-Jae;Lee, Bong-Ju;Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.194-194
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    • 2011
  • The effects of argon neutral beam (NB) energy on the amorphous carbon (a-C) films were investigated, while the a-C films were deposited by neutral particle beam assisted sputtering (NBAS) system. The energy of neutral particle beam can be controlled by reflector bias voltage directly as a unique operating parameter in this system. The deposition characteristics of the films investigated of Raman spectra, UV-visible spectroscopy, electrical conductivity, stress measurement system, and ellipsometer indicate the properties of amorphous carbon films can be manipulated by only NB energy (or reflector bias voltage) without changing any other process parameters. We report the effect of reflector bias voltage in the range from 0 to -1KV. By the increase of the reflector bias voltage, the amount of cross-linked sp2 clusters as well as the sp3 bonding in the a-C film coated by the NBAS system can be increased effectively and the composition of carbon thin films can be changed from nano-crystalline graphite phase to amorphous carbon phase.

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Highly Stretchable and Sensitive Strain Sensors Fabricated by Coating Nylon Textile with Single Walled Carbon Nanotubes

  • Park, Da-Seul;kim, Yoonyoung;Jeong, Soo-Hwan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.363.2-363.2
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    • 2016
  • Stretchable strain sensors are becoming essential in diverse future applications, such as human motion detection, soft robotics, and various biomedical devices. One of the well-known approaches for fabricating stretchable strain sensors is to embed conductive nanomaterials such as metal nanowires/nanoparticles, graphene, conducting polymer and carbon nanotubes (CNTs) within an elastomeric substrate. Among various conducting nanomaterials, CNTs have been considered as important and promising candidate materials for stretchable strain sensors owing to their high electrical conductivity and excellent mechanical properties. In the past decades, CNT-based strain sensors with high stretchability or sensitivity have been developed. However, CNT-based strain sensors which show both high stretchability and sensitivity have not been reported. Herein, highly stretchable and sensitive strain sensors were fabricated by integrating single-walled carbon nanotubes (SWNTs) and nylon textiles via vacuum-assisted spray-layer-by-layer process. Our strain sensors had high sensitivity with 100 % tensile strain (gauge factor ~ 100). Cyclic tests confirmed that our strain sensors showed very robust and reliable characteristic. Moreover, our SWNTs-based strain sensors were easily and successfully integrated on human finger and knee to detect bending and walking motion. Our approach presented here might be route to preparing highly stretchable and sensitive strain sensors with providing new opportunity to realize practical wearable devices.

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Fabrication of plastic CE (capillary electrophoresis) microchip by hot embossing process (핫 엠보싱 공정을 이용한 플라스틱 CE(capillary electrophoresis) 마이크로 칩의 제작)

  • Cha Nam-Goo;Park Chang-Hwa;Lim Hyun-Woo;Park Jin-Goo
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.1140-1144
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    • 2005
  • A plastic-based CE (capillary electrophoresis) microchip was fabricated by hot embossing process. A Si mold was made by wet etching process and a PMMA wafer was cut off from 1mm thick PMMA sheet. A micro-channel structure on PMMA substrate was produced by hot embossing process using the Si mold and the PMMA wafer. A vacuum assisted thermal bonding procedure was employed to seal an imprinted PMMA wafer and a blank PMMA wafer. The results of microscopic cross sectional images showed dimensions of channels were well preserved during thermal bonding process. In our procedure, the deformation amount of bonding process was below 1%. The entire fabrication process may be very useful for plastic based microchip systems.

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Development of a Photoemission-assisted Plasma-enhanced CVD Process and Its Application to Synthesis of Carbon Thin Films: Diamond, Graphite, Graphene and Diamond-like Carbon

  • Takakuwa, Yuji
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.105-105
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    • 2012
  • We have developed a photoemission-assisted plasma-enhanced chemical vapor deposition (PAPE-CVD) [1,2], in which photoelectrons emitting from the substrate surface irradiated with UV light ($h{\nu}$=7.2 eV) from a Xe excimer lamp are utilized as a trigger for generating DC discharge plasma as depicted in Fig. 1. As a result, photoemission-assisted plasma can appear just above the substrate surface with a limited interval between the substrate and the electrode (~10 mm), enabling us to suppress effectively the unintended deposition of soot on the chamber walls, to increase the deposition rate, and to decrease drastically the electric power consumption. In case of the deposition of DLC gate insulator films for the top-gate graphene channel FET, plasma discharge power is reduced down to as low as 0.01W, giving rise to decrease significantly the plasma-induced damage on the graphene channel [3]. In addition, DLC thickness can be precisely controlled in an atomic scale and dielectric constant is also changed from low ${\kappa}$ for the passivation layer to high ${\kappa}$ for the gate insulator. On the other hand, negative electron affinity (NEA) of a hydrogen-terminated diamond surface is attractive and of practical importance for PAPECVD, because the diamond surface under PAPE-CVD with H2-diluted (about 1%) CH4 gas is exposed to a lot of hydrogen radicals and therefore can perform as a high-efficiency electron emitter due to NEA. In fact, we observed a large change of discharge current between with and without hydrogen termination. It is noted that photoelectrons are emitted from the SiO2 (350 nm)/Si interface with 7.2-eV UV light, making it possible to grow few-layer graphene on the thick SiO2 surface with no transition layer of amorphous carbon by means of PAPE-CVD without any metal catalyst.

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Rear Surface Passivation with Al2O3 Layer by Reactive Magnetron Sputtering for High-Efficiency Silicon Solar Cell

  • Moon, Sun-Woo;Kim, Eun-Kyeom;Park, Won-Woong;Jeon, Jun-Hong;Choi, Jin-Young;Kim, Dong-Hwan;Han, Seung-Hee
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.211-211
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    • 2012
  • The electrical loss of the photo-generated carriers is dominated by the recombination at the metal- semiconductor interface. In order to enhance the performance of the solar cells, many studies have been performed on the surface treatment with passivation layer like SiN, SiO2, Al2O3, and a-Si:H. In this work, Al2O3 thin films were investigated to reduce recombination at surface. The Al2O3 thin films have two advantages, such as good passivation properties and back surface field (BSF) effect at rear surface. It is usually deposited by atomic layer deposition (ALD) technique. However, ALD process is a very expensive process and it has rather low deposition rate. In this study, the ICP-assisted reactive magnetron sputtering method was used to deposit Al2O3 thin films. For optimization of the properties of the Al2O3 thin film, various fabrication conditions were controlled, such as ICP RF power, substrate bias voltage and deposition temperature, and argon to oxygen ratio. Chemical states and atomic concentration ratio were analyzed by x-ray photoelectron spectroscopy (XPS). In order to investigate the electrical properties, Al/(Al2O3 or SiO2,/Al2O3)/Si (MIS) devices were fabricated and characterized using the C-V measurement technique (HP 4284A). The detailed characteristics of the Al2O3 passivation thin films manufactured by ICP-assisted reactive magnetron sputtering technique will be shown and discussed.

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Design and Manufacturing of Natural Composite Chemical Container Tank Using Resin Flow Simulation

  • Kim, Myungsub;Park, Hyunbum
    • International Journal of Aerospace System Engineering
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    • v.4 no.1
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    • pp.9-12
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    • 2017
  • In this study, an investigation on mechanical properties of flax natural fiber composite is performed as a precedent study on the design of eco-friendly structure using flax natural fiber composite. The Vacuum Assisted Resin Transfer Molding-Light (VARTML) manufacturing method is adopted for manufacturing the flax fiber composite panel. The VARTML is a manufacturing process that the resin is injected into the dry layered-up fibers enclosed by a rigid mold tool under vacuum. In this work, the resin flow analysis of VARTM manufacturing method is performed. A series of flax composite panels are manufactured, and several kinds of specimens cut out from the panels are tested to obtain mechanical performance data. Based on this, structural design of chemical storage tank for agricultural vehicle was performed using flax/vinyl ester. After structural design and analysis, the resin flow analysis of VARTM manufacturing method was performed.

Effect On Glass Texturing For Enhancement of Light Trapping in Perovskite Solar Cells

  • Kim, Dong In;Nam, Sang-Hun;Hwang, Ki-Hwan;Lee, Yong-Min;Boo, Jin-Hyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.387.2-387.2
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    • 2016
  • Glass texturing is a sufficient method for changing the surface morphology to enhance the light trapping. In this study, glass texturing was applied to the perovskite solar cell for improving the current density. Glass substrates (back-side glass of FTO coated glass substrate) were textured by randomly structure assisted wet etching process using diluted HF solution at a constant concentration of etchants (HF:H2O=1:1). Then, the light trapping properties of suitable films were controlled over a wide range by varying the etching time (1, 2, 3, 4 and 5 min.). The surface texturing changed the reflected light in an angle that it can be reflected by substrate glass surface. As a result, Current density and cell efficiency were affected by light trapping layer using glass texturing method in perovskite solar cells.

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Soft Lithographic Approach to Fabricate Sub-50 nm Nanowire Field-effect Transistors

  • Lee, Jeong-Eun;Lee, Hyeon-Ju;Go, U-Ri;Lee, Seong-Gyu;Qi, Ai;Lee, Min-Hyeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.410.1-410.1
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    • 2014
  • A soft-lithographic top-down approach is combined with an epitaxial layer transfer process to fabricate high quality III-V compound semiconductor nanowires (NWs) and integrate them on Si/SiO2 substrates, using MBE-grown ultrathin InAs as a source wafer. The channel width of the InAs nanowires is controlled by using solvent-assisted nanoscale embossing (SANE), descumming, and etching processes. By optimizing these processes, the NW width is scaled to less than 50 nm, and the InAs NWFETs has ${\sim}1,600cm^2/Vs$ peak electron mobility, which indicates no mobility degradation due to the size.

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Mechanical Properties of Carbon Fiber Nano Composites for Nano-fiber Additives and Fabric Orientation (나노섬유 분산과 섬유 배향성에 따른 탄소섬유 나노 복합재료의 기계적 특성)

  • Song, Jun Hee;Choi, Jun Yong;Kim, Yonjig
    • Korean Journal of Metals and Materials
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    • v.50 no.2
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    • pp.93-99
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    • 2012
  • The mechanical properties of nano composites were evaluated for structural performance in order to enhance their applicability to the car and machine industrial fields. Carbon fiber reinforced plastics (CFRP) and GFRP were manufactured by vacuum-assisted resin transfer molding (VARTM) process with good mechanical properties. Tensile test was conducted to obtain the process factor of each composite. Also, carbon nano fiber (CNF) was dispersed in the composites and the relationship between the mechanical property and the CNF fraction was compared. The tensile strength and stiffness of 0/90 laminated CFRP were the best. CFRP/CNF (0.5 wt.%) was confirmed to be an excellent material for its elasticity and tensile strength.