• Transactions on Electrical and Electronic Materials
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• v.18 no.2
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• pp.93-96
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• 2017

The structural, electrical and optical properties of Ti thin films fabricated by dual magnetron sputtering were investigated under various film thicknesses. The fabricated Ti thin films exhibited uniform surfaces, crystallinity, various grain sizes, and with various film thicknesses. Also, the crystallinity and grain size of the Ti thin films increased with the increase of film thickness. The electrical properties of Ti thin films improved with the increase of film thickness. The results showed that the performance of TCO-less DSSC critically depended on the film thickness of the Ti working electrodes, due to the conductivity of Ti thin film. However, the maximum conversion efficiency of TCO-less DSSC was exhibited at the condition of 100 nm thickness due to the surface scattering of photons caused by the variation of grain size.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 1998.10a
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• pp.166-174
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• 1998

The distribution of oil film thickness in piston were measured by induced fluorescence method. A Xe lamp was used as light source. Coumarine-6 was mixed with oil as the fluorescent dye. Fluorescent signal which is proportional to the oil film thickness was acquired by CCD camera and transmitted to the personal computer as video signal. In order to solve the problem of measurement system, irregular distribution and unstability of light intensity, as well as to know the relationship between the oil film thickness and output signal, three different calibration techniques were used. Motoring and firing tests were performed in a single cylinder research engine with transparent liner. By analyzing the oil film thickness converted from the photographed image, it was observed that each of three piston rings scrapes the oil both upward and downward and oil film thickness is not uniform horizontally at a given piston land. The amount of oil in each land was considerably affected by the engine load. It is thought that the blow-by gas blows the oil down to the crankcase.

• Journal of Surface Science and Engineering
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• v.30 no.3
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• pp.183-190
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• 1997

Fabrication and crystallization characteristics of yttria($T_2O_3$) stabilized zirconia(YSZ) thin film by sol-gel process were studied. YSZ sol was synthesized with zirconium n-propoxide($Zr(OC_3H_7)_4)$) and yttrium nitrate pentahydrate ($Y(NO_3)_3.5H_2O$). YSZ film was prepared by depositing the polymeric sol on porous $Al_2O_3$ substrate by spin-coating, and the film characteristics were investigated by FRIR, TG-DTA, XRD, DSC, optical microscopy and SEM. The film topology was uniform and cracks were not found. It was found that the annealing temperature and the concentration of stabilizer affect the crystallization of YSZ film. The YSZ film began to crystallize from amorphous to tetragonal phase at 40$0^{\circ}C$, and it was not converted to cubic structure until $1100^{\circ}C$. It seemed that the grains were formed over $700^{\circ}C$and the average grain size was obtained about 0.2$\mu\textrm{m}$.

• Transactions on Electrical and Electronic Materials
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• v.7 no.6
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• pp.305-308
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• 2006

We have studied liquid crystal (LC) aligning capabilities for homeotropic alignment and the control of tilt angles on the $SiO_{x}$ thin film by electron beam evaporation method. A high tilt angle of about $86.5^{\circ}$ was obtained, and also the suitable tilt angle of the NLC on the $SiO_{x}$ thin film at $20{\sim}50\;nm$ thickness with e-beam evaporation can be achieved. The uniform LC alignment on the $SiO_{x}$ thin film surfaces with electron beam evaporation can be achieved. It is considerated that the LC alignment on the $SiO_{x}$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $SiO_{x}$ thin film surface created by evaporation.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.10
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• pp.98-106
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• 1998

Efficient power transmission from a single mode fiber to a thin-film waveguide devices is one of the most fundamental and inevitable subject that should be first solved toward the realization of the integrated optic system. In this paper, fiber-waveguide coupling structure is considered and the large mismatch of field profiles at the fiber-waveguide interface is well avoided by using to the coupling guide which is intentionally developed on the top of the thin-film guuide. From the simulation, the taper-type structure are shown to be easier realizeable than the uniform one, since optical coupling between the guides in the latter has a stronger tolerance to the deviation of waveguide parameters.

• Progress in Superconductivity
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• v.5 no.2
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• pp.118-123
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• 2004

We investigated quench distribution in AU/YBCO thin film meander lines with a heater. Quench distribution during faults is important for superconducting fault current limter applications, because uniform quench allows application of higher voltages across the meander lines. AU/YBCO thin films grown on sapphire substrates were patterned into meander lines by photolithography. Gold films grown on the rear sides of the substrates were also patterned into meander lines, and used as heaters. Meander lines on the front and the rear sides were connected in parallel. The meander lines were subjected to simulated AC fault currents for quench measurements during faults. They were immersed in liquid nitrogen during the experiment for effective cooling. Resistance of the AU/YBCO meander lines initially increased more rapidly with the rear heater than without, and consequently the fault current was limited more. The resistance subsequently became similar, The resistance distribution was more uniform with the heater, especially during the initial quench. Quench was completed more uniformly and significantly earlier. This resulted in uniform distribution of dissipated power. These results could be explained with the concept of quench propagation, which was accelerated by heat transfer across the substrate from the rear heater.

• Journal of the Korea Institute of Military Science and Technology
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• v.7 no.1
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• pp.34-46
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• 2004

Copper films were prepared by using ECR-MOCVD(Electron Cyclotron Resonance Metal Organic Chemical Vapor Deposition) coupled with a DC bias system. The DC bias is connected to the electrode which placed 1∼3cm above the polymer substrate. The pulse electrical field around the electrode attracts the positive charged copper ions generated from the dissociation of copper precursor, $Cu(hfac)_2$, under ECR plasma. Condensation of supersaturated copper ions in the space between the electrode and substrate, makes it possible to deposit copper film on the polymer substrate even at room temperature. In this study, optimization of the electrode configuration was carried out in order to obtain the uniform films. The uniformity of the deposited films were closely related to the parameters of electrode geometry such as electrode shape, thickness, grid size and the spacing between electrodes. The most uniform copper film was observed with the electrode that enabled uniform electrical field distribution across the whole dimension of electrode.

• Journal of Surface Science and Engineering
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• v.54 no.2
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• pp.62-70
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• 2021

Al2024 aluminum alloy specimens were exposed to atmospheric conditions for maximum 24 months and analyzed by electron microscopes to characterize their corrosion behavior and oxide film characteristics. As the exposure time increased from 12 months to 24 months, the number of pitting sites per 1 mm² increased from ~100 to ~200. The uniform oxidation (or non-pitting) region of the 12-month exposure specimen showed 30~120 nm thick oxide layer, whereas the 24-month exposure specimen showed 170~200 nm thick oxide with the local oxygen penetration region up to 1 ㎛ deep. There was no local corrosion area observed in the 12-month exposure specimen except pitting. However, in the 24-month exposure specimen, local oxygen penetration region was observed beneath the uniform oxide layer and near the pitting cavity. Al2024 showed two times thicker uniform oxide layer but much shallower local oxygen penetration region than Al1050, which appears to be related to low Si concentration. Further research is needed on the effects of Mg segregation near the tip of the oxygen penetration region.

• Journal of Surface Science and Engineering
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• v.55 no.5
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• pp.273-283
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• 2022

Al6061 aluminum alloy specimens were exposed to atmospheric conditions for maximum 24 months. 24-month exposure specimen showed some more frequent and larger size of corrosion products and pitting on the surface compared with the 12-month exposure specimens. The XRD examination revealed the dominant surface oxide phases of Al₂O₃ and Al(OH)₃. The oxide thickness at uniform oxidation (or non-pitting) region was not much changed over exposure time. The 1.2 ㎛ deep oxygen penetration area was found in the 12-months exposed specimen near the thin uniform aluminum oxide film. The line-EDS was conducted through the penetration regions and non-penetrated grain boundary. There were signs of O and Si concentration through the penetration region, whereas non-penetration region showed no concentration of O or Si. It was confirmed that pitting is a more severe degradation mode in Al6061 (max. >4 ㎛ deep) compared with the uniform oxidation (max. ~200 nm deep) up to 24-months exposure.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.22 no.5
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• pp.425-430
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• 2009

$ZrO_2$ film was deposited by facing target sputtering (FTS) system on polyethylene naphthalate (PEN) substrate as a gas barrier layer for flexible organic light emitting devices (FOLEDs), In order to control the heat of the FTS system caused by the ion bombardment in the cathode compared with the conventional sputtering system, the process characteristics of the FTS apparatus are investigated under various sputtering conditions such as the distance between two targets ($d_{TT}$), the distance between the target and the substrate ($d_{TS}$), and the deposition time. The $ZrO_2$ film by the FTS system can reduce the damage on the films because the ion bombardment with high-energy particles like gamma-electrons, Moreover, the $ZrO_2$ film with optimized condition ($d_{TT}$=140 mm) as a function of the distance from center to edge showed a very uniform thickness below 5 % for a deposition time of 3 hours, which can improve the interface property between the anode and the plastics substrate for flexible displays, It is concluded that the $ZrO_2$ film prepared by the FTS system can be applied as a gas barrier layer or an interlayer between the anode and the plastic substrate with good properties of an uniform thickness and a low deposition-temperature.