• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.1163-1166
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• 2004

Cinnamate group is well-known for the dimerization reaction by ultra-violet irradiation and cinnamate polymers are studied for photo-alignment materials. The cinnamate groups of flexible polymer are found to produce LC alignment parallel to polarization direction of ultra-violet light, which is contrary to the LC orientation on conventional cinnamate polymers. The un-reacted cinnamate groups in the flexible polymer are also found to participate in cycloadducts formation by additional thermal reaction that preserves the orientation of cycloadducts, leading to the enhancement of thermal stability of LC alignment.

• 대한기계학회논문집A
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• 제24권9호
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• pp.2371-2380
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• 2000

In this paper, we developed the proximity exposure system with the vertical structure of glass and mask stage to minimize the mask's warp caused by the pull of gravity. This system, which canirradiate the ultra violet through 1440 H 850 $\textrm{mm}^2$ and 1330X 1015 $\textrm{mm}^2$ exposure area, has the followingcharacteristics. The glass stage can be inclined by 80 degrees at vertical structure to load substrate withsafety on it. When the glass stage is the vertical state, the gap control, alignment control and exposureof ultra violet are executed. So, it enhances the pattern uniformity by minimizing the mask's warp. Theglass stage can also control the gap between the mask and the substrate by the coarse and fine motioncontrol. The mask stage can adjust the posture of photomask to the position of substrate by imageprecessing method. The galss stage for the gap control and the mask stage for the alignment aredesigned independently for each function.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.1167-1168
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• 2004

Polarized ultraviolet irradiation techniques have been developed recently to produce alignment of liquid crystals (LC). Because of the excellent thermal stability and the alignment ablility of polyimides, polyimides has attracted considerable research interest for the photoinduced alignment layer. Hasegawa and Taira confirmed homogeneous alignment of LC by the decompostion of a polyimide induced by lineraly ultra-violet polarized light. It was reported that ultraviolet visible absorption spectra of a polyimide alignment film showed a remarkable change upon irradiation. In this study, we synthesized phthalic polyimide and a naphthalenic polyimide in order to investigate the effect of the polyimide structure. Some difference in terms of the photo-induced molecular orientaion of liquid crystals were observed with the polyimide structure.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회A
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• pp.1939-1943
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• 2008

Deformation of a mold is measured and analyzed in alignment and curing processes of UV-Imprint Lithography. We are focused on mold deformation caused by a UV resin, which is laminated between a mold and a target glass-panel. The UV resin is viscous in case of liquid state, and the resin will be solidified when being exposed by the ultra-violet light. The viscosity of the resin causes shear force on the mold during the alignment process. Moreover, the shrinkage during phase change from liquid to solid may cause residual stress on the mold. The experiments for measuring temperature and strain are made during alignment and curing process. Strain-gages and thermocouples are used for measuring the strain and variation of temperature on several points of the mold, respectively. The deformation of mold is also simulated and analyzed. The simulation results are compared with the experiments. Finally, sources of alignment errors in large area UV-nanoimprint lithography are discussed.

• 전기학회논문지P
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• 제62권4호
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• pp.223-226
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• 2013

In this study, we investigated the electro-optical(EO) characteristic of fringe-field switching(FFS) mode cell by the two kinds of ultraviolet(UV) alignment method on the organic thin film(polyimide: PI). The suitable organic layersfor FFS cell and the aligning capabilities of nematic liquid crystal(NLC) using the in-situ photoalignment method were studied Disclination is observed after conventional photoalignment method for 1h, and in-situ photoalignment method for 1h. Monodomain alignment of the NLC can be observed via in-situ photoalignment method for 2h and 3h. It is considered that NLC alignment is due to photo-depolymerization of the polymer with oblique non-polarized UV irradiation on PI surface. An unstable V-T curve of UV-aligned FFS-LCD with conventional photoalignment method can be achieved. However, a stable V-T curve of UV-aligned FFS-LCD with in-situ photoalignment method(1h), and V-T curve of UV-aligned FFS-LCD with in-situphotoalignment method was much stable comparing with that of other UV-aligned FFS-LCD's. As a result, more stable EO performanceof UV-aligned FFS-LCD with in-situphotoalignment method for 3h is obtained than that of the other UV-aligned FFS-LCD's.

• 한국재료학회지
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• 제16권10호
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• pp.619-623
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• 2006

Selective vapor deposition of conductive poly(3,4-ethylenedioxythiophene) (PEDOT), thin films has been carried out on self assembled monolayers patterned oxide substrate. Since the 3,4-ethylenedioxythiophene(EDOT) monomer can be polymerized only in the presence of oxidant such as $FeCl_3$, the PEDOT thin film is selectively deposited on patterned $FeCl_3$, which only adsorbs on the partly removed SAMs region due to the inability of $FeCl_3$ to adsorb on SAMs. Therefore, the partly removed SAMs can act as an adsorption layer for the $FeCl_3$ and also as a glue layer for the deposition of PEDOT, resulting in the significantly increased adhesion of PEDOT to $SiO_2$ substrate. The use of UV lithography and Cr patterned quartz mask provided the formation of SAMs patterns on oxide substrates, which allowed for the selective deposition of conductive PEDOT thin films.$^{oo}The$ new process was successfully developed for the selective deposition of PEDOT thin films on SAMs patterned oxide substrate, providing a new way for the patterning of vapor phase deposition of PEDOT thin films with accurate alignment and addressing the inherent adhesion issues between PEDOT and dielectrics.