• Journal of the Korean Crystal Growth and Crystal Technology
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• v.14 no.6
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• pp.236-243
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• 2004

The oxide etching process was characterized in a magnetically enhanced reactive ion etching (MERIE) reactor with a $CHF_3CF_4$ gas chemistry. A statistical experimental design plus one center point was used to characterize relationships between process factors and etch response. The etch response modeled are etch rate, etch selectivity to TiN and uniformity. Etching uniformity was improved with increasing $CF_4$ flow ratio, increasing source power, and increasing pressure depending on source power. Characterization of via etching in $CHF_3CF_4$ MERIE using neural networks was successfully executed giving to highly valuable information about etching mechanism and optimum etching condition. It was found that etching uniformity was closely related to surface polymerization, DC bias, TiN and uniformity.

• 한국가시화정보학회:학술대회논문집
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• 2004.11a
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• pp.48-51
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• 2004

Chemical Mechanical Polishing(CMP) is popularly used in production of semiconductor because of large area polishing ability probability of improvement for more integrated circuit. However, present CMP processing causes some non-uniformity errors which can be critical for highly integrated circuit. Previous studies predict that flow-field of slurry during CMP can create non-uniformity, but no quantitative measurement has conducted. In this study, using PIV, slurry velocity flow-field during CMP is measured by changing the ratio of RPM of pad and carrier with tuned PIV system adequate for small room in CMP machine and Cabot's non-groove pad Epad-A100. The result show that velocity of slurry is majorly determined by pad-rpm and the ratio of between carrier and pad rpm make some changes in streamlines.

• Transactions of the Korean Society of Automotive Engineers
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• v.20 no.5
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• pp.36-43
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• 2012

In this work the mixing and flow characteristics of a vane-type static mixer were investigated numerically for the reduction of NOx in the SCR-system of the diesel engines. The mixer was located in the 57 times pipe diameter away from the inlet. The analysis were performed by changing such various parameters as vane shape, angles, blockage ratio and location of the vane. The flow structure through the mixer was characterized by uniformity index and pressure drop. The results show that uniformity index and pressure coefficient are substantially influenced by the vane shape, angle, blockage ratio and position of the vane of the mixer.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.508-508
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• 2012

CST microwave studio is used to simulate the plasma profile of the 450mm CCP source. Standing wave effect becomes important at the high frequency as the electrode radius increases. To solve plasma non-uniformity problem, we designed multi electrode chamber to decreasing standing wave effect. Simulation showed the ratio of input power of each electrode is related with electric field strength. The multi electrode was constructed and measured by 2D probe arrays using floating harmonic method. Uniformity of 450 mm CCP was changed by the ratio of input power of each electrode. We described this dependence with circuit model.

• The Proceedings of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.13 no.2
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• pp.139-139
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• 1999

In this paper, the result of study in artificial lighting uniformity ratio yield method subject to lecture room are reported. It is desirable that the application of equation ① U=Ei/Ex×100 cannot be used to the mean value in place to be effective of light and darkness. And it is desirable that the application of equation ② U=Ei/Ea×100 or equation ③ U=(Ea-Ei)/Ea×100 be used to the mean Value equality illumination conditions. Also, requiring preparation of judgement standard, uniformity ratio equation agree with actual circumstances in this country. It must be considered intensity of illumination and specificity of space in established standard.

• Proceedings of the KSME Conference
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• 2008.11b
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• pp.2369-2374
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• 2008

In the precision hot plate for wafer processing, the temperature uniformity of upper plate surface is one of the key factors affecting the quality of wafers. Precision hot plates require temperature variations less than ${\pm}1.5%$ during heating to $120^{\circ}C$. In this study, we have manufactured the flat plate heat pipe hot chuck of circle type(300mm) and investigated the operating characteristics of flat plate heat pipe hot chuck experimentally. Various liquids(aceton, FC-40, water) were used as the working fluid and charging ratio was changed($14{\sim}36\;vol.%$). Several cases were tested to improve temperature uniformity. Major working fluid to be investigated was water. Using water, various parameters such as charging ratio, wafer operation on-off time, different working fluids. In case of water, the temperature uniformity was ${\pm}1.5%$, response time of wafer were investigated.

• Journal of the Korean Magnetic Resonance Society
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• v.7 no.1
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• pp.25-36
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• 2003

The performance of radio frequency (RF) coils, used in MRI units, is determined by the image uniformity and the signal-to-noise ratio (SNR). Birdcage and surface coils are commonly used. A birdcage coil provides a good image uniformity while a surface coil produces a high SNR. In this study, therefore, a staircase coil was designed from a standard version of a birdcage coil, with some structural changes to increase SNR while maintaining image uniformity. In phantom experiments, the improvement of the image to uniformity and the SNR increase of the staircase coil compared with the values for the birdcage coil were about 3.5% and 35%, respectively. In clinical experiment, the SNR increase of the staircase coil, compared with the value for the birdcage coil was about 40% in bone, muscle and blood-vessel tissues. These results show that the performance of the staircase coil was very improved over the standard birdcage coil in terms of SNR, and that image uniformity was maintained. Therefore, the staircase coil designed by this study should be useful in experimental and clinical l.5T MRI systems, and this coil offers an alternative method of quadrature detection.

• Journal of Environmental Science International
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• v.22 no.11
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• pp.1481-1498
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• 2013

The SCR (selective catalytic reduction) system is highly-effective technique for NOx reduction from exhaust gases. In this study, the effects of the direction and size of nozzle and the ammonia injection concentration on the performance of SCR system are analyzed by using the computational fluid dynamics method. When the nozzle is arranged in zigzaged direction which is normal to exhausted gas flow, it is shown that the uniformity of gas flow and the NH3/NO molar ratio is improved remarkably. With the change of the ammonia injection concentration from 0.2 vol%(wet) to 1.0 vol%(wet), the uniformity of gas flow shows a good results. As the size of nozzle diameter changes from 6 mm to 12 mm, the uniformity of gas flow is maintained well. It is shown that the uniformity of the $NH_3/NO$ molar ratio becomes better with decreasing the ammonia injection concentration and the size of nozzle diameter.

• Journal of the Semiconductor & Display Technology
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• v.20 no.2
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• pp.19-24
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• 2021

As the size of semiconductor devices decreases, the etching pattern becomes very narrow and a deep high aspect ratio process becomes important. The cryogenic etching process enables high aspect ratio etching by suppressing the chemical reaction of reactive ions on the sidewall while maintaining the process temperature of -100℃. ESC is an important part for temperature control in cryogenic etching equipment. Through the cooling path inside the ESC, liquid nitrogen is used as cooling water to create a cryogenic environment. And since the ESC directly contacts the wafer, it affects the temperature uniformity of the wafer. The temperature uniformity of the wafer is closely related to the yield. In this study, the cooling path was designed and analyzed so that the wafer could have a uniform temperature distribution. The optimal cooling path conditions were obtained through the analysis of the shape of the cooling path and the change in the speed of the coolant. Through this study, by designing ESC with optimal temperature uniformity, it can be expected to maximize wafer yield in mass production and further contribute to miniaturization and high performance of semiconductor devices.

• Transactions on Electrical and Electronic Materials
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• v.13 no.1
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• pp.16-18
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• 2012

LED lighting systems that combine lighting capability, emotional and physiological characteristics are required for lighting source and multifunctional applications. In this work, Simulation studies using optical analysis software packages, Light Tools, are presented. This is done to estimate the uniformity ratio of illuminance and photosynthetic photon flux density (PPFD) of the periodic 2D lattice arrangements, such as square, diamond, two-way bias quadrangular, hexagonal, and Kagome lattices, under the same transmissivity, absorptance and reflectivity. It has been found out that the two-dimensional Kagome lattice arrangement exhibited high uniformity ratio of illuminance and PPFD compared to other lattices. Accordingly, these results can be used to guide a design and improve the lighting environment which in turn would maximize the uniform distributions of illuminance.