• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.1220-1223
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• 2003

The UV nanoimprint technology uses the UV light as the energy source. Because the imprint process is carried out in room temperature and low pressure, this technology has its own merits compared to the thermal nanoimprint. However, in UV nanoimprint technology, a resin which has low viscosity is essential for the improvement of accuracy. In this research, a resin (named as IMS01) which has relatively low viscosity was developed. And a measurement system was developed in order to measure the degree of cure of the resin. The measurement system which is composed of FT-IR, UV light source and optical guide can measure the degree of cure in real time. From the experimental results, it was found that the IMS01 is cured more rapidly than existing resin (PAK01).

• 한국인쇄학회지
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• 제18권1호
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• pp.13-24
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• 2000

UV-curable resin has the properties of quick-drying, high productivity at low temperature, energy, space saving, solventless, non-polluting and low-stinking, and thus, UV-curing system has been widely used in the fields of printing inks, adhesives, paints and coating agents. This study has been executed to develop a new functionnal material by the polymerization induced phase separation. The results obtained were as follows. As for the curing properties of the monomer/prepolymer/alkyd resin blends, it was found out that there was a peak by the polymerization induced phase separation when measuring the changes of viscosity and elasticity. It was also found out that such polymerization phase separation occurred in case that the alkyd resin contents were 20wt% and 30wt% and not found at the contents of 40wt%. Therefore, it would be desirable to maintain the contents of alkyd resin at less than 30wt% in order to use the polymerization induced phase separation.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 춘계학술대회 논문집
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• pp.672-675
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• 2005

To imprint 70-nm wide line-patterns, we used a newly developed ultraviolet nanoimprint lithography (UV-NIL) process in which an elementwise patterned stamp (EPS), a large-area stamp, and pressurized air are used to imprint a wafer in a single step. For a single-step UV-NIL of a 4' wafer, we fabricated two identical $5'\times5'\times0.09'(W{\times}L{\times}H)$ quartz EPSs, except that one is with nanopatterns and the other without nanopatterns. Both of them consist of 16 small-area stamps, called elements, each of which is $10\;mm\;\times\;10\;mm$. UV-curable low-viscosity resin droplets were dispensed directly on each element of the EPSs. The volume and viscosity of each droplet are 3.7 nl and 7 cps. Droplets were dispensed in such a way that no air entrapment between elements and wafer occurs. When the droplets were fully pressed between ESP and wafer, some incompletely filled elements were observed because of the topology mismatch between EPS and wafer. To complete those incomplete fillings, pressurized air of 2 bar was applied to the bottom of the wafer for 2 min. Experimental results have shown that nanopatterns of the EPS were successfully transferred to the resin layer on the wafer.

• 한국정밀공학회지
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• 제25권2호
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• pp.123-130
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• 2008

A 3D structure production method for microstereolithography is a useful way that produces complex structures with flexible processes and low cost. Several UV curable resins were blended and the optimal resin for micro-lens fabricate was selected through viscosity, workability and transmission tests. It consists of 1, 6 - Hexanediol diacrylate with 15 Apha and Isobornyl acrylate for reducing some shrinkage. When fabricating a micro-lens array on large surface, some distortion of shape occurred because of the surface tension between cured part. To overcome this problem, the optimal processing conditions were derived from considering amount of the resin and surface tension. Large surface Micro-lens array, which are a type of elliptical convex and consist of 18,000 micro-lens in the range of 2cm*2cm were fabricated. The focal length to the X-axis and Y-axis were calculated. To verify the performance, measure an energy distribution of transmitted light from the Large surface Micro-lens array.