• 제목/요약/키워드: UV Process

검색결과 1,514건 처리시간 0.027초

개선된 플라즈마 공정을 이용한 Ralstonia Solanacearum 불활성화에 관한 연구 (A Study on the Ralstonia Solanacearum Inactivation using Improved Plasma Process)

  • 김동석;박영식
    • 한국환경과학회지
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    • 제23권3호
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    • pp.369-378
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    • 2014
  • Effect of improvement of the dielectric barrier discharge (DBD) plasma system on the inactivation performance of bacteria were investigated. The improvement of plasma reactor was performed by combination with the basic plasma reactor and UV process or combination with the basic plasma reactor and circulation system which was equipped with gas-liquid mixer. Experimental results showed that tailing effect was appeared after the exponential decrease in basic plasma reactor. There was no enhancement effect on the Ralstonia Solanacearum inactivation with combination of basic plasma process and UV process. The application of gas-liquid mixing device on the basic plasma reactor reduced inactivation time and led to complete sterilization. The effect existence of gas-liquid mixing device, voltage, air flow rate (1 ~ 5 L/min), water circulation rate (2.8 ~ 9.4 L/min) in gas-liquid mixing plasma, plasma voltage and UV power of gas-liquid mixing plasma+UV process were evaluated. The optimum air flow rate, water circulation rate, voltage of gas-liquid mixing system were 3 L/min, 3.5 L/min and 60 V, respectively. There was no enhancement effect on the Ralstonia Solanacearum inactivation with combination of gas-liquid mixing plasma and UV process.

Nd:YAG UV 레이저를 이용한 연성회로 다층기판 절단특성에 대한 연구 (An analysis of Cutting Characteristic of Multilayer FPCB using Nd:YAG UV Laser System)

  • 최경진;이용현
    • 한국정밀공학회지
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    • 제27권3호
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    • pp.9-17
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    • 2010
  • The FPCB is used for electronic products such as LCD display. The process of manufacturing FPCB includes a cutting process, in which each single FPCB is cut and separated from the panel where a series of FPCBs are arrayed. The most-widely used cutting method is the mechanical punching, which has the problem of creating burrs and cracks. In this paper, the cutting characteristics of the FPCB have been experimented using Nd:YAG DPSS UV laser as a way of solving this problem. To maximize the industrial application of this laser cutting process, test samples of the multilayered FPCB have been chosen as it is actually needed in industry. The cutting area of the FPCB has four different types of layer structure. First, to cut the test sample, the threshold laser cut-off fluence has been found. Various combinations of laser and process parameters have been made to supply the acquired laser cut-off fluence. The cutting characteristics in terms of the variation of the parameters are analyzed. The laser and process parameters are optimized, in order to maximize the cutting speed and to reach the best quality of the cutting area. The laser system for the process automation has been also developed.

광전기촉매 공정과 전기/UV 공정을 이용한 Rhodamine B의 색 제거 (Decolorization of a Rhodamine B Using Photoelectrocatalytic and Electrolytic/UV Process)

  • 김동석;박영식
    • 한국환경과학회지
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    • 제17권9호
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    • pp.1023-1032
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    • 2008
  • The feasibility study of the application of the photoelectrocatalytic and electrolytic/UV decolorization of Rhodamine B (RhB) was investigated in the photoelectrocatalytic and electrolytic/UV process with $TiO_2$ photoelectrode and DSA (dimensionally stable anode) electrode. Three types of $TiO_2$ photoelectrode were used. Thermal oxidation electrode (Th-$TiO_2$) was made by oxidation of titanium metal sheet; sol-gel electrode (5G-$TiO_2$) and powder electrode (P-$TiO_2$) were made by coating and then heating a layer of titania sol-gel and slurry $TiO_2$ on titanium sheet. DSA electrodes were Ti and Ru/Ti electrode. The relative performance for RhB decolorization of each of the photoelecoodes and DSA electrodes is: Ru/Ti > Ti > SG-$TiO_2$ > Th-$TiO_2$. It was observed that photoelectrocatalytic decolorization of RhB is similar to the sum of the photocatalytic and electrolytic decolorization. Therefore the synergetic effect was not showed in pthotoelectrocatalytic reaction. $Na_{2}SO_{4}$ and NaCl showed different decolorization effect between pthotoelectrocatalytic and electrolytic/UV reaction. In the presence of the NaCl, RhB decolorization of Ru/Ti DSA electrode was higher than that of the other photoelectrode and Ti electrode. Optimum current, NaCl dosage and UV lamp power of the electrolytic/UV process (using Ru/Ti electrode) were 0.75 A, 0.5 g/L and 16 W, respectively.

4-nonylphenol의 오존산화 처리반응에 관한 연구 (A Study on Ozonation of 4-nonylphenol)

  • 이철규
    • 한국물환경학회지
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    • 제33권6호
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    • pp.736-743
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    • 2017
  • In this study, 4-nonylphenol (4-NP), an endocrine disrupting chemical, was removed by ozone treatment processes under the various experimental conditions including UV irradiation, $TiO_2$ addition. The ozone flow rate and concentration were maintained at $1.0L{\cdot}min^{-1}$ and $70{\pm}5mg{\cdot}L^{-1}$. The pH, COD and TOC of the samples were obtained every 10 minutes for 60 minutes in laboratory scale batch reactor. We found that the combination of UV irradiation and $TiO_2$ addition for ozonation improves the removal efficiency of COD and TOC in 4-NP aqueous solution. In case of the $O_3/UV/TiO_2$ system, COD and TOC were greatly reduced to 85.3 ~ 94.0% and 89.2 ~ 97.2%, respectively. 4-NP degradation rate constants, $k_{COD}$ and $k_{TOC}$, were calculated based on the COD and TOC values. Significantly, $k_{COD}$ and $k_{TOC}$ were improved in the $O_3/UV/TiO_2$ treatment process compared with single $O_3$ process, because the oxidation and the mineralization of 4-NP were increased by generating of the hydroxyl radical. The $k_{COD}$ and $k_{TOC}$ were obtained to be $5.81{\times}10^{-4}{\sim}10.8{\times}10^{-4}sec^{-1}$ and $11.9{\times}10^{-4}{\sim}19.4{\times}10^{-4}sec^{-1}$ in the $O_3/UV/TiO_2$ process. Activation energy ($E_a$) of ozone oxidation reaction based on $k_{COD}$ and $k_{TOC}$ were increased in order of $O_3/UV/TiO_2$ < $O3/UV$ < $O_3/TiO_2$ < $O_3$ process. It was confirmed that the addition of $TiO_2$ and UV irradiation to the ozone oxidation reaction significantly reduced the $E_a$ value and the degradation of 4-NP.

UV-LED를 이용한 광조형 장치 개발 (Development of Stereolithography Apparatus by using UV-LED)

  • 윤해룡;고태조;김호찬
    • 한국기계가공학회지
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    • 제13권2호
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    • pp.15-20
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    • 2014
  • The stereolithography(SL) process is a type of fabrication technology which relies on photopolymerization. It has a relatively simple fabrication process and a resolution of several tens of ${\mu}m$. Recently, SL technology has been applied to various areas, such as bioengineering and MEMS devices, due to the development of advanced materials. This technologycan be divided intothe scanning(SSL) and projection (PSL) types. In this paper, in stereolithography, parts are fabricated by curing photopolymeric resins with light. The application of stereolithography can now include fabricated parts. This process, called stereolithography, can fabricate parts by taking into account theirdegrees of geometry complexity. In particular, UV-LED stereolithography can perform quite rapid fabrication in which specific cross-sections are cured upon exposure to light.

오존을 산화제로 사용한 다양한 고급산화 공정에 의한 TNT Red Water의 처리 (Treatment of TNT Red Water by the Ozone-based Advanced Oxidation Processes)

  • 전정철;권태옥;문일식
    • Korean Chemical Engineering Research
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    • 제45권3호
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    • pp.298-303
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    • 2007
  • 오존을 중심으로 한 다양한 조합의 고급산화 공정(advanced oxidation process: AOP)을 이용하여 2,4,6-trinitrotoluene (TNT) 제조 공정에서 발생되는 난분해성 폐수인 red water(RW)의 유기물 및 색도 제거 연구를 수행하였다. 적용된 고급산화 공정은 $O_3$, $UV/O_3$, $UV/O_3/H_2O_2$, $UV/O_3/H_2O_2/Fe^{2+}$ 공정이었으며, 유기물 및 색도 제거 효과는 $O_3 < $UV/O_3/H_2O_2/Fe^{2+}$ 공정의 순서로 나타났다. $UV/O_3/H_2O_2/Fe^{2+}$ 공정에서 최적 분해조건은 오존 유량 0.053 g/min, $H_2O_2$ 주입농도 10 mM, $FeSO_4$ 주입농도 0.1 mM로 나타났으며, 90 min 동안 유기물 및 색도 제거율은 각각 96, 100%로 나타났다. tert-butyl alcohol(t-buOH)을 이용한 수산화 라디칼(hydroxyl radical : ${\cdot}OH$)의 scavenging 실험을 통해 오존에 UV, $H_2O_2$, $FeSO_4$를 산화제로 조합함으로써 수산화 라디칼의 발생량을 더욱 증가시키고 유기물 제거율을 효과적으로 향상시킬 수 있음을 확인하였다.

자외선 활성화 원자층 성장 기술을 이용한 상온에서 TiO2 박막의 제조 (Fabrication of TiO2 Thin Films Using UV-enhanced Atomic Layer Deposition at Room Temperature)

  • 이병훈;성명모
    • 한국진공학회지
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    • 제19권2호
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    • pp.91-95
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    • 2010
  • 상온에서 고품질의 $TiO_2$ 박막을 제조하기 위하여 titanium isopropoxide [Ti(OCH$(CH_3)_2)_4$, TIP]와 $H_2O$을 이용한 자외선 활성화 원자층 증착(UV-enhanced atomic layer deposition: UV-ALD) 기술을 개발하였다. UV-ALD 기술은 상온에서 자체제어 표면 반응(self-limitting surface reaction)을 통해 균일하고 고품위 등방 특성을 갖는 순수한 $TiO_2$ 박막 증착이 가능하였다. ALD 반응 시 조사되는 자외선은 Si 기질 위에 우수한 접착력을 가지는 고품질의 $TiO_2$ 박막을 얻는데 효과적이었다. UV-ALD 기술은 높은 단차비(aspect ratio)를 가지는 trench 기질 위에 균일한 $TiO_2$ 박막을 증착하는 데에 적용되었다.

산업폐수 재이용을 위한 고급산화공정 시스템 연구 (A Study of Advanced Oxidation Process for Reuse of Industrial Wastewater)

  • 김성준;김명희;원찬희;황정석;이길용
    • 한국물환경학회지
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    • 제26권4호
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    • pp.580-584
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    • 2010
  • As water becomes more scarce around the world the reuse of treated wastewater is being recenlty considered as indispensible trend we need to follow. Especially, industrial area consuming large amount of water has been encouraged to reuse the treated wastewater to secure sufficient water for the production of merchandise. In this study, a study of advanced oxidation process for treatment of industrial wastewater. The treatment performance of UV and ozoznation and five types advanced oxidation processes such as UV/AC, UV/Catalyst, $O_3$/Catalyst, UV/$O_3$/Catalyst was experimentally investigated for reuse of industrial wastewater. The removal efficiency of $COD_{Cr}$, color were relatively evaluated in each treatment unit simulated outflow water of wastewater treatment area. UV/$O_3$/Catalyst process showed the highest $COD_{Cr}$ remaval and color remaval among proposed oxidation process.

Enhanced Lycopene Production by UV-C Irradiation in Radiation-Resistant Deinococcus radiodurans R1

  • Kang, Chang Keun;Yang, Jung Eun;Park, Hae Woong;Choi, Yong Jun
    • Journal of Microbiology and Biotechnology
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    • 제30권12호
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    • pp.1937-1943
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    • 2020
  • Although classical metabolic engineering strategies have succeeded in developing microbial strains capable of producing desired bioproducts, metabolic imbalance resulting from extensive genetic manipulation often leads to decreased productivity. Thus, abiotic strategies for improving microbial production performance can be an alternative to overcome drawbacks arising from intensive metabolic engineering. Herein, we report a promising abiotic method for enhancing lycopene production by UV-C irradiation using a radiation-resistant ΔcrtLm/crtB+dxs+ Deinococcus radiodurans R1 strain. First, the onset of UV irradiation was determined through analysis of the expression of 11 genes mainly involved in the carotenoid biosynthetic pathway in the ΔcrtLm/crtB+dxs+ D. radiodurans R1 strain. Second, the effects of different UV wavelengths (UV-A, UV-B, and UV-C) on lycopene production were investigated. UV-C irradiation induced the highest production, resulting in a 69.9% increase in lycopene content [64.2 ± 3.2 mg/g dry cell weight (DCW)]. Extended UV-C irradiation further enhanced lycopene content up to 73.9 ± 2.3 mg/g DCW, a 95.5% increase compared to production without UV-C irradiation (37.8 ± 0.7 mg/g DCW).