• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1934-1938
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• 2008

Formation of air bubble is the one of common defects in UV nano imprint lithography. Location of dispensing and volume of droplets are among the most important parameters in the process. ]n this study, UV curable resin droplets with different volumes were dispensed at different locations and pressed to investigate air bubble formation. By varying volume of droplet and dispensing location, process conditions were found for minimum air bubble area.

• Journal of Fashion Business
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• v.11 no.6
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• pp.52-61
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• 2007

To increase the ultraviolet radiation (UVR) protection of cotton fabric, ultraviolet protection (UVP) materials were treated onto cotton fabric using a new technique, UV-curing. A photocrosslinkablepolymer, poly(ethylene glycol) dimethacrylate was used as a UV-curable resin in the presence of a small amount of photoinitiator. Two kinds of UVP materials were used, UV-absorber, 2,2'-dihydroxy-4-methoxy benzophenone, and UV-scatterer, $TiO_2/ZnO$ Pad-dry-cure method in employing these materials onto cotton was also conducted to compare the effectiveness and the washfastness of UVP treatment between curing methods. UVP treated cotton fabric showed a moderate increase in UVP in case of 2,2'-dihydroxy-4-methoxy benzophenone treatment and a high increase in case of $TiO_2/ZnO$. UV-curing method increased the washfastness of UVP property of $TiO_2/ZnO$ treated cotton fabrics. However, in case of 2,2'-dihydroxy-4-methoxy benzophenone, similar wash fastnesses of UV-cured and pad-dry-cured cotton were observed. It can be presumed that 2,2'-dihydroxy-4-methoxy benzophenone was not significantly affected by water since its hydrophobicity. In short, UV-curing of UVP materials onto cotton was successfully done, and treated cotton fabrics showed the increased UVP properties and an increased washfastness in some extent.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.05a
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• pp.623-624
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• 2010

• Journal of the Korean Society of Industry Convergence
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• v.22 no.5
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• pp.467-473
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• 2019

In this study, approached to improve durability of the multi-functional nano-pattern fabricated on the curved lens surface using nanoimprint lithography (NIL) was proposed, and the effects of the proposed methods on functionality after wear test were examined. To improve the mechanical property of ultraviolet(UV)-curable resin, UV-NIL was conducted at the elevated temperature around $60^{\circ}C$. In addition, micro/nano hierarchical structures was fabricated on the lens surface with a durable film mold. Analysis on the worn surfaces of nano-hole pattern and hierarchical structures and measurements on the static water contact angle and critical water volume for roll-off indicated that the UV curing process with elevated temperature is effective to maintain wettability by increasing hardness of resin. Also, it was found that the micro-scale pattern is effective to protect nano-pattern from damage during wear test.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.40-44
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• 2008

The interfacial adhesion energy between resist and a substrate is very important due to resist pull-off problems during separation of mold from a substrate in nanoimprint process. And effect of substrate surface roughness on interfacial adhesion energy is very important. In this paper, we have treated glass wafer surface using $CF_4$ gas for increase surface roughness and it has tested interfacial adhesion properties of UV resin/glass substrate interfaces by 4 point bending test. The interfacial adhesion energies by bare, 30, 60 and 90 sec surface treatments are 0.62, 1.4, 1.36 and 2 $J/m^2$, respectively. The test results showed quantitative comparisons of interfacial fracture energy (G) effect of glass wafer surface roughness.

• Transactions of Materials Processing
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• v.19 no.2
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• pp.73-78
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• 2010

Recently, many researches on the development of super-hydrophobic surface have been concentrated on the fabrication of nano-patterned products. Nano-patterned mold is a key to replicate nano-patterned products by mass production process such as injection molding and UV molding. The present paper proposes the new fabricating method of nano-patterned mold at low cost. The nano-patterned mold was fabricated by electroforming the anodic aluminum oxide membrane filled with UV curable resin in nano-hole by capillary phenomenon. As a result, the final mold with nano-patterns which have the holes with the diameter of 100~200 nm was fabricated. Furthermore, the UV-molded products with clear nano- patterns which have the pillars with the diameter of 100~200nm were achieved.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.7
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• pp.777-782
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• 2011

Micro features on the surface are well-known to have significant effects on optical or mechanical properties such as the optical interference, reflectance at the surface, contact angle, interfacial friction, etc. These surface micro features are increasingly employed to enhance the functionality of the applications in various application areas such as optical components for LCD or solar panel. Diverse surface features have been proposed and some of them are showing excellent efficiency or functionality, especially in optical applications. Most applications employing the micro features need manufacturing process for mass production and the injection molding and roll-to-roll forming, which are typical processes for mass production adopting polymeric materials, may be also preferred for micro patterned plastic product. Since the functionality or efficiency of the surface structures generally depends on the shape and the size of the structure itself or the array of the structures on the surface, it would be very important to replicate the features very precisely as being designed during the molding the micro pattern applications. In this paper, a series of research activities is introduced for roll-to-roll forming of micro patterned film including filling of patterns with UV curable resin, demolding of surface structures from the roll tool, control of surface energy and cure shrinkage of resin and dispose time and intensity of the UV light for curing of UV curable resin.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.521-522
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• 2008

An etch-less simple method was developed to fabricate two-dimensional nanostructures on glass substrate directly by using UV curable polymer resin and UV nanoimprint lithography in order to improve output coupling efficiency of OLEDs. OLEDs integrated on nanoimprinted substrates enhanced electro-luminance intensity by up to 50% compared with the conventional device.

• Journal of the Korean Graphic Arts Communication Society
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• v.18 no.2
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• pp.113-124
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• 2000

It is well known that the characteristics of liquid crystal polymer composite(LCPC) films are possessed of large-area and flexible display, polarizer free, high contrast, wide angle of visual filed and high responsiveness. In this study, we have investigated to the best optimal mixing rates chiral nematic liquid crystals and UV-curable resins having different properties acrylate moleculars. The purpose of this study has been the development of new functional application with liquid crystal polymer composite films. For example the films were applied a new thermal sensor. In results, best phase separation behaviors turned out liquid crystal/monomer/oilgomer mixture system.

• KSBB Journal
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• v.22 no.6
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• pp.433-437
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• 2007

A constant desire has been to fabricate nanopatterns for biochip and the Ultraviolet-nano imprint lithography (UV-NIL) is promising technology especially compared with thermal type in view of cost effectiveness. By using this method, nano-scale to micro-scale structures also called nanopore structures can be fabricated on large scale gold plate at normal conditions such as room temperature or low pressure which is not possible in thermal type lithography. One of the most important methods in fabricating biochips, immobilizing, was processed successfully by using this technology. That means immobilizing proteins only on the nanopore structures based on gold, not on hardened resin by UV is now possible by utilizing this method. So this selective nano-patterning process of protein can be useful method fabricating nanoscale protein chip.