• Conservation Science in Museum
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• v.26
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• pp.25-34
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• 2021

3D printing technology has been actively applied for the restoration of cultural properties. However, its application to the restoration of glass cultural properties has not yet been reported and thus requires further study. In this study, 3D printing technology was used to restore a defective part of a glass sarira bottle that forms an element of a series of sarira reliquaries commissioned by Yi Seonggye (known as King Taejo after founding the Joseon Dynasty) that was excavated from Geumgangsan Mountain (designated as Treasure No. 1925) and is currently housed at the National Museum of Korea. The defective area was reproduced using 3D printing and the printed reproduction was reproduced again using an epoxy resin. This latter piece was used as the restoration component rather than the 3D printed element. After the completion of the conservation treatment, the materials used for the 3D printing were compared with transparent materials used to restore ceramics to evaluate their usability and stability. A total of five specimens were produced, including from photocurable resin made by a stereo lithography apparatus (SLA), epoxy resin, acrylic resin, and more. They were exposed to UV for 96 hours to test for yellowing. Of the two specimens made of photocurable resins and exposed to UV, one was sprayed with a UV blocking agent but the other was exposed as-is. The UV exposure test showed that the specimen made by the SLA and sprayed with a UV blocking agent and the specimen made of epoxy resin were stable in terms of yellowing with a change in the b-value was less than 1. They are thus considered to be suitable materials for the restoration of glass cultural properties. Such glass cultural properties are often diverse in shape and their restoration can be difficult as they generally consist of a range of complex parts that hamper restoration. In this regard, diverse materials should be considered when selecting materials for the restoration of glass cultural properties.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.11 no.2
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• pp.49-55
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• 2001

ZnO films were fabricated on p-type Si(100) wafer ITO glass and quartz glass by the sol-gel process using zinc acetate dihydrate as starting material. A homogeneous and stable solution was prepared by dissolving the zinc acetate dihydrate in a solution of 2-methoxyethanol and monoethanolamine (MEA). ZnO films were deposited by spin-coating at 2800 rpm for 25 s and were dried on a hot plate at $250^{\circ}C$ for 10 min. Crystallization of the films was carried out at $400^{\circ}C$~$800^{\circ}C$ for 1 h in air. X-ray diffraction (XRD) analysis, scanning electron microscopy (SEM), UV-vis transmittance spectroscopy, FTIR transmittance spectroscopy and Photoluminescence (PL) spectroscopy measurements have been used to study the structural and optical properties of the films. ZnO films highly oriented along the (002)plane were obtained. In all cases the films were found to be transparent (above 70%) in visible range with a sharp absorption edge at wavelengths of about 380nm, which is very close to the intrinsic band-gap of ZnO(3.2 eV). The low temperature band-edge photoluminescence revealed a complicated multi-line structure in terms of bound exciton complexes and the phonon replicas.

• Korean Chemical Engineering Research
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• v.45 no.2
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• pp.149-154
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• 2007

Nanoimprint lithography (NIL) is useful technique because of its low cost and high throughput capability for the fabrication of sub-micrometer patterns which has potential applications in micro-optics, magnetic memory devices, bio sensors, and photonic crystals. Usually, a chemical surface treatment of the stamp is needed to ensure a clean release after imprinting and to protect the expensive original master against contamination. Meanwhile, adhesion promoter between resin and substrate is also important in the nanoscale pattern. In this work, we have investigated the effect of surface treatment using silane coupling agent as release layer and adhesion promoter for UV-Nanoimprint lithography. Uniform SAM (self-assembled monolayer) could be fabricated by vapor deposition method. Vapor phase process eliminates the use of organic solvents and greatly simplifies the handling of the sample. It was also proven that 3-acryloxypropyl methyl dichlorosilane (APMDS) could strongly improve the adhesion force between resin and substrate compared with common planarization layer such as DUV-30J or oxygen plasma treatment.