• Title/Summary/Keyword: VI Probe

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Gas Flow Rate Dependency of Etching Result: Use of VI Probe for Process Monitoring (가스 유량 변화에 따른 식각 공정 결과: VI Probe 활용 가능성 제안)

  • Song, Wan Soo;Hong, Sang Jeen
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.3
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    • pp.27-31
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    • 2021
  • VI probe, which is one of various in-situ plasma monitoring sensor, is frequently used for in-situ process monitoring in mass production environment. In this paper, we correlated the plasma etch results with VI probe data with the small amount of gas flow rate changes to propose usefulness of the VI probe in real-time process monitoring. Several different sized contact holes were employed for the etch experiment, and the etched profiles were measured by scanning electron microscope (SEM). Although the shape of etched hole did not show satisfactory relationship with VI probe data, the chamber status changed along the incremental/decremental modification of the amount of gas flow was successfully observed in terms of impedance monitoring.

Fault Detection with OES and Impedance at Capacitive Coupled Plasmas

  • Choe, Sang-Hyeok;Jang, Hae-Gyu;Chae, Hui-Yeop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.499-499
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    • 2012
  • This study was evaluated on etcher of capacitive coupled plasmas with OES (Optical Emission Spectroscopy) and impedance by VI probe that are widely used for process control and monitoring at semiconductor industry. The experiment was operated at conventional Ar and C4F8 plasma with variable change such as pressure and addition of gas (Atmospheric Leak: N2 and O2), RF, pressure, that are highly possible to impact wafer yield during wafer process, in order to observe OES and VI Probe signals. The sensitivity change on OES and Impedance by Vi probe was analyzed by statistical method to determine healthy of process. The main goal of this study is to understand unwanted tool performance to eventually improve productive capability. It is important for process engineers to actively adjust tool parameter before any serious problem occurs.

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Understanding of RF Impedance Matching System Using VI-Probe

  • Lee, Ji Ha;Park, Hyun Keun;Lee, Jungsoo;Hong, Snag Jeen
    • Journal of the Semiconductor & Display Technology
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    • v.19 no.3
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    • pp.43-48
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    • 2020
  • The demand for stable plasma has been on the rise because of the increased delivery power amount in the chamber for improving productivity, and fast and accurate plasma impedance matching become a crucial performance measure for radio frequency (RF) power system in semiconductor manufacturing equipment. In this paper, the overall impedance matching was understood, and voltage and current values were extracted with voltage - current (VI) probe to measure plasma impedance in real-time. Actual matching data were analyzed to derive calibration coefficient for V and I measurements to understand the characteristics of VI probe, and we demonstrated the tendency of RF impedance matching according to changes in load impedance. This preliminary empirical research can contribute to fast RF matching as well as advanced equipment control for the next level of detailed investigation on embedded system based-RF matching controller.

Fault Detection of Plasma Etching Processes with OES and Impedance at CCP Etcher

  • Choi, Sang-Hyuk;Jang, Hae-Gyu;Chae, Hee-Yeop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.257-257
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    • 2012
  • Fault detection was carried out in a etcher of capacitive coupled plasma with OES (Optical Emission Spectroscopy) and impedance by VI probe that are widely used for process control and monitoring at semiconductor industry. The experiment was operated at conventional Ar and Fluorocarbon plasma with variable change such as pressure and addition of N2 and O2 to assume atmospheric leak, RF power and pressure that are highly possible to impact wafer yield during wafer process, in order to observe OES and VI Probe signals. The sensitivity change on OES and Impedance by VI probe was analyzed by statistical method including PCA to determine healthy of process. The main goal of this study is to find feasibility and limitation of OES and Impedances for fault detection by shift of plasma characteristics and to enhance capability of fault detection using PCA.

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Drug-Biomacromolecule Interaction (VI) Binding of Nalidixic Acid and Probenecid to Bovine Serum Albumin (약물과 생체고분자간의 상호작용(VI) Nalidixic Acid 및 Probenecid와 우혈청 단백간의 결합에 관한 연구)

  • 김종국;임연수;양지선
    • YAKHAK HOEJI
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    • v.27 no.4
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    • pp.257-261
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    • 1983
  • Binding of nalidixic acid which is used primarily in the treatment of urinary infection and probenecid which is used as a uricosuric agent to bovine serum albumin were studied using difference spectrophotomeric method. 2-(4'-Hydroxybenzeneazo) bcnzoic acid as a spectrophotometric probe was used for measuring the binding of nalidixic acid and probenecid to bovine serum albumin. The association constants of nalidixic acid and probenecid were $1.58{\times}10^{4}M^{-1}$ and $1.70{\times}10^{4}M^{-1}$, respectively.

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Non-Invasive Plasma Monitoring Tools and Multivariate Analysis Techniques for Sensitivity Improvement

  • Jang, Haegyu;Lee, Hak-Seung;Lee, Honyoung;Chae, Heeyeop
    • Applied Science and Convergence Technology
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    • v.23 no.6
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    • pp.328-339
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    • 2014
  • In this article, plasma monitoring tools and mulivariate analysis techniques were reviewed. Optical emission spectroscopy was reviewed for a chemical composition analysis tool and RF V-I probe for a physical analysis tool for plasma monitoring. Multivariate analysis techniques are discussed to the sensitivity improvement. Principal component analysis (PCA) is one of the widely adopted multivariate analysis techniques and its application to end-point detection of plasma etching process is discussed.

End Plate Effect of Helicon Plasma with Permanent Magnet

  • An, Sang-Hyeok;Lee, Jin-Won;Kim, Yong-Hun;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.223-223
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    • 2011
  • 헬리콘 플라즈마는 자기장을 이용하여 높은 전자밀도를 가지게 하는 플라즈마 소스이다. 이러한 장점에도 불구하고, 전자석의 크기 때문에 설치가 어렵고, 전자석을 작동시키기 위해 추가 파워에 대한 비용이 필요하며, 플라즈마의 균일도가 좋지 않아 공정에서는 많이 사용되지 못하였다. 이러한 난점은 UCLA의 Chen이 영구자석을 이용한 새로운 개념의 소스를 개발함으로써 풀릴 수 있다. 이 소스는 헬리콘 플라즈마의 높은 저항을 이용하여 여러 개의 헬리콘 소스를 병렬로 연결이 가능하게끔 한다. 본 연구에서는 우선 Helic Code를 이용하여 floating metal end plate의 위치에 따른 플라즈마의 loading resistance를 계산한 후, 플라즈마의 internal 및 external parameter를 각각 single Langmuir probe와 VI-probe를 이용하여 측정하여 비교해 보았다. 헬리콘 플라즈마의 파장에 따른 보강간섭 조건을 맞췄을 경우, 헬리콘 모드로 전환이 낮은 파워에서 이루워지는 것을 external parameter를 통해 확인해 보았다.

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Plasma Monitoring by Multivariate Analysis Techniques (다변량 분석기법을 통한 플라즈마 공정 모니터링 기술)

  • Jang, Haegyu;Koh, Kyongbeom;Lee, Honyoung;Chae, Heeyeop
    • Vacuum Magazine
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    • v.2 no.4
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    • pp.27-32
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    • 2015
  • Plasma diagnosis and multivariate analysis techniques for plasma processes are reviewed. The principles and applications of optical emission spectroscopy (OES) and VI probe are discussed briefly. The research results of principal component analysis (PCA), one of the widely used multivariate analysis techniques for plasma process monitoring is discussed in this article.

Green Synthesis of Multifunctional Carbon Nanodots and Their Applications as a Smart Nanothermometer and Cr(VI) Ions Sensor

  • Li, Lu;Shao, Congying;Wu, Qian;Wang, Yunjian;Liu, Mingzhu
    • Nano
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    • v.13 no.12
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    • pp.1850147.1-1850147.14
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    • 2018
  • In this work, water-soluble and blue-emitting carbon nanodots (CDs) were synthesized from apple peels for the first time via one-step hydrothermal method. The synthetic route is facile, green, economical and viable. The as-prepared CDs were characterized thoroughly by transmission electron microscopy (TEM), X-ray diffraction (XRD), Raman, Fourier transform infrared (FT-IR), X-ray photoelectron (XPS), fluorescence and UV-Vis absorption spectroscopy in terms of their morphology, surface functional groups and optical properties. The results show that these CDs possessed ultrasmall size, good dispersivity, and high tolerance to pH, ionic strength and continuous UV irradiation. Significantly, the CDs had fast and reversible response towards temperature, and the accurate linear relationship between fluorescence intensity and temperature was used to design a novel nanothermometer in a broad temperature range from 5 to $65^{\circ}C$ facilely. In addition, the fluorescence intensity of CDs was observed to be quenched immediately by Cr(VI) ions based on the inner filter effect. A low-cost Cr(VI) ions sensor was proposed employing CDs as fluorescent probe, and it displayed a wide linear range from 0.5 to $200{\mu}M$ with a detection limit of $0.73{\mu}M$. The practicability of the developed Cr(VI) sensor for real water sample assay was also validated with satisfactory recoveries.

Atomic Raman Spectroscopy of Wind Accretion in Symbiotic Stars

  • Heo, Jeong-Eun;Lee, Hee-Won;Angeloni, Rodolfo
    • The Bulletin of The Korean Astronomical Society
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    • v.44 no.1
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    • pp.46.3-46.3
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    • 2019
  • We present our observational and theoretical investigation of Raman-scattered features in symbiotic stars (SySts). SySts are long interacting binaries, consisting of a hot compact star and an evolved giant, whose interaction via accretion process is at the origin of a tangled network of gas and dust nebulae. These systems are ideal objects to study a variety of important astrophysical problems, and have also been proposed as possible progenitors of type Ia supernova. In this talk, we emphasize that Raman-scattered features are exclusive spectroscopic tools to probe the stellar wind accretion processes in SySts. We studied mass transfer and mass loss processes in SySts using high resolution spectra obtained with 1.8m telescope at Mt. Bohyun and the 6.5m Magellan-Clay telescope combining with the theoretical modeling of radiative transfer of Raman-scattered features. We also note that there are a much smaller number of SySts known in our Galaxy, implying the necessity of systematic search programs. In view of the fact that Raman O VI features at $6830{\AA}$ are found in only bona fide SySts, we will carry out a photometric search of objects with Raman O VI features using a narrow band filter centered at $6830{\AA}$ in Local group galaxies.

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