• Proceedings of the KIEE Conference
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• 2006.10a
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• pp.46-47
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• 2006

Ga-doped ZnO nanowires have been synthesized by pulsed laser deposition (PLD) in furnace on gold coated (0001) sapphire substrates. The effect of repetition rate on structural and optical properties of Ga-doped ZnO nanowires are investigated. By controlling repetition rate, the diameter of nanowires is varied between about 60 and 100 nm, and the length of nanowires is varied between about 2 and 4 um. The X-ray diffraction (XRD) reveals the structural defects induced by the Ga doping. The room temperature photoluminescence (PL) spectra of Ga-doped ZnO nanowires show strong UV emission between 382.394 and 385.279 nm with negligible visible emission.

• Korean Journal of Optics and Photonics
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• v.16 no.1
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• pp.103-108
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• 2005

Second harmonic generation(SHG) by guided phase matching is observed in waveguide structure using the anomalous dispersion of a poled polymer. The second harmonic TM$_{0}$ guided mode could be generated from the fundamental TM$_{0}$ guided mode and then the second harmonic power was higher than any other phase matchable mode because the overlap integral between the fundamental and the second harmonic wave was the largest in the theoretical analysis. Near UV SHG(370 nm) was obtained from the fundamental wavelength of Ti-sapphire laser(740 nm).

• Proceedings of the KIEE Conference
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• 2005.07c
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• pp.1884-1886
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• 2005

KrF 펄스 레이저 증착법(pulsed laser deposition: PLD)으로 ZnO 박막을 증착하여 평판 디스플레이 소자 구동용 박막 트랜지스터(thin film transistor) 소자를 제작하였다. 전도성이 높은 실리콘웨이퍼(c-Si, 하부전극) 기판 위에 LPCVD 법으로 silicon nitride 박막을 절연막으로 형성하고, 다양한 공정 조건에서 펄스 레이저 증착법으로 제작한 ZnO 박막을 증착하여 채널층으로 하였으며, Al 박막을 증착하고 패터닝하여 소스 및 드레인 전극으로 하였다. ZnO 박막의 증착 시에 기판 온도를 다양하게 조절하고 산소 분압을 변화시켜 ZnO 박막의 특성을 조절하였다. 제작된 박막의 표면특성은 AFM(atomic force microscopy)로 분석하고, 결정특성은 XRD(X-ray diffraction)로 조사하였다. ZnO 박막의 전기적 특성은 Hall-van der Pauw 법으로 측정하였고, 광학 투과도(optical transparency)를 UV-visible photometer로 조사하였다. ZnO-TFT 소자는 $10^6$ 수준의 on-off ratio와 $2.4{\sim}6.1cm^2/V{\cdot}s$의 전계효과이동도(field effect mobility)를 보였다.

• Proceedings of the KAIS Fall Conference
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• 2003.06a
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• pp.307-310
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• 2003

In order to analyze the concentration of cetylpyridinium chloride(CPC), a widely used cationic surfactant, we developed a simple and compact spectrometer, which consisted of a diode laser and a photodiode detector. Preliminary results are described here on the performances of the system in terms if the stability of output intensity, sensitivity, and reproducibility. Data on the comparisons of the system with the conventional UV-VIS spectrometer are also given. With the instrument, the concentration of CPC between 3${\times}$10$\^$-5/M and 1.1${\times}$ 10$\^$-4/M are calibrated as a correlation coefficient of 0.9635. The results shown here indicate a potential for developing a portable spectrometer useful for analyzing concentrations of CPC.

• Proceedings of the KWS Conference
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• 2009.11a
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• pp.109-109
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• 2009

최근 유럽의 완성차 업체에서 조립라인에 적용을 시작하고 있는 레이저 원격 용접기술은 저항 점용접에서의 문제점들을 동시에 해결하고 작업 시간을 획기적으로 감소시켜 생산성을 향상시킬 수 있는 용접공정으로 떠오르고 있다. 레이저 원격 용접기술은 레이저 빔을 용접부의 원거리에서 조사하여 용접하는 기술로서 레이저의 초점거리와 갈바노미터의 고속 이송를 이용한 최첨단 용접공정이다. 높은 생산성을 유지 하기 위하여 정확한 용접 컨트롤이 필요하지만, 레이저 용접의 경우 용접시 안전 문제로 육안으로 관찰하기가 힘들다. 이러한 문제를 해결하기 위하여 모니터링이 필수적이다. 기존의 레이저 모니터링으로는 음향 센서를 이용하여 음향을 측정하는 방법이나 UV 센서, IR 센서 등의 빛을 이용한 방법이 많이 사용되어왔다. 하지만 이 방법들은 간접적인 방법들로 노이즈에 민감하고 또 설치가 까다로운 단점이 있었다. 본 연구에서는 CCD 카메라를 이용하여 시스템의 복잡함을 줄이고 더 정확하고 빠르게 용접 현상을 관찰하기 위하여 동축 모니터링 시스템을 이용하였으며, 이를 통해 Keyhole을 관찰하고 센서를 이용한 용접 변수(레이저 출력, 용접 속도 등)의 변화에 따른 용접 현상을 규명하였다.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2003.10a
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• pp.428-433
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• 2003

In this study, we composed algorithm of DIAL(Differential Absorption Lidar). we investigated the absorption spectrum of $O_3$, S $O_2$ and N $O_2$ dependent on wavelengths using data base UV-Bank and determine the optimized wavelength model. Here, the selected optimal wavelengths are 292.00(λ$_{on}$ ), 295.20(λ$_{off}$) for $O_3$, 299.38(λ$_{on}$ ), 300.05(λ$_{off}$) for S $O_2$ and 448.00(λ$_{on}$ ), 449.85(λ$_{off}$) for N $O_2$. In particular, we established the supposed model of DIAL and simulated the error of measuring distance using the selected optimal wavelength. In the model-I with telescope of 300 mm diameter, laser energy of 3 mJ and transmission of 10000 shots, maximum distances are 4 km for $O_3$ measurement and 5 km for S $O_2$ and N $O_2$ measurements. Also, in the model-II with telescope of 600 mm diameter, laser energy of 30 mJ and transmission of 10000 shots, maximum distances are 13 km for S $O_2$ and N $O_2$ measurements.ments.

• Journal of Korean Society of Environmental Engineers
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• v.22 no.1
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• pp.113-120
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• 2000

In this study, we composed algorithm for DIAL(Differential Absorption Lidar). We investigated the absorption spectrum of $O_3$, $SO_2$ and $NO_2$ dependent on wavelengths using data base UV-Bank and determined the optimized wavelength model. Here, the selected optimal wavelengths are 292.00(${\lambda}_{on}$), 295.20 (${\lambda}_{off}$) for $O_3$, 299.38(${\lambda}_{on}$), 300.05 (${\lambda}_{off}$) for $SO_2$ and 448.00(${\lambda}_{on}$), 449.85(${\lambda}_{off}$) for $NO_2$. In particular, we established the supposed model of DIAL and simulated the error of measuring distance using the selected optimal wavelength. In the model-I with telescope of 300 mm diameter, laser energy of 3 mJ and transmission of 10000 shots, maximum distances are 4 km for $O_3$ measurement and 5 km for $SO_2$ and $NO_2$ measurements. Also, in the model-II with telescope of 600 mm diameter, laser energy of 30 mJ and transmission of 10000 shots, maximum distances are 13 km for $SO_2$ and $NO_2$ measurements.

• Proceedings of the SCSK Conference
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• 2003.09a
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• pp.178-191
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• 2003

OMC is essentialiy necessary compound in sun goods as organic UV protecting products. But the skin-trouble problem is raising because of skin penetration of OMC. In this study, non-capsulated pure OMC was compared with Organic-Inorganic-Nano-hybrid OMC for skin penetration force and SPF degree. Organic- Inorganic Nano-Hybrid OMC is OMC trapped in the pore of the mesoporous silica synthesized by the sol-gel method after OMC is nanoemulsified in the system of the hydrogenated Lecithin/ Ethanol/caprylic/capric triglyceride/OMC/water. OMC- nano- emulsion was obtained by a microfluidizing process at 1000bar and then micelle size in the nanoemulsion solution is 100-200nm range. Mesoporous silica nano-hybrid OMC was prepared by the process; surfactant was added in dissolved OMC-Nanoemulsion, then the rod Micelle was formed. OMC-nanoemulsion was capsulated in this rod Micelle and then silica precursor was added in the OMC-nanoemulsion solution. Through the hydrolysis reaction of the silica precursor, mesoporous silica concluding OMC-Nanocapsulation was obtained. The nano-hybrid surface of this OMC-Nanoemulsion-Inorganic system was treated with polyalkyl-silane compound. OMC-Mesoporous silica Nano-hybrids coated with polyalkyl-silane compound show the higher sun protecting factor (SPF Analyzer: INDEX 10-15) than pure OMC and could reduce a skin penetration of OMC. The physico-chemical properties of these nano-hybrids measured on the SPF index, partical size, strcture, specific surface area, pore size, morphology, UV absorption, rate of the OMC dissolution using SPF Analyzer, Laser light scattering system, XRD, BET, SEM, chroma Meter, HPLC, Image analyzer, microfluidizer, UV/VIS. spectrometer.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.5 no.3
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• pp.197-203
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• 2004

New lithography techniques are employed for the patterning of arbitrary shapes in nanometer scale. When, in the photolithography, the electromagnetic waves such as UV and X-ray are incident on the mask patterned in nanometer scale, the diffraction effect is unavoidable and degrades images of the mask imprinted on wafer. Only a convex lens is well-known Fourier transformer. It is possible to make the mask Fourier-transformed with the convex lens, even though the size of pattern on the mask is very large compared to the wavelength of electromagnetic wave. If the mask, modified according to new technique described in this paper, was placed at the front of the lens and was illuminated with laser beam, the nanometer-size patterns are only formed on the plane called Fourier transform plane. The new method presented here is quite simple setup and comparable with present and next generation lithographies such as UV/EUV photolithograpy and electron projection lithography when compared in attainable minimum linewidth. In this paper, we showed our theoretical research work in the field of Fourier optics, . In the near future, we are going to verify this theoretical work by experiments.

• Korean Journal of Optics and Photonics
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• v.20 no.6
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• pp.334-338
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• 2009

Recently, with increasing demand for flat-panel display product, methods for large area patterning are required. TIR (total internal reflection) holographic photo-lithography isstudied as one of the methods of large area lithography. In conventional TIR holography, light sources for hologram recording and image reconstruction are coherent beams such as laser beams. If the image is reconstructed with an incoherent light source such a UV lamp, the image noise from the coherence of light will be reduced and the UV lamp will be a better light source for large area exposure. We analyzed the effect of spectral bandwidth and angular bandwidth of the light source in image reconstruction and verified image blurring with experiments. For large area patterning which has micro-scale line width, it is expected that TIR holographic photo lithography by UV lamp will become a low-noise and low-priced technique.