• Journal of the Korea Academia-Industrial cooperation Society
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• v.5 no.2
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• pp.186-190
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• 2004

By this time, a mold with nano size pattern was produced using a fabrication of X-ray lithography method and in a m icro size's case it was produced using fabrication of Deep UV lithography. In this paper, we produced mold with 400 $\mu{m}$depth pattern using a new technology of SLS(Selective Laser Sintering) Rapid Prototyping method. In addition to enhance strength and thermal stability, we produced Ni structure with a thickness of 300 $\mu{m}$ on a surface of mold using electro forming method.

• Journal of Convergence for Information Technology
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• v.7 no.1
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• pp.43-48
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• 2017

The design trend is changed with the times. The design trend of recent 21 century is eco-friendly design. The optical illusion design is a new trend of digital convergence era. In this study, optical illusion patterns were designed for furniture with eco-friendly UV-curable resin. The micro-patterns of optical illusion design were fabricated with the micro-mold which was mastered using a semiconductor micro-fabrication process by photolithography technique. The micro-patterns of optical illusion design were manufactured on PET film with a roll-to-roll process using a UV-curable resin. The manufactured PET film of optical illusion micro-pattern exhibits hologram effect, optical illusion effect, and texture of metal with the backside digital printing of metal tone. The furniture of new design concept so-called emotional furniture was manufactured with the various optical illusion design patterns. The optical illusion design patterns by UV mold prospect a new trend of interior design materials.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.19 no.1
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• pp.596-602
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• 2018

Nanoimprint lithography (NIL) is an emerging technology that enables cost-effective and high-throughput nanofabrication. In ultraviolet (UV) NIL, low-cost and high-speed production can be achieved using a non-vacuum environment at room temperature and low pressure. However, there are problems with the formation of bubble defects in such an environment. This paper investigates the shape of the mold cavity and the bubble defect formation in UV NIL in a non-vacuum environment. The bubble defect formation was simulated using two-dimensional flow analysis and the VOF method for commonly used cavity mold shapes (rectangular, elliptical, and triangular). The characteristics of the resist flow front and various contact angles were also analyzed. The shape of the mold cavity had a very significant effect on the bubble defect formation. For all cavity shapes, a smaller contact angle with the mold and larger contact angle with the substrate decreased the possibility of bubble defect formation. The elliptical shape was the most effective for preventing bubble defect formation.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1939-1943
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• 2008

Deformation of a mold is measured and analyzed in alignment and curing processes of UV-Imprint Lithography. We are focused on mold deformation caused by a UV resin, which is laminated between a mold and a target glass-panel. The UV resin is viscous in case of liquid state, and the resin will be solidified when being exposed by the ultra-violet light. The viscosity of the resin causes shear force on the mold during the alignment process. Moreover, the shrinkage during phase change from liquid to solid may cause residual stress on the mold. The experiments for measuring temperature and strain are made during alignment and curing process. Strain-gages and thermocouples are used for measuring the strain and variation of temperature on several points of the mold, respectively. The deformation of mold is also simulated and analyzed. The simulation results are compared with the experiments. Finally, sources of alignment errors in large area UV-nanoimprint lithography are discussed.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.34 no.12
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• pp.1849-1856
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• 2010

Glass/resin/glass laminate structures are used in the automobile, biological, and display industries. The sandwich structures are used in the micro/nanoimprint process to fabricate a variety of functional components and devices in fields such as display, optics, MEMS, and bioindustry. In the process, micrometer- or nanometer-scale patterns are transferred onto the substrate using UV curing resins. The demodling process has an important impact on productivity. In this study, we investigated the fracture behavior of glass/resin/glass laminates fabricated via UV curing. We performed measurements of the adhesion force and the interfacial energy between the mold and resin materials using the four-point flexural test. The bending-test measurements and the load-displacement curves of the laminates indicate that the fracture behavior is influenced by the interfacial energy between the mold and resin and the resin thickness.

• Transactions of the Society of Information Storage Systems
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• v.2 no.2
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• pp.91-95
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• 2006

High-density image sensors rave microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using UV transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.

• 정보저장시스템학회:학술대회논문집
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• 2005.10a
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• pp.17-21
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• 2005

High-density image sensors have microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using W transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.

• Tribology and Lubricants
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• v.26 no.5
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• pp.297-302
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• 2010

This study is focused on the resin layer formation of UV imprinting process by changing imprinting pressure and period. The mold shape is made for the process of window open over the pattern transfer area and the imprinting period is assigned as the time just before the UV light curing. The residual layer is measured by changing the imprinting period and pressure magnitude, and the measured data of residual layer provides useful information for the design of the process conditions of imprinting processes.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.12 no.5
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• pp.16-22
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• 2013

A two-dimensional photonic crystal structure was investigated using a roll-to-roll nanoreplication and physical vapor deposition processes for the inexpensive enhanced fluorescence substrate which is not sensitive to the polarization directions of excitation light source. An 8 inch silicon master having nano dot array with a diameter of 200 nm, a height of 100 nm and a pitch of 400 nm was prepared by KrF laser scanning lithography and reactive ion etching processes. A flexible polymer mold was fabricated by flat type UV replication process and a deposition of 10 nm nickel layer as an anti-adhesion layer. A roll mold was prepared by warping the flexible polymer mold on an aluminum roll base and a roll-to-roll UV replication process was carried out using the roll mold. After the deposition of ~ 100 nm $TiO_2$ layer on the replicated nano dot array, a 2 dimensional photonic crystal structure was realized with a resonance wavelength of 635 nm for both p- and s-polarized light sources.

• Proceedings of the KAIS Fall Conference
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• 2002.11a
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• pp.238-242
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• 2002

본 논문에서는 3차원 마이크로구조물을 위한 새로운 Thick Photoresist(TPR) 공정 기술을 개발하였다. 일반적으로 Thin Photoresist는 얇은 두께로 코팅을 할 수 있다. 그러나 SU-8과 같은 TRP은 몇 십 ㎛ 또는 그 이상으로 코팅이 가능하고 높은 종횡비를 얻을 수 있다. SU-8과 같은 TPR을 사용하여 마이크로구조물을 제작할 때 TPR의 crack들은 bake시의 갑작스런 tool down에 의한 stress에 의해 나타나는데, 이러한 crack들은 마이크로구조물의 도금을 어렵게 만든다. 본 논문에서는 TPR의 코팅, baking 시간 조절, cool down과 PEB(Post Expose Sake) 시간 조절을 통하여 stress에 의해 발생되는 crack이 없는 3차원 마이크로구조물을 제작할 수 있는 새로운 공정 기술을 개발하였다.