• Journal of Electrical Engineering and Technology
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• v.12 no.4
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• pp.1605-1610
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• 2017

The electrochemical luminescence (ECL) device was investigated, which has similar structure to the dye-sensitized solar cell. The structure of the ECL cell in this experiment reliably induces a large amount of the oxidation around electrodes. The band gap of the ECL electrode is of 3.0 - 3.2 eV. Titanium dioxide ($TiO_2$) nanoparticle has following properties: a band gap of 3.4 eV, a low-priced material, and 002 preferred orientation (Z-axis). Zinc Oxide (ZnO) nanorod is easy to grow in a vertical direction. In this paper, in order to determine material suitable for the ECL device, the properties of various materials for electrodes of ECL devices such as ZnO nanorod (ZnO-NR) and $TiO_2$ nanoparticle ($TiO_2-NP$) were compared. The threshold voltage of the light emission of the ZnO-NR was 2.0 V which is lower than 2.5 V of $TiO_2-NP$. In the other hand, the luminance of $TiO_2-NP$ was $44.66cd/m^2$ and was higher than that of $34cd/m^2$ of ZnO-NR at the same applied voltage of 4 V. Based on the experimental results, we could conclude that $TiO_2-NP$ is a more suitable electrode material in ECL device than the ZnO-NR.

• Applied Chemistry for Engineering
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• v.23 no.5
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• pp.485-489
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• 2012

We investigated vanadium (V) loading effects on selective catalytic reduction (SCR) activity and $SO_2$ resistance using commercial SCR catalysts applied on a power plant and incinerator with different amounts of V loading. These catalysts were characterized using XRD, Raman, ICP, BET analysis and found to contain $TiO_2$ (anatase) supported $V_2O_5$ added $WO_3$ and $SiO_2$. The SCR activity of the catalysts increased by increasing either the $V_2O_5$ or the $WO_3$ loading amounts; the SCR activity of the catalysts added $WO_3$ is higher than that of $WO_3$-free catalysts. As the V loading amount in the catalyst increased, the $SO_2$ durability decreased. The $V_2O_5$ supported $TiO_2$ catalyst added $WO_3$ and $SiO_2$ inhibits the deactivation process by $SO_2$. The $SO_2$ resistance of catalysts added $SiO_2$ is higher than that of catalysts added $WO_3$.

• Clean Technology
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• v.17 no.4
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• pp.370-378
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• 2011

Catalytic activity of $V_2O_5-WO_3/TiO_2$-based SCR catalyst was examined for the oxidation of gas-phase elemental mercury to oxidized mercury. Mercury species was not detected on the commercial SCR catalyst after the oxidation reaction of elemental mercury, regadless of the presence of HCl acting as oxidant and the reaction conditions. This suggests that elemental mercury oxidation by HCl could occur via a Eley-Rideal mechanism with gas phase or weakly-bound mercury on the surface of $V_2O_5-WO_3/TiO_2$ SCR catalyst. The activity for mercury oxidation was significantly increased with the increase of $V_2O_5$ loading, which indicates that $V_2O_5$ is the active site. However, turnover frequency for mercury oxidation was decreased with the increase of $V_2O_5$ loading, indicating the activity for mercury oxidation was strongly dependent on the surface structure of vanadia species. The activity for oxidation of elemental mercury under SCR condition was much less than that under oxidation condition at the same HCl concentration and reaction temperature.

• Electrical & Electronic Materials
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• v.5 no.4
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• pp.421-429
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• 1992

본 연구에서는 (Sr.Pb)TiO$_{3}$계 세라믹을 고압용 세라믹 캐패시터로 응용하기 위하여 일반적인 세라믹 소성법으로 제작하였으며 Bi$_{2}$O$_{3}$. 3TiO$_{2}$의 첨가량에 따른 전기전도 및 DC 절연파괴 특성을 조사하였다. 전도전류는 측정온도의 상승과 Bi$_{2}$O$_{3}$.3TiO$_{2}$의 첨가량이 증가함에 따라 상승하였다. 실온에서 전도전류는 전계에 따라 3영역으로 나누어졌다. 전계 15[kV/cm]이하의 영역에서는 오음의 법칙이 성립하는 이온전도가 나타났으며 전계 15[kV/cm]~40[kV/cm]인 영역에서는 전계에 강요된 강유전성 분극의 반전게에 기인하여 전류의 포화현상이 나타났다. 전계 40[kV/cm] 이상의 영역에서는 공간전하제한전류에 관련된 차일드법칙이 성립하였다. DC 절연파괴 강도는 측정온도의 상승과 Bi$_{2}$O$_{3}$.3TiO$_{2}$의 첨가량이 증가함에 따라 감소하였다. 온도 100[.deg.C] 이하에서는 전자적파괴가 일어났으며 100[.deg.C] 이상에서는 주울열과 유전손실에 의한 열적파괴가 나타났다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.11a
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• pp.480-483
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• 2001

Epitaxial rutile-TiO$_2$ and anatase-TiO$_2$ films were grown at 80$0^{\circ}C$ on $Al_2$O$_3$ (1102) and LaAlO$_3$ (001), respectively, using pulsed laser deposition. The formation of different phases on different substrates could be qualitatively explained by the atomic arrangements at the interfaces. We also successfully deposited epitaxial rutile-TiO$_2$ and anatase-TiO$_2$ films on conductive RuO$_2$ and La$_{0.5}$Sr$_{0.5}$CoO$_3$ electrodes, respectively Using a Kelvin probe, we measured the photovoltaic properties of these multilayer structures. A rutile-TiO$_2$ film grown on RuO$_2$ showed a very broad peak in the visible light region. An epitaxial anatase-TiO$_2$ film grown on La$_{0.5}$Sr$_{0.5}$CoO$_3$ showed a strong peak with a threshold energy of 3.05 eV 3.05 eV

• Journal of IKEEE
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• v.22 no.4
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• pp.965-969
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• 2018

In the dye-sensitized solar cell, the semiconductor oxide plays an important role in the generation and transport of electrons, and thus extensive research on this has been continuously carried out. In this study, the characteristics of dye-sensitized solar cell are studied by fabricating semiconductor oxide doped with $V_2O_5$. The $TiO_2$ paste with $V_2O_5$ is prepared by the screen printing method of the sol - gel process and the surface and electrical properties are measured. The addition of $V_2O_5$ increased grain size and improved the open circuit voltage, short circuit current, charge factor and conversion efficiency of the dye sensitized solar cell.

• Journal of Welding and Joining
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• v.27 no.2
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• pp.38-43
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• 2009

In this study, we investigated photocatalytic ability of plasma sprayed $TiO_2$ and Ag sputtering $TiO_2$(Ag-$TiO_2$) coatings. A sputtering processes were adopted to coat the surface of $TiO_2$ with Ag(99.99%). Ag was sputtered at 10mA, 450V for $1{\sim}11$ seconds. $TiO_2$ and Ag-$TiO_2$ coatings were heat-treated at 250, 300, 350, $400^{\circ}C$ for $0{\sim}240$seconds. Photoelectrical conductivity was measured by four-point probe, and photodegradation was calculated by UV-V is spectrometer. Microstructure observation of $TiO_2$ and Ag-$TiO_2$ coatings were investigated by SEM. Crystal structure of $TiO_2$ and Ag-$TiO_2$ coatings were investigated by XRD. Qualitative analyses of $TiO_2$ and Ag-$TiO_2$ coatings were conducted by EDX. When $TiO_2$ coatings were heat-treated at $350^{\circ}C$ for 30 sec, photoelectrical conductivity and photodegradation were best. And in XRD analysis result, (101)/(110) relative intensity ratio of $TiO_2$(rutile) was comparably changed with photoelectrical conductivity. When Ag-$TiO_2$ coatings were heat-treated at $350^{\circ}C$ for 30 [sec] after sputtering Ag for 7 sec, Photoelectrical conductivity and photodegradation are best. Surface of coatings in such condition has very small and uniform Ag particles.

• Korean Journal of Materials Research
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• v.18 no.10
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• pp.515-520
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• 2008

We fabricated 10 nm-$TiO_2$ thin films for DSSC (dye sensitized solar cell) electrode application using ALD (atomic layer deposition) method at the low temperatures of $150^{\circ}\;and\;250^{\circ}$. We characterized the crosssectional microstructure, phase, chemical binding energy, and absorption of the $TiO_2$ using TEM, HRXRD, XPS, and UV-VIS-NIR, respectively. TEM analysis showed a 10 nm-thick flat and uniform $TiO_2$ thin film regardless of the deposition temperatures. Through XPS analysis, it was found that the stoichiometric $TiO_2$ phase was formed and confirmed by measuring main characteristic peaks of Ti $2p^1$, Ti $2p^3$, and O 1s indicating the binding energy status. Through UV-VIS-NIR analysis, ALD-$TiO_2$ thin films were found to have a band gap of 3.4 eV resulting in the absorption edges at 360 nm, while the conventional $TiO_2$ films had a band gap of 3.0 eV (rutile)${\sim}$3.2 eV (anatase) with the absorption edges at 380 nm and 410 nm. Our results implied that the newly proposed nano-thick $TiO_2$ film using an ALD process at $150^{\circ}$ had almost the same properties as thsose of film at $250^{\circ}$. Therefore, we confirmed that the ALD-processed $TiO_2$ thin film with nano-thickness formed at low temperatures might be suitable for the electrode process of flexible devices.

• Proceedings of the Korean Ceranic Society Conference
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• 2003.04a
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• pp.134.1-134
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• 2003

• Bulletin of the Korean Chemical Society
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• v.28 no.12
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• pp.2333-2337
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• 2007

Nanoporous TiO2 and ZrO2 thin films were spin-coated using a surfactant-templated approach from Pluronic P123 (EO20PO70EO20) as the templating agent, titanium alkoxide (Ti(OC4H9)4) as the inorganic precursor, and butanol as a the solvent. The control of the electronic structure of TiO2 is crucial for its various applications. We found that the band gap of the hybrid nanoporous thin films can be easily tuned by adding an acetylacetonestabilized Zr(OC4H9)4 precursor to the precursor solution of Ti(OC4H9)4. Pores with a diameter of 5 nm-10 nm were randomly dispersed and partially connected to each other inside the films. TiO2 and ZrO2 thin films have an anatase structure and tetragonal structure, respectively, while the TiO2-ZrO2 hybrid film exhibited no crystallinity. The refractive index was significantly changed by varying the atomic ratio of titanium to zirconium. The band gap for the nanoporous TiO2 was estimated to 3.43 eV and that for the TiO2-ZrO2 hybrid film was 3.61 eV.