• 접착 및 계면
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• 제18권2호
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• pp.59-67
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• 2017

스마트 모바일 산업의 성장에 따라 부품의 집적화가 가속화 되고 있다. 이러한 부품의 집적화는 부품간의 간섭현상문제를 야기했으며, 이를 해결하기 위한 전자파 차폐 기술의 중요성이 부각되고 있다. 전자파 차폐 기술은 전자파를 반사하거나 흡수하는 방식으로 구현되며, 일반적으로 전도성물질이 전자파 차폐에 활용된다. 최근 산업의 변화에 따라 투명 차폐기술이 요구되고 있으며, 본 연구에서는 임프린팅 기술을 활용한 음각 구조 패턴에 전도성 복합 바인더를 충진 하여 투명 차폐소재를 제안하고자 하였다. 전도성 복합 바인더를 제조하기 위하여 UV 중합 아크릴 바인더를 활용하고 전도성 부여를 위해 구상, 판상 및 적층상의 은 입자를 활용하였다. 은 입자의 구조적인 특징에 따라 경화특성, 전도성 그리고 접착력의 변화를 확인하였다. 경화과정에서는 구상 입자의 활용이 가장 효율적이었으며, UV에 취약한 구조를 보완할 추가적인 경화 시스템이 요구되었다. 전도성평가에서는 적층상 구조가 우수한 특성을 보였다. 접착력은 구상이 가장 우수한 특성을 보였으며, 표면에서의 불규칙성에 따른 결과로 평가된다. 최종적으로 이를 활용한 패턴필름은 우수한 투명특성을 보여주었다.

• 한국기계가공학회지
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• 제10권4호
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• pp.76-81
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• 2011

UV imprinting process can manufacture high-functional optical components with low cost. If hard polymers can be used as transparent molds at this process, the cost will be much lower. However, there are limited researches to predict the machinability and the burr of hard polymers. Therefore, a new method to predict them by analyzing load-depth curves which can be obtained by the instrumented indentation test was developed in this study. The load-depth curve contains elastic deformation and plastic deformation simultaneously. The ratio of the plastic deformation over the sum of the two deformation is proportional to the ductility of materials which is one of the parameters of the machinability and the burr. The instrumented indentation tests were performed on the transparent molds of the hard polymers and the values of ratio were calculated. The machinability and the burr of three kinds of hard polymers were predicted by the ratio, and the prediction was in agreement with the experimental results from the machined surfaces of the three kinds of hard polymers.

• 폴리머
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• 제37권3호
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• pp.288-293
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• 2013

A group of molecularly imprinted polymers (MIPs) with specific recognition for chiral (S)-ibuprofen were successfully prepared based on hydrogen bonds, utilizing ${\alpha}$-methacrylic acid as a functional monomer. The IR analysis of MIPs showed that the blue- and red-shifted hydrogen bonds were formed between templates and functional monomers in the process of self-assembly imprinting and re-recognition, respectively. According to UV-Vis analysis, we found that the ratio of host-guest complexes between template molecule and functional monomer was 1:1. The effect of cross-linker's quantity on the polymerization was studied by transmission electron microscope (TEM). The adsorption selectivity experiments indicated that MIPs exhibited higher selectivity to (S)-ibuprofen than those to ketoprofen and (R)-ibuprofen, (S)-ibuprofen's structural analogs.

• 한국생산제조학회지
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• 제18권6호
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• pp.697-701
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• 2009

A simple method for the fabrication of porous nano-master for the anti-reflection effect on the transparent substrates is presented. In the conventional fabrication methods for antireflective surface, coating method using materials with low refractive index has usually been used. However, it is required to have a high cost and long processing time for mass production. In this paper, we developed a porous nano-master with anti-reflective surface for the molding stamper of the injection mold, hot embossing and UV imprinting by using the aluminum anodizing process. Through two-step anodizing and etching processes, a porous nano-master with anti-reflective surface was fabricated at the large area. Pattern size Pore diameter and inter-pore distance are about 130nm and 200nm, respectively. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

• 한국재료학회지
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• 제16권4호
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• pp.225-230
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• 2006

Nanoimprint lithography (NIL) is a novel method of fabricating nanometer scale patterns. It is a simple process with low cost, high throughput and resolution. NIL creates patterns by mechanical deformation of an imprint resist and physical contact process. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting process. Stiction between the resist and the stamp is resulted from this physical contact process. Stiction issue is more important in the stamps including narrow pattern size and wide area. Therefore, the antistiction layer coating is very effective to prevent this problem and ensure successful NIL. In this paper, an antistiction layer was deposited and characterized by PECVD (plasma enhanced chemical vapor deposition) method for metal stamps. Deposition rates of an antistiction layer on Si and Ni substrates were in proportion to deposited time and 3.4 nm/min and 2.5 nm/min, respectively. A 50 nm thick antistiction layer showed 90% relative transmittance at 365 nm wavelength. Contact angle result showed good hydrophobicity over 105 degree. $CF_2$ and $CF_3$ peaks were founded in ATR-FTIR analysis. The thicknesses and the contact angle of a 50 nm thick antistiction film were slightly changed during chemical resistance test using acetone and sulfuric acid. To evaluate the deposited antistiction layer, a 50 nm thick film was coated on a stainless steel stamp made by wet etching process. A PMMA substrate was successfully imprinting without pattern degradations by the stainless steel stamp with an antistiction layer. The test result shows that antistiction layer coating is very effective for NIL.

• 한국분말재료학회지
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• 제24권6호
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• pp.464-471
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• 2017

A metal mesh TCE film is fabricated using a series of processes such as UV imprinting of a transparent trench pattern (with a width of $2-5{\mu}m$) onto a PET film, filling it with silver paste, wiping of the surface, and heat-curing the silver paste. In this work nanosized (40-50 nm) silver particles are synthesized and mixed with submicron (250-300 nm)-sized silver particles to prepare silver paste for the fabrication of metal mesh-type TCE films. The filling of these silver pastes into the patterned trench layer is examined using a specially designed filling machine and the rheological testing of the silver pastes. The wiping of the trench layer surface to remove any residual silver paste or particles is tested with various mixture solvents, and ethyl cellosolve acetate (ECA):DI water = 90:10 wt% is found to give the best result. The silver paste with 40-50 nm Ag:250-300 nm Ag in a 10:90 wt% mixture gives the highest electrical conductance. The metal mesh TCE film obtained with this silver paste in an optimized process exhibits a light transmittance of 90.4% and haze at 1.2%, which is suitable for TSP application.

• 한국인쇄학회지
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• 제29권3호
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• pp.105-124
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• 2011

TFT-LCD consists of LCD panel on the top, circuit unit on the side and BLU on the bottom. The recent development issues of BLU-dependent TFT-LCD have been power consumption minimization, slimmerization and size maximization. As a result of this trend, LED is adopted as BLU instead of CCFL to increase brightness and to reduce thickness. In liquid crystal displays, the light efficiency is below 10% due to the loss of light in the path from a light source to an LCD panel and presence of absorptive polarizer. This low efficiency results in low brightness and high power consumption. One way to circumvent this situation is to use a reflective polarizer between backlight units and LCD panels. Since a nano-wire grid polarizer has been known as a reflective polarizer, an idea was proposed that it can be used for the enhancement of the brightness of LCD. The use of reflective polarizing film is increasing as edge type LED TV and 3D TV markets are growing. This study has been carried out to fabrication of the nano-wire grid polarizer(NWGP) and investigated the brightness enhancement of LCD through polarization recycling by placing a NWGP between an c and a backlight unit. NWGPs with a pitch of 200nm were fabricated using laser interference lithography and aluminum sputtering and wet etching. And The NWGP fabrication process was using by the UV imprinting and was applied to plastic PET film. In this case, the brightness of an LCD with NWGPs was 1.21 times higher than that without NWGPs due to polarization recycling.

• 멤브레인
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• 제31권3호
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• pp.219-227
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• 2021

분자각인막(MIM)은 특정 분자의 결합자리를 갖고 있는 다공성 고분자 막이다. 비용매유도 상분리(NIPS)법을 사용하여 분자각인막의 지지체로 사용될 P(AN-co-MA) 비대칭막을 제조하고, 여기에 표면 각인법을 적용하여 광활성 이니퍼터 도입과 photo-grafting을 통해 라이소자임 분자각인막을 제조하였다. P(AN-co-MA) 비대칭막을 3-chloropropyltrimethoxysilane과 광활성 이니퍼터 dithiocarbamate로 개질하고, acrylamide 단량체, N,N'-methylenebisacrylamide 가교제, 라이소자임 주형분자 혼합액을 UV 조사 환경에서 혼성중합 시켜 MIM을 제조하였다. 제조된 MIM의 FT-IR과 FE-SEM 및 EDS 분석을 실시한 결과 P(AN-co-MA) 막은 비대칭 단면 구조이었고 표면에 이니퍼터 그룹이 잘 결합되어 있어 MIM이 성공적으로 제조되었다. 제조공정의 변수 조절을 통해 라이소자임의 흡착량이 비각인막(NIM)에 비해 13배 큰 값인 2.7 mg/g을 갖는 P(AN-co-MA) 기반 MIM이 제조되었으며, 막여과 실험을 통해 라이소자임에 대한 오발부민의 투과선택도를 측정한 결과 MIM은 라이소자임의 선택적 결합력이 우수하였다.

• Korean Chemical Engineering Research
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• 제45권2호
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• pp.149-154
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• 2007

나노임프린트 공정기술은 나노구조물이 패턴된 스템프(혹은 몰드)를 이용하여 적절한 기판 위에 나노구조물을 복제하여 패턴을 전사하는 기술이다. 효과적인 나노임프린트 공정을 위해서는 몰드의 이형처리뿐 아니라 반대쪽의 기질과 레지스트 사이에 접착력 증가(adhesion promoter) 처리가 매우 중요한 역할을 한다. 본 연구에서는 자기조립 실란커플링제의 기상증착을 이용하여 나노임프린트 공정에서 사용되는 접착 증가막 및 표면처리 방법을 비교 분석 하였다. 이를 위해서 평탄화층(DUV-30J), 산소 플라즈마 처리, 실란커플링제 자기조립막이 비교되었다. 실란커플링제 자기조립막이 형성된 실리콘 표면은 전체적으로 나노 두께의 균일한 막이 형성되며 임프린트시 구조물들을 정밀하게 전사하였으며 3-acryloxypropyl methyl dichlorosilane(APMDS)을 이용한 자기조립막(SAMs) 처리가 평탄화층과 산소 플라즈마 처리보다 강한 접착력을 가지고 있어 나노임프린트 공정에 적합함을 알 수 있었다.

• 천문학회지
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• 제33권2호
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• pp.111-121
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• 2000

Many models of globular cluster formation assume the presence of cold dense clouds in early universe. Here we re-examine the Fall & Rees (1985) model for formation of proto-globular cluster clouds (PGCCs) via thermal instabilities in a protogalactic halo. We first argue, based on the previous study of two-dimensional numerical simulations of thermally unstable clouds in a stratified halo of galaxy clusters by Real et al. (1991), that under the protogalactic environments only nonlinear (${\delta}{\ge}1$) density inhomogeneities can condense into PGCCs without being disrupted by the buoyancy-driven dynamical instabilities. We then carry out numerical simulations of the collapse of overdense douds in one-dimensional spherical geometry, including self-gravity and radiative cooling down to T = $10^4$ K. Since imprinting of Jeans mass at $10^4$ K is essential to this model, here we focus on the cases where external UV background radiation prevents the formation of $H_2$ molecules and so prevent the cloud from cooling below $10^4$ K. The quantitative results from these simulations can be summarized as follows: 1) Perturbations smaller than $M_{min}\~(10^{5.6}\;M{\bigodot})(nh/0.05cm^{-3})^{-2}$ cool isobarically, where nh is the unperturbed halo density, while perturbations larger than $M_{min}\~(10^8\;M{\bigodot})(nh/0.05cm^{-3})^{-2}$ cool isochorically and thermal instabilities do not operate. On the other hand, intermediate size perturbations ($M_{min} < M_{pgcc} < M_{max}$) are compressed supersonically, accompanied by strong accretion shocks. 2) For supersonically collapsing clouds, the density compression factor after they cool to $T_c = 10^4$ K range $10^{2.5} - 10^6$, while the isobaric compression factor is only $10^{2.5}$. 3) Isobarically collapsed clouds ($M < M_{min}$) are too small to be gravitationally bound. For supersonically collapsing clouds, however, the Jeans mass can be reduced to as small as $10^{5.5}\;M_{\bigodot}(nh/0.05cm^{-3})^{-1/2}$ at the maximum compression owing to the increased density compression. 4) The density profile of simulated PGCCs can be approximated by a constant core with a halo of $p{\infty} r^{-2}$ rather than a singular isothermal sphere.