• Title/Summary/Keyword: Two-port SAW resonator

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Development of a SAW based Gyroscope (표면탄성파를 이용한 자이로스코프 개발)

  • Oh, Hae-Kwan;Yun, Sung-Jin;Lee, Kee-Keun;Wang, Wen;Yang, Sang-Sik
    • Journal of the Korea Institute of Military Science and Technology
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    • v.12 no.1
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    • pp.106-113
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    • 2009
  • This paper presents a surface acoustic wave(SAW) micro-electro-mechanical-systems(MEMS) interdigital transducer (IDT) gyroscope with 80MHz central frequency on a $128^{\circ}\;YX\;LiNbO_3$, which is consisted of a two-port SAW resonator, metallic dots and dual delay lines for the sensor and reference oscillators. Reason for using two delay line oscillators is to extract the gyroscope effect by comparing the resonant frequencies between two oscillators and to compensate the temperature effect. Based on the coupling of modes(COM) simulation, an 80MHz two ports SAW resonator and dual delay line were fabricated and characterized by the network analyzer. Obtained sensitivity was $109Hz/deg{\cdot}s^{-1}$ in the angular rate range of $0{\sim}1000deg/s$. Good Linearity and superior directivity were observed.

Double-Mode SAW Filter for Mobile Communication System (이중 모드 결합에 의한 이동 통신 기기용 SAW 필터)

  • 정영지;진익수;황금찬
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.18 no.4
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    • pp.468-480
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    • 1993
  • In this paper, at first, the characteristics of double mode SAW (DMS) resonator are analysed by applying the wave guide model and coupled mode theory to 1-port resonator. The DMS resonators (2-pole), which are arranged in a close, parallel configuration of two identical 1-port resonators on a single plate, and 4-pole DMS filters are designed and fabricated at the center frequency of 150.15 MHz with 3-dB bandwidth of 80 KHz. The empirical design characteristics are obtained from the comparison of experimental and theoretical values resulted from several fabrications, and the narrow bandpass filters are implemented on the basis of the above empirical results, which can be used to mobile communication systems. A ST-cut quartz substrate is selected for the stable temperature-frequence characteristics, and high resolution photolithography is applied to the fabrication of filter to get the fine electrode patterns.

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Effect of thermal annealing on surface acoustic wave properties of AlN films (AlN 박막의 열처리에 따른 표면탄성파의 특성)

  • Hoang, Si-Hong;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.71-72
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    • 2008
  • In this paper, the effect of thermal annealing on surface acoustic wave (SAW) properties of aluminum nitride (AlN) films were described. The films were fabricated on Si substrates by using Pulsed Reactive Magnetron Sputtering System. The SAW properties of $600^{\circ}C$-annealed AlN films were better than those of both $900^{\circ}C$-annealed AlN films and as-deposited ones. Their SAW velocities (Raleigh mode) and insertion losses were about 5212 m/s and 16.19 dB at $600^{\circ}C$ with the wavelength of $40{\mu}m$. The dependence of characteristics of AlN films on annealing conditions were also evaluated by using Fourier Transform-Infrared Spectroscopy (FT-IR) Spectrums and Atomic Force Microscopy (AFM).

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Fabrication of SAW for harsh environment USN and its characteristics (극한 환경 USN용 SAW 제작과 그 특성)

  • Chung, Gwiy-Sang;Hoang, Si-Hong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.04b
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    • pp.13-16
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    • 2009
  • In this study, AlN thin films were deposited on a polycrystalline (poly) 3C-SiC buffer layer for surface acoustic wave (SAW) applications using a pulsed reactive magnetron sputtering system. AFM, XRD and FT-IR were used to analyze structural properties and preferred orientation of the AlN/3C-SiC thin film. Suitability of the film in SAW applications was investigated by comparing the SAW characteristics of an interdigital transducer (IDT)/AlN/3C-SiC structure with the IDT/AIN/Si structure at 160 MHz in the temperature range $30-150^{\circ}C$. These experimental results showed that AlN films on the poly 3C-SiC layer were highly (002) oriented. Furthermore, the film showed improved temperature stability for the SAW device, $TCF\;=\;-18\;ppm//^{\circ}C$. The change in resonance frequency according to temperature was nearly linear. The insertion loss decrease was about $0.033dB/^{\circ}C$. However, some defects existed in the film, which caused a slight reduction in SAW velocity.

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SAW characteristics of AlN films sputtered on SiC buffer layer for harsh environment applications (SiC 버퍼충위 스퍼터링법으로 증착된 극한 환경용 AlN박막의 SAW 특성)

  • Hoang, Si-Hong;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.273-273
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    • 2008
  • This paper describes the frequency response of two-port surface acoustic wave (SAW) resonator made of 002-polycrystalline aluminum nitride (AlN) thin film on 111-poly 3C-SiC buffer layer. In there, Polycrystalline AlN thin films were deposited on polycrystalline 3C-SiC buffer layer by pulsed reactive magnetron sputtering system, the polycrystalline 3C-SiC was grown on $SiO_2$/Si sample by CVD. The obtained results such as the temperature coefficient of frequency (TCF) of the device is about from 15.9 to 18.5 ppm/$^{\circ}C$, the change in resonance frequency is approximately linear (30-$150^{\circ}C$), which resonance frequency of AlN/3C-SiC structure has high temperature stability. The characteristics of AlN thin films grown on 3C-SiC buffer layer are also evaluated by using the XRD, and AFM images.

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Effect of a 3C-SiC buffer layer on SAW properties of AlN films (3C-SiC 버퍼층이 AlN 박막형 SAW 특성에 미치는 영향)

  • Hoang, Si-Hong;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.235-235
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    • 2009
  • This paper describes the influence of a polycrystalline (poly) 3C-SiC buffer layer on the surface acoustic wave (SAW) properties of poly aluminum nitride (AlN) thin films by comparing the center frequency, insertion loss, the electromechanical coupling coefficient ($k^2$), andthetemperaturecoefficientoffrequency(TCF) of an IDT/AlN/3C-SiC structure with those of an IDT/AlN/Si structure, The poly-AlN thin films with an (0002)-preferred orientation were deposited on a silicon (Si) substrate using a pulsed reactive magnetron sputtering system. Results show that the insertion loss (21.92 dB) and TCF (-18 ppm/$^{\circ}C$) of the IDT/AlN/3C-SiC structure were improved by a closely matched coefficient of thermal expansion (CTE) and small lattice mismatch (1 %) between the AlN and 3C-SiC. However, a drawback is that the $k^2(0.79%)$ and SAW velocity(5020m/s) of the AlN/3C-SiC SAW device were reduced by appearing in some non-(0002)AlN planes such as the (10 $\bar{1}$ 2) and (10 $\bar{1}$ 3) AlN planes in the AlN/SiC film. Although disadvantages were shown to exist, the use of the AlN/3C-SiC structure for SAW applications at high temperatures is possible. The characteristics of the AlN thin films were also evaluated using FT-IR spectra, XRD, and AFM images.

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Effects of thermal annealing of AlN thin films deposited on polycrystalline 3C-SiC buffer layer (다결정 3C-SiC 버퍼층위 증착된 AlN 박막의 열처리 효과)

  • Hong, Hoang-Si;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.112-112
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    • 2009
  • In this study, the effect of a long post-deposition thermal annealing(600 and 1000 $^{\circ}C$) on the surface acoustic wave (SAW) properties of polycrystalline (poly) aluminum-nitride (AlN) thin films grown on a 3C-SiC buffer layer was investigates. The poly-AlN thin films with a (0002) preferred orientation were deposited on the substrates by using a pulsed reactive magnetron sputtering system. Experimental results show that the texture degree of AlN thin film was reduced along the increase in annealing temperature, which caused the decrease in the electromechanical coupling coefficient ($k^2$). The SAW velocity also was decreased slightly by the increase in root mean square (RMS) roughness over annealing temperature. However, the residual stress in films almost was not affect by thermal annealing process due to small lattice mismatch different and similar coefficient temperature expansion (CTE) between AlN and 3C-SiC. After the AlN film annealed at 1000 $^{\circ}C$, the insertion loss of an $IDT/AlN/3C-SiC/SiO_2/Si$ structure (-16.44 dB) was reduced by 8.79 dB in comparison with that of the as-deposited film (-25.23 dB). The improvement in the insertion loss of the film was fined according to the decrease in the grain size. The characteristics of AlN thin films were also evaluated using Fourier transform-infrared spectroscopy (FT-IR) spectra and X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM) images.

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