• Title/Summary/Keyword: V Band

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A 70/140 GHz Dual-Band Push-Push VCO Based on 0.18-㎛ SiGe BiCMOS Technology (0.18-㎛ SiGe BiCMOS 공정 기반 70/140 GHz 듀얼 밴드 전압 제어 발진기)

  • Kim, Kyung-Min;Kim, Nam-Hyung;Rieh, Jae-Sung
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.23 no.2
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    • pp.207-212
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    • 2012
  • In this work, a 70/140 GHz dual-band push-push voltage controlled oscillator(VCO) has been developed based on a 0.18-${\mu}m$ SiGe BiCMOS technology. The lower band and the upper band oscillation frequency varied from 67.9 GHz to 76.9 GHz and from 134.3 GHz to 154.5 GHz, respectively, with tuning voltage swept from 0.2 to 2 V. The calibrated maximum output power for each band was -0.55 dBm and -15.45 dBm. The VCO draws DC current of 18 mA from 4 V supply.

A Study on the V-band Waveguide-to-CPW Transitions (V-band 도파관-CPW 변환 구조에 대한 연구)

  • Kim Dong-Ki;Jeong Jin-Ho;Kwon Young-Woo
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.16 no.5 s.96
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    • pp.488-493
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    • 2005
  • In this study, waveguide-to-CPW transitions were developed for integrating waveguide and MMIC at V-band. The finite element method for numerical analysis and repeated experiments were performed to propose two types of waveguide-to-CPW transition. Using quartz substrate, proposed structures were designed for low loss as well as broadband characteristics. These waveguide-to-CPW transitions showed a good reliability and insensitivity to matching precision, and they could be fabricated with lower cost than that of the conventional connectors. Proposed two types of the structure showed insertion loss less than 1.9 dB and return loss better than 14 dB from 53 GHz to 60 GHz except unwanted resonance region, respectively.

The optical characteristics of $Al_{0.25}Ga_{0.75}As/In_{0.15}Ga_{0.85}As$/GaAspseudomorphic high electron mobility transistor structure grown by molecular beam epitaxy (분자선 에피탁시법으로 성장된 $Al_{0.25}Ga_{0.75}As/In_{0.15}Ga_{0.85}As$/GaAs 슈우도형 고 전자 이동도 트랜지스터 구조의 광학적 특성)

  • 이동율;이철욱;김기홍;김종수;김동렬;배인호;전헌무;김인수
    • Journal of the Korean Vacuum Society
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    • v.9 no.2
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    • pp.130-135
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    • 2000
  • We have analyzed characteristics for the structure of $Al_{0.25}/Ga_{0.75}/As/In_{0.15}/Ga_{0.85}$/AS/GaAS pseudomorphic high electron mobility transistor (PHEMT) by photoluminescence (PL) and photoreflectance (PR) measurements. By the PL measurement at 10 K, we observed el-hl transition peak at 1.322 eV and e2-hl transition peak at 1.397 eV in the InGaAs quantum well. We calculated value of 23 meV, the difference between the first energy level and the second energy level of a valence band by dependence of temperatures. Also, (e2-h2) transition signal was observed at 300 K by PR measurement. From the PR measurement, we recognized that the transition was dominated the second energy level of conduction band than the first energy level of conduction band due to band filling. The other hand, PL signal of the first energy level of conduction band was dominated because of the electron screening effect.

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Photocurrent Study on the Splitting of the Valence Band and Growth of $AgInS_2$GaAs Single Crystal Thin Film by Hot Wall Epitaxy (Hot Wall Epitaxy(HWE)법에 의한 $AgInS_2$단결성 박막의 성장과 가전자대 갈라짐에대한 광전류 연구)

  • 홍광준
    • Korean Journal of Crystallography
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    • v.12 no.4
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    • pp.197-206
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    • 2001
  • A stoichiometric mixture of evaporating materials for AgInS₂ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films. AgInS₂ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy(HWE)system. The source and substrate temperatures were 680℃ and 410℃, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction(DCXD). The carrier density and mobility of AgInS₂ single crystal thin film mea-sured from Hall effect by van der Pauw method are 9.35×10/sup 16/㎤ and 294㎠/V·s at 293K respectively. The temperature dependence of the energy band gap of the AgInS₂ obtained from the absorption spectra was well described by the Varshni's relation , E/sub g/(T)=2.1365eV-(9.89×10/sup-3/eV/K/)T²(T+2930K). The crystal field and the spin-orbit splitting energies for the valence band of the AgInS₂ have been estimated to be 0.1541eV and 0.0129 eV, respectively, by means of the photocur-rent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the Δso definitely exists in the Γ/sub 5/ states of the valence band of the AgInS₂ /GaAs epilayer. The three photo-current peaks ovserved at 10K are ascribed to the A₁-, B-₁and C₁-exction peaks for n=1.

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Defect Formatìon and Annealìng Behavìor in MeV Si Self-Implanted Silicon (MeV Si 자기 이온주입된 단결정 Silicon내의 결함 거동)

  • Cho, Nam-Hoon;Jang, Ki-Wan;Suh, Kyung-Soo;Lee, Jeoung-Yong;Ro, Jae-Sang
    • Korean Journal of Materials Research
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    • v.6 no.7
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    • pp.733-741
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    • 1996
  • In this study MeV Si self ion implantations were done to reveal the intrinsic behavior of defect formation by excluding the possibility of chemical interactions between substrate atoms and dopant ones. Self implantations were conducted using Tandem Accelerator with energy ranges from 1 to 3 MeV. Defect formation by high energy ion implantation has a significant characteristics in that the lattice damage is concentrated near Rp and isolated from the surface. In order to investigate the energy dependence on defect formation, implantation energies were varied from 1 to 3 MeV under a constant dose of $1{\times}10^{15}/cm^2$. RBS channe!ed spectra showed that the depth at which as-implanted damaged layer formed increases as energy increases and that near surface region maintains better crystallinity as energy increases. Cross sectional TEM results agree well with RBS ones. In a TEM image as-implanted damaged layer appears as a dark band, where secondary defects are formed upon annealing. In the case of 2 MeV $Si^+$ self implantation a critical dose for the secondary defect formation was found to be between $3{\times}10^{14}/cm^24$ and $5{\times}10^{14}/cm^2$. Upon annealing the upper layer of the dark band was removed while the bottom part of the dark band did not move. The observed defect behavior by TEM was interpreted by Monte Carlo computer simulations using TRIM-code. SIMS analyses indicated that the secondary defect formed after annealing gettered oxygen impurities existed in silicon.

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V-Band filter using Multilayer MCM-D Technology (MCM-D 공정기술을 이용한 V-BAND FILTER 구현에 관한 연구)

  • Yoo Chan-Sei;Song Sang-Sub;Part Jong-Chul;Kang Nam-Kee;Cha Jong-Bum;Seo Kwang-Seok
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.43 no.9 s.351
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    • pp.64-68
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    • 2006
  • Novel system-on-package (SOP) - D technology to improve the mechanical and thermal properties of a MCM-D substrate was suggested. Based on this investigation, the two types of band pass filters for the V-band application with unique structure were designed and implemented using 2-metals, 3-BCB layers. The first type using distributed resonator had the insertion loss below 2.6 dB at 55 GHz and group delay was below 0.06 ns. For the second type with edge coupled structure, the insertion loss and group delay were 3 dB and 0.1 ns, respectively. Suggested MCM-D substrate with band pass filter can be used to evaluate mm-Wave system including flip-chip bonded MMIC.

Molecular Biological Characteristics of Vibrio cholerae O1 Isolated from Diarrheal patients in the Gyeongbuk province. (최근 경북지역 설사환자 검체에서 분리된 Vibrio cholerae O1의 분자생물학적 특성)

  • 이상조;이복권;이건주;이희무
    • Microbiology and Biotechnology Letters
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    • v.31 no.4
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    • pp.334-341
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    • 2003
  • This study was carried out to investigate the cause of cholera outbreak in Gyeongbuk province in 2001.90 strains of Vibrio cholerae O1 El Tor serotype Inaba were isolated from diarrheal patients. By multiplex-PCR, all of the isolated strains revealed positive for detection ctxA, hlyA and tcpA genes. There were DNA sequence difference of the cholera-toxin subunit A gene and subunit B gene between isolated V. cholerae O1 and the strain of GenBank. In analysis of PFGE patterns, all of the isolated strains were showed the same DNA fragments. We also collected plankton samples in the east coast of Gyeongbuk to isolate V. cholerae O1 and V. cholerae O139 from August to October 2002. The samples were examined to detect the rfb gene and cholera-toxin gene by multiplex-PCR. The cholera-toxin gene was detected and then we tried to isolate V. cholerae O1 and V. cholerae O139, but they were not isolated.

Photocurrent study on the splitting of the valence band and growth of $CdGa_2Se_4$ single crystal thin film by hot wall epitaxy (Hot Wall epitaxy(HWE)법에 의한 $CdGa_2Se_4$ 단결정 박막의 성장과 가전자대 갈라짐에 대한 광전류 연구)

  • Park, Chang-Sun;Hong, Kwang-Joon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.17 no.5
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    • pp.179-186
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    • 2007
  • Single crystal $CdGa_2Se_4$ layers were grown on a thoroughly etched semi-insulating GaAs(100) substrate at $420^{\circ}C$ with the hot wall epitaxy(HWE) system by evaporating the polycrystal source of $CdGa_2Se_4$ at $630^{\circ}C$. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction(DCXD). The carrier density and mobility of single crystal $CdGa_2Se_4$ thin films measured with Hall effect by van der Pauw method are $8.27{\times}10^{17}cm^{-3},\;345cm^2/V{\cdot}s$ at 293 K, respectively. The photocurrent and the absorption spectra of $CdGa_2Se_4/SI$(Semi-Insulated) GaAs(100) are measured ranging from 293 K to 10 K. The temperature dependence of the energy band gap of the $CdGa_2Se_4$ obtained from the absorption spectra was well described by the Varshni's relation $E_g(T)=2.6400eV-(7.721{\times}10^{-4}eV/K)T^2/(T+399K)$. Using the photocurrent spectra and the Hopfield quasicubic model, the crystal field energy(${\Delta}cr$) and the spin-orbit splitting energy(${\Delta}so$) far the valence band of the $CdGa_2Se_4$ have been estimated to be 106.5 meV and 418.9 meV at 10 K, respectively. The three photocurrent peaks observed at 10 K are ascribed to the $A_{1^-},\;B_{1^-},\;and\;C_{11}-exciton$ peaks.

Development of HVPS of the X-Band TWTA for Military Transportable Satellite Communications (군위성통신 차량용단말 X-대역 TWTA용 HVPS 개발)

  • Park, Jae-Don;Jang, Jeen-Sang;Dong, Moon-Ho
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.30 no.12A
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    • pp.1168-1173
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    • 2005
  • The HVPS of the TWTA for military satellite communications is developed and tested. With 380 V input DC voltage, the HVPS provides -10.95 kV for Cathode, -4.27 kV for Collectorl and -6.57 kV for Collector2 of the TWT that generates 600 W X-band output signal power. The total output power of the HVPS is about 1.6 kW. The voltage ripples of Cathode, Collectorl and Collector2 are 6 V, 12 V and 6 V, respectively, which are only $0.055\%,\;0.281\%$ and $0.091\%$ compared to the absolute output voltages.

V/UHF-Band Broadband 2-Way Power Divider (V/UHF-대역 광대역 2분기 전력 분배기)

  • Park, Yeo-Il;Ko, Jin-Hyun;Park, Young-Joo;Park, Dong-Chul
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.18 no.4 s.119
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    • pp.416-422
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    • 2007
  • In this paper, a broadband 2-way power divider which can be used from 20 MHz to 500 MHz in the V/UHF band is designed using transmission-line transformer and ferrite toroid. A 2:1 impedance transformer instead of the conventional 4:1 impedance transformer is realized and this 2:1 transformer is connected with the conventional bridge-type 2-way divider to form a 2-way power divider. Insertion loss of about 3.5 dB, isolation of less than -10 dB, and return loss of less than -10 dB in most band of interest are measured.