• Title/Summary/Keyword: UV 레이저

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Fabrication of a UV laser micromachining platform with process-monitoring optical modules (공정 모니터링 광학모듈이 장착된 UV 레이저 미세가공 플랫폼 제작)

  • Sohn, H.;Lee, J.H.;Jeong, Y.W.;Kim, S.I.;Hahn, J.W.
    • Laser Solutions
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    • v.11 no.2
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    • pp.33-38
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    • 2008
  • Laser micromachining has increasingly been adopted in various advanced industries where the high-precision machining of large-area, high-density and multi-layered components is in a strong demand. To effectively meet the requirements, the laser micromachining process must be carefully monitored. In order to facilitate the development of a new laser micromachining process and/or a new system, we have fabricated a UV laser micromachining platform that is equipped with optical modules for monitoring the process online. They include a laser power stabilizing module, a module for laser-induced breakdown spectroscopy, and an auto-focusing module.

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Radiation Effects on Fiber Bragg Grating Sensors Written in UV KrF Laser Process Condition (UV KrF 레이저 공정조건에 따른 FBG 센서의 방사선 영향)

  • Kim, Jong-Yeol;Lee, Nam-Ho;Jung, Hyun-Kyu
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.20 no.1
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    • pp.161-166
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    • 2016
  • We studied the effect of $Co^{60}$ gamma-radiation on the FBGs by a variation of grating the fabrication parameters. The FBGs were fabricated in a different UV KrF laser intensity using the same boron co-doped photo-sensitive fiber and exposed to gamma-radiation up to a dose of 33.8 kGy. According to the experimental data and analysis results, We confirmed that the laser intensity for grating inscription has a highly effect on the radiation sensitivity of the FBGs and the radiation-induced Bragg wavelength shift by the change of laser process condition showed a difference more than about 30 %.

Study of Laser Trimming and Cutting of Printed Circuit Board by using UV Laser with Nanosecond Pulse Width (나노초 펄스폭을 갖는 자외선 레이저를 이용한 전자회로기판의 저항체 트리밍과 절단공정 특성에 관한 연구)

  • Ryu, Kwang-Hyun;Shin, Suk-Hoon;Park, Hyeong-Chan;Nam, Gi-Jung;Kwon, Nam-Ic
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.10
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    • pp.23-28
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    • 2010
  • Resistance trimming and cutting processes of printed circuit board by making use of high power UV laser with nano-second pulse width have been proposed and investigated experimentally. Also laser-based application system with high flexibility and complex has been designed and adopted power controller, auto beam size control, auto-focusing and control program developed for ourselves. The function of each module shows that they can be reliable for industrial equipments. Resistance trimming method used a plunge and double cut process with $20{\mu}m$ spot size beam. Results show that double cut process is more effective to control resistance trimming in precision than plunge cut process.

Study on High Speed Laser Cutting of Rigid Flexible Printed Circuit Board by using UV Laser with Nano-second Pulse Width (자외선 나노초 펄스 레이저를 이용한 경연성(Rigid Flexible) 인쇄전자회로기판(Printed Circuit Board) 고속 절단에 관한 연구)

  • Bae, Han-Sung;Park, Hee-Chun;Ryu, Kwang-Hyun;Nam, Gi-Jung
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.2
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    • pp.20-24
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    • 2010
  • High speed cutting processes of rigid flexible printed circuit board by making use of high power UV laser with nano-second pulse width have been proposed and investigated experimentally. Also robust laser cutting system has been designed and developed in order to obtain a good cutting quality of rigid and flexible PCB with multi-layers (2-6 layers). Power controller module developed for ourselves is adapted to control the laser output power in the range less than 1%. The systems show the good performance of cutting speed, cutting width and cutting accuracy, respectively. Especially we have confirmed that the short circuit problem due to the carbonized contamination occurred in cross section of multi-layers by thermal effect of high power laser has been improved largely by using multi-pass cutting process with low power and high speed.

Characteristics of direct laser micromachining of IC substrates using a nanosecond UV laser (나노초 UV 레이저 응용 IC 기판 소재 조성별 가공 특성)

  • Sohn, Hyon-Kee;Shin, Dong-Sig;Choi, Ji-Yeon
    • Laser Solutions
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    • v.15 no.3
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    • pp.7-10
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    • 2012
  • Dimensions (line/space) of circuits in IC substrates for high-end chips (e.g. CPU, etc.) are anticipated to decrease as small as $10{\mu}m/10{\mu}m$ in 2014. Since current etch-based circuit-patterning processes are not able to address the urgent requirement from industry, laser-based circuit patterning processes are under active research in which UV laser is used to engrave embedded circuits patterns into IC substrates. In this paper, we used a nanosecond UV laser to directly fabricate embedded circuit patterns into IC substrates with/without ceramic powders. In experiments, we engraved embedded circuit patterns with dimensions (width/depth) of abut $10{\mu}m/10{\mu}m$ and $6{\mu}m/6{\mu}m$ into the IC substrates. Due to the recoil pressure occurring during ablation, the circuit patterning of the IC substrates with ceramic powders showed the higher ablation rate.

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Fabrication and Characterization of Ge/B-doped Optical Fiber for UV Poling Applications (UV 폴링용 Ge와 B가 첨가된 실리카 유리 광섬유 제조 및 특성 평가)

  • Kim, Bok-Hyeon;Ahn, Tae-Jun;Heo, Jong;Shin, Dong-Wook;Han, Won-Taek
    • Journal of the Korean Ceramic Society
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    • v.39 no.12
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    • pp.1158-1163
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    • 2002
  • An Ge/B-doped optical fiber with high photosensitivity was fabricated to induce large second-order optical nonlinearity by UV poling. It was found that long period fiber gratings were inscribed on the fiber by the 248 nm KrF excimer laser irradiation with pulse energy of 116 mJ/$cm^2$ and pulse frequency of 10 Hz without hydrogen loading treatment. The photosensitivity was measured by use of the long period fiber grating pair method and the refractive index change of 3.3$10{\times}^{-3}$ was found to be induced in the core of the optical fiber by the KrF excimer laser irradiation of 8.67 kJ/$cm^2$. An H-shaped optical fiber was also fabricated for the UV poling through optimization of the fiber drawing condition.

Computational Analysis of 355 nm UV Laser Single-Pulsed Machining of Copper Material Considering the Strain Rate Effect (변형률 속도 효과를 고려한 355 nm UV 레이저 구리재질의 싱글 펄스 전산해석)

  • Lee, Jung-Han;Oh, Jae Yong;Park, Sang Hu;Shin, Bo Sung
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.9 no.3
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    • pp.56-61
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    • 2010
  • Recently, UV pulse laser is widely used in micro machining of the research, development and industry field of IT, NT and BT products because the laser short wavelength provides not only micro drilling, micro cutting and micro grooving which has a very fine line width, but also high absorption coefficient which allows a lot of type of materials to be machined more easily. To analyze the dynamic deformation during a very short processing time, which is nearly about several tens nanoseconds, the commercial Finite Element Analysis (FEA) code, LS-DYNA 3D, was employed for the computitional simulation of the UV laser micro machining behavior for thin copper material in this paper. A finite element model considering high strain rate effect is especially suggested to investigate the micro phenomena which are only dominated by mechanically pressure impact in disregard of thermally heat transfer. From these computational results, some of dynamic deformation behaviors such as dent deformation shapes, strains and stresses distributions were observed and compared with previous experimental works. These will help us to understand micro interaction between UV laser beam and material.

A Study on Sapphire Wafer Scribing Using Picosecond Pulse laser (피코초 펄스 레이저를 이용한 사파이어 웨이퍼 스크라이빙에 관한 연구)

  • Moon, Jae-Won;Kim, To-Hoon
    • Laser Solutions
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    • v.8 no.2
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    • pp.7-12
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    • 2005
  • The material processing of UV nanosecond pulse laser cannot be avoided the material shape change and contamination caused by interaction of base material and laser beam. Nowadays, ultra short pulse laser shorter than nanosecond pulse duration is used to overcome this problem. The advantages of this laser are no heat transfer, no splashing material, no left material to the adjacent material. Because of these characteristics, it is so suitable for micro material processing. The processing of sapphire wafer was done by UV 355nm, green 532nm, IR 1064nm. X-Y motorized stage is installed to investigate the proper laser beam irradiation speed and cycles. Also, laser beam fluence and peak power are calculated.

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