• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.207-207
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• 2003

최근 광촉매 재료로 각광받고 있는 TiO$_2$는 band gap 에너지가 3.0-3.2eV로 자외선 영역과 일부 가시광선 영역에서 활성을 갖는 것으로 알려져 있다. 따라서 용액 중에 결정화 및 안정화 되어있는 TiO$_2$의 band gap 에너지를 낮춘다면 가시광 영역의 광반응을 얻을 수 있다. 이에 본 연구는 G. Sato등이 제안한 방법으로 TiO$_2$ sol을 제조할 때 band gap 에너지를 낮추고자 천이 금속원소를 첨가하여 복합 및 담지된 TiO$_2$계 복합 sol을 합성하고자 하였다 출발원료는 TiC1$_4$를 가수분해하여 제조한 TiOCl$_2$에 천이금속원소인 V, Cr, Fe, Ni, Nb 등의 chloride 화합물을 첨가하여 중화 및 세척과정을 거친 후, 과산화수소수에 용해하여 전구체 용액인 titania peroxo용액을 제조하였다 제조된 전구체 용액은 온도와 시간을 변수로 각각 열처리하여 TiO$_2$계 복합 sol을 합성하였다. 제조된 시편은 X-선 회절 분석, 투과전자현미경, particle size analyzer, ζ-potential analyzer 및 UV-VIS Spectrometer 통을 이용하여 천이금속 첨가에 따른 TiO$_2$계 복합 sol의 형성과정과 특성변화를 관찰하였다.

• Journal of the Microelectronics and Packaging Society
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• v.13 no.2 s.39
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• pp.15-19
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• 2006

The resistance switching characteristics of amorphous $SiO_2$ and poly-crystalline $TiO_2$ were investigated. Both films exhibit well defined switching characteristics with low and high resistance states. From I-V curve analyses, it was found that the low resistance states of both films obey an ohmic conduction mechanism and the high resistance states show generation of a Schottky potential barrier. Regarding the mechanism for resistance switching of the binary oxide, it is suggested that the generation and annihilation of potential barriers accounts for the changes to the high resistance state and low resistance state, respectively. The device operation characteristic parameters such as reset and set voltages of $TiO_2$ are distinctly smaller than those of $SiO_2$, indicating that the values are related to the dielectric constant.

• Korean Journal of Materials Research
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• v.24 no.4
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• pp.207-213
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• 2014

Flexible $BaTiO_3$ films as dielectric materials for high energy density capacitors were deposited on polyethylene terephthalate (PET) substrates by r.f. magnetron sputtering. The growth behavior, microstructure and electrical properties of the flexible $BaTiO_3$ films were dependent on the sputtering pressure during sputtering. The RMS roughness and crystallite size of the $BaTiO_3$ increased with increasing sputtering pressure. All $BaTiO_3$ films had an amorphous structure, regardless of the sputtering pressures, due to the low PET substrate temperature. The composition of films showed an atomic ratio (Ba:Ti:O) of 0.9:1.1:3. The electrical properties of the $BaTiO_3$ films were affected by the microstructure and roughness. The $BaTiO_3$ films prepared at 100 mTorr exhibited a dielectric constant of ~80 at 1 kHz and a leakage current of $10^{-8}A$ at 400 kV/cm. Also, films showed polarization of $8{\mu}C/cm^2$ at 100 kV/cm and remnant polarization ($P_r$) of $2{\mu}C/cm^2$. This suggests that sputter deposited flexible $BaTiO_3$ films are a promising dielectric that can be used in high energy density capacitors owing to their high dielectric constant, low leakage current and stable preparation by sputtering.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.24 no.5
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• pp.213-218
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• 2014

An investigation of the influence of $WO_3$ addition with different precursors and preparation methods on the phase formation and selective catalytic reduction (SCR) efficiency of anatase-$TiO_2$ powders has been carried out. An anatase-$TiO_2$ synthesized by precipitation process was used as a catalyst support. For $WO_3(10wt%)/TiO_2$, the W loading to the $TiO_2$ support led to the lower in anatase to rutile transition temperature to ${\sim}900^{\circ}C$ from $1200^{\circ}C$ of the $TiO_2$ support alone. In the case of $WO_3(10wt%)/TiO_2$ SCR powders obtained from a wet process with ammonium meta-tungstate (AMT) precursor, the highest $NO_X$ conversion efficiency was achieved at $450^{\circ}C$ remaining high efficiency at $500^{\circ}C$, while the same composition prepared from a dry process with $WO_3$ addition showed the lowered efficiency with temperature after reaching the efficiency maximum at $350^{\circ}C$. The same tendency has been found that the $V_2O_5(5wt%)-WO_3(10wt%)/TiO_2$ SCR powders obtained from the wet process with AMT precursor has shown the superior $NO_X$ conversion efficiency over 90 % in a wider temperature range of $300{\sim}500^{\circ}C$.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.16 no.11
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• pp.7433-7438
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• 2015

Deactivation characteristics of $V_2O_5/TiO_2$ catalysts were studied for selective catalytic reduction(SCR) of NOx with ammonia in the presence of $SO_2$. Performance of catalyst was investigated for $deNO_x$ activity while changing temperature, $SO_2$ concentration. The activity of catalyst was decreased with the increase of $SO_2$ concentration and reaction time. Also, degree of activity drop was largely decreased with the increase of reaction temperature in the range of $250{\sim}300^{\circ}C$. Physicochemical properties of deactivated catalysts were characterized by BET, XRD, SEM, TPD analysis. According to the analysis results, deactivation phenomena occur due to the relatively high formation of ammonium sulfate salts, which created by unreacted ammonia and water in the presence of $SO_2$. It was revealed that ammonium sulfate cause the pore plogging of support and deposition of active matter.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1992.11a
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• pp.34-37
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• 1992

In this paper, the $(SrPb)(CaMg)TiO_3$-xBi_2O_3{\cdot}3TiO_2$ ceramics with paraelectric properties were fabricated by the mixed oxide method. In order to investigate the behavior of charged particles, the characteristics of electrical conduction and thermally stimulated current were measured respectively. As a result on characteristics of the electrical conduction, the leakage current was increased as measuring temperature was increased. At room temperature, the conduction current was divided into the three steps as a function of DC electric field. The first step was Ohmic region due to ionic conduction, below 15[kV/cm]. The second step was showed a saturation which seems to be related to a depolarizing field occuring in field-enforced ferroelectric phase, between 15[kV/cm] and 40[kV/cm]. The third step was attributed to Child's law related to spare charge which injected from electrode, above 40[kV/cm]. Thermally stimulated currents(TSC) spectra with various biasing fields exhibited three distinguished peaks that were denoted as ${\alpha}$, ${\alpha}'$ and ${\beta}$ peak, each of which appeared at nearby -30, 20 and 95[$^{\circ}C$] respectively. It is confirmed that the a peak was due to trap electron trapped in the grainboundary, and ${\alpha}'$ peak that was observed above only 1.5[kV/mm] was attributed to field-enforced ferroelectric polarization. The origin of ${\beta}$ peak was identified as ion migration which caused the degradation.

• Journal of the Korean Ceramic Society
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• v.37 no.11
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• pp.1051-1057
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• 2000

TiO$_2$와 CeO$_2$박막을 Si 위에 증착한 후 MOCVD법에 의해 PbTiO$_3$박막을 증착하여 MFIS 구조를 형성하였다. 절연층의 후열처리가 절연층 및 MFIS 구조의 전기적 특성에 미치는 영향을 관찰하기 위해 산소분위기와 $600^{\circ}C$~90$0^{\circ}C$의 온도범위에서 후 열처리를 행하였고, C-V 특성 및 누설전류 특성을 분석하였다. CeO$_2$와 TiO$_2$박막의 유전상수는 증착 직후 6.9와 15였으며, 90$0^{\circ}C$ 열처리를 행한 후 약 4.9와 8.8로 감소하였다. 누설전류밀도 역시 증착 직후 각각 7$\times$$10^{-5}$ A/$ extrm{cm}^2$와 2.5$\times$$10^{-5}$ A/$\textrm{cm}^2$에서 90$0^{\circ}C$ 열처리를 거친 후에 약 4$\times$$10^{-8}$ A/$\textrm{cm}^2$와 4$\times$$10^{-9}$ A/$\textrm{cm}^2$로 감소하였다. Ellipsometry 시뮬레이션을 통해 계산된 계면층의 두께는 90$0^{\circ}C$에서 약 115$\AA$(CeO$_2$) 및 140$\AA$(TiO$_2$)까지 증가하였다. 계면층은 MFIS 구조에서 강유전층에 인가되는 전계를 감소시켜 항전계를 증가시켰고, charge injection을 방지하여 Al/PbTiO$_3$/CeO$_2$(90$0^{\circ}C$, $O_2$)/Si 구조의 경우 $\pm$2 V~$\pm$10 V의 측정범위에서 memory window가 계속 증가하는 것을 보여주었다.

• Korean Chemical Engineering Research
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• v.44 no.2
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• pp.179-186
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• 2006

Two types of $TiO_2$, nanotube and nanoparticle, were used for the mesoporous coatings by doctor blade technique followed by calcining at $450^{\circ}C$. The coatings were used as working materials for dye-sensitized solar cells (DSCs) later on and their photovoltaic characterization was carried out. The nanoparticle was synthesized from hydrogen titanate nanotube by hydrothermal treatment at $180^{\circ}C$ for 24 hr. The solar energy conversion efficiency (${\eta}$) of DSCs prepared by this nanoparticle reached 8.07％ with $V_{OC}$ (open-circuit potential) of 0.81 V, $I_{SC}$ (short-circuit current) of $18.29mV/cm^2$, and FF (fill factor) of 66.95％, respectively. For the preparation of nanotube, the concentration of NaOH solution varied from 3 M to 5 M. In the case of DSCs fabricated with nanotubes from 3 M NaOH solution, the ${\eta}$ reached 6.19％ with $V_{OC}$ of 0.77 V, $I_{SC}$ of $12.41mV/cm^2$, and FF of 64.49％, respectively. On the other hand, in the case of 5 M solution, the photovoltaic ${\eta}$ was decreased with 4.09％ due to a loss of photocarriers. In conclusion, it is demonstrated that the solar energy conversion efficiency of DSCs made from $TiO_2$ nanoparticle showed best results among those under investigation.

• Journal of the Korean Vacuum Society
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• v.9 no.4
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• pp.373-378
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• 2000

There was a great difference in the formation kinetics of $TiO_2$ and $Bi_2O_3$ on silicon, but the growth of bismuth titanate (BIT) thin film was mainly limited by the formation of $TiO_2$. As a result, the BIT film was easy to be lack of bismuth. The pulse injection metalorganic chemical vapor deposition (MOCVD) process was introduced in order to overcome this problem by recovering the insufficient bismuth content in the film. By this pulse injection method, bismuth content was increased and also the uniform in-depth composition of the film was attained with a abrupt $Bi_4Ti_3O_{12}/Si$ interface. In addition, the crystallinity of $Bi_4Ti_3O_{12}$ thin film prepared by pulse injection process was greatly improved and the leakage current density was lowered by 1/2~1/3 of magnitude. Clockwise hysteresis of C-V was observed and the ferroelectric switching was confirmed for $Bi_4Ti_3O_{12}$ film deposited by pulse injection method.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.8 no.4
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• pp.726-732
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• 2007

We fabricated UV absorption functional $10{\sim}50nm-TiO_{2-x}/quartz$ structures layer using ALD (atomic layer deposition) method. We deposited $10nm-TiO_{2-x}$ layer on quartz substrate using ALD, and film thickness was determined by an ellipsometer. The others specimen thickness was controlled by ALD time lineally. We characterized controlling phase UV and visible optical property using an X-ray difractometer, a UV-VIS-IR spectrometer and a digital camera. $ALD-TiO_{2-x}$ layers were non-stoichiometric $TiO_{2-x}$ form and amorphous phases comparing with bulk $TiO_2$. While the conventional bulk $TiO_2$ had band gap of $3.0{\sim}3.2eV$ resulting in absorption edges at 380 nm and 415 nm, $ALD-TiO_{2-x}$ layers showed absorption edges at 197 nm and 250 nm. Therefore, our nano-thick $ALD-TiO_{2-x}$ was able to absorb shorter UV region and showed excellent transmittance in visible region. Our result implies that our newly proposed nano-thick $TiO_{2-x}$ using ALD process may improve transmittance in visible rays and be able to absorb shorter UV light effectively.